Comparative Study on the Decomposition of Chloroform in Thermal and Cold Plasma

Decomposition of trichloromethane (chloroform, CHCl₃) has been studied in inductively coupled RF thermal plasma and in cold plasma, i.e. in silent electric discharge, in neutral and oxidative conditions, as well. GC--MS analysis of the gaseous products and the extracts of the soots were performed and resulted in the formation of solid soot, aliphatic dienes, cyclo-dienes and some aromatic compounds in neutral conditions of RF thermal plasma. In oxidative conditions, however, much less soot and dienes, and much more oxygen-containing products were formed as compared to neutral ones. In the cold plasma reactor, wide range of chlorinated ethane, ethene and propene derivatives were formed in neutral conditions. In oxidative conditions, formation of carbonyl compounds and carbon monoxide as intermediates took place, while the final product consisted of CO₂, H₂O and Cl₂ in the low temperature plasma reactor.     

Converting Methane by Using an RF Plasma Reactor

A radio-frequency (RF) plasma system was used to convert methane gas. The reactants and final products were analyzed by using an FTIR (Fourier transform infrared spectrometer). The effects of plasma operational parameters, including feeding concentration (C) of CH ₄ , operational pressure (P) in the RF plasma reactor, total gas flow rate (Q) and input power wattage (W) for CH ₄ decomposition were evaluated. The results showed that the CH ₄ decomposition fraction increases with increasing power input, decreasing operational pressure in the RF plasma reactor, decreasing CH ₄ feeding concentration, and decreasing total gas flow rate. In addition, mathematical models based on the obtained experimental data were developed and tested by means of sensitivity analysis.     

Comparative Study of the Decomposition of CCl4 in Cold and Thermal Plasma

Decomposition of carbon tetrachloride was studied in an inductively coupled thermal plasma reactor and in a low temperature, non-equilibrium plasma reactor, in neutral and oxidative conditions, respectively. In neutral conditions formation of solid soot, aliphatic- and cyclodienes was observed in equilibrium, and products, such as Cl₂ and C₂Cl₆ were detected in non-equilibrium plasma. Feeding of oxygen into the thermal plasma reactor depressed both soot and dienes formation and induced the formation of oxygen containing intermediates and products. GC-MS analyses of the gaseous products and the extract of the soot referred to as complex decomposition and recombination mechanism at given conditions. Presence of oxygen in the low temperature plasma reactor results in the formation of carbonyl compounds as intermediers. CO₂ and Cl₂ revealed as final products of CCl₄ decomposition in cold plasma.     

Comparative Study on Decomposition of CFCl<Subscript>3</Subscript> in Thermal and Cold Plasma

Decomposition of CFCl₃ was investigated in an RF inductively coupled thermal reactor in neutral, oxidative and reductive conditions, and in a silent electric discharge (cold plasma) in neutral and oxidative conditions, respectively. In RF thermal plasma reactor, in neutral conditions, mainly gaseous products and minor amount of solid soot was formed. About 50% the soot could be extracted by toluene. Both the gas phase and the extract contained a wide range of aliphatic and aromatic compounds including chlorine and fluorine containing polyaromatic hydrocarbons (PAHs). In oxidative conditions much less soot was formed as compared to the neutral case. The solid product contained about 45% extractable fraction even in oxidative conditions. However, the extract contained less PAHs than in neutral conditions. In reducing atmosphere the soot yield was similar to the neutral case, but the soot contained 29% extractable fraction only. The extract consisted of polyhalogenated aromatic and polyaromatic hydrocarbons as main components. In neutral conditions different chlorofluorocarbons (CFCs) and chlorine were detected as gaseous products in cold plasma. In oxidative conditions, as final products of decomposition CO₂, CFCs and Cl₃ were formed.     

