Growth and microstructural features of laser ablated LiCoO2 thin films

Thin films of LiCoO₂ were prepared by pulsed laser deposition technique and the properties were studied in relation to the deposition parameters. The films deposited from a sintered composite target (LiCoO₂+Li₂O) in an oxygen partial pressure of 100 mTorr and at a substrate temperature of 300 °C exhibited preferred c-axis (0 0 3) orientation perpendicular to the substrate surface. The AFM data demonstrated that the films are composed of uniform distribution of fine grains with an average grain size of 80 nm. The grain size increased with an increase in substrate temperature. The (0 0 3) orientation decreased with increase in (1 0 4) orientation for the films deposited at higher substrate temperatures (>500 °C) indicating that the films’ growth is parallel to the substrate surface. The composition of the experimental films was analyzed using X-ray photoelectron spectroscopy (XPS). The binding energy peaks of Co(2p_3/2) and Co(2p_1/2) are, respectively, observed at 779.3 and 794.4 eV, which can be attributed to the Co³⁺ bonding state of LiCoO₂. The electrochemical measurements were carried out on Li//LiCoO₂ cells with a lithium metal foil as anode and LiCoO₂ film as cathode of 1.5 cm² active area using a Teflon home-made cell hardware. The Li//LiCoO₂ cells were tested in the potential range 2.6-4.2 V. Specific capacity as high as 205 mC/cm² μm was measured for the film grown at 700 °C. The growth of LiCoO₂ films were studied in relation to the deposition parameters for their effective utilization as cathode materials in solid-state microbattery application.     

Influence of thermoannealing on crystallinity and optical properties of Sb2S3 thin films

Sb₂S₃ thin films are obtained by evaporating of Sb₂S₃ powder onto glass substrates maintained at room temperature under pressure of 2×10^‐5 torr. The composition of the thin films was determined by energy dispersive analysis of X‐ray (EDAX). The effect of thermal annealing in vacuum on the structural properties was studied using X‐ray diffraction (XRD) technique and scanning electron microscopy (SEM). The as‐deposition films were amorphous, while the annealed films have an orthorhombic polycrystalline structure. The optical constants of as‐deposited and annealed Sb₂S₃ thin films were obtained from the analysis of the experimental recorded transmission spectral data over the wavelength range 400‐1400 nm. The transmittance analysis allowed the determination of refractive index as function of wavelength. It was found that the refractive dispersion data obeyed the single oscillator model, from which the dispersion parameters (oscillator energy, E₀, dispersion energy, E_d) were determined. The static refractive index n(0), static dielectric constant, ε_∞, and optical band gap energy, E_g, were also calculated using the values of dispersion parameters. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Effects of CdCl2 treatment on properties of CdTe thin films grown by evaporation at low substrate temperatures

The structural, morphological and optical properties of vacuum‐evaporated CdTe thin films were investigated as a function of substrate temperature and post‐deposition annealing without and with CdCl₂/treatment at 400°C for 30 min. Diffraction patterns are almost the same exhibiting higher preferential orientation corresponding to (111) plane of the cubic phase. The intensity of the (111) peak increased with the CdCl₂/annealing treatment. The microstructure observed for all films following the CdCl₂/annealing treatment are granular, regardless of the as‐deposited microstructure. The grain sizes are increased after the CdCl₂/annealing treatment but now contain voids around the grain boundaries. The optical band gaps, E_g, were found to be 1.50, 1.50 and 1.48 eV for films deposited at 200 K and annealed without and with CdCl₂/treatment at 400°C for 30 min respectively. A progressive sharpening of the absorption edge upon heat treatment particularly for the CdCl₂/treated was observed. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Photocatalytic TiO2 films prepared by chemical vapor deposition at atmosphere pressure

Nanometer semiconductor titanium dioxide thin films have excellent properties of photocatalysitic degeneration. The glass coated TiO₂ films is called self-cleaning glass. In this paper, chemical vapor deposition (CVD) method is employed to deposit TiO₂ films on glass. The effect of spacing between nozzle and glass and the effect of substrate temperature on deposition rate are studied. The crystalline structure at different deposition temperatures is analyzed by XRD and anatase was found. And the microstructure of the TiO₂ films is also determined by SEM. It shows that the size of crystal grain increases with the temperature.     

