Kinetics of ultraviolet and plasma surface modification of poly(dimethylsiloxane) probed by sum frequency vibrational spectroscopy

In numerous applications in microfluidics, cell growth, soft lithography, and molecular imprinting, the surface of poly(dimethylsiloxane) (PDMS) is modified from a hydrophobic methyl-terminated surface to a hydrophilic hydroxyl-terminated surface. In this study, we investigated molecular structural and orientational changes at the PDMS-air interface in response to three commonly used surface modification processes: exposure to long-wavelength ultraviolet light (UV), exposure to short-wavelength UV that generates ozone (UVO), and exposure to oxygen plasma (OP). The surfaces of two PDMS compositions (10:1 and 4:1 of base polymer/curing agent) were probed during modification, using monolayer-sensitive IR + visible sum frequency generation (SFG) vibrational spectroscopy, with two different polarization combinations. During PDMS surface modification, the peak intensities of CH3 side groups and CH2 cross-link groups decreased, while peak intensities of Si-OH groups increased. There was no significant change in the average orientation of the CH3 groups on the PDMS surface during modification. The concentration of CH3 groups on the surface decreased exponentially with time, for all three UV, UVO, and OP modification processes, with first order kinetics and time constants of approximately 160, 66, and 0.3 min, respectively. At steady state, residual CH3 groups were detected at the PDMS surface for UV and UVO treatments; however, there were negligible CH3 groups detected after OP modification.     

Study of ultraviolet light and ozone surface modification of polypropylene

Chemical reactions of the surface of a polypropylene (PP) film in the presence of various combinations of ultraviolet light and ozone gas (UVO) conditions were studied. Exposure of the polymer surface was carried out in a laboratory-scale UVO reactor in which the following parameters could be varied: ozone concentration, wavelength of ultraviolet (UV) radiation, pulsed operation of the UV lamps, the treatment distance between the PP film and the lamps, and water vapor concentration. Advancing and receding contact angle measurements were used to monitor surface energy changes imparted by the treatment. Two spectroscopic techniques, X-ray photoelectron spectroscopy (XPS) and attenuated total reflectance–Fourier transform infrared spectroscopy (ATR–FTIR), were used to monitor changes in the polymer surface chemistry. Oxidation of the PP surface is proposed to occur through two alternate mechanisms: (1) insertion of an O (¹D) atom to form ether linkages, or (2) hydrogen abstraction by O (³P), followed either by crosslinking or by reaction with oxygen species to form carbonyl and/or carboxyl functional groups. It was found that reaction 1 dominates initially, but that its rate is reduced by the formation of products from reaction 2. It appears that the ether functional groups produced by reaction 1 are responsible primarily for increased surface energy. Carbonyl, carboxyl, and hydroxyl groups formed in reaction 2 appear to have little additional effect on surface energy; it is proposed that these groups are involved strongly in intramolecular hydrogen bonding, thereby decreasing their availability to contribute to increased surface energy. High-energy UV radiation was found to play only a minor role in the surface modification of PP. Of the narrow range of ozone concentrations studied, no clear relationship was found to exist between ozone concentration and rate of modification of the surface; thus, the concentration of ozone must not affect the relative concentrations of products from the competing reactions. Increased surface oxidation and decreased contact angles were observed when the lamp-to-sample distance was minimized. The presence of water vapor during UVO treatment was found to lead to greater oxygen uptake after short-term treatments but did not result in increased surface energy. © 1999 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 37: 2489–2501, 1999     

基于表面起皱法的梯度图案的可控制备

报道了基于非刻蚀法的表面起皱机制来实现高分子薄膜表面的周期性梯度图案的简单可控制备.即对于处于机械拉伸状态的聚二甲基硅氧烷(PDMS)弹性基底,在其底部垫入"积木",而后对其进行紫外-臭氧(UVO)和氧等离子体(OP)的联合表面处理."积木"的加入引起了表面处理后表面硅氧层(SiOx)梯度厚度的形成,进而当释放拉伸应变后,诱导产生了梯度皱纹图案.结果表明:当UVO与OP联用处理时,不仅实现了较小拉伸应变下梯度皱纹形貌的制备,而且扩大了UVO单独使用时梯度皱纹周期的变化范围.通过OP与UVO的处理顺序和处理时间等因素的简单调节,进一步实现了不同梯度皱纹微结构的精细构筑.     