Deposition of Diamondlike Carbon Film and Mass Spectrometry Measurement in CH4/N2 RF Plasma

The deposition of diamondlike carbon (DLC) film and the measurements of ionic species by means of mass spectrometry were carried out in a CH₄/N₂ RF (13.56 MHz) plasma at 0.1 Torr. The film deposition rate greatly depended on both CH₄/N₂ composition ratio and RF power input. It was decreased monotonically as CH₄ content decreased in the plasma and then rapidly diminished to negligible amounts at a critical CH₄ content, which became large for higher RF power. The rate increased with increasing RF power, reaching a maximum value in 40% CH₄ plasma. The predominant ionic products in CH₄/N₂ plasma were NH⁺ ₄ and CH₄N⁺ ions, which were produced by reactions of hydrocarbon ions, such as CH⁺ ₃, CH⁺ ₂, CH⁺ ₅, and C₂H⁺ ₅ with NH₃ molecules in the plasma. It was speculated that the production of NH⁺ ₄ ion induced the decrease of C₂H⁺ ₅ ion density in the plasma, which caused a reduction in higher hydrocarbon ions densities and, accordingly, in film deposition rate. The N⁺ ₂ ion sputtering also plays a major role in a reduction of film deposition rate for relatively large RF powers. The incorporation of nitrogen atoms into the bonding network of the DLC film deposited was greatly suppressed at present gas pressure conditions.     

Deposition of Gallium Nitride Thin Films by MOCVD in Microwave Plasma

The deposition of GaN thin films in a nitrogen–hydrogen microwave plasma using Ga(CH ₃ ) ₃ as a gallium precursor was investigated. The deposit was identified as stoichiometric GaN by XPS and XRD. The substrate was dielectrically heated in the microwave discharge and the substrate temperature was lower than that in usual thermal MOCVD. The NH radicals, which were the primary N-atoms precursors, and fragments of Ga(CH ₃ ) ₃ were identified in the plasma by OES. The NH radical formation and the decomposition of Ga(CH ₃ ) ₃ in the plasma may be one of the reasons for the lower deposition temperature of GaN. The position dependence of the substrate temperature showed similar tendency as the position dependence of the electron temperature. The plasma state contributes to the deposition of GaN thin films. The deposited GaN exhibited a wide optical band gap of 3.4eV. Material highly oriented along the c axis was detected in the deposit, and a PL spectrum which has the band head at about 450 mm was obtained.     

Methane Decomposition in a Barium Titanate Packed-Bed Nonthermal Plasma Reactor

The behavior of lattice oxygen species of the ferroelectric material during methane oxidation was investigated using a nonthermal plasma reactor packed with BaTiO ₃ pellets. Lattice oxygen species in BaTiO ₃ play an important role in the formation of N ₂ O and the oxidation of CH ₄ . The oxidation products such as CO and CO ₂ were formed from independent reaction pathways. Lattice oxygen species were able to preferentially oxidize the carbon species deposited on the pellet surface into CO. Also, N ₂ O and NO _x were independently formed in the N ₂–O ₂ reaction, suggesting that different oxygen species give N ₂ O and NO _x. N ₂ O was produced by the oxidation of molecular nitrogen with lattice oxygen species.     

A comparative study of CH4 and CF4 rf discharges using a consistent plasma physics and chemistry simulator

A self-consistent, one-dimensional simulator for the physics and chemistry of radio frequency (rf) plasmas was developed and applied for CH₄ and CF₄. The simulator consists of a fluid model for the discharge physics, a commercial Boltzmann equation solver for calculations of electron energy distribution fuction (EEDF), a generalized plasma chemistry code, and an interface module among the three models. The CH₄ and CF₄ discharges are compared and contrasted: CH₄ plasmas are electropositive, with negative ion densities one order of magnitude less than those of electrons, whereas CF₄ plasmas are electronegative, with ten times more negative ions than electrons. The high-energy tail of tire EEDF in CH₄, lies below both the Druyvensteyn and Maxwell distributions, whereas tire EEDF high-energy tail in CF₄ lies between the two. For CH₄, the chemistry model was applied for four species, namely, CH₄ CH₃ CH₂, and H, whereas for CF₄, five species were examined namely CF₄, CF₃, CF₂, CF, and F The predicted densities and profiles compare favorably with experimental data. Finally, the chemistry results were fedback into the physics model until convergence was obtained.     