Preparation and characterisation of Ag incorporated Al2O3 nanocomposite films obtained by sol‐gel method

Sol‐gel route has been applied for a deposition of the thin films of aluminum oxide and Ag embedded in Al₂O₃ films. The films are spin‐coated on Si and quartz substrates with the film thickness of 120 nm. XRD analysis has been used for the determination of the film structure. FTIR spectroscopy is applied for studying vibrational properties of the obtained coatings. Optical characterization is done by UV‐VIS spectroscopy. The formation of Ag nanoparticles has been confirmed by XRD and optical data. The sol‐gel process is found to be useful technology for incorporation of Ag nanoparticles in the metal oxide matrices. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

TiO2 thin films as sensing gas materials

TiO₂ thin films were prepared by DC reactive magnetron sputtering on heated Si, quartz and glass substrates using O₂ and water vapor as reactive gases. The percentage of anatase and rutile as well as the grain size strongly depend on the deposition conditions, as revealed by X-ray diffraction patterns. The films deposited on Si substrates are pure rutile, while a mixed anatase/rutile structure occurs in the films deposited on glass and quartz substrates. Smaller grain rutile and anatase films were prepared in a water vapor atmosphere, in contrast to the films grown in oxygen. The former choice considerably increases the sensing properties of titanium dioxide films. The gas sensitivity was investigated for some reducing gases (methane, acetone, ethanol and liquefied petroleum gas) and the optimum operating temperatures were found.     

Morphology,composition, structure and optical properties of thermally annealed Cu2O thin films prepared by reactive DC sputtering method

Abstract

Thin films copper oxides are perspective materials for many optoelectronic applications, including photovoltaics. The samples were deposited on glass and silicon substrates by magnetron sputtering method using Modular Platform PREVAC. After deposition the samples were thermally treated by annealing in oxygen atmosphere for 60?min at 450?°C. Morphology confirms that all the films have crystalline structure. Optical measurements show that the films have wide band gap within the range 2.20÷2.48?eV before and 2.03÷2.40?eV after annealing. The article presents the discussion about the influence of annealing on Cu₂O thin film parameters.     

HRTEM and GIXRD studies of CdS nanocrystals embedded in Al2O3 films produced by magnetron RF-sputtering

In this paper we report on the structural properties of as-grown CdS nanoparticles embedded in Al₂O₃ films produced by a magnetron RF-sputtering technique. Grazing incidence X-ray diffraction together with high-resolution transmission electron microscopy (HRTEM) and electron diffraction were used to study the crystallinity and morphology of the CdS nanocrystals. Depending on the deposition parameters, elongated or spherical nanocrystals were grown. HRTEM shows evidence of the growth of CdS nanocrystals at room temperature with sizes in the range of 3–8 nm, and indicates that the nanocrystals formed in the cubic phase during the early stages of the deposition process. Stress-free films were formed under selected deposition conditions.     

MoS<Subscript>2</Subscript>-Ti composite films having (002) orientation and low Ti content

MoS₂ is a solid lubricant exhibiting the properties like graphite as structure. The selection and control of deposition parameters should be attached importance very much since it exposes the properties desired from tribological and mechanical directions. Its usage is limited at atmospheric conditions because it is very sensitive to humidity. Therefore, both mechanical strength and resistant to oxidation can be provided by adding a suitable selected interleaving metal into MoS₂ matrix and by using suitable deposition parameters. In this work, MoS₂-Ti, composite films were grown on AISI 52100 steel by PMS (pulsed magnetron sputtering), and evaluated mechanically, structurally and tribologically. The produced film exhibited a low friction coefficient, low wear rate and significantly high wear life. This development was attributed to (002) basal plane orientation which is chemically inert, and low %Ti content and the use of pulsed-dc which is offers a stable deposition process, and also the accordance between the hardness values of substrate and film.     

