Influence of selenization temperature on synthesis,morphology, and properties of nanostructured CoSe2 films

Nanostructured cobalt selenide (CoSe₂) thin films were deposited on a glass substrate using the selenization of Co films at different selenization temperatures (300 °C, 400 °C, and 500 °C) in a pure Se vapor for two hours. The morphology and structure of the as‐deposited films shows that the film morphology and crystallinity are affected by the selenization temperature. Increasing the selenization temperature from 300 °C to 400 °C and 500 °C results in a change in the surface and cross sectional morphology. At 300 °C, the Co films have an almost amorphous structure, while at temperatures of 400 and 500 °C, the Co films have a crystalline nanostructure with bilayered morphology. Optical analyses of the CoSe₂ films at 500 °C show a large absorption (α > 1.0 × 10⁵ cm⁻¹) and a direct band gap (∼1.0 eV).     

Amorphous to crystalline transition of selenium thin films of different thicknesses

Thin films of amorphous selenium obtained by vacuum evaporation display an increase of “optical gap” E_g^opt with an increase of thickness of the film. From the observed dependence of E_g^opt on the thickness of the film, the influence of the thickness on the gap states is interpreted in terms of the density of states model proposed by Mott and Davis. The amorphous to crystalline transition obtained by heat treatment of the specimen is also investigated. The minimum temperature for an appreciable change in crystallisation determined by the transmission of light through selenium films is also a function of the thickness and binding energy of the films. The crystalline structures resulting from heat treatment at different temperatures have been identified by scanning electron microscopy. The generation of different crystalline structures is reported in terms of the thickness and preparation conditions of the amorphous films.     

Influence of temperature on the microcrystalline structure of thermally evaporated Sb2S3 thin films

Thin films of antimony trisulfide (Sb₂S₃) were prepared by thermal evaporation under vacuum (p=5×10^–5 torr) on glass substrates maintained at various temperatures between 293 K and 523 K. Their microstructural properties have obtained by transmission electron microscopy (TEM). The electron diffraction analysis showed the occurrence of amorphous to polycrystalline transition in the films deposited at higher temperature of substrates (523 K). The polycrystalline thin films were found to have an orthorhombic structure. The interplanar distances and unit‐cell parameters were determined by high‐resolution transmission electron microscopy (HRTEM) and compared with the standard values for Sb₂S₃. The surface morphology of Sb₂S₃ thin films was investigated by scanning electron microscopy (SEM). The optical transmission spectra at normal incidence of Sb₂S₃ thin films have been measured in the spectral range of 400–1400 nm. The analysis of the absorption spectra revealed indirect energy gaps, characterizing of amorphous films, while the polycrystalline films exhibited direct energy gap. From the photon energy dependence of absorption coefficient, the optical band gap energy, E_g, were calculated for each thin films. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Spray pyrolysis deposition and characterization of highly (100) oriented magnesium oxide thin films

Transparent dielectric thin films of MgO has been deposited on quartz substrates at different temperatures between 400 and 600°C by a pneumatic spray pyrolysis technique using Mg(CH₃COO)₂·4H₂O as a single molecular precursor. The thermal behavior of the precursor magnesium acetate is described in the results of thermogravimetry analysis (TGA) and differential thermal analysis (DTA). The prepared films are reproducible, adherent to the substrate, pinhole free and uniform. Amongst the different spray process parameters, the substrate temperature effect has been optimized for obtaining single crystalline and transparent MgO thin films. The films crystallize in a cubic structure and X‐ray diffraction measurements have shown that the polycrystalline MgO films prepared at 500°C with (100) and (110) orientations are changed to (100) preferred orientation at 600°C. The MgO phase formation was also confirmed with the recorded Fourier Transform Infrared (FTIR) results. The films deposited at 600°C exhibited highest optical transmittivity (>80%) and the direct band gap energy was found to vary from 4.50 to 5.25 eV with a rise in substrate temperature from 500 to 600°C. The measured sheet resistance and the resistivity of the film prepared at 600°C were respectively 10¹³Ω/□ and 2.06x10⁷Ω cm. The surface morphology of the prepared MgO thin films was examined by atomic force microscopy. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Influence of thermoannealing on crystallinity and optical properties of Sb2S3 thin films