Masterless soft lithography: patterning UV/ozone-induced adhesion on poly(dimethylsiloxane) surfaces

A novel microreactor-based photomask capable of effecting high resolution, large area patterning of UV/ozone (UVO) treatments of poly(dimethylsiloxane) (PDMS) surfaces is described. This tool forms the basis of two new soft lithographic patterning techniques that significantly extend the design rules of decal transfer lithography (DTL). The first technique, photodefined cohesive mechanical failure, fuses the design rules of photolithography with the contact-based adhesive transfer of PDMS in DTL. In a second powerful variation, the UVO masks described in this work enable a masterless soft lithographic patterning process. This latter method, UVO-patterned adhesive transfer, allows the direct transfer of PDMS-based polymer microstructures from a slab of polymer to silicon and other material surfaces. Both methods exploit the improved process qualities that result from the use of a deuterium discharge lamp to affect the UVO treatment to pattern complex, large area PDMS patterns with limiting feature sizes extending well below 1 microm (> or = 0.3 microm). The use of these structures as resists is demonstrated for the patterning of metal thin films. A time-of-flight secondary ion mass spectroscopy study of the process provides new insights into the mechanisms that contribute to the chemistry responsible for the interfacial adhesion of DTL transfers.     

Synthesis and Characterization of a New UV Cross‐linkable Waterborne Siloxane‐polyurethane Dispersion

A new cross‐linkable waterborne siloxane‐polyurethane dispersion (PEDA‐SiPU) was synthesized by incorporating the acrylate groups into the side chain of the polyurethane using the pentaerythritol diacrylate(PEDA) and introducing polysiloxane groups into the soft segment of the polyurethane using dihydroxybutyl‐terminated polydimethylsiloxane (PDMS). They can form the cross‐linking structure by UV radiation in the presence of a photo‐initiator. Fourier transform infrared spectroscopy (FTIR) was used to identify the chain structure of PEDA‐SiPU. The effect of the PDMS content and the PEDA content on the C?C conversion behaviors under UV irradiation was investigated. Water resistance and the mechanical properties of the UV cured films were also studied. Through the controlling of suitable content of PDMS and PEDA introduced in the chain, the obtained PEDA‐SiPU films were proved to possess both good water resistance and mechanical properties.     

Time resolved ultraviolet photoluminescence of mesoporous silica

We studied the optical properties of sol-gel synthesized porous silica excited by synchrotron radiation in the 4-10 eV range. The spectral and temporal characteristics of the ultraviolet photoluminescence at about 3.7 eV are reported. The UV emission results from the contribution of two different centers: the first one centered at 3.7 eV with a decay time of 2.0 ns and the second one peaked at 3.9 eV with a decay time of 20 ns. We propose to assign the observed luminescence to different interacting surface silanols.     

Applying magnetic soft mold imprint technology with ultraviolet light‐emitting‐diode array on the fabrication of microlens arrays

This study proposed a novel technology, which uses exposed technology with ultraviolet light‐emitting‐diode (UV‐LED) arrays and the polydimethylsiloxane (PDMS) magnetic flexible soft mold imprint technology, to develop exposed equipments with UV‐LED arrays. This study used magnetic soft mold imprint technology to replicate the structure of microlens, providing a more effective alternative for imprint technology and application. The measurement results showed that PDMS with magnetic iron powder can precisely cast mold to replicate the structures of microlens. Electromagnetic plates were used to control even imprinting with magnetic force, in order to fill the mold of micro‐structure of the photo‐resist. Magnetic iron powder was added to PDMS to produce composite material, which can effectively avoid the transformation of pure PDMS during soft mold imprinting, and increase mechanical strength. Magnetic PDMS soft mold is easy to make, and the casting time is short, so that costs can be effectively reduced. Also with advantages of less free energy on its surface, and unlikely to adhere to the photo‐resist during imprinting, it can be combined with electromagnetic plates evenly to control the magnetic soft mold. This imprinting technology is a big advantage to the production process of micro‐structures during imprinting. Copyright © 2009 John Wiley & Sons, Ltd.     

