Preparation of polyhedral oligomeric silsesquioxane‐containing block copolymer with well‐controlled stereoregularity

Preparation of functional domains with a spacing of 10 nm is a benchmark set to fabricate next‐generation electronic devices. Organic–inorganic block copolymers form well‐ordered microphase separations with very small domain sizes. The design and preparation of a novel block copolymer consisting of syndiotactic polymethyl methacrylate (st‐PMMA) and polyhedral oligomeric silsesquioxane (POSS)‐functionalized polymethacrylate, designated as st‐PMMA‐b‐PMAPOSS, which can recognize functional molecules, are reported. The st‐PMMA segments form a helical structure and encapsulate C₆₀ in the helical nanocavity, leading to the formation of an inclusion complex. Although the ordering of the domains is not high, C₆₀ domains that are in a quasi‐equilibrium state, with about 10‐nm domain spacings, are generated using st‐PMMA‐b‐PMAPOSS that can recognize functional molecules. © 2019 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2019, 57, 2181–2189     

Annealing effect on performance and morphology of photovoltaic devices based on poly(3‐hexylthiophene)‐b‐poly(ethylene oxide)

Novel block copolymers, poly(3‐hexylthiophene)‐b‐poly(ethylene oxide) (P3HT‐b‐PEO) were synthesized via Suzuki coupling reaction of P3HT and PEO homopolymers. The copolymers were characterized by NMR, gel permeation chromatography, differential scanning calorimeter, and UV–vis measurements. A series of devices based on the block copolymers with a fullerene derivative were evaluated after thermal or solvent annealing. The device using P3HT‐b‐PEO showed higher efficiency than using P3HT blend after thermal annealing. Phase‐separated structures in the thin films of block copolymer blends were investigated by atomic force microscopy to clarify the relationship between morphologies constructed by annealing and the device performance. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011     

Strength of polymer phase boundaries with large interfacial width: Effects of interfacial profile and phase separation morphology

In this study, we investigate the effect of random copolymer additives on the interfacial profile, the lateral phase separation morphology, and the interfacial fracture toughness (G_c) between two immiscible polymers. The interface between polystyrene (PS)/poly(methyl methacrylate) (PMMA) was reinforced with a random copolymer mixture when two or more PS_f ‐r‐PMMA_1‐f random copolymers with different volume fraction, f, were blended. For short annealing time (<3 h), the random copolymer mixture exhibits a disordered and large domain structure (>1 lm) from which crazes can be extensively initiated and developed, leading to a large interfacial fracture energy. With increasing annealing time, the random copolymer mixture self‐organizes as multiple layers, with the composition that changes gradually from PS‐rich layers to PMMA‐rich layers across the interface, leading to a large interfacial width. However, within each layer, the random copolymer mixture microphase separates laterally into smaller domains (<200 nm). We found that the microphase‐separated domains with nanometer‐sized structure significantly affect the stability of craze fibrils that can be initiated and widened at the interface, leading to a decrease in the fracture energy. © 2010 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 48: 1834–1846, 2010     

Synthesis of coil‐comb block copolymers containing polystyrene coil and poly(methyl methacrylate) side chains via atom transfer radical polymerization

A series of polystyrene‐b‐(poly(2‐(2‐bromopropionyloxy) styrene)‐g‐poly(methyl methacrylate)) (PS‐b‐(PBPS‐g‐PMMA)) and polystyrene‐b‐(poly(2‐(2‐bromopropionyloxy)ethyl acrylate)‐g‐poly(methyl methacrylate)) (PS‐b‐(PBPEA‐g‐PMMA)) as new coil‐comb block copolymers (CCBCPs) were synthesized by atom transfer radical polymerization (ATRP). The linear diblock copolymer polystyrene‐b‐poly(4‐acetoxystyrene) and polystyrene‐b‐poly(2‐(trimethylsilyloxy)ethyl acrylate) PS‐b‐P(HEA‐TMS) were obtained by combining ATRP and activators regenerated by electron transfer (ARGET) ATRP. Secondary bromide‐initiating sites for ATRP were introduced by liberation of hydroxyl groups via deprotection and subsequent esterification reaction with 2‐bromopropionyl bromide. Grafting of PMMA onto either the PBPS block or the PBPEA block via ATRP yielded the desired PS‐b‐(PBPS‐g‐PMMA) or PS‐b‐(PBPEA‐g‐PMMA). ¹H nuclear magnetic resonance spectroscopy and gel permeation chromatography data indicated the target CCBCPs were successfully synthesized. Preliminary investigation on selected CCBCPs suggests that they can form ordered nanostructures via microphase separation. © 2016 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2016 , 54, 2971–2983     