By-Products NOx Control and Performance Improvement of a Packed-Bed Nonthermal Plasma Reactor

NO_x are main toxic by-products in the effluent gas whendecomposing volatile organic compounds in air by a packed-bed plasmareactor. Several types of materials such as 13X zeolite, BaTiO₃and Pd/Pt catalysts have been selected to be packed in the reactor, andmethane decomposition and NOx by-products in discharged gases areinvestigated at different range of reaction temperature and dischargeenergy density at atmospheric pressure. The ratios of methane decompositionpercentage/NO_x concentration are used to assess these packed bedmaterials and reaction conditions. The results show that usingPd/-Al₂O₃ with lower percentage Pd as packedbed, and discharging with lower discharge density at higher reactiontemperature can reduce NO_x output effectively and greatly improveperformance of the reactor.     

Reaction Mechanisms in Both a CCl2F2/O2/Ar and a CCl2F2/H2/Ar RF Plasma Environment

Decomposition of dichlorodifluoromethane (CCl₂F₂ or CFC-12) in aradiofrequency (RF) plasma system is demonstrated. The CCl₂F₂decomposition fractions _{CCl 2 F 2} and mole fractionsof detected products in the effluent gas stream of CCl₂F₂/O₂/Ar andCCl₂F₂/H₂/Ar plasma, respectively, have been determined. The experimentalparameters including input power wattage, O₂/CCl₂F₂ or H₂/CCl₂F₂ ratio,operational pressure, and CCl₂F₂ feeding concentration wereinvestigated. The main carbonaceous product in the CCl₂F₂/O₂/Arplasma system was CO₂, while that in the CCl₂F₂/H₂/Ar plasma systemwas CH₄ and C₂H₂. Furthermore, the possible reaction pathways werebuilt-up and elucidated in this study. The results of the experimentsshowed that the highly electronegative chlorine and fluorine wouldeasily separate from the CCl₂F₂ molecule and combine with the addedreaction gas. This led to the reactions terminated with the CO₂,CH₄, and C₂H₂ formation, because of their high bonding strength. Theaddition of hydrogen would form a preferential pathway for the HCland HF formations, which were thermodynamically stable diatomicspecies that would limit the production of CCl₃F, CClF₃, CF₄, andCCl₄. In addition, the HCl and HF could be removed by neutral orscrubber method. Hence, a hydrogen-based RF plasma system provideda better alternative to decompose CCl₂F₂.     

Tunable Diode Laser Absorption Studies of Hydrocarbons in RF Plasmas Containing Hexamethyldisiloxane

Tunable infrared diode laser absorption spectroscopy has been used to detect the methyl radical and three stable molecules, CH₄, C₂H₂ and C₂H₆, in radio frequency plasmas (f=13.56 MHz) containing hexamethyldisiloxane (HMDSO). The methyl radical concentration and the concentration of the stable hydrocarbons, produced in the plasma, have been measured in pure HMDSO discharges and with admixtures of Ar, while discharge power (P=20–200 W), total gas pressure (p=0.08–0.6 mbar), gas mixture and total gas flow rate (=1–10 sccm) were varied. The methyl radical concentration was found to be in the range of 10¹³ molecules cm^-3, while methane and ethane are the dominant hydrocarbons with concentrations of 10¹⁴–10¹⁵ mol cm^-3. Conversion rates to the measured stable hydrocarbons (RC(C_xH_y): 2×10¹²–2×10¹⁶ molecules J^-1 s^-1) could be estimated in dependence on power, flow, mixture and pressure. Under the used experimental conditions a maximum deposition rate of polymer layers of about 400 nm min^-1 has been found.     

Vapour-liquid equilibrium measurements for binary mixtures of R32, R143a, R134a and R125 with a perfluoropolyether lubricant

In the present work, vapour-liquid equilibria of four binary systems refrigerant-lubricant oil have been investigated, CF₃CHF₂ (R125), CF₃CH₂F (R134a), CF₃CH₃ (R143a) and CH₂F₂ (R32) as refrigerants and a commercial perfluoropolyether (PFPE), Fluorolink D10H, as lubricant. Vapour-liquid equilibrium data, consisting of isothermal measurement of equilibrium pressure at a fixed composition, have been correlated with an extended Flory-Huggins equation and the corresponding parameters have been determined. Good agreement has been found between experimental data and the model predictions.     