Fabrication and characterization of transparent conductive ZnO:Al thin films prepared by direct current magnetron sputtering with highly conductive ZnO(ZnAl2O4) ceramic target

Using a highly conductive ZnO(ZnAl₂O₄) ceramic target, c-axis-oriented transparent conductive ZnO:Al₂O₃ (ZAO) thin films were prepared on glass sheet substrates by direct current planar magnetron sputtering. The structural, electrical and optical properties of the films (deposited at different temperatures and annealed at 400°C in vacuum) were characterized with several techniques. The experimental results show that the electrical resistivity of films deposited at 320°C is 2.67×10⁻⁴ Ω cm and can be further reduced to as low as 1.5×10⁻⁴ Ω cm by annealing at 400°C for 2 h in a vacuum pressure of 10⁻⁵ Torr. ZAO thin films deposited at room temperature have flaky crystallites with an average grain size of ∼100 nm; however those deposited at 320°C have tetrahedron grains with an average grain size of ∼150 nm. By increasing the deposition temperature or the post-deposition vacuum annealing, the carrier concentration of ZAO thin films increases, and the absorption edge in the transmission spectra shifts toward the shorter wavelength side (blue shift).     

Band alignment at the interfaces of Al2O3 and ZrO2-based insulators with metals and Si

Internal photoemission of electrons was used to determine the band alignment in metal (Mg, Al, Ni, Cu, Au)-oxide-silicon structures with Al₂O₃- and ZrO₂-based insulators. For Al₂O₃- and ZrO₂ layers grown on Si by atomic layer deposition the barrier height between the Si valence band and the oxide conduction band was found to be 3.25 and 3.1 eV, respectively. Thermal oxidation of the Si/oxide stacks results in a barrier height increase to ≈4 eV for both cases due to formation of a silicate interlayer. However, there is a significant sub-threshold electron emission both from silicon and metals, indicating a high density of states in the band gap of the insulators. These states largely determine the electron transport across metal oxides and may also account for a significant dipole component of the potential barrier at the metal/ZrO₂ and metal/Al₂O₃ interfaces.     

Signatures of Ge2Sb2Te5 film at structural transitions

Ge₂Sb₂Te₅ (GST) films, one of the most suitable Chalcogenide alloys for Phase change Random Access Memory applications are studied for changes in sheet resistance, optical transmission, morphology and surface science by annealing at various transition temperatures. The crystallization leads to an increase of grain size and roughness in the films and the resistance changes to three orders of magnitude. Optical studies on GST films show distinct changes during phase transitions and the optical parameters are calculated. An increase of Tauc parameters B^1/2 indicates a reduction in disorder during phase transition. It is confirmed from XPS studies that Ge-Te, Sb-Te bonds are present in both amorphous and crystalline phases whereas Sb-Ge, Te-Te, Sb-Sb bonds are absent.     

Preparation and optical properties of AgGaS2 nanofilms

In this paper, AgGaS₂ nanofilms have been prepared by a two‐step process involving the successive ionic layer absorption and reaction (SILAR) and annealing method. Using AgNO₃, GaCl₃ and Na₂S₂O₃ as reaction sources, the mixture films were firstly deposited on quartz glass substrates at room temperature, and then annealed in Ar environment at 200–500 °C for 4 h, respectively. The effects of annealing temperature on structural and optical properties were investigated by XRD, UV‐Vis, EDS and photoluminescence (PL) spectra. It was revealed in XRD results that α‐Ag₉GaS₆ was contained in the samples annealed at 200 °C, and this phase was decreased with increase of the annealing temperatures. When the sample was annealed at above 400 °C, the chalcopyrite AgGaS₂ nanofilm was obtained. The preferred orientation was exhibited along the (112) plane. It was shown in atomic force microscopy (AFM) results that the grain sizes in AgGaS₂ nanofilms were 18‐24 nm and the thin films were smooth and strongly adherent to the substrates. When the annealing temperature was higher than 400 °C, it is an optimum condition to improve the structural and optical properties of the AgGaS₂ thin films. The room temperature PL spectra of AgGaS₂ nanofilms showed prominent band edge emission at 2.72 eV. Based on all results mentioned above, it can be concluded that the SILAR‐annealing method is preferable to preparing high‐quality AgGaS₂ nanofilms. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Characterisation of ALCVD Al2O3-ZrO2 nanolaminates, link between electrical and structural properties