Star polymers with POSS via azide–alkyne click reaction

Azidopropyl‐heptaisobutyl‐substituted polyhedral oligomeric silsesquioxane (POSS‐N₃) was reacted with 1,1,1‐tris[4‐(2‐propynyloxy)phenyl]‐ethane ( 1 ) and poly(ethylene glycol) (PEG)‐b‐poly(methyl methacrylate) (PMMA) copolymer with alkyne at its center (PEG‐PMMA‐alkyne) affording the first time synthesis of 3‐arm star POSS and PEG‐PMMA‐POSS 3‐miktoarm star terpolymer, respectively, in the presence of CuBr/N,N,N′,N″,N″‐pentamethyldiethylenetriamine as catalyst and N,N‐dimethylformamide/tetrahydrofuran as solvent at room temperature. The precursors and the target star polymers were characterized comprehensively by ¹H NMR, GPC, and DSC. © 2009 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 47: 5947–5953, 2009     

Nanostructured hybrid polymer networks from in situ self‐assembly of RAFT‐synthesized POSS‐based block copolymers

A series of well‐defined hybrid block copolymers PMACyPOSS‐b‐PMMA and PMAiBuPOSS‐b‐PMMA exhibiting high POSS weight contents have been synthesized by RAFT polymerization and further studied as modifiers for epoxy thermosets based on diglycidyl ether of bisphenol A. The hybrid block copolymers self‐assembled within the epoxy precursors into micelles possessing an inorganic core and a PMMA corona. Thanks to the presence of the PMMA blocks that remain miscible until the end of the reaction, curing of the resulting blends afforded nanostructured hybrid organic/inorganic networks with well‐dispersed inorganic‐rich nanodomains with diameters on the order of 20 nm. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011     

Hyperbranched block copolymer from AB2 macromonomer: Synthesis and its reaction‐induced microphase separation in epoxy thermosets

In this contribution, we reported the synthesis of a hyperbranched block copolymer composed of poly(ε‐caprolactone) (PCL) and polystyrene (PS) subchains. Toward this end, we first synthesized an α‐alkynyl‐ and ω,ω′‐diazido‐terminated PCL‐b‐(PS)₂ macromonomer via the combination of ring‐opening polymerization and atom transfer radical polymerization. By the use of this AB₂ macromonomer, the hyperbranched block copolymer (h‐[PCL‐b‐(PS)₂]) was synthesized via a copper‐catalyzed Huisgen 1,3‐dipolar cycloaddition (i.e., click reaction) polymerization. The hyperbranched block copolymer was characterized by means of ¹H nuclear magnetic resonance spectroscopy and gel permeation chromatography. Both differential scanning calorimetry and atomic force microscopy showed that the hyperbranched block copolymer was microphase‐separated in bulk. While this hyperbranched block copolymer was incorporated into epoxy, the nanostructured thermosets were successfully obtained; the formation of the nanophases in epoxy followed reaction‐induced microphase separation mechanism as evidenced by atomic force microscopy, small angle X‐ray scattering, and dynamic mechanical thermal analysis. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2016 , 54, 368–380     

Block‐brush copolymers via ROMP and sequential double click reaction strategy

We report an efficient way, sequential double click reactions, for the preparation of brush copolymers with AB block‐brush architectures containing polyoxanorbornene (poly (ONB)) backbone and poly(ε‐caprolactone) (PCL), poly(methyl methacrylate) (PMMA) or poly(tert‐butyl acrylate) (PtBA) side chains: poly(ONB‐g‐PMMA)‐b‐poly(ONB‐g‐PCL) and poly(ONB‐g‐PtBA)‐b‐poly(ONB‐g‐PCL). The living ROMP of ONB affords the synthesis of well‐defined poly(ONB‐anthracene)₂₀‐b‐poly (ONB‐azide)₅ block copolymer with anthryl and azide pendant groups. Subsequently, well‐defined linear alkyne end‐functionalized PCL (PCL‐alkyne), maleimide end‐functionalized PMMA (PMMA‐MI) and PtBA‐MI were introduced onto the block copolymer via sequential azide‐alkyne and Diels‐Alder click reactions, thus yielding block‐brush copolymers. The molecular weight of block‐brush copolymers was measured via triple detection GPC (TD‐GPC) introducing the experimentally calculated dn/dc values to the software. © 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011     

