Structural characterizations of Co2MnSi/MgO/Co2MnSi magnetic tunnel junctions by transmission electron microscopy

We have investigated the structure of Co₂MnSi/MgO/Co₂MnSi magnetic tunneling junctions with different tunnel magnetoresistance values depending on the in situ annealing temperatures just after the deposition of the upper Co₂MnSi electrodes. The nano-beam diffraction patterns indicated that the degree of order of the upper Co₂MnSi electrode annealed at 550 °C was higher than that of an electrode annealed at 400 °C. Moreover, the degree of the L2₁ order of the upper Co₂MnSi electrode annealed at 550 °C was even lower than that of the lower Co₂MnSi electrode annealed at an almost equal temperature of 600 °C. Atomic-scale observation using a high-angle annular dark-field (HAADF) method distinctly showed the existence of the L2₁-ordered regions in the B2-ordered matrix in the upper Co₂MnSi electrode annealed at 400 °C.     

Sputtered amorphous Co-Pt-P thin films for soft underlayer of perpendicular magnetic recording

In this paper, a novel amorphous Co-Pt-P thin film fabricated by DC sputtering was proposed for soft underlayer in perpendicular recording. The structural and magnetic properties of the films were investigated by X-ray diffraction (XRD) and vibrating sample magnetometer (VSM), respectively. The results show that maximum permeability of Co-12 at%Pt-P films sputtered at room temperature (RT) is quite low when the phosphorus content is less than 5.2 at%, but Co-12 at%Pt-7 at%P thin film, is of amorphous state and has a high permeability of ∼500. The excellent soft magnetic properties of maximum permeability (500), coercivity (18 Oe) and saturation magnetization (760 emu/cm³) indicate that the amorphous Co-12 at%Pt-7 at%P film is expected to be a promising soft magnetic underlayer of perpendicular magnetic recording. The Co-12 at%Pt-7 at%P thin film is gradually crystallized with increasing substrate temperatures. The crystallization temperature of the Co-12 at%Pt-7 at%P thin film is ∼200 °C.     

Two routes to polycrystalline CoSi2 thin films by co-sputtering Co and Si

Two processes for the fabrication of polycrystalline CoSi₂ thin films based on the codeposition of Co and Si by sputtering were studied and compared. The first process involved “annealing after deposition”, where Co and Si are codeposited at ambient temperature and then crystallized by annealing. This process yielded randomly oriented plate-like CoSi₂ grains with a grain size that is governed by the nanostructure of the as-deposited film. Polycrystalline CoSi₂ thin films were obtained at a process temperature of 170 °C, which was much lower than the annealing temperature of 500 °C needed for Co/Si bilayers. The second process involved “heating during deposition”, where Co and Si are codeposited on heated substrates. This process yielded CoSi₂ grains with a columnar structure, and the grain size and degree of (1 1 1) orientation are temperature dependent. The sheet resistance of the resulting films was determined by the preparation temperature regardless of the deposition process used, i.e. “annealing after deposition” or “heating during deposition”. Temperatures of 500 °C and higher were needed to achieve CoSi₂ resistivity of 40 μΩ cm or lower for both processes.     

Exchange interaction effect of TbCo/FePt bilayers

Interlayer exchange coupling in dc-magnetron sputtered Tb_29.6Co_70.4/FePt bilayers with different annealing temperatures of the FePt film have been investigated. The dependence of ordering degree on perpendicular magnetic properties of the FePt film was studied. The Tb_29.6Co_70.4/FePt film has high perpendicular coercivity and high saturated magnetization about 7.5 kOe, and 302 emu/cm³, respectively as the substrate temperature is 500 °C and annealing at 500 °C for 30 min. It also shows a strong exchange coupling between this FePt layer and Tb_29.6Co_70.4 layer. We also examined the interface wall energy in the exchange coupled Tb_29.6Co_70.4/FePt double layers.     

Magnetic,structural and electrical properties of ordered and disordered Co50Fe50 films

Co₅₀Fe₅₀ films with thickness varying from 100 to 500 Å were deposited on a glass substrate by sputtering process, respectively. Two kinds of CoFe films were studied: one was the as-deposited film, and the other the annealed film. The annealing procedure was to keep the films at 400 °C for 5 h in a vacuum of 5×10⁻⁶ mbar. From the X-ray study, we find that the as-deposited film prefers the CoFe(1 1 0) orientation. Moreover, the body-centered cubic (bcc) CoFe(1 1 0) line is split into two peaks: one corresponding to the ordered body-centered tetragonal (bct) phase, and the other, the disordered bcc phase. After annealing, the peak intensity of the ordered bct phase becomes much stronger, while that of the disordered bcc phase disappears. The annealing has also caused the ordered CoFe(2 0 0) line to appear. When the amount of the ordered bct phase in Co₅₀Fe₅₀ is increased, the saturation magnetization (M_s) and coercivity (H_c) become larger, but the electrical resistivity (ρ) decreases. From the temperature coefficient of resistance (TCR) measurement, we learn that the bct grains in the CoFe film start to grow at temperature 82 °C.     

Microstructures, optical and electrical properties of In-doped ZnO thin films prepared by sol-gel method

ZnO and indium-doped ZnO (I_xZO) thin films were prepared on silica-glass substrates by the sol-gel method. The thin films were crystallized at 600 °C and 700 °C for 1 h in 6.9 × 10⁻¹ Torr under pure O₂ atmosphere. The analyzed results were compared to investigate the structural characteristics and optical properties. The surface morphology of the I_xZO films was different from that of the ZnO films, and showed a thin overlay structure. In addition, the crystallization of I_xZO film was depleted at higher crystallized temperatures. From XRD analysis, the ZnO and I_xZO thin films possessed hexagonal structures. Notably, micro-In₂O₃ phases were observed in the I_xZO thin films using EDS. Both of In₂O₃ phases and the crystallization mechanism not only improved the peeling of structure, but also improved the electrical conductivity of I_xZO thin films. For the PL spectrum, the optical property of the I_xZO film was raised at a higher crystallization temperature. Although the In₂O₃ phases reduced the structural defects of I_xZO thin film, the optical effect of the residual In³⁺ was not enhanced completely at higher crystallized temperatures.     

Spin polarization measurements of Co2Mn (Ga0.5Sn0.5) thin films

Co₂MnGa_0.5Sn_0.5 (CMGS) thin films were epitaxially grown on MgO (0 0 1) substrates by magnetron sputtering and the current spin polarizations of the films with different post annealing conditions were measured by the point contact Andreev reflection method. The film deposited at a substrate temperature of 150 °C had a B2 structure and its spin polarization was estimated to be 59%. The film was ordered to the L2₁ structure by annealing at 600 °C, and the spin polarization was enhanced to 66%. The spin polarization and the intensity of the L2₁ diffraction showed clear correlation, suggesting L2₁ ordering is essential to achieve higher spin polarization of this quaternary Heusler alloy.     

Electrochemical properties of electrosynthesized TiO2 thin films

Titanium dioxide (TiO₂) thin films prepared by cathodic electrodeposition on indium-tin-oxide coated glass substrates from simple aqueous peroxo-titanium complex solutions have been studied as a function of sintering temperature (25-500 °C). The films crystallized in to anatase phase at relatively low temperature (300 °C). Electrochemical properties of amorphous and anatase films were investigated by cyclic voltammogram (CV) in lithium ion containing organic electrolyte. All the films were found to show reversible electrochemical properties upon Li⁺ ion intercalation. The effects of sintering temperature on the crystallinity and consequently on the electrochemical properties of TiO₂ has been discussed.     

Low-temperature growth of polycrystalline Ge thin film on glass by in situ deposition and ex situ solid-phase crystallization for photovoltaic applications

Poly-crystalline germanium (poly-Ge) thin films have potential for lowering the manufacturing cost of photovoltaic devices especially in tandem solar cells, but high crystalline quality would be required. This work investigates the crystallinity of sputtered Ge thin films on glass prepared by in situ growth and ex situ solid-phase crystallization (SPC). Structural properties of the films were characterized by Raman, X-ray diffraction and ultraviolet-visible reflectance measurements. The results show the transition temperature from amorphous to polycrystalline is between 255 °C and 280 °C for in situ grown poly-Ge films, whereas the transition temperature is between 400 °C and 500 °C for films produced by SPC for a 20 h annealing time. The in situ growth in situ crystallized poly-Ge films at 450 °C exhibit significantly better crystalline quality than those formed by solid-phase crystallization at 600 °C. High crystalline quality at low substrate temperature obtained in this work suggests the poly-Ge films could be promising for use in thin film solar cells on glass.     

Structural and optical properties of SrCu2O2 films deposited on sapphire substrates by pulsed laser deposition

We deposited SrCu₂O₂ (SCO) films on sapphire (Al₂O₃) (0 0 0 1) substrates by pulsed laser deposition. The crystallographic orientation of the SCO thin film showed clear dependence on the growth temperature. X-ray diffraction (XRD) and transmission electron microscopy (TEM) analysis showed that the film deposited at 400 °C was mainly oriented in the SCO [2 0 0] direction, whereas when the growth temperature was increased to 600 °C, the SCO film showed a dominant orientation of SCO [1 1 2]. The SCO film deposited at 500 °C was obvious polycrystalline, showing multi peaks from (2 0 0), (1 1 2), and (2 1 1) diffraction in the XRD spectrum. The SCO film deposited at 600 °C showed a band gap energy of 3.3 eV and transparency up to 80% around 500 nm. The photoluminescence (PL) spectra of the SCO films grown at 500 °C and 600 °C mainly showed blue-green emission, which was attributed to the intra-band transition of the isolated Cu⁺ and Cu⁺–Cu⁺ pairs according to the temperature dependent-PL analysis.     

Crystallization and electrochemical performance of La0.6Sr0.4Co0.2Fe0.8O3 − δ-Ce0.8Gd0.2O1.9 thin film cathodes processed by single solution spray pyrolysis

La_0.6Sr_0.4Co_0.2Fe_0.8O_3 − δ-Ce_0.8Gd_0.2O_1.9 (LSCF-CGO) thin films obtained by spray pyrolysis of a single precursor solution were investigated by XRD, TEM and impedance spectroscopy at annealing temperatures ranging from 500 to 900 °C. Films annealed at 600 °C contained a mixture of amorphous regions and crystalline regions composed of fine crystallites (< 5 nm). Annealing above 600 °C increased the ratio of crystalline to amorphous material, led to the segregation of the films into distinct LSCF and CGO phases, and promoted grain growth. The electrical behavior of the films depended on annealing temperature. At testing temperatures of 400 °C and below, the polarization resistance of films with lower annealing temperatures was larger than the polarization resistance of films with higher annealing temperatures. However, at testing temperatures of 500 °C and above the polarization resistance of films with lower annealing temperatures was equal to or lower than the polarization resistance of films with higher annealing temperatures. This was reflected by the activation energy that decreased with increasing annealing temperature. The varying electrical behavior may be related to microstructural changes that caused bulk diffusion to be the rate-limiting step in films with lower annealing temperatures and oxygen dissociation to be the rate-limiting step in films with higher annealing temperatures.     

Effect of nanoscale thin films of Dy2Fe14B on the magnetic hysteresis characteristics of melt-spun ribbons of Nd2Fe14B

The effectiveness of nanoscale Dy₂Fe₁₄B thin films on coercivity and energy product of melt-spun ribbons of Nd₂Fe₁₄B at high temperatures was investigated. It is hypothesized that the nanoscale Dy-thin film will act as an obstacle for the nucleation of reverse domains and also maximize the energy of domain walls and thereby improve the magnetic performance at high temperatures. Pulsed laser deposition (PLD) of amorphous Dy₂Fe₁₄B layers on Nd₂Fe₁₄B melt-spun ribbons was performed for a nominal thickness of 40 nm. The coated ribbons were then annealed in environmentally controlled quartz furnace at two different cycles (750 °C for 15 min and 900 °C for 2 h) to cause crystallization. Magnetic hysteresis tests conducted at 300 and 400 K revealed that there is small but consistent improvement in the magnetic properties of the coated ribbons annealed at 750 °C for 15 min. However, higher temperature annealing (900 °C for 2 h) drastically reduced the magnetic properties. The incomplete recrystallization of amorphous structure at 750 °C for 15 min and large grain growth and formation of non-magnetic phases at 900 °C for 2 h are believed to be responsible for not meeting the expected magnetic performance.     

Effect of annealing on phase composition,structural and magnetic properties of Sm-Co based nanomagnetic material synthesized by sol-gel process

Sm-Co based nanomagnetic material was synthesized by means of a Pechini-type sol-gel process. In this method, a suitable gel-precursor was prepared using respective metal salts and complexing agent such as citric acid. The gel-precursor was dried at 300 °C and then subjected to various reductive annealing temperatures: 350, 500 and 600 °C. The nanopowders so obtained were characterized for their structure, phase composition and magnetic properties. FT-IR studies on the gel-precursor showed the binding of metal cations with the citrate molecules in the form of metal-citrate complex. The gel-precursor, which was annealed at 350 °C showed the presence of both meta-stable cobalt carbide (Co₂C, Co₃C) and Co₃O₄ phases; while the sample annealed at 500 °C indicated the sign of SmCo₅ phase. Upon increasing the reductive annealing temperature to 600 °C, crystalline phase such as fcc-Co and Sm₂C₃ were formed prominently. FE-SEM analysis revealed the change in sample morphology from spherical to oblate spheres upon increasing the annealing temperature. VSM measurements demonstrated ferromagnetic nature at room temperature for all the nanopowders obtained irrespective of their after reductive annealing temperature.     

High-temperature oxidation resistance and magnetic properties of Si-doped Sm2Co17-type magnets at 500 °C

The high-temperature oxidation resistance and magnetic properties of Si-doped Sm₂Co₁₇-type magnets at 500 °C were systematically investigated. The Sm(Co_0.76, Fe_0.1, Cu_0.1, Zr_0.04)₇Si_x (x=0–0.6) magnets were prepared by the conventional powder metallurgical technique. It is found that the addition of silicon in the Sm₂Co₁₇-type magnet can remarkably improve its oxidation resistance. Moreover, a small amount of silicon addition can also increase its high-temperature intrinsic coercivity. A maximum intrinsic coercivity of 6.7 kOe at 500 °C was obtained for the Sm₂Co₁₇-type magnet with Si content x=0.4, whose high-temperature maximum energy product loss was about 2.5 times smaller than pure Sm₂Co₁₇-type magnet after oxidation at 500 °C for 100 h, indicating the enhanced oxidation resistance. Its corresponding Curie temperature and saturation magnetization are about 723.9 °C and 7.4 kG, respectively.     

Electrochemical behaviour of sputtered c-V2O5 and LiCoO2 thin films for solid state lithium microbatteries

Here are reported for the first time electrochemical data on all-solid-state lithium microbatteries using crystalline sputtered V₂O₅ thin films as cathode materials and LiPON as solid electrolyte. The stable specific capacity of 30 µAh/cm² found with a 2.4 µm thick film competes very well with the best values obtained for solid state microbatteries using amorphous films. With the challenge of decreasing the temperature of heat treatment for sputtered LiCoO₂ thin films, we show that a temperature of 500 °C combined with an optimized bias sputtering (-50 V) allows to get highly crystalline deposits, to minimize the presence of Co₃O₄ and to suppress any trace of the cubic phase. At the same time the theoretical specific capacity is reached in the 4.2 V-3 V range and a good cycling behaviour is achieved with a high capacity of 50 µAh/cm²/µm after 140 cycles at 10 µA.cm².     

Crystallization and surface segregation in CuIn0.7Ga0.3Se2 thin films on Cu foils grown by pulsed laser deposition

This work reports unexpected crystallization and segregation behavior of CuIn_0.7Ga_0.3Se₂ (CIGS) thin films deposited on flexible Cu foils by pulsed laser deposition. A composite-type microstructure containing nanometer-scaled CIGS crystallites embedded in amorphous Cu-rich matrix is observed even at the high temperature of 500 °C. The findings are attributed to very fast condensation of the ablated species and random nucleation induced from the amorphous matrix. Cu-rich particulates tend to precipitate on the film surface, and their average size, shape, number density and composition exhibit a strong dependence on the substrate temperature up to 500 °C. The similar crystallization properties of the films on Cu foils and glass substrates are noticeable to the use of Cu foils for flexible solar cells.     

Epitaxial growth of bcc-FexCo100-x thin films on MgO(1 1 0) single-crystal substrates

Fe_xCo_100-x (x=100, 65, 50 at%) epitaxial thin films were prepared on MgO(1 1 0) single-crystal substrates heated at 300 °C by ultra-high vacuum molecular beam epitaxy. The film structure and the growth mechanism are discussed. FeCo(2 1 1) films with bcc structure grow epitaxially on MgO(1 1 0) substrates with two types of variants whose orientations are rotated around the film normal by 180° each other for all compositions. Fe_xCo_100-x film growth follows the Volmer Weber mode. X-ray diffraction analysis indicates the out-of-plane and the in-plane lattice spacings are in agreement with the values of respective bulk Fe_xCo_100-x crystals with very small errors less than ±0.4%, suggesting the strains in the films are very small. High-resolution cross-sectional transmission electron microscopy shows that periodical misfit dislocations are preferentially introduced in the film at the Fe₅₀Co₅₀/MgO interface along the MgO[1 1¯ 0] direction. The presence of such periodical dislocations decreases the large lattice mismatch of about −17% existing at the FeCo/MgO interface along the MgO[1 1¯ 0] direction.     

Electrical properties of La2O3 thin films grown on TiN/Si substrates via atomic layer deposition

The electrical as well as the structural properties of La₂O₃ thin films on TiN substrates were investigated. Amorphous stoichiometric La₂O₃ thin films were grown at 300 °C via atomic layer deposition technique by using lanthanum 2,2,6,6-tetramethyl-3,5-heptanedione [La(TMHD)₃] and H₂O as precursors. Post-annealing of the grown film induced dramatic changes in structural and the electrical properties. Crystalline phases of the La₂O₃ film emerged with the increase of the post-annealing temperature. Metal-insulator-metal (MIM) capacitor was fabricated to measure the electrical properties of the grown film. The dielectric constant of the La₂O₃ thin films increased with annealing temperature to reach the value of 17.3 at 500 °C. The leakage current density of the film post-annealed at 400 °C was estimated to be 2.78 × 10⁻¹⁰ and 2.1 × 10⁻⁸ A/cm² at ±1 V, respectively.     

Structural and optical properties of YSZ thin films grown by PLD technique

We report on the structural and optical properties of yttria stabilized zirconia (YSZ) thin films grown by pulsed laser deposition (PLD) technique and in situ crystallized at different substrate temperatures (T_s = 400 °C, 500 °C and 600 °C). Yttria-stabilized zirconia target of ∼1 in. diameter (∼95% density) was fabricated by solid state reaction method for thin film deposition by PLD. The YSZ thin films were grown on an optically polished quartz substrates and the deposition time was 30 min for all the films. XRD analysis shows cubic crystalline phase of YSZ films with preferred orientation along 〈1 1 1〉. The surface roughness was determined by AFM for the films deposited at different substrate temperatures. The nano-sized surface roughness is found to increase with the increase of deposition temperatures. For the optical analysis, a UV-vis-NIR spectrophotometer was used and the optical band gap of ∼5.7 eV was calculated from transmittance curves.     

The influence of substrate temperature and annealing on the properties of pulsed laser-deposited YIG films on fused quartz substrate

Yttrium iron garnet (YIG) thin films were deposited on fused quartz substrate at different substrate temperatures (T_s) varying from room temperature (RT) to 850 °C using pulsed laser deposition (PLD) technique. All the films in the as-deposited state were X-ray amorphous and non-magnetic at RT. The film deposited at RT after annealing at temperatures T_a?700 °C showed both X-ray peaks and the magnetic order. The films deposited at higher T_s (500–850 °C) and then annealed at 700 °C resulted in better-quality films with higher 4πM_s value. The highest value of magnetization was for the sample deposited at 850 °C and annealed at 700 °C, which is 68% of the bulk 4πM_s value.