Al₂O₃ and ZrO₂ mixtures for gate dielectrics have been investigated as replacements for silicon dioxide aiming to reduce the gate leakage current and reliability in future CMOS devices. Al₂O₃ and ZrO₂ films were deposited by atomic layer chemical vapor deposition (ALCVD) on HF dipped silicon wafers. The growth behavior has been characterized structurally and electrically. ALCVD growth of ZrO₂ on a hydrogen terminated silicon surface yields films with deteriorated electrical properties due to the uncontrolled formation of interfacial oxide while decent interfaces are obtained in the case of Al₂O₃. Another concern with respect to reliability aspects is the relatively low crystallization temperature of amorphous high-k materials deposited by ALCVD. In order to maintain the amorphous structure at high temperatures needed for dopant activation in the source drain regions of CMOS devices, binary Al/Zr compounds and laminated stacks of thin Al₂O₃ and ZrO₂ films were deposited. X-ray diffraction and transmission electron microscope analysis show that the crystallization temperature can be increased dramatically by using a mixed oxide approach. Electrical characterization shows orders of leakage current reduction at 1.1-1.7 nm of equivalent oxide thickness. The permittivity of the deposited films is determined by combining quantum mechanically corrected capacitance voltage measurements with structural analysis by transmission electron microscope, X-ray reflectivity, Rutherford backscattering, X-ray photoelectron spectroscopy, and inductively coupled plasma optical emission spectroscopy. The k-values are discussed with respect to formation of interfacial oxide and possible silicate formation.     

Growth and electrical properties of flash evaporated AgGaTe2 thin films

Thin films have been prepared by flash evaporation technique of a stoichiometric bulk of AgGaTe₂ compound in vacuum and analysed using X‐ray diffraction, transmission electron microscopy, selected area diffraction and energy dispersive analysis of X‐rays. The effect of substrate temperature on the structural properties – grain size, film orientation, composition, and stoichiometry of the films have been studied. It was found that the polycrystalline, stoichiometric films of AgGaTe₂ can be grown in the substrate temperature range of 473K < Ts < 573K. The influence of substrate temperature (Ts) on the electrical characteristics‐ Resistivity, Hall Mobility, Carrier concentration of AgGaTe₂ thin films were studied. The electrical resistivity was found to decrease with increase in substrate temperature up to 573K and then increases. The variation of activation energy of AgGaTe₂ thin films were also investigated. The implications are discussed. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Optimization of parameters for deposition of ZnO films by sol gel using Taguchi method

ABSTRACT

ZnO transparent conductive films were deposited on glass substrates by sol-gel spin coating method. Taguchi method was used to find the optimal deposition parameters, three influential parameters were selected in this experiment, Concentration of zinc (II) ions. Zn²⁺, annealing temperature T_r and pre-annealing temperature T_P. By employing the analysis of variance, we found that the annealing temperature T_r and the precursor Zn²⁺ are the most influencing parameters on the properties of ZnO films. Under the optimized deposition conditions, the ZnO films showed high crystal quality, and high transmittance of 90% in the visible region.     

Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system

Hydrogenated carbon nitride (a-CN:H) films were deposited on n-type (1 0 0) silicon substrates making use of direct current radio frequency plasma enhanced chemical vapor deposition (DC-RF-PECVD), using a gas mixture of CH₄ and N₂ as the source gas in range of N₂/CH₄ flow ratio from 1/3 to 3/1 (sccm). The deposition rate, composition and bonding structure of the a-CN:H films were characterized by means of X-ray photoelectron spectroscopy (XPS) and Fourier-transform infrared spectrometry (FTIR). The mechanical properties of the deposited films were evaluated using nano-indentation test. It was found that the parameter for the DC-RF-PECVD process had significant effects on the growth rate, structure and properties of the deposited films. The deposition rate of the films decreased clearly, while the N/C ratio in the films increased with increasing N₂/CH₄ flow ratio. CN radicals were remarkably formed in the deposited films at different N₂/CH₄ flow ratio, and their contents are related to the nitrogen concentrations in the deposited films. Moreover, the hardness and Young’s modulus of the a-CN:H films sharply increased at first with increasing N₂/CH₄ flow ratio, then dramatically decreased with further increase of the N₂/CH₄ flow ratio, and the a-CN:H film deposited at 1/1 had the maximum hardness and Young’s modulus. In addition, the structural transformation from sp³-like to sp²-like carbon-nitrogen network in the deposited films also was revealed.     