Behaviors of self‐assembled diblock copolymer with pendant photosensitive azobenzene segments

A novel monomer, ethyl 4‐[4‐(11‐methacryloyloxyundecyloxy)phenyl azobenzoyl‐oxyl] benzoate, containing a photoisomerizable N?N group was synthesized. The monomer was further diblock copolymerized with methyl methacrylate. Amphiphilic diblock copolymer poly(methyl methacrylate‐block‐ethyl 4‐[4‐(11‐methacryloyloxyundecyloxy)phenyl azobenzoyl‐oxyl] benzoate ( PMMA ‐ b ‐ PAzoMA ) was synthesized using atom transfer radical polymerization. The reverse micelles with spherical construction were obtained with 2 wt % of the diblock copolymer in a THF/H₂O mixture of 1:2. Under alternating UV and visible light illumination, reversible changes in micellar structure between sphere and rod‐like particles took place as a result of the reversible E‐Z photoisomerization of azobenzene segments in PMMA ‐ b ‐ PAzoMA . Microphase separation of the amphiphilic diblock copolymer in thin films was achieved through thermal and solvent aligning methods. The microphases of the annealed thin films were investigated using atom force microscopy topology and scanning electron microscopy analyses. © 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 48: 1142–1148, 2010     

Synthesis,micelle formation,and bulk properties of poly(ethylene glycol)‐b‐poly(pentafluorostyrene)‐g‐polyhedral oligomeric silsesquioxane amphiphilic hybrid copolymers

The synthesis, micelle formation, and bulk properties of semifluorinated amphiphilic poly(ethylene glycol)‐b‐poly(pentafluorostyrene)‐g‐cubic polyhedral oligomeric silsesquioxane (PEG‐b‐PPFS‐g‐POSS) hybrid copolymers is reported. The synthesis of amphiphilic PEG‐b‐PPFS block copolymers are achieved using atom transfer radical polymerization (ATRP) at 100 °C in trifluorotoluene using modified poly(ethylene glycol) as a macroinitiator. Subsequently, a proportion of the reactive para‐F functionality on the pentafluorostyrene units was replaced with aminopropylisobutyl POSS through aromatic nucleophilic substitution reactions. The products were fully characterized by ¹H‐NMR and GPC. The products, PEG‐b‐PPFS and PEG‐b‐PPFS‐g‐POSS, were subsequently self‐assembled in aqueous solutions to form micellar structures. The critical micelle concentrations (cmc) were estimated using two different techniques: fluorescence spectroscopy and dynamic light scattering (DLS). The cmc was found to decrease concomitantly with the number of POSS particles grafted per copolymer chain. The hydrodynamic particle sizes (R_h) of the micelles, calculated from DLS data, increase as the number of POSS molecules grafted per copolymer chain increases. For example, R_h increased from ～60 nm for PEG‐b‐PPFS to ～80 nm for PEG‐b‐PPFS‐g‐POSS25 (25 is the average number of POSS particles grafted copolymer chain). Static light scattering (SLS) data confirm that the formation of larger micelles by higher POSS containing copolymers results from higher aggregation numbers (N_agg), caused by increased hydrophobicity. The R_g/R_h values, where R_g is the radius of gyration calculated from SLS data, are consistent with a spherical particle model having a core‐shell structure. Thermal characterization by differential scanning calorimetry (DSC) reveals that the grafted POSS acts as a plasticizer; the glass transition temperature (T_g) of the PPFS block in the copolymer decreases significantly with increasing POSS content. Finally, the rhombohedral crystal structure of POSS in PEG‐b‐PPFS‐g‐POSS was verified by wide angle X‐ray diffraction measurements. © 2009 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 48: 152–163, 2010     

Selective control over the lamellar thickness of one domain in thin binary blends of block copolymer films