Sb₂S₃ thin films are obtained by evaporating of Sb₂S₃ powder onto glass substrates maintained at room temperature under pressure of 2×10^‐5 torr. The composition of the thin films was determined by energy dispersive analysis of X‐ray (EDAX). The effect of thermal annealing in vacuum on the structural properties was studied using X‐ray diffraction (XRD) technique and scanning electron microscopy (SEM). The as‐deposition films were amorphous, while the annealed films have an orthorhombic polycrystalline structure. The optical constants of as‐deposited and annealed Sb₂S₃ thin films were obtained from the analysis of the experimental recorded transmission spectral data over the wavelength range 400‐1400 nm. The transmittance analysis allowed the determination of refractive index as function of wavelength. It was found that the refractive dispersion data obeyed the single oscillator model, from which the dispersion parameters (oscillator energy, E₀, dispersion energy, E_d) were determined. The static refractive index n(0), static dielectric constant, ε_∞, and optical band gap energy, E_g, were also calculated using the values of dispersion parameters. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Effects of annealing on the lattice parameter of polycrystalline CdS thin films

Cubic CdS (β‐CdS) polycrystalline thin films were prepared on glass substrates by chemical synthesis at 80 °C. Samples were subjected to thermal treatments (TT) in the range of temperatures (T) 180 – 500 °C during 30 hours in different ambients. Annealing in air and in H₂ produces in CdS larger lattice parameter enlargements (≤2.5 %) when T of TT increases up to T ≤ 500 °C. Whereas, annealing in Ar + S₂ and vacuum provokes intermediate (≤1.2 %) and smaller (≤0.9 %) maxima values of the lattice parameter increments, respectively. Energy band gap (E_g) as a function of T of TT and as a function of the lattice parameter has been also studied where it was observed that E_g behaves in very different manners depending on the ambient chosen for annealing. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Effects of CdCl2 treatment on properties of CdTe thin films grown by evaporation at low substrate temperatures

The structural, morphological and optical properties of vacuum‐evaporated CdTe thin films were investigated as a function of substrate temperature and post‐deposition annealing without and with CdCl₂/treatment at 400°C for 30 min. Diffraction patterns are almost the same exhibiting higher preferential orientation corresponding to (111) plane of the cubic phase. The intensity of the (111) peak increased with the CdCl₂/annealing treatment. The microstructure observed for all films following the CdCl₂/annealing treatment are granular, regardless of the as‐deposited microstructure. The grain sizes are increased after the CdCl₂/annealing treatment but now contain voids around the grain boundaries. The optical band gaps, E_g, were found to be 1.50, 1.50 and 1.48 eV for films deposited at 200 K and annealed without and with CdCl₂/treatment at 400°C for 30 min respectively. A progressive sharpening of the absorption edge upon heat treatment particularly for the CdCl₂/treated was observed. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Distribution of electronic states in amorphous Cd-As thin films on the basis of optical measurements

Transmission and fundamental reflectivity studies, completed on amorphous Cd-As thin films, allowed us to obtain parameters describing the fundamental absorption edge, i.e. the optical pseudogap E_G^opt, Urbach energy E_U and exponential edge parameter E_T. All these data, together with the results of earlier transport measurements, have been utilized in developing simple models of electronic structure (distribution of electronic states) for amorphous Cd-As thin films of various compositions.     