Growth of heavy ion-induced nanodots at the SiO2–Si interface: Correlation with ultrathin gate oxide reliability

Scaling-down the oxide thickness induces weakness influencing its intrinsic reliability. Even unbiased, swift heavy ions irradiated devices clearly show oxide alteration. Despite numerous studies on oxide reliability, some results are not yet well understood. In this paper, we focus on the structural degradation induced in thin silicon oxide films on silicon substrate after a 210 MeV low fluence gold ion irradiation and on its effect on the reliability of MOS devices in radiation-harsh environments. We describe such degradation as a local silicon growth in the SiO₂ layer, near the SiO₂–Si interface. Experimental results can bring some emergent elements to explain earlier works in the field of oxide reliability. Based on the specific behavior of heavy ion-irradiated oxides, this paper aims to link together thermal spike model, heavy ion-induced nanodots and reliability of ultrathin gate oxides. We propose to evaluate the possible sensitivity of some high-k materials in radiation-harsh environments with respect to their thermal conductivity property.     

Photostimulated changes of properties of CdTe films

The effect of illumination during the close‐spaced sublimation (CSS) growth on composition, structural, electrical, optical and photovoltaic properties of CdTe films and CdTe/CdS solar cells were investigated. Data on comparative study by using X‐ray diffraction (XRD), scanning electron microscopy (SEM), absorption spectra and conductivity‐temperature measurements of CdTe films prepared by CSS method in dark (CSSD) and under illumination (CSSI) were presented. It is shown that the growth rate and the grain size of CdTe films grown under illumination is higher (by factor about of 1.5 and 3 respectively) than those for films prepared without illumination. The energy band gap of CdTe films fabricated by both technology, determined from absorption spectra, is same (about of 1.50 eV), however conductivity of the CdTe films produced by CSSI is considerably greater (by factor of 10⁷) than that of films prepared by CSSD. The photovoltaic parameters of pCdTe/nCdS solar cells fabricated by photostimulated CSSI technology (J_sc = 28 mA/cm², V_oc =0.63 V) are considerably larger than those for cells prepared by CSSD method (J_sc = 22 mA/cm², V_oc = 0.52 V). A mechanism of photostimulated changes of properties of CdTe films and improvement of photovoltaic parameters of CdTe/CdS solar cells is suggested. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Growth and properties of chemical-vapor-deposited Ti-P-O films grown under the CO2- and H2-existing conditions

Amorphous titanium phosphate (Ti-P-O) films are prepared by low-pressure chemical vapor deposition (CVD) using a mixture of titanium tetrachloride (TiCl₄) and trimethyl phosphite (P(O-CH₃)₃). Two systems are studied: one is the TiCl₄/P(O-CH₃)₃/CO₂ or the CO₂ system and the other is the TiCl₄/P(O-CH₃)₃/H₂ or the H₂ system. Growth and properties of the CVD Ti-P-O films are functions of deposition temperature and the CO₂ and H₂ inputs. The films have a higher growth rate and a lower Ti content at higher deposition temperature. A high CO₂ input favors for film growth, but a high H₂ flow rate is detrimental. Variations of growth rate and film composition with the CO₂ and H₂ inputs are rationalized by the proposed growth mechanisms. The changes in internal stress with deposition temperature and the CO₂ and H₂ inputs are mainly attributed to film thickness. The large difference in electrical resistivity of films of the two systems deposited at 500 °C can be related to the drift of defect protons on the oxygen sites under an electric field.