Thin binary blends of poly(styrene‐b‐methyl methacrylate) (PS‐PMMA) block copolymers in films where the lamellar thickness of one domain is controlled while preserving the thickness of the other domain were demonstrated without microphase separation. One of the block copolymers used here was short and symmetric, and the other was long and asymmetric; the molecular weights of the PMMA block chains in the constituents were similar. A random copolymer brush was introduced and film thickness and composition of brush were adjusted to induce perpendicular orientation in thin film. As the blend composition of the long asymmetric block copolymer increased, the PS lamellar thickness increased from 15.8 to 25.1 nm, whereas the PMMA lamellar thickness remained constant at approximately 14 nm (the thickness decreased slightly from 14.0 to 13.3 nm). The domain spacing behavior in thin film was consistent in the bulk. These results were compared with the Birshtein, Zhulina, and Lyatskaya model and the theories for pure block copolymers in the strong segregation limit and in the intermediate segregation regime. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2013, 51, 1393–1399     

Encapsulation of nanomaterials using an intermediary layer cross‐linkable ABC triblock copolymer

For the preparation of core‐shell nanoparticles containing functional nanomaterials, a photo‐cross‐linkable amphiphilic ABC triblock copolymer, poly(ethylene glycol)‐b‐poly(2‐cinnamoyloxyethyl methacrylate)‐b‐poly(methyl methacrylate) (PEG‐PCEMA‐PMMA), was synthesized. This triblock copolymer was then used to encapsulate Au nanoparticles or pyrene. The triblock copolymer of PEG‐b‐poly(2‐hydroxyethyl methacrylate)‐b‐PMMA (PEG‐PHEMA‐PMMA) (M_n = 15,800 g/mol, M_w/M_n = 1.58) was first synthesized by activators generated by electron transfer atom transfer radical polymerization. Its middle block was then functionalized with cinnamoyl chloride. The degrees of polymerization of the PEG, PHEMA, and PMMA blocks were 45, 13, and 98, respectively. PMMA‐tethered Au nanoparticles (with an average diameter of 3.0 nm) or pyrene was successfully encapsulated within the PEG‐PCEMA‐PMMA micelles. The intermediary layers of the micelles were then cross‐linked by UV irradiation. The spherical structures of the PEG‐PCEMA‐PMMA micelles containing Au nanoparticles or pyrene were not changed by the photo‐cross‐linking process and they showed excellent colloidal stability. © 2009 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 47: 4963–4970, 2009     

Synthesis and dielectric properties of novel liquid crystalline triblock copolymers with cyanobiphenyl moieties and poly(n‐butyl acrylate) segments

In this work, self‐assembly method was used to improve the dielectric constant of triblock copolymers. A series of ABA triblock copolymers with a defined length of poly(n‐butyl acrylate) (PBA, B block) segment and different lengths of liquid crystalline (LC) poly[11‐(4‐cyano‐4′‐biphenoxy)undecyl methacrylate] (P11CBMA, A block) segments were synthesized by using the atom transfer radical polymerization method. The well‐defined triblock copolymers P11CBMA_m‐b‐PBA_n‐b‐P11CBMA_m possess three different B/A ratios (n = 50, m = 17, 43, 53). Due to the supramolecular cooperative motion effect, the copolymers can form worm‐like microstructure (W_LC = 52.8%), cylinder‐like nanostructure with P11CBMA phase embedded in PBA matrix (W_LC = 73.9%), and wide stripe structure with LC domains distributed unevenly in a continuous PBA matrix (W_LC = 77.7%) after annealed at 160°C (above T_i) under N₂ for 24 h, respectively. In order to study the influence of microphase separated morphology of triblock copolymer on the dielectric properties, solvent annealing was also used to develop various nanostructures. After thermal or solvent annealing, the dielectric constants of block copolymers increased dramatically while their loss factors remained the same. For different block copolymers, the dielectric constants increased with the increase of the LC block length. For diverse treatments, dielectric permittivities of samples varied widely with different nanostructures. The results show that the dielectric constants of block copolymers could be tuned by the block ratios and the self‐assembled microstructures. These findings will inspire researchers using self‐assembly method to design and develop novel flexible materials with high dielectric permittivity. Copyright © 2014 John Wiley & Sons, Ltd.     