由组分可控的LB膜前驱物法制备Y2O3稳定立方相ZrO2的超薄陶瓷膜

由有机LB膜技术发展了一种制备组分、厚度可控的无机超薄陶瓷膜的方法.以Zr、 Y的β-二酮络合物的作为"表面离子"代替传统的亚相离子,沉积它们与花生酸的混合LB膜.并将它作为前驱物,经臭氧处理和热处理,成功制得了Y2O3稳定的立方相ZrO2超薄膜(YSZ).用X射线衍射(XRD)、 X射线光电子能谱(XPS)等手段研究了YSZ薄膜的相结构和其组成.结果表明,超薄陶瓷膜中Zr与Y的含量比率控制得很好,且形成Y2O3稳定的立方相ZrO2.说明这种方法可以成功地用来制备组分和膜厚均可控的纳米陶瓷膜.     

OZONE DEPLETION AND INCREASE IN ANNUAL CARCINOGENIC ULTRAVIOLET DOSE

An increase in skin cancer incidence due to an increase of solar ultraviolet (UV) radiation is one of the best quantitated effects of stratospheric ozone depletion. Until now, estimates of effective UV dosages could not be based on spectral data on carcinogenicity. Instead the spectral dependence of sunburn or mutations was used. These data contained little information on longwave ultraviolet radiation (UVA: 315-380 nm). Recently, in hairless mice, experimental data have become available on the carcinogenic effectiveness of the ultraviolet, including UVA. From these new data we can estimate the effect of ozone depletion on the ambient annual carcinogenic UV dose. We find that a 1% decrease in ozone yields a 1.56% increase in annual carcinogenic UV; this value is not strongly dependent on geographical latitude. From this result, combined with the dose-response relationship for UV carcinogenesis, we conclude that for a 1% decrease in total column atmospheric ozone an increase of 2.7% in non-melanoma skin cancer is to be expected.     

Parameterization of daily solar global ultraviolet irradiation

Daily values of solar global ultraviolet (UV) B and UVA irradiation as well as erythemal irradiation have been parameterized to be estimated from pyranometer measurements of daily global and diffuse irradiation as well as from atmospheric column ozone. Data recorded at the Meteorological Observatory Potsdam (52 degrees N, 107 m asl) in Germany over the time period 1997-2000 have been used to derive sets of regression coefficients. The validation of the method against independent data sets of measured UV irradiation shows that the parameterization provides a gain of information for UVB, UVA and erythemal irradiation referring to their averages. A comparison between parameterized daily UV irradiation and independent values of UV irradiation measured at a mountain station in southern Germany (Meteorological Observatory Hohenpeissenberg at 48 degrees N, 977 m asl) indicates that the parameterization also holds even under completely different climatic conditions. On a long-term average (1953-2000), parameterized annual UV irradiation values are 15% and 21% higher for UVA and UVB, respectively, at Hohenpeissenberg than they are at Potsdam. Daily global and diffuse irradiation measured at 28 weather stations of the Deutscher Wetterdienst German Radiation Network and grid values of column ozone from the EPTOMS satellite experiment served as inputs to calculate the estimates of the spatial distribution of daily and annual values of UV irradiation across Germany. Using daily values of global and diffuse irradiation recorded at Potsdam since 1937 as well as atmospheric column ozone measured since 1964 at the same site, estimates of daily and annual UV irradiation have been derived for this site over the period from 1937 through 2000, which include the effects of changes in cloudiness, in aerosols and, at least for the period of ozone measurements from 1964 to 2000, in atmospheric ozone. It is shown that the extremely low ozone values observed mainly after the eruption of Mt. Pinatubo in 1991 have substantially enhanced UVB irradiation in the first half of the 1990s. According to the measurements and calculations, the nonlinear long-term changes observed between 1968 and 2000 amount to +4%, ..., +5% for annual global irradiation and UVA irradiation mainly because of changing cloudiness and + 14%, ..., +15% for UVB and erythemal irradiation because of both changing cloudiness and decreasing column ozone. At the mountain site, Hohenpeissenberg, measured global irradiation and parameterized UVA irradiation decreased during the same time period by -3%, ..., -4%, probably because of the enhanced occurrence and increasing optical thickness of clouds, whereas UVB and erythemal irradiation derived by the parameterization have increased by +3%, ..., +4% because of the combined effect of clouds and decreasing ozone. The parameterizations described here should be applicable to other regions with similar atmospheric and geographic conditions, whereas for regions with significantly different climatic conditions, such as high mountainous areas and arctic or tropical regions, the representativeness of the regression coefficients would have to be approved. It is emphasized here that parameterizations, as the one described in this article, cannot replace measurements of solar UV radiation, but they can use existing measurements of solar global and diffuse radiation as well as data on atmospheric ozone to provide estimates of UV irradiation in regions and over time periods for which UV measurements are not available.     