NMR and infrared study of cation motion in vitreous and polycrystalline TlPO3

The activation energy for Tl⁺ conduction in TlPO₃ glass is obtained from analysis of temperature-dependent motional narrowing for Tl²⁰⁵ NMR spectra and determinations of the localized far infrared (FIR) vibrational frequency for Tl⁺. Use is made of the phenomenological equation of Hendrickson and Bray to analyze the NMR data, yielding E_a = 1.19 eV; the measured FIR Tl⁺ vibrational frequency of 80 cm^?1 yields E_a = 1.09 eV. No significant ionic conduction is observed in polycrystalline TlPO₃. Differential scanning calorimeter measurements yield a glass transition temperature T_g of 96°C and the onset of crystallization temperature of 132°C. Measurements of the Tl²⁰⁵ chemical shift interaction as a function of frequency indicate that (1) the Tl⁺ sites in both polycrystalline and glassy TlPO₃ are ionic, the sites in the polycrystal being slightly more ionic than in the glass; (2) the chemical shift interaction is anisotropic in the glass and isotropic in the polycrystal; and (3) distributions in the values of the principal components of the chemical shift tensor exist in the glass, corresponding to a variety of TlO bond lengths and bond strengths.     

Thermo-mechanical behavior of uniaxially drawn and crystallized poly(ethylene naphthalene-2,6-dicarboxylate) (PEN) films

Thermo-mechanical properties of poly(ethylene naphthalene-2,6-dicarboxylate) (PEN) films in the amorphous state, uniaxially stretched and thermally crystallized were compared and show different microstructure–property relationships. The glass transition temperature shifts to higher temperatures when films are stretched above T_g at 160 °C, in relation with a crystallinity increase and subsequent confinement effects of the amorphous phase, but films stretched below T_g at 100 °C show an opposite trend while drawing. This is discussed in relation with the highly mobile structural state arising from plastic deformation of the amorphous phase. The confinement effects were particularly assessed by the estimation of a ‘rigid amorphous fraction’ (RAF). Crystallinities and RAF were estimated from DSC data for the uniaxially drawn and thermally crystallized films respectively. It was observed that the RAF was higher in thermally crystallized films than in uniaxially drawn samples in relation to a lamellar semi-crystalline morphology. In addition to this detailed thermo-mechanical characterizations, low stress creep measurements were carried out during heating scans. They can be related to the microstructure and thermal transitions of the films. In particular, for the uniaxially stretched films, the measured shrinkage decreases when the draw ratio increases because the crystalline entities developed during the draw process are locking the chain motions.     

Influence of density of states on optical properties of GaSe thin film

A systematic investigation on the effect of substrate temperature on the structure, optical absorption and density of states of vacuum evaporated gallium monoselenide (GaSe) thin films is reported. The X‐ray diffraction analysis shows an occurrence of amorphous to polycrystalline transformation in the films deposited at higher‐temperature substrates (573K). The compositional analysis is made with Auger Electron Spectroscopy (AES). The thickness of the film (175nm) is measured by a multiple beam interferometery. Optical characteristics of the GaSe sample have been analyzed using spectrophotometer in the photon energy range of 1.0 ‐ 4 eV. The absorption mechanism has been recognized and the allowed indirect as well as forbidden direct transitions have been found. As‐deposited films show two indirect and allowed transitions due to spin‐orbit splitting of the valence band, as reported here for the first time. Low field conduction have enabled us to determine the density of states in amorphous and poly‐GaSe films. The amorphous and polycrystalline GaSe thin films have localized states density values of N (E_F) = 1.686 × 10¹⁷ cm^‐3 eV^‐1 and 1.257 × 10¹⁵ cm^‐3 eV^‐1 respectively. The experimental results are interpreted in terms of variations in the density of localized states due to progressive decrease of the unsaturated bonds during deposition. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Effect of annealing temperatures on properties of sol‐gel grown ZnO‐ZrO2 films

Mixed ZnO‐ZrO₂ films have been obtained by sol‐gel technology. By using spin coating method, the films were deposited on Si and glass substrates. The influence of thermal annealings (the temperatures vary from 400 °C to 750 °C) on their structural properties has been studied. The structural behavior has been investigated by the means of XRD and FTIR techniques. The results revealed no presence of mixed oxide phases, the detected crystal phases were related to the hexagonal ZnO and to crystalline ZrO₂. The sol‐gel ZnO‐ZrO₂ films showed polycrystalline structure with a certain degree of an amorphous fraction. The optical transmittance reached 91% and it diminished with increasing the annealing temperatures. The optical properties of the sol‐gel ZnO‐ZrO₂ films, deposited on glass substrates are excellent with high transparency and better then those of pure ZrO₂ films, obtained at similar technological conditions. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Control of the optical band gap of hydrogenated amorphous boron: The use of the B2H6–BF3 gas mixtures

Amorphous boron thin films have been produced by the glow discharge decomposition of diborane, boron trifluoride, and hydrogen gas mixtures. The optical band gap of these films was controlled by changing the relative proportions of diborane and boron trifluoride. Films with band gaps of approximately 1.45 eV can be obtained by using a B₂H₆ : BF₃ gas volume ratio of 8 : 1 and a substrate temperature of 225°C. The electron paramagnetic resonance spectrum shows a pronounced shift in the g factor, giving evidence of fluorine incorporated into the amorphous matrix.     

Influence of the substrate temperature on the structural,optical, and electrical properties of tin selenide thin films deposited by thermal evaporation method

Thin films of tin selenide (SnSe) were deposited on sodalime glass substrates, which were held at different temperatures in the range of 350‐550 K, from the pulverized compound material using thermal evaporation method. The effect of substrate temperature (T_s) on the structural, morphological, optical, and electrical properties of the films were investigated using x‐ray diffraction analysis (XRD), scanning electron microscopy (SEM), transmission measurements, and Hall‐effect characterization techniques. The temperature dependence of the resistance of the films was also studied in the temperature range of 80‐330 K. The XRD spectra and the SEM image analyses suggest that the polycrystalline thin films having uniform distribution of grains along the (111) diffraction plane was obtained at all T_s. With the increase of T_s the intensity of the diffraction peaks increased and well‐resolved peaks at 550 K, substrate temperature, were obtained. The analysis of the data of the optical transmission spectra suggests that the films had energy band gap in the range of 1.38‐1.18 eV. Hall‐effect measurements revealed the resistivity of films in the range 112‐20 Ω cm for films deposited at different T_s. The activation energy for films deposited at different T_s was in the range of 0.14 eV‐0.28 eV as derived from the analysis of the data of low‐temperature resistivity measurements. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Structure and optical properties of amorphous GeSx films prepared by PLD

Amorphous GeS_x (x = 2, 4, 6) films were prepared by the pulsed laser deposition (PLD) technique. The optical band gaps (E_g^opt) and refractive indices of the films were obtained from the optical absorption spectra and transmission spectra, respectively. The short-wave absorption edges of the films were described using the ‘non-direct transition’ model proposed by Tauc. The dispersion of the refractive index was analyzed in terms of the single-oscillator Wemple–Di Domenico model. The structural units of the films were characterized using Raman spectroscopy. In addition to the basic structural units of edge-sharing and corner-sharing [GeS₄] tetrahedra, there are S–S homopolar bonds in S-rich GeS₄ and GeS₆ films while Ge–Ge bonds exist in stoichiometric GeS₂ film. The results show that the index of refraction decreases while E_g^opt increases with the sulphur content in the GeS_x films. The changes of E_g^opt were discussed in relation to the structure of GeS_x films, which were confirmed by the Raman spectra analysis.     

Properties of Sm‐doped CaNb2O6 thin films deposited by radio‐frequency magnetron sputtering

Sm‐doped CaNb₂O₆ (CaNb₂O₆:Sm) phosphor thin films were prepared by radio‐frequency magnetron sputtering on sapphire substrates. The thin films were grown at several growth temperatures and subsequently annealed at 800 °C in air. The crystallinity, surface morphology, optical transmittance, and photoluminescence of the thin films were investigated by X‐ray diffraction, scanning electron microscopy, ultraviolet‐visible spectrophotometry, and fluorescence spectrophotometry, respectively. All of the thin films showed a main red emission radiated by the transition from the ⁴G_5/2 excited state to the ⁶H_9/2 ground state of the Sm³⁺ ions and several weak bands under ultraviolet excitation with a 279 nm wavelength. The optimum growth temperature for depositing the high‐quality CaNb₂O₆:Sm thin films, which was determined from the luminescence intensity, was found to be 400 °C, where the thin film exhibited an orthorhombic structure with a thickness of 370 nm, an average grain size of 220 nm, a band gap energy of 3.99 eV, and an average optical transmittance of 85.9%. These results indicate that the growth temperature plays an important role in controlling the emission intensity and optical band gap energy of CaNb₂O₆:Sm thin films.     