Nanostructured epoxy thermoset templated by an amphiphilic PCL‐b‐PES‐b‐PCL triblock copolymer

The PCL‐b‐PES‐b‐PCL triblock copolymer is used to incorporate into epoxy resin when the blends are cured with 4,4'‐diaminodiphenylsulfone (DDS) to afford the nanostructured epoxy thermosets. The differential scanning calorimetry (DSC) and Fourier transform‐infrared spectroscopy (FT‐IR) show that the nanostructured PCL‐b‐PES‐b‐PCL thermosets are accessed through the formation of the intermolecular hydrogen bonding interactions. The nanostructures are further evidenced by means of small‐angle X‐ray scattering (SAXS) and transmission electron microscopy (TEM). By considering the miscibility of the subchains of block copolymer with epoxy before and after the curing reaction, it is judged that the formation of the nanostructures follows the mechanism of reaction‐induced microphase separation. It is noted that the epoxy resin is significantly toughened in terms of the measurement of critical stress field intensity factor (K_IC). © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016 , 54, 424–432     

Synthesis and characterization of polystyrene‐b‐poly (1,2‐isoprene‐ran‐3,4‐isoprene) block copolymers with azobenzene side groups

Polystyrene‐b‐poly(1,2‐isoprene‐ran‐3,4‐isoprene) block copolymers with azobenzene side groups were synthesized by the esterification of azobenzene acid chloride with polystyrene‐b‐hydroxylated poly(1,2‐isoprene‐ran‐3,4‐isopenre) block copolymers for creating new photochromic materials. The resulting block copolymers with azobenzene side groups were characterized for structural, thermal, and morphological properties. IR and NMR spectroscopies confirmed that the polymers obtained had the expected structures. Differential scanning calorimetric measurements by heating runs clearly showed the glass transitions of polystyrene and polyisoprene main chains and two distinct first‐order transitions at temperatures of azobenzene side groups around 48 and 83 °C. The microstructure of these block copolymer films was investigated using both transmission electron microscopy (TEM) and near‐field optical microscopy (NOM). TEM images revealed typical microphase‐separated morphologies such as sphere, cylinder, and lamellar structures. The domain spacing of microphase‐separated cylindrical morphology in the NOM image agreed with that of the TEM results. © 2002 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 40: 2406–2414, 2002     

Controlled synthesis and microstructure tuning of PEG‐containing side‐chain discotic liquid crystalline block copolymers via RAFT polymerization

Liquid crystalline block copolymers (LCBCPs) are fascinating for their combining molecular level liquid crystalline orders and microphase separated multidomain morphologies. Here in this article, a series of PEG‐containing side‐chain discotic LCBCPs of PEG‐b‐P_m‐n with variant spacer length m = 6, 10 and degree of polymerization (DP) of discotic LC block from n = 10 to 45, have been well‐synthesized via reversible addition‐fragmentation chain‐transfer (RAFT) polymerization. The RAFT process mediated by macromolecular chain transfer agent (macroCTA) shows remarkable monomer concentration dependence. The influence of the introduced PEG block on the nano‐scale microphase‐segregation and mesophase organization is closely related to the side‐chain triphenylene (TP) discogens stacking mode dependent on the spacer length. Wherein, the PEG‐b‐P₆‐n series with a six‐methylene spacer exhibit consistent microphase separation with slightly disturbed yet ordered columnar structures. While for PEG‐b‐P₁₀‐n series with a longer ten‐methylene spacer, the columnar organization in the copolymers is even improved in contrast with the low order of randomly TP stacking in their corresponding homopolymers. This work offers a viable and inspiring pathway for controlled synthesis of block copolymers with bulky side groups, as well as enhances in‐depth understanding of the hierarchical superstructure organization in discotic units involved complex block copolymers. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2017 , 55, 2544–2553     

Synthesis of PMMA‐b‐PBA block copolymer in homogeneous and miniemulsion systems by DPE controlled radical polymerization