Tunable Diode Laser Diagnostic Studies of H2-Ar-O2 Microwave Plasmas Containing Methane or Methanol

Tunable infrared diode laser absorption spectroscopy has been used to detect the methyl radical and ten stable molecules in H₂-Ar-O₂ microwave plasmas containing up to 7.2% of methane or methanol, under both flowing and static conditions. The degree of dissociation of the hydrocarbons varied between 30 and 90% and the methyl radical concentration was found to be in the range 10 ¹⁰ –10 ¹² molecules cm ^–3 . The methyl radical concentration and the concentrations of the stable C-2 hydrocarbons C ₂ H ₂ , C ₂ H ₄ , and C ₂ H ₆ , produced in the plasma decayed exponentially when increasing amounts of O ₂ were added at fixed methane or methanol partial pressures. In addition to detecting the hydrocarbon species, the major products CO, CO ₂ , and H ₂ O were also monitored. For the first time, formaldehyde, formic acid, and methane were detected in methanol microwave plasmas, formaldehyde was detected in methane microwave plasmas. Chemical modeling with 57 reactions was used to successfully predict the concentrations in methane plasmas in the absence of oxygen and the trends for the major chemical product species as oxygen was added.     

H2S and NH3 Removal by Silent Discharge Plasma and Ozone Combo-System

Treatment of H₂S and NH₃ using the non-thermal plasma (NTP) methods was investigated. Two NTP systems were used in this study, one consisting of a multi-cell plate-to-wire reactor (PTW), and the other consisting of an ozonization chamber and the multi-cell PTW reactor. Each cell of the PTW reactor had a sheet of copper foil embedded in dielectric layers as its high voltage electrode and a wired rack as its gounded electrode. Use of the wired rack type electrode allowed large flow throughput, and promoted intense local electric fields. The experiments showed that under constant energy input, the decomposition efficiency of H₂S or NH₃ decreased with increasing initial concentration of the gas, and increased with increasing injected ozone and relative humidity. Injection of NH₃ into H₂S stream did not improve the H2S decomposition efficiency but was necessary for removal of sulfite-containing compounds in the discharge air.     

Ab initio study of the potential energy surface and product branching ratios for the reaction of O(D) with CH3CH2F

The potential energy surface of O(¹D) + CH₃CH₂F reaction has been studied using QCISD(T)/6-311++G(d,p)//MP2/6-311G(d,p) method. The calculations reveal an insertion–elimination reaction mechanism of the title reaction. The insertion process has two possibilities: one is the O(¹D) atom inserting into C–F bond of CH₃CH₂F produces one energy-rich intermediate CH₃CH₂OF and another is the O(¹D) atom inserting into one of the C–H bonds of CH₃CH₂F produces two energy-rich intermediates, IM1 and IM2. The three intermediates subsequently decompose to various products. The calculations of the branching ratios of various products formed though the three intermediates have been carried out using RRKM theory at the collision energies of 0, 5, 10, 15, 20, 25 and 30 kcal/mol. CH₃CH₂O is the main decomposition product of CH₃CH₂OF. HF and CH₃ are the main decomposition products for IM1; CH₂OH is the main decomposition product for IM2. Since IM1 is more stable and more likely to form than CH₃CH₂OF and IM2, HF and CH₃ are probably the main products of the O(¹D) + CH₃CH₂F reaction. Our computational results can give insight to reaction mechanism and provide probable explanations for future experiments.     

Oxidation of Dilute Benzene in an Alumina Hybrid Plasma Reactor at Atmospheric Pressure

The combination of plasma discharge and adsorption was examined for oxidation of dilute benzene in air in a plasma reactor packed with a mixture of BaTiO ₃ pellets and porous Al ₂ O ₃ pellets (i.e., an alumina hybrid reactor). The oxidative decomposition of benzene was enhanced by the benzene concentrating on the Al ₂ O ₃ pellets. Furthermore, there was a higher selectivity to CO ₂ in the products from the hybrid than from a plasma reactor packed with BaTiO ₃ pellets alone. The presence of the Al ₂ O ₃ pellets suppressed the formation of N ₂ O.     

Characterization of Polypropylene Surface Treated in a CO2 Plasma

The polypropylene modification in CO₂ plasma mainly contributes to degradation, functionalization, and cross-linking. The degradation, whose rate is depending on CO₂ dissociation and oxygen atom formation, is a quite slow reaction and it is associated with surface topography alteration, especially of the amorphous phase of the polypropylene. The surface roughness increases with the treatment duration and the amorphous phase is more degraded than the crystallized part. The functionalization, corresponding to an increase of the surface energy (57.3 mJ m ^{– 2} in 30 s), and to an oxidation (23 oxygen at.%) with the appearance of alcohol, ketone, and acid functions is a much faster phenomenon. Cross-linking takes also place during this type of treatment and will reinforce the stability of the modified surface.     

反式2-甲基-2-丁烯酸甲酯与臭氧反应机理的计算研究

采用G3B3方法构建反式2-甲基-2-丁烯酸甲酯与O3反应体系以及后续Criegee自由基有、无水分子参与下异构化反应的势能面剖面.结果表明,反式2-甲基-2-丁烯酸甲酯与O3反应首先生成一个稳定的五元环中间体,此中间体按断键位置不同后续裂解反应存在两条路径,分别生成产物P1(CH3CHOO+CH3OC(O)C(CH3)O)和P2(CH3CHO+CH3OC(O)C(CH3)OO).利用经典过渡态理论(TST)并结合Wigner矫正模型计算了200-1200 K温度区间内标题反应的速率常数kTST/W.计算结果显示,294 K时,该反应速率常数为7.55×10-18cm3molecule-1s-1,与Bernard等对类似反应所测实验值非常接近.生成的Criegee自由基(CH3CHOO和CH3OC(O)C(CH3)OO)可分别与水分子发生α-加成及β-氢迁移反应,其中Criegee自由基与水的α-加成反应较其与水的β-氢迁移反应具有优势.另外与无水分子参与CH3CHOO和CH3OC(O)C(CH3)OO异构化反应相比,水分子的参与使得异构化反应较为容易进行.     

双铂核药物与DNA作用的理论研究

利用分子力学和量子化学方法研究了双铂核药物［{trans-PtCl(NH₃)₂}₂(μ-NH₂(CH₂)_nNH₂)］²⁺与寡聚DNA片段d(ATATG*TACATAT)·d(ATGTG*TACATAT)复合物的几何构型和电子结构. 计算结果表明,Pt配合物与DNA中碱基G的N7原子形成了较强的配位键,并与O6原子之间存在较强的静电作用,使药物与DNA产生稳定作用,药物中的烃链的伸缩性使得DNA在键合药物后其构型并未发生大的变化. 同时,铂配合物中配体NH₃上的H与其邻近的鸟嘌呤的O6,DNA中磷酸根上的O以及与其邻近的碱基T上的O或N等电负性较大的原子间形成的氢键及弱氢键也是影响Pt配合物与DNA键合及其几何结构变化的重要因素. 这些化学键和氢键是药物分子能够对DNA进行识别的重要基础. 因此,可以认为药物结合后所引起DNA的变形较小可能是药物与顺铂产生不同的抗癌机理的主要原因.     

Oxidative Conversion of PFC via Plasma Processing with Dielectric Barrier Discharges

Perfluorocompounds (PFCs) have been extensively used as plasma etching andchemical vapor deposition (CVD) gases for semiconductor manufacturingprocesses. PFCs have significant effects on the global warming and havevery long atmospheric lifetimes. Laboratory-scale experiments were performedto evaluate the effectiveness of CF4 conversion by using dielectric barrierdischarges (DBD). The results of this study revealed that the removalefficiency of CF₄ increased with application of higher voltage, gas residence time, oxygen content, and frequency. Combined plasma catalysis(CPC) is an innovative way for abatement of PFC and experimental results indicated that combining plasma with catalysts could effectively remove CF4. Products were analyzed by Fourier transform–infrared spectroscopy (FT–IR) and the major products of the CF4 processing with DBD were CO2, COF2, and CO, when O was included in the discharge process. Preliminary results indicated that as high as 65.9% of CF4 was decomposed with CPC operated at 15 kV, 240 Hz for the gas stream containing 300 ppmv CF₄,20% by volume O₂, and 40% by volume Ar, with N₂ as thecarrier gas.