发光多孔硅的表面氮钝化

报道对多孔硅在NH₃气中进行快速热处理的结果。红外吸收谱表明,经处理样品的表面由Si(NH)₂和Si₃N₄所覆盖,电子自旋共振谱指出,经处理的样品有相当低的悬挂键密度,光荧光谱表明,经适当条件处理的样品的发光强度与未作处理样品相比仅略有降低,而且在大气中存放三个月基本不变,这些结果表明,氮化物可以在多孔硅表面形成优良的钝化膜,这对多孔硅的实际应用及理论研究都有一定意义。     

多孔硅表面钝化对其发光性能的影响

报道多孔硅（ＰＳ）的表面钝化对其光致发光（ＰＬ）和电致发光（ＥＬ）的影响,ＰＬ和ＥＬ谱表明,经钝化处理的ＰＳ的ＰＬ和ＥＬ强度明显增强,且发光峰位较大蓝移;存放实验表明,经钝化处理的ＰＳ的ＰＬ和ＥＬ发光强度和发光峰位具较好的稳定性;Ｉ～Ｖ曲线显示,经钝化处理的ＰＳ发光器件具有较低的劝电压,结结果表明：用钝化处理的方法是几ＰＬ和ＥＬ强度和稳定性及改善器件性能的有效途径。     

多孔硅镍钝化处理的光致发光谱研究

报道了对多孔硅在NiCl2中电解钝化处理的一种新方法,观测了经不同时间处理后多孔硅的光致发光谱,其光谱表明,恰当的处理条件,可使峰值强度增大约2．5倍,峰值波长蓝移33nm,分析了现象发生的原因是由于多孔硅表面的SiHx中的H被Ni替换成SiNix的结果。     

金刚石膜/多孔硅复合材料的性能表征

提出了一种新颖的多孔硅表面钝化技术,即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。采用原子力显微镜（AFM）、扫描电子显微镜（SEM）、X射线衍射仪（XRD）、拉曼光 谱仪和荧光分光度计对多孔硅及金刚石膜的表面形貌、结构和发光特性进行了表征。结果表明采用微波等离子体化学气相沉积法可在多孔硅基片上形成均匀、致密、性能稳定且对可见光具有全透性的金刚石膜。金刚石膜与多孔硅的复合,大大稳定了多孔硅的发光波长和强度,同时增强了多孔硅的机械强度。     

铁钝化多孔硅中的输运性质

采用水热法制备了发光强度强且不衰减、峰位不蓝移的铁钝化多孔硅。标准四引线法测得的电阻一温度结果表明杂质能级是输运的主宰者;电流一电压结果说明当有电流流过样品时会有明显的热效应．考虑到金属电极和铁钝化多孔硅之间形成的肖特基势垒会对样品的输运性质产生影响,采用其平面的两引线法测量了铁钝化多孔硅样品在不同温度下的电流一电压特性,发现隧道模型可以很好地拟和这些结果这些研究结果指出作为未来的多孔硅光电集成器件;通过多孔硅的电流必须限定在一定的范围１引言 １９９０年英国的Ｌ．Ｔ,Ｃａｎｈａｍ首次成功获得在室…     

多孔硅激光染料镶嵌膜的荧光光谱研究

本文对以多孔硅为载体，镶嵌激光染料形成复合膜的光致发光进行了研究，比较了镶嵌膜与其他不同状态下染料发光的差异，发现镶嵌染料荧光光谱线型较其他状态下明显趋于对称，同时考察了衬底情况的改变对镶嵌膜发光的影响。通过对实验结果的分析指出，这种硅基镶嵌膜中的染料的发光主要来自单体的荧光发射。     

多孔硅表面形貌的观测和探讨

一、引言多孔硅室温下较强的光致发光现象给全硅大规模光电集成电路和硅基发光器件的开发带来曙光，但要把它变为现实仍有许多问题要解决，就以发光机理为例，仍有不同意见[1].为此必须深入研究其特性，为探讨发光机理提供依据.已有作者观察到发光畴区[2]，测得多孔硅成分近于二氧化硅[3]，观察到快和慢的发光带[4]以及证实自然氧化引入新的表面态[5]等.但迄今为止测量的均为晾干后的多孔硅，而未深究在空气中贮存干燥过程中形貌的变化.本文对多孔硅在空气中贮存初期表面形貌的变化做了显微观测和探讨.还尝试测量了多孔硅／硅的界面特性.二…     

表面活性剂修饰多孔硅的光致发光光谱

分别利用4种不同的表面活性剂对多孔硅进行表面修饰,结果表明油酸钠溶液、CPB溶液和乳化剂OP溶液修饰的多孔硅样品发光减弱,SDS溶液修饰的多孔硅样品发光增强,不同浓度的SDS溶液的增强倍数也不同。这种现象不仅可以为研究多孔硅的发光机制提供新的依据,还为提高多孔硅的发光效率提供了一个新的有效途径。     

多孔硅膜龟裂过程的显微荧光观察和分析

用Ｏｌｙｍｐｕｓ显微荧光照相系统对多孔硅膜的龟裂过程进行观测，讨论荧光特性和龟裂过程的关系以及龟裂引起的表观荧光横向不均匀性，为研究荧光机理提供了新信息。     

Temporary Surface Passivation for Characterisation of Bulk Defects in Silicon: A Review

Accurate measurements of the bulk minority carrier lifetime in high‐quality silicon materials is challenging due to the influence of surface recombination. Conventional surface passivation processes such as thermal oxidation or dielectric deposition often modify the bulk lifetime significantly before measurement. Temporary surface passivation processes at room or very low temperatures enable a more accurate measurement of the true bulk lifetime, as they limit thermal reconfiguration of bulk defects and minimize bulk hydrogenation. In this article we review the state‐of‐the‐art for temporary passivation schemes, including liquid immersion passivation based upon acids, halogen‐alcohols and benzyl‐alcohols, and thin film passivation usually based on organic substances. We highlight how exceptional surface passivation (surface recombination velocity below 1 cm s^?1) can be achieved by some types of temporary passivation. From an extensive review of available data in the literature, we find p‐type silicon can be best passivated by hydrofluoric acid containing solutions, with superacid‐based thin films showing a slight superiority in the n‐type case. We review the practical considerations associated with temporary passivation, including sample cleaning, passivation activation, and stability. We highlight examples of how temporary passivation can assist in the development of improved silicon materials for photovoltaic applications, and provide an outlook for the future of the field.

     

Influence of Iodine-Containing Solutions on the Condition of a Porous Silicon Surface and Its Photoluminescent Properties

The influence of surface treatment of porous silicon in iodine-containing solutions on its photoluminescent properties has been investigated. The porous silicon samples were prepared by anodizing in HF-based electrolytes and placed in fluoride-hydrogen solutions with the addition of iodine immediately after their formation. The surface condition was controlled by IR Fourier spectroscopy methods in the 400–4000-cm^–1 range. It has been established that the result of the porous silicon treatment in iodine-containing solutions is a decrease in the intensity of Si–H _x -bonds without the appearance of additional vibrations in the range under investigation. At the same time, such a treatment substantially affects the spectrum and intensity of porous silicon photoluminescence and increases its stability in subsequent storage. The possible reasons for the revealed phenomena are discussed.     

Spontaneous Agglomeration of Silver Nanoparticles Deposited on Carbon Film Surface

The spontaneous aggregation of silver nanoparticles on a two-dimensional surface at room temperature is investigated. The nanoparticles were deposited on a carbon film and have been observed by a transmission electron microscope (TEM) for over one year. These particles were about 10nm, spherical and well dispersed initially, and an obviously spontaneous agglomeration was observed at the 12th day, the values, coverage rate of the silver particles on carbon film, were increased with time (before 40th day), but reduced with time (after 40th day). These show that the aggregates of the particles tend to have the smallest surface to reduce their surface free energy and are compact three-dimensional cluster in which the most size is above 100nm. Agglomerating is a successively slow diffusion-limited aggregation (DLA) growth. Another phenomenon, a big aggregate gathering some particles and a small aggregate to form a still bigger one, is observed. This indicates that the aggregating processes are controlled by migration of the particles on carbon film surface and surface energy of the particles.     

氢化非晶硅叠层薄膜对单晶硅表面钝化研究

采用等离子体增强化学气相沉积法生长的单层本征氢化非晶硅薄膜对单晶硅片进行钝化,结果表明增加氢稀释比有利于减少薄膜中的缺陷,增强钝化效果,过量的氢稀释比会导致非晶硅在硅片表面的外延晶化生长,降低钝化效果。退火导致非晶硅晶化程度增加,降低了钝化效果,同时退火提升了薄膜的质量,改变了H键合方式,增强了钝化效果。因此,单层氢化非晶硅只有在合适的氢稀释比和退火温度才可以获得最佳钝化效果。为了提高非晶硅薄膜对硅片的钝化效果,采用具有高低氢稀释比的叠层本征非晶硅薄膜对硅片进行钝化。因此将高氢稀释比沉积的非晶硅薄膜叠层生长于低氢稀释比的薄膜之上,避免非晶硅在硅片表面的外延生长。在退火过程中,高氢稀释比薄膜中的氢扩散到低氢稀释比薄膜中,有效地钝化了非晶硅中和单晶硅表面的悬挂键,改善了非晶硅/硅片的界面质量,叠层钝化后硅片的少子寿命为7.36 ms,隐含开路电压为732 mV。     

Investigation of Porous Silicon Wetting by Raman Scattering

Wetting phenomena in porous silicon layers are experimentally investigated by Raman scattering. The experimental results show a reversible blue-shift of Raman spectra of wetted porous silicon layers with respect to the unperturbed layers. We ascribe the shift to a compressive stress due to the increased lattice mismatch between the porous silicon layer and the bulk silicon substrate in wetting conditions.