Passivation of GaAs surface by atomic-layer-deposited titanium nitride

The suitability of titanium nitride (TiN) for GaAs surface passivation and protection is investigated. A 2-6-nm thick TiN passivation layer is deposited by atomic layer deposition (ALD) at 275 ° C on top of InGaAs/GaAs near surface quantum well (NSQW) structures to study the surface passivation. X-ray reflectivity measurements are used to determine the physical properties of the passivation layer. TiN passivation does not affect the surface morphology of the samples, but increases significantly the photoluminescence intensity and carrier lifetime of the NSQWs, and also provides long-term protection of the sample surface. This study shows that ALD TiN coating is a promising low-temperature method for ex situ GaAs surface passivation.     

InGaP/GaAs heterojunction bipolar transistor grown by solid-source molecular beam epitaxy with a GaP decomposition source

Lattice-matched InGaP epilayers on GaAs (001) and InGaP/GaAs heterojunction bipolar transistors (HBTs) were successfully grown by solid-source molecular beam epitaxy (SSMBE) with a GaP decomposition source. A 3 μm thick InGaP epilayer shows that low temperature photoluminescence (PL) peak energy is as large as 1.998 eV, full width at half maximum (FWHM) is 5.26 meV, which is the smallest ever reported, and X-ray diffraction (XRD) rocking curve linewidth is as narrow as that of GaAs substrate. The electron mobilities at room temperature of nominally undoped InGaP layers obtained by Hall measurements are comparable to similar InGaP epilayer grown by solid-source molecular beam epitaxy (SSMBE) with other sources or other growth techniques. The large area InGaP/GaAs HBTs show very good Dc characteristics.     

Measurements of residual stress in semi-insulating GaAs by Cr-related luminescence lines

We have measured systematically the Cr-related zero-phonon lines in the 0.839 eV region in a series of plastically-bent semi-insulating GaAs:Cr with compressive or tensile stress along various bending axes. As a result, it has been found that the residual stress in semi-insulating GaAs:Cr wafers can be sensitively characterized from a splitting and energy shift of the 0.839 eV Cr-related luminescence lines in the low-temperature photoluminescence spectra. Furthermore, we have applied this method to the characterization of the interface stress of OMVPE-grown ZnSe/GaAs:Cr heterostructure and found that anomalous stress exists at the ZnSe/GaAs interface, which is inconsistent with stress predicted by the lattice mismatch of the heterojunctions.     

Photoreflectance study of energy level structure of self-assembled InAs/GaAs quantum dots emitting at 1.3 μm

Photoreflectance and photoluminescence measurements were performed on the ensemble of self assembled InAs/GaAs quantum dots designed to emit at 1.3 μm. As many as six QDs-related optical transitions were observed in PR spectra, the energies of which were confirmed by high-excitation PL results. Numerical calculations allowed estimating the average size of the dots, which is larger than for standard InAs/GaAs QDs. This result is in agreement with structural data. Additionally, the energy level structure for such QDs was derived and compared with the electronic structure of standard InAs/GaAs dots. It was shown that the energy level structure of such large dots qualifies them for the active region of a laser emitting at 1.3 μm.     

Barrier-disorder induced exciton relaxation via LO-phonons in GaAs/Al x Ga1−x As multiple quantum wells

Hot exciton relaxation is observed in GaAs/Al _x Ga_1–x As multiple quantum wells. The photolumnescence excitation spectra of the localized exciton emission at low temperatures and excitation densities are composed of narrow equidistant peaks exactly separated by the GaAs LO-phonon energy (36 meV). The relaxation mechanism via LO-phonons is found to be important for localized excitons in multiple quantum wells with GaAs layer thicknