Tunneling through narrow-gap semiconductor Sb2Te3 barrier

Tunnel experiments have been performed on Au/Sb₂Te₃/Al tunnel junctions to study elastic interelectrode tunneling through the small energy gap of a narrow-gap semiconductor. Tunnel conductance exhibited narrow width conductance peak at zero bias voltage. This behaviour is in accordance with the result of the theoretically calculated tunnel conductance, in which the nonparabolic dispersion relation within the energy gap of the narrow-gap semiconductor used as a tunnel barrier in a metal/narrow-gap semiconductor/metal tunnel structure is included. And some interesting structures are also observed in the conductance curves.     

Oxidation process of Mg films by using high-concentration ozone for magnetic tunnel junctions

Ozone oxidization process of metal Mg film for the barrier formation in magnetic tunnel junctions (MTJs) is investigated. Ozone exposure method is expected to oxidize ultra-thin metal films more mildly than with the plasma oxidization method, since the energy level of atomic oxygen is ∼2 eV lower in the ozone method than in the plasma method. The main results were as follows: (1) In the case of ozone oxidation, the diffusion coefficient of oxygen in the insulator is much smaller than that in plasma oxidation. (2) Mg–O film thickness, which is formed by reaction immediately on the metal Mg surface, is thicker as compared with the Al case. (3) In the ozone oxidation method of metal films with the thickness of more than the film thickness formed by reaction, the oxidation is spontaneously stopped at the interface to the bottom Co–Fe. As a result, we succeeded in inducing a TMR ratio of 25% at room temperature in MTJs with Mg(1.3 nm)–O barrier with wider exposure range than in the plasma case.     

Exponential temperature dependence and low-bias conductance anomaly in transport through Langmuir–Blodgett monolayer devices

Current–voltage characteristics are reported as a function of temperature (2–300 K) for 2.8-nm-thick eicosanoic acid (C₂₀) Langmuir–Blodgett organic monolayers sandwiched between planar platinum electrodes of area 5–200 m². An exponential temperature dependence observed between 60 and 300 K does not fit standard activated conduction, but can be described by thermionic field emission through a thin 0.1-eV barrier. A second model of tunneling through a vibrationally excited harmonic oscillator barrier also fits the data. A broad 200 meV dip in conductance at V=0 suggests strong inelastic tunneling, supporting the vibrational model. PACS 73.40.Gk; 68.47.Pe; 73.63.-b     

Temperature and bias voltage dependence of Co/Pd multilayer-based magnetic tunnel junctions with perpendicular magnetic anisotropy

Temperature- and bias voltage-dependent transport measurements of magnetic tunnel junctions (MTJs) with perpendicularly magnetized Co/Pd electrodes are presented. Magnetization measurements of the Co/Pd multilayers are performed to characterize the electrodes. The effects of the Co layer thickness in the Co/Pd bilayers, the annealing temperature, the Co thickness at the MgO barrier interface, and the number of bilayers on the tunneling magneto resistance (TMR) effect are investigated. TMR-ratios of about 11% at room temperature and 18.5% at 13 K are measured and two well-defined switching fields are observed. The results are compared to measurements of MTJs with Co-Fe-B electrodes and in-plane anisotropy.     

Switching between one- and two-dimensional conductance: Coupled chains in the monolayer of Pb on Si(5 5 7)

Four-point conductance measurements of a high temperature annealed monolayer of Pb on Si(5 5 7) are combined with tunneling microscopy (STM) and LEED for structural investigations. We found extremely high surface state conductance which becomes quasi-one-dimensional below a critical temperature of T_c = 78 K. The change from low to extremely high conductance anisotropy is associated with a reversible order-disorder phase transition with a temperature dependence ∝1/T + const. along the chains below the phase transition. Below the phase transition order is found simultaneously in the lateral separation between Pb chains and along the chains. There a 10-fold superperiodicity appears. We suggest that strong two-dimensional coupling, leading to electronic stabilization of terraces with a width of lattice constants, results in perfect nesting normal to the chains at E_F (below T_c), which is the origin of this switching to one-dimensional behavior. Therefore, no metal-insulator transition is expected at low temperature.     

Low-temperature STM/STS studies on boron-doped (1 1 1) diamond films

We have performed scanning tunneling microscopy/spectroscopy (STM/STS) experiments on (1 1 1)-oriented epitaxial films of heavily boron-doped diamond (T_c∼5.4 K). We present that tunneling conductance spectra show temperature-dependent spatial variations. In the low-temperature region (T=0.47 K), the tunneling spectra do not show strong spatial dependence and a superconducting energy gap is observed independent of the surface morphology. In the high-temperature region (T=4.2 K), on the other hand, the tunneling conductance spectra show significant spatial dependence, indicating the inhomogeneous distribution of the superconducting property due to the distribution of boron atoms.     

Spin transport and relaxation in graphene

We review our recent work on spin injection, transport and relaxation in graphene. The spin injection and transport in single layer graphene (SLG) were investigated using nonlocal magnetoresistance (MR) measurements. Spin injection was performed using either transparent contacts (Co/SLG) or tunneling contacts (Co/MgO/SLG). With tunneling contacts, the nonlocal MR was increased by a factor of ∼1000 and the spin injection/detection efficiency was greatly enhanced from ∼1% (transparent contacts) to ∼30%. Spin relaxation was investigated on graphene spin valves using nonlocal Hanle measurements. For transparent contacts, the spin lifetime was in the range of 50-100 ps. The effects of surface chemical doping showed that for spin lifetimes in the order of 100 ps, charged impurity scattering (Au) was not the dominant mechanism for spin relaxation. While using tunneling contacts to suppress the contact-induced spin relaxation, we observed the spin lifetimes as long as 771 ps at room temperature, 1.2 ns at 4 K in SLG, and 6.2 ns at 20 K in bilayer graphene (BLG). Furthermore, contrasting spin relaxation behaviors were observed in SLG and BLG. We found that Elliot-Yafet spin relaxation dominated in SLG at low temperatures whereas Dyakonov-Perel spin relaxation dominated in BLG at low temperatures. Gate tunable spin transport was studied using the SLG property of gate tunable conductivity and incorporating different types of contacts (transparent and tunneling contacts). Consistent with theoretical predictions, the nonlocal MR was proportional to the SLG conductivity for transparent contacts and varied inversely with the SLG conductivity for tunneling contacts. Finally, bipolar spin transport in SLG was studied and an electron-hole asymmetry was observed for SLG spin valves with transparent contacts, in which nonlocal MR was roughly independent of DC bias current for electrons, but varied significantly with DC bias current for holes. These results are very important for the use of graphene for spin-based logic and information storage applications.     

Effect of Pb on the electrical properties of a-Ge20Se80 glasses

The present paper reports the effect of Pb impurity (low ∼2 at% and high ∼10 at%) on the ac conductivity (σ_ac) of a-Ge₂₀Se₈₀ glass. Frequency-dependent ac conductance and capacitance of the samples over a frequency range ∼100 Hz to 50 kHz have been taken in the temperature range ∼268 to 358 K. At frequency 2 kHz and temperature 298 K, the value of σ_ac increases at low as well as at higher concentration of Pb. σ_ac is proportional to ω^s for undoped and doped samples. The value of frequency exponent (s) decreases as the temperature increases. The static permittivity (ε_s) increases at both Pb concentrations. These results have been explained on the basis of some structural changes at low and higher concentration of Pb impurity.     

约瑟夫森结AlOx-Al隧道势垒的实验研究

通过Ｘ光电子能谱（ＸＰＳ）、阳极氧化电压谱（ＡＶＳ）和Ｆｉｓｋｅ台阶电压的测量，研究了约瑟夫森结中ＡｌＯ_x-Ａｌ隧道势垒．发现结的隧道势垒最佳沉积Ａｌ层厚度为７ｎｍ，Ａｌ上形成ＡｌＯ_x厚度只取决于氧化条件，与沉积Ａｌ厚无关，势垒Ａｌ氧化物可能含有一个像ＡｌＯＯＨ态的ＯＨ基团．同时，估算了剩余Ａｌ厚度，证实了结中Ａｌ／Ｎｂ间在４.２Ｋ时，由常态Ａｌ而产生临近效应的存在 关键词：     

Electron tunneling through superconducting A1/monolayer/Pb junctions

The current-voltage characteristic of Al/adsorbed monolayer/Pb junctions was measured at 77, 4.2 and 1.8K at applied voltages from 1 to 3 mV. At 77K the current changes linearly with voltage whereas at 4.2 and 1.8 K the relationship becomes nonlinear. From the results at 1.8 K we obtain an approximate band gap for Pb equal to 2.6 meV. The observation of a nonlinear current-voltage characteristic at temperatures where Pb becomes superconducting is strong evidence that the observed current through the insulator is a tunneling current.     

Dynamics of copper atoms on Si(1 1 1)-7 × 7 surfaces

This study investigated the dynamics of copper atoms adsorbed on Si(1 1 1)-7 × 7 surfaces between 300 K and 623 K using a variable-temperature scanning tunneling microscope (STM). The diffusion behavior of copper clusters containing up to ∼6 atoms into a particular half unit cell of the 7 × 7 reconstructed Si(1 1 1) surface was considered. The movements and the formation of copper clusters were tracked in detail. The activation energies and pre-exponential factors for various diffusion paths were estimated. Finally, the Cu-etching-Si process and the quasi-5 × 5 incommensurated phase of Cu/Si islands were discussed.     

Scanning tunneling microscopy study on initial stage of atomic hydrogen adsorption on the Si(1 1 1) 7 × 7 surface

Initial hydrogen adsorption on the Si(1 1 1) 7 × 7 surface was studied by scanning tunneling microscopy (STM) in an ultrahigh vacuum. Room temperature adsorbed hydrogen on the adatom in the 7 × 7 reconstruction led to depression of adatoms in the STM images. The hydrogen uptake curve at the adatom site as a function of hydrogen exposure time was well represented by Langmuir adsorption. No preferential adsorption was seen among four inequivalent adatoms in the 7 × 7 reconstruction. Adsorption of the adjacent center and corner adatoms respectively showed ∼10% higher adsorption. Even though the number of reacted adatoms in the half unit of the 7 × 7 reconstruction was statistically random, the number of reacted adatoms in the nearest neighbor half unit was enhanced as the number of reacted sites increased in the half unit.     

Halogen chemisorption, the pairwise diffusion of I, and trapping by defects on Si(1 0 0)

Halogen molecules dissociatively chemisorb on Si(1 0 0)-(2 × 1), and the bonding structures that they adopt can be elucidated with scanning tunneling microscopy. Of the Cl, Br, and I group, Cl has the highest single atom diffusion barrier, and both single and paired adatoms are observed at 295 K. The barrier is smaller for Br, and the adatoms can interrogate the surface until they form pairs, which are then immobile, or are trapped at C-type defects. The barrier is smallest for I, allowing the formation of pairs and trapped states, but the pairs are mobile at ambient temperature. Their motion is thermally activated, the events are random, and the diffusivities along and across the dimer row are ∼0.42 and ∼0.17 Å²/s at 295 K. The respective energy barriers for pairwise diffusion are ∼0.76 and ∼0.82 eV, assuming an attempt frequency of 10¹² s⁻¹. Studies over long times reveal that pairwise diffusion at low coverage is ultimately quenched by the increasing density of C-type defects, i.e. the increasing amounts of dissociated H₂O.     

Low energy dynamics of two-dimensional lateral tunnel junctions

We report on the low temperature tunneling characteristics of two-dimensional lateral tunnel junctions (2DLTJs) consisting of two coplanar two-dimensional electron systems separated by an in-plane tunnel barrier. The tunneling conductance of the 2DLTJ exhibits a characteristic dip at small voltages—consistent with the phenomenon of zero-bias anomaly in low-dimensional tunnel junctions—and a broad conductance peak at the Coulombic energy scale. The conductance peak remains robust under magnetic fields well into the quantum Hall regime. We identify the broad conductance maxima as the signature of the pseudogap in the tunneling density of states below the characteristic Coulomb interaction energy of the 2DLTJ.     

Low temperature CO induced growth of Pd supported on a monolayer silica film

Nucleation, growth and sintering of Pd deposited on an ultra-thin silica film were studied by scanning tunneling microscopy and infrared reflection absorption spectroscopy. No preferential nucleation of Pd on the silica surface was observed both at 90 and 300 K deposition. When adsorbed on Pd clusters formed at 90 K, CO causes a strong sintering effect even at this temperature. The results are rationalized on the basis of a high mobility of Pd carbonyl-like species on the silica film. At a given Pd coverage, the extent of CO induced sintering cannot be achieved by annealing in vacuum. In addition, vacuum sintering, which commences above 700 K, goes simultaneously with interdiffusion of Pd and support.     

Pentacene islands grown on ultra-thin SiO2

Ultra-thin oxide (UTO) films were grown on Si(1 1 1) in ultrahigh vacuum at room temperature and characterized by scanning tunneling microscopy. The ultra-thin oxide films were then used as substrates for room temperature growth of pentacene. The apparent height of the first layer is 1.57 ± 0.05 nm, indicating “standing up” pentacene grains in the thin film phase were formed. Pentacene is molecularly resolved in the second and subsequent molecular layers. The measured in-plane unit cell for the pentacene (0 0 1) plane (ab plane) is a = 0.76 ± 0.01 nm, b = 0.59 ± 0.01 nm, and γ = 87.5 ± 0.4°. The films are unperturbed by the UTO’s short-range spatial variation in tunneling probability, and reduce its corresponding effective roughness and correlation exponent with increasing thickness. The pentacene surface morphology follows that of the UTO substrate, preserving step structure, the long range surface rms roughness of ∼0.1 nm, and the structural correlation exponent of ∼1.     

CdS thin films growth by fast evaporation with substrate rotation

CdS thin films were grown by fast evaporation technique combined with substrate rotation. The source evaporation temperature was maintained at 600 °C and the substrate temperature at 350 °C with background pressure of 1.0 m Torr. The substrates were corning glass 2947 with dimension of 1 in. × 1 in. rotate at 500 rpm during the growth. In order to verify the quality of the CdS films, the samples were analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and optical measurements. The films shown a flat uniformity thickness with growth rate of ∼3.5 nm/s, the orientation was in the cubic-(1 1 1) and hexagonal-(0 0 2) plane in dependence of the growth time, grain size ∼5 nm, roughness uniformity ∼2.7 nm, transmittance in the visible region spectrum ∼80%, energy band gap between 2.39 and 2.42 eV and short circuit photocurrent density (J_SC) losses in the CdS films of 4.7 mA/cm².     

Thickness dependence of the surface plasmon dispersion in ultrathin aluminum films on silicon

The collective excitation in Al films deposited on Si(1 1 1)-7 × 7 surface was investigated by high-resolution electron-energy-loss spectroscopy (HREELS), X-ray photoelectron spectroscopy (XPS) and scanning tunneling microscopy (STM). At the Al film thickness d < 10 ML, the surface plasmon of Al film has only a small contribution to the observed energy-loss peaks in the long wavelength limit (q_∥≈0), while its contribution becomes significant for q_∥>d^-1. More interestingly, for thin Al films, the initial slope of the surface plasmon dispersion curve is positive at q_∥∼0, in a sharp contrast to bulk Al surface where the energy dispersion is negative. These observations may be explained based on the screening interaction of the space charge region at the Al-Si interface.     

A comparison of barrier type tunnel junction and point contact tunnel junction formed on the same highT c material

By making a combination of both point contact and barrier type tunnel junctions on a single sample of the highT _c superconductor BSCCO (2212) single crystal, we have shown that as the tunneling tip is slowly retracted from the surface a point contact junction gradually evolves from a N-S short to a high resistance tunnel junction. The scaled dynamic conductance (dI/dV) of this point contact tunnel junction becomes almost identical to that of a conventional barrier type tunnel junction and both show a linear dI/dV —V curve. The observation implies that at high resistance a point contact junction behaves in the same way as a barrier type tunnel junction. We suggested that the almost linear tunneling conductance obtained in both the cases most likely arises due to an intrinsic characteristic of the surface of the crystal comprising of a mosaic of superconducting regions of the order of a few nanometers. We also conclude that the barrierless (N-S) point contact obtained by piercing the surface oxide layer of the crystal shows Andreev reflection which we suggest as the origin of the zero bias anomaly often observed in point contact junctions.     

量子线/绝缘层/p波超导体结的隧道谱

用Bogoliubov-de Gennes方程来研究量子线/绝缘层/p波超导体结(q/I/p)中的准粒子输运过程，利用推广的Blonder，Tinkham和Klapwijk模型计算绝对零度和有限温度下q/I/p的一级谐波隧道谱.和量子线/绝缘层/d波超导体结的一级谐波隧道谱不同的是q/I/p的一级谐波隧道谱中存在零偏压电导峰.随着q/I/p中绝缘层的势垒散射增强，q/I/p的一级谐波隧道谱中零偏压电导峰变高.