In this research, poly(methyl methacrylate)‐b‐poly(butyl acrylate) (PMMA‐b‐PBA) block copolymers were prepared by 1,1‐diphenylethene (DPE) controlled radical polymerization in homogeneous and miniemulsion systems. First, monomer methyl methacrylate (MMA), initiator 2,2′‐azobisisobutyronitrile (AIBN) and a control agent DPE were bulk polymerized to form the DPE‐containing PMMA macroinitiator. Then the DPE‐containing PMMA was heated in the presence of a second monomer BA, the block copolymer was synthesized successfully. The effects of solvent and polymerization methods (homogeneous polymerization or miniemulsion polymerization) on the reaction rate, controlled living character, molecular weight (M_n) and molecular weight distribution (PDI) of polymers throughout the polymerization were studied and discussed. The results showed that, increasing the amounts of solvent reduced the reaction rate and viscosity of the polymerization system. It allowed more activation–deactivation cycles to occur at a given conversion thus better controlled living character and narrower molecular weight distribution of polymers were demonstrated throughout the polymerization. Furthermore, the polymerization carried out in miniemulsion system exhibited higher reaction rate and better controlled living character than those in homogeneous system. It was attributed to the compartmentalization of growing radicals and the enhanced deactivation reaction of DPE controlled radical polymerization in miniemulsified droplets. © 2009 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 47: 4435–4445, 2009     

Synthesis and self‐assembly of diblock copolymers composed of poly(3‐hexylthiophene) and poly(fluorooctyl methacrylate) segments

Regioregular poly(3‐hexylthiophene)‐b‐poly(1H,1H‐dihydro perfluorooctyl methacrylate) (P3HT‐b‐PFOMA) diblock copolymers were synthesized by atom transfer radical polymerization of fluorooctyl methacrylate using bromoester terminated poly(3‐hexylthiophene) macroinitiators in order to investigate their morphological properties. The P3HT macroinitiator was previously prepared by chemical modification of hydroxy terminated P3HT. The block copolymers were well characterized by ¹H NMR spectroscopy and gel permeation chromatography. Transmission electron microscopy was used to investigate the nanostructured morphology of the diblock copolymers. The block copolymers are able to undergo microphase separation and self‐assemble into well‐defined and organized nanofibrillar‐like micellar morphology. The development of the morphology of P3HT‐b‐PFOMA block copolymers was investigated after annealing in solvent vapor and also in supercritical CO₂. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011     

Radiation‐induced fabrication of polymer nanoporous materials from microphase‐separated structure of diblock copolymers as a template

Polymer nanoporous materials with periodic cylindrical holes were fabricated from microphase‐separated structure of diblock copolymers consisting of a radiation‐crosslinking polymer and a radiation‐degrading polymer through simultaneous crosslinking and degradation by γ‐irradiation. A polybutadiene‐block‐poly(methyl methacrylate) (PB‐b‐PMMA) diblock copolymer film that self‐assembles into hexagonally packed poly(methyl methacrylate) cylinders in polybutadiene matrix was irradiated with γ‐rays. Solubility test, IR spectroscopy, and TEM and SEM observations for this copolymer film in comparison with a polystyrene‐block‐poly(methyl methacrylate) diblock copolymer film revealed that poly(methyl methacrylate) domains were removed by γ‐irradiation and succeeding solvent washing to form cylindrical holes within polybutadiene matrix, which was rigidified by radiation crosslinking. Thus, it was demonstrated that nanoporous materials can be prepared by γ‐irradiation, maintaining the original structure of PB‐b‐PMMA diblock copolymer film. © 2007 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 45: 5916–5922, 2007     

Monte Carlo simulation of AB diblock copolymer between surface and substrate and comparison of experimental results

The morphologies of AB diblock copolymer film between the substrate and surface were investigated via Monte Carlo simulations on simple cubic lattices. The morphological dependence of the diblock copolymer thin film on the thickness, as well as the composition and interactive intensity has been mainly studied. With the increase of A‐segments fraction, various microdomain morphologies including regular parallel stripe‐like, mesh‐like, and normal lamella near the region of the surface were generated in this work. The morphology of thin films of asymmetric diblock copolymer was found to form cylinders in a bulk system when L_z was equal to 30. The morphologies of PS‐b‐PDMS diblock copolymer films have been studied via atomic force microscopy (AFM) and transition electron microscopy (TEM) measurements. The surface morphology of the PS‐b‐PDMS copolymer thin film shows a mesh‐like microphase separated structure, and PDMS continuous phase protruded on the PS dispersed phase. The surface composition of PS‐b‐PDMS copolymer thin films was measured by means of X‐ray photoelectron spectroscopy (XPS) and ATR‐IR. The comparison results show that the experimental observations are in good agreement with the simulation results. © 2006 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 44: 1835–1845, 2006