Doping dependence of crystallization growth rate in a-Si CVD films

Crystallization growth rates (V_g) on boron and phosphorus doped a-Si C VD films are obtained using conductivity measurements during isothermal annealings at temperatures 510<T_A<650°C. For boron doping, the associated activation energy of V_g is equal to 2.9 eV in the whole doping range (up to 2 × 10^?3 B₂H₆), whereas V_g increases by a factor 4 in the range 0 ? 7 × 10^?6 and remains almost constant for higher doping. In this low range, the neutral dangling bonds became positively charged and non paramagnetic by electronic compensation with the acceptors, and the E.S.R. signal decreases from 10¹⁹ to 10¹⁷ cm^?3. These results indicate clearly that dangling bonds and their charge state play an important role in the growth rate process.     

Structures of vapour-deposited amorphous films of arsenic chalcogenides

The structures of vapour-deposited amorphous films of composition As_xSe_1?x′, with x between 0 and 1, have been investigated by X-ray diffraction. In all cases the structure of the freshly deposited film differs very considerably from that of the corresponding bulk glass. For the elemental amorphous films the structure is highly disordered and contains voids which for Se cannot be annealed out below the crystallization temperature of 70°C or, for As, below the temperature ($\text{?130°}\text{C}$) where the As film re-evaporated. Annealing of the arsenic selenide films at temperatures below T_g causes the structures to relax towards those of the bulk, with a distribution of activation energies around 25 kJ mol^?1. The composition of the vapour has been examined by mass spectroscopy and it is concluded that even if some molecular identity is retained on condensation there must be considerable cross-linking to give the observed structural behaviour.     

Electrical, structural and optical properties of SnO2 thin films prepared by spray pyrolysis

This study investigated the effect of the substrate temperature on the structural, optical, morphological, and electrical properties of undoped SnO₂ films prepared by a spray deposition method. The films were deposited at various substrate temperatures ranging from 300-500 °C in steps of 50 °C and characterized by different optical and structural techniques. X-ray diffraction studies showed that the crystallite size and preferential growth directions of the films were dependent on the substrate temperature. These studies also indicated that the films were amorphous at 300 °C and polycrystalline at the other substrate temperatures used. Infrared and visible spectroscopic studies revealed that a strong vibration band, characteristic of the SnO₂ stretching mode, was present around 630 cm⁻¹ and that the optical transmittance in the visible region varied over the range 75-95% with substrate temperature, respectively. The films deposited at 400 °C exhibited the highest electrical conductivity property.     

Ferroelectric PbTiO3 Powders and Thin Films Derived from Sol-Gel Processing

Lead titanate powders and thin films were prepared by the sol-gel process of metal alkoxide solutions and solvents. From DSC measurements, phase transition temperature of crystallized PbTiO₃ powders was obtained at about 484 °C. From XRD investigation, it was confirmed that the tetragonal phase of polycrystalline PbTiO₃ thin films is formed by coating of concentrated solution on all of the substrates we used after heat treatment above 500 °C. It was found by SEM and ellipsometric analysis that the thin film coated with 0.25 M concentrated solutions once had an average thickness of about 720 Å. Surfaces of thin films were crack-free, uniform, and its average grain size investigated by SEM was 0.6–0.8 μm. Band gap energy of PbTiO₃ thin film coated on the Al₂O₃ (2243) substrate was 3.45 eV, which is assumed to be due to the direct band to band transition. Dielectric constant (ϵ) and dielectric loss (tan δ) of PbTiO₃ thin film amounted to 60–70 and 0.01–0.02 in the region of 10 kHz ∼ 1 MHz at room temperature, respectively, and transition temperature was 486 °C at 1 MHz. From the hysteresis loop of PbTiO₃ thin film, spontaneous polarization of 12 μC/cm² and coercive filed of 45 kV/cm were obtained.