Densities of Active Species in R/x%(N2–5%H2) (R = Ar or He) Microwave Flowing Afterglows

Plasma Chemistry and Plasma Processing - Afterglows of R/x(N2–5%H2) (R?=?Ar or He) flowing microwave discharges are characterized by optical emission spectroscopy. Absolute...     

Study on the Physical and Chemical Characteristics of DBD: The Effect of N2/O2 Mixture Ratio on the Product Regulation

Plasma Chemistry and Plasma Processing - The chemical product behaviors of dielectric barrier discharge (DBD) in N2/O2 gas mixtures are investigated. Besides ozone mode and nitrogen oxides mode, a...     

Superhydrophilic Modification of Magnetic Fe3o4 Nanoparticles Assisted by Low-Temperature Atmosphere N2/H2 Plasma

Plasma Chemistry and Plasma Processing - Superhydrophilic modification of magnetic Fe3O4 nanoparticles (MNPs) assisted by low-temperature atmosphere N2/H2 plasma was proposed in this work to...     

Comparison of Chemistry Induced by Direct and Indirect Plasma Treatment of Water to the Effect of UV Radiation

Plasma Chemistry and Plasma Processing - The yield of redox reactions (Fe2+ oxidation and Mn7+ reduction in aqueous solutions) under the action of hot plasma radiation in liquid and species formed...     

Assessing the Efficiency of Sodium Ferrate Production by Solution Plasma Process

Plasma Chemistry and Plasma Processing - Application of sodium ferrate (Na2FeO4) is considered as the environmental friendly and cost-effective method for oxidation, coagulation and disinfection...     

Characterization of Reversed Arc Hydrocarbon Plasma in Material Processing

Plasma Chemistry and Plasma Processing - A comprehensive study of the reversed arc plasma enhanced CVD (RACVD) reactor utilizing an Ar?+?H2?+?CH4 plasma-creating mixture in...     

On the Use of the Numerical Simulation of the First Positive System of N2: II. Fast Trot Estimation from the Partially Resolved (3, 0) Band

Plasma Chemistry and Plasma Processing - A fast and simple method for estimating the rotational temperature from the partially resolved (3, 0) band of the first positive system of N2...     

Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching

Plasma Chemistry and Plasma Processing - In this study, the dry plasma-chemical etching process of monocrystalline SiO2 (quartz) in a fluoride-based (sulfur hexafluoride, SF6) inductively coupled...     

Influence of Operating Parameters,Al2O3 and Ni/Al2O3 Catalysts on Plasma-Assisted CO2 Reforming of CH4 in a Parallel Plate Dielectric Barrier Discharge for High H2/CO Ratio Syngas Production

Plasma Chemistry and Plasma Processing - This work aimed to investigate plasma-assisted CO2 reforming of CH4 in a parallel plate dielectric barrier discharge (DBD) system for production of high...     

Phase-Resolved Measurement of Atmospheric-Pressure Radio-Frequency Pulsed Discharges in Ar/CH4/CO2 Mixture

Plasma Chemistry and Plasma Processing - In order to comprehensively investigate the discharge characteristics of an atmospheric-pressure radio-frequency (RF) pulsed discharge in Ar/CH4/CO2, a...     

Investigation of CO2 Splitting Process Under Atmospheric Pressure Using Multi-electrode Cylindrical DBD Plasma Reactor

Plasma Chemistry and Plasma Processing - In this paper, the CO2 splitting process was performed under atmospheric pressure in a multi-electrode cylindrical dielectric barrier discharge (DBD) plasma...     

Cr(VI) Reduction by Microsecond Pin-to-Pin Discharges Generated in an Aqueous Solution

Plasma Chemistry and Plasma Processing - The total reduction of Cr(VI) by microsecond pin-to-pin electric discharge generated in aqueous solution has been reported. [Cr(VI)] and [H2O2] were...     

Formation of Nitrogen Oxides by Nanosecond Pulsed Plasma Discharges in Gas–Liquid Reactors

Plasma Chemistry and Plasma Processing - A gas–liquid-film flow reactor with a nanosecond pulsed power supply was utilized to produce nitrogen oxides from Ar/N2 mixtures (gas phase) and...     

Hydrogen Production via Synthetic Biogas Reforming in Atmospheric-Pressure Microwave (915 MHz) Plasma at High Gas-Flow Output

Plasma Chemistry and Plasma Processing - This paper is a contribution to the development of microwave plasma-based technology for hydrogen (H2) production from a so-called synthetic biogas,...     

Promoting Plasma Photocatalytic Oxidation of Toluene Via the Construction of Porous Ag–CeO2/TiO2 Photocatalyst with Highly Active Ag/oxide Interface

Plasma Chemistry and Plasma Processing - Plasma-photocatalysis system (PPS) constructed by dielectric barrier discharge and TiO2 photocatalysts could realize toluene oxidation removal at low...     

Effects of Buffer Gases on Plasma Properties and Arc Decaying Characteristics of C4F7N–N2 and C4F7N–CO2 Arc Plasmas

Plasma Chemistry and Plasma Processing - C4F7N is one of the most promising candidate to replace SF6 as arc quenching medium. Some buffer gases (N2 and CO2) are usually mixed with C4F7N to reduce...     

On the Use of the Numerical Simulation of the First Positive System of N2: I. Emission and LIF Analysis

Plasma Chemistry and Plasma Processing - Numerical modeling of the first positive system of N2 (B3Πg-A3Σu+ has been applied to analyze the plasma-induced emission and the laser-induced...     

Nanostructure protein repellant amphiphilic copolymer coatings with optimized surface energy by Inductively Excited Low Pressure Plasma

Statistically designed amphiphilic copolymer coatings were deposited onto Thermanox, Si wafer, and quartz crystal microbalance (QCM) substrates via Plasma Enhanced Chemical Vapor Deposition of 1H,1H,2H,2H-perfluorodecyl acrylate and diethylene glycol vinyl ether in an Inductively Excited Low Pressure Plasma reactor. Plasma deposited amphiphilic coatings were characterized by Field Emission Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Atomic Force Microscopy, and Water Contact Angle techniques. The surface energy of the coatings can be adjusted between 12 and 70 mJ/m(2). The roughness of the coatings can be tailored depending on the plasma mode used. A very smooth coating was deposited with a CW (continuous wave) power, whereas a rougher surface with R(a) in the range of 2 to 12 nm was deposited with the PW (pulsed wave) mode. The nanometer scale roughness of amphiphilic PFDA-co-DEGVE coatings was found to be in the range of the size of the two proteins namely BSA and lysozyme used to examine for the antifouling properties of the surfaces. The results show that the statistically designed surfaces, presenting a surface energy around 25 mJ/m(2), present no adhesion with respect to both proteins measured by QCM.     

Byproducts Generation Characteristics of Non-thermal Plasma for NO Conversion: Effect of Reaction Conditions

Plasma Chemistry and Plasma Processing - Over the years, the combined Non-thermal Plasma (NTP) denitrification process which is used for decomposition of NOx has have become an application...     

Dynamics of Gas Heating in the Afterglow of Pulsed CO2 and CO2–N2 Glow Discharges at Low Pressure

Plasma Chemistry and Plasma Processing - The time-dependent evolution of the energy transfer into gas heating in the afterglow of pulsed CO2 and CO2–N2 glow discharges produced in cylindrical...