+1/-1相位掩模板和532nm激光下低损耗As_2S_3硫系光纤布喇格光栅的制备

采用改进型Sagnac干涉光栅写入系统,利用532nm准带隙光曝光源和带+1/-1衍射级的相位掩模板,在两种不同直径的低损耗As_2S_3硫系玻璃光纤上刻写布喇格光栅,并研究曝光期间光栅的动态特性.实验表明,As_2S_3光纤布喇格光栅透射峰值随光纤直径的减小而增强;在曝光过程中,布喇格波长先是较快地向短波长方向移动,随着曝光时间的延长,布喇格波长缓慢地向长波长方向回复.曝光时间为800~1 000s时,在包层直径为140μm的As_2S_3光纤上获得质量良好的布喇格光栅光谱,其透射峰值可达-2.6dB,带宽为0.37nm.对As_2S_3硫系光纤纤芯的光敏性分析结果表明,折射率调制幅度和平均折射率变化随曝光时间分别可达到10-4和10-3数量级.     

Strong Bragg gratings photoinduced by 633-nm illumination in evaporated As2Se3 thin films

Bragg gratings are used in several photonic devices to reflect, and thus to isolate, specific wavelengths of light. Gratings can be photoinduced in chalcogenide glasses by illumination of bandgap light in an interference pattern. We used holographic interferometry to create Bragg gratings in amorphous As2Se3 thin films with a period of 0.56 microm by illumination with 633-nm light. The quality of the gratings was tested in real time, and refractive-index modulations as high as 0.037 were measured. These gratings were found to be stable over a period of several months if they were kept in the dark.