Changes in silicon elastomeric surface properties under stretching induced by three surface treatments

Poly(dimethylsiloxane) (PDMS) substrates are used in many applications where the substrates need to be elongated and various treatments are used to regulate their surface properties. In this article, we compare the effect of three of such treatments, namely, UV irradiation, water plasma, and plasma polymerization, both from a molecular and from a macroscopic point of view. We focus our attention in particular on the behavior of the treated surfaces under mechanical stretching. UV irradiation induces the substitution of methyl groups by hydroxyl and acid groups, water plasma leads to a silicate-like layer, and plasma polymerization causes the formation of an organic thin film with a major content of anhydride and acid groups. Stretching induces cracks on the surface both for silicate-like layers and for plasma polymer thin coatings. This is not the case for the UV irradiated PDMS substrates. We then analyzed the chemical composition of these cracks. In the case of water plasma, the cracks reveal native PDMS. In the case of plasma polymerization, the cracks reveal modified PDMS. The contact angles of plasma polymer and UV treated surfaces vary only very slightly under stretching, whereas large variations are observed for water plasma treatments. The small variation in the contact angle values observed on the plasma polymer thin film under stretching even when cracks appear on the surface are explained by the specific chemistry of the PDMS in the cracks. We find that it is very different from native PDMS and that its structure is somewhere between Si(O2) and Si(O3). This is, to our knowledge, the first study where different surface treatments of PDMS are compared for films under stretching.     

Subsurface investigation of the surface modification of polydimethylsiloxane by 172‐nm vacuum ultraviolet irradiation using ToF‐SIMS and VUV spectrometry

We investigate the mechanism of polydimethylsiloxane (PDMS) surface modification by 172‐nm vacuum ultraviolet (VUV) light. Time‐of‐flight secondary ion mass spectrometry and optical spectrometry are used to measure the chemical composition and VUV transmittance of the PDMS before and after surface modification, respectively. For modified samples of bulk PDMS, the VUV transmittance and the depth of the modified region increased with increasing VUV dose. This can be explained by the following self‐reinforcing cycle of (1) modification of PDMS by VUV light to a more silica‐like composition, (2) improvement of the VUV light transparency, and (3) deeper modification. For thin‐film samples of PDMS formed on sapphire substrates, the transmittance at 172 nm also increased with increasing VUV dose and exceeded that of sapphire in the region from 172 to 300 nm. Finally, thin‐film samples of PDMS formed on silicon substrates, which function as a VUV reflector, were also investigated. For these samples, the secondary ion depth profiles for several chemical species in the PDMS were oscillatory, probably due to the interference of the incident and reflected VUV light. These results strongly suggest that the photon energy of the VUV light plays an important role in modifying PDMS.     

Effects of Suplementary Ultraviolet‐B Irradiance on Maize Yield and Qualities: A Field Experiment¶

Stratospheric ozone depletion has caused an increase in the amount of ultraviolet‐B (UV‐B) radiation reaching the earth's surface. Numerous investigations have demonstrated that the effect of UV‐B enhancements on plants includes reduction in grain yield, alteration in species competition, susceptibility to disease and changes in plant structure and pigmentation. Many experiments examining UV‐B radiation effects on plants have been conducted in growth chambers or greenhouses. It has been questioned whether the effect of UV‐B radiation on plants can be extrapolated to field responses from indoor studies because of the unnaturally high ratios of UV‐B/ ultraviolet‐A radiation (320–400 nm) and UV‐B/photosynthetically active radiation (PAR) in many indoor studies. Field studies on UV‐B radiation effect on plants have been recommended to use the UV and PAR irradiance provided by natural light. This study reports the growth and yield responses of a maize crop exposed to enhanced UV‐B radiation and the UV‐B effects on aize seed qualities under field conditions. Enhanced UV‐B radiation caused a significant reduction in the dry matter accumulation and the maize yield in turn was affected. With increased UV‐B radiation the flavonoid accumulation in maize leaves increased and the contents of chlorophyll a, b and (a+b) of maize leaves were reduced. The levels of protein, sugar and starch of maize seed decreased with enhanced UV‐B radiation, whereas the level of lysine increased with enhanced UV‐B radiation.     

Nanoscale hydrophobic recovery: A chemical force microscopy study of UV/ozone-treated cross-linked poly(dimethylsiloxane)

Chemical force microscopy (CFM) in water was used to map the surface hydrophobicity of UV/ozone-treated poly(dimethylsiloxane) (PDMS; Sylgard 184) as a function of the storage/recovery time. In addition to CFM pull-off force mapping, we applied indentation mapping to probe the changes in the normalized modulus. These experiments were complemented by results on surface properties assessed on the micrometer scale by X-ray photoelectron spectroscopy and water contact-angle measurements. Exposure times of < or = 30 min resulted in laterally homogeneously oxidized surfaces, which are characterized by an increased modulus and a high segmental mobility of PDMS. As detected on a sub-50-nm level, the subsequent "hydrophobic recovery" was characterized by a gradual increase in the pull-off forces and a decrease in the normalized modulus, approaching the values of unexposed PDMS after 8-50 days. Lateral imaging on briefly exposed PDMS showed the appearance of liquid PDMS in the form of droplets with an increasing recovery time. Longer exposure times (60 min) led to the formation of a hydrophilic silica-like surface layer. Under these conditions, a gradual surface reconstruction within the silica-like layer occurred with time after exposure, where a hydrophilic SiOx-enriched phase formed < 100-nm-sized domains, surrounded by a more hydrophobic matrix with lower normalized modulus. These results provide new insights into the lateral homogeneity of oxidized PDMS with a resolution in the sub-50-nm range.     

On the importance of spectral responsivity of Robertson-Berger-type ultraviolet radiometers for long-term observations

A system to determine the spectral responsivity of ultraviolet (UV) radiometers has been developed and is routinely operated at the Central Ultraviolet Calibration Facility, at the National Oceanic and Atmospheric Administration. The instrument and the measurement methodologies are described. Results of measurements from thermally controlled broadband UV radiometers of the Robertson-Berger (R-B)-type are described. Systematic differences in the spectral response curves for these instruments have been detected. The effect of these differences on the field operation of UV-B radiometers has been studied by calculating the instrumental response from modeled UV spectra. The differences of the weighted spectral UV irradiances, measured by two radiometers with different spectral response functions, caused by the daily variation in the position of the sun were estimated for fixed values of total ozone, altitude and albedo, and for cloud-free conditions. These differences increase with the solar zenith angle and are as large as 8%. Larger differences in the instrumental response may be produced by ozone variations. Thus, care must be taken when analyzing data from R-B radiometers and comparing results from different instruments. Routine cycling of UV-B radiometers in operative networks without a careful determination of the spectral responsivity, or small drifts of the spectral responsivity, may strongly affect the accuracy of UV radiation measurements and produce an erroneous trend. Because of the possible differences among radiometers, it would not be practical to derive the long-term behavior of UV radiation without routine and thorough characterization of the spectral responsivities of the instruments.     

Functional oligomers for the control and fixation of spatial organization in nanoparticle assemblies

Interactions in nanoparticle assemblies play an important role in modulating their interesting magnetic and optical properties. Controlling and fixing the distance between nanoparticles is therefore crucial to the development of next-generation nanodevices. Here, we show that the interparticle distance in two-dimensional assemblies can be quantitatively controlled by functionalizing the nanoparticles with short polymers containing one functional end group that binds to the nanoparticle. Carboxy-functional poly(dimethylsiloxane) (PDMS) ligands are attached to the nanoparticle surface by a simple ligand exchange process with the oleic acid synthesis ligands. The distance between nanoparticles is manipulated by adjusting either the number of PDMS ligands per molecule or their molecular weight. The use of PDMS ligands is unique in that they provide a means to permanently and robustly fix the spatial distribution of nanoparticles because PDMS is readily converted to silicon oxide by a simple UV/ozone treatment. The distance between nanoparticles can be designed a priori, as it is found to scale well with theoretical predictions for the thickness of the surface-bound polymer brush layer.     

Micellar transitions in solvent-annealed thin films of an amphiphilic block copolymer controlled with tunable surface fields

We investigated the response of symmetric poly(styrene-block-4vinylpyridine) P(S-b-4VP) diblock copolymer micelles to surface fields of variable strength at free surfaces and substrate interfaces when the micelles as spun were subjected to solvent annealing. Free surface interactions were controlled with solvent annealing in solvents of varied selectivity. On exposure to vapors of a solvent strongly selective for PS, the micelles retained their spherical shape but grew into cylindrical micelles or lamellar nanostructures via fusion on exposure to slightly selective or neutral solvent vapors. Giant 2D disks that completely wetted PS-grafted substrates resulted when spherical micelles were exposed to vapors of a highly selective solvent for P4VP. The interfacial interactions were controlled through subjecting them to UV/ozone (UVO) substrates initially coated with an end-grafted layer of short PS chains, with which the grafted PS chains became oxidized, degraded, or totally removed through UVO treatment for a controlled duration. When thin films were annealed in vapors of THF, the structural transition from spherical to cylindrical micelles depended on the interfacial field. On applying selective UVO exposure of optimal duration, we fabricated a substrate with two interfacial chemistries that promoted varied micellar species (spherical and cylindrical micelles) with a sharp boundary developed within thin films through solvent annealing for a controlled duration.     

Measurement of solar ultraviolet radiation at a temperate and a tropical site using polysulphone film

Measurements of solar ultraviolet radiation (<320 nm) have been made with polysulphone film at a temperate and a tropical site and compared mean monthly values of the fraction of ultraviolet in solar radiation are calculated which allow an estimate of ultraviolet dose to be made from a knowledge of total solar radiation.While the data demonstrate the marked effect of sun elevation on the ultraviolet fraction of solar radiation they also indicate the effect of seasonal variation in the thickness of the ozone layer above the temperate site.It is also shown that whereas sunlight makes by far the major contribution to total solar radiation, skylight is of prime importance as regards ultraviolet radiation.     

Facile non‐lithographic route to highly aligned silica nanopatterns using unidirectionally aligned polystyrene‐block‐polydimethylsiloxane films

Thin films (monolayer and bilayer) of cylinder forming polystyrene‐block‐polydimethylsiloxane (PS‐b‐PDMS) were shear aligned by the swelling and deswelling of a crosslinked PDMS pad that was physically adhered to the film during solvent vapor annealing. The nanostructures formed by self‐assembly were exposed to ultraviolet‐ozone to partially oxidize the PDMS, followed by calcination in air at 500 °C. In this process, the PS segments were fully decomposed, while the PDMS yielded silica nanostructures. The highly aligned PDMS cylinders were thus deposited as silica nanolines on the silicon substrate. Using a bilayer film, the center‐to‐center distance of these features were effectively halved from 38 to 19 nm. Similarly, by sequential shear‐alignment of two distinct layers, a rhombic array of silica nanolines was fabricated. This methodology provides a facile route to fabricating complex topographically patterned nanostructures. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2015 , 53, 1058–1064     

Concentration measurements of ozone in the 1200-300ppbv range: an intercomparison between the BNM ultraviolet standard and infrared methods

Simultaneous ultraviolet (UV) and infrared (IR) measurements of ozone concentration in air in the 1200-300 ppbv range have been performed using the ultraviolet absorption in the Hartley band at 0.2537 microm and the infrared absorption of a doublet at 9.507 microm in the nu(3) vibration-rotation band. Infrared concentration measurements were achieved using the tunable diode laser spectrometer of LPMA in Paris with interferometric control of the emitted wavelength while the UV concentration measurements were performed with the 49PS Megatec ozone generator of the Bureau National de Metrologie (BNM). The simultaneous recording of spectra of a reference cell filled with pure distilled ozone and of a low concentration mixture inside a long absorbing path Herriott cell allows to carry out infrared concentration measurements with an accuracy of the same order as the ultraviolet ones and provides the instrumental parameters of the spectrometer corresponding to each concentration measurement, which reduces systematic errors. Within the respective absolute uncertainties proper to the two techniques, no systematic discrepancy was evidenced between the IR and the UV measurements. The ozone ultraviolet absorption coefficient value determined by Hearn (308.3 +/- 4 cm(-1)atm(-1)) and used by the BNM and the National Institute of Standards and Technology (NIST) is confirmed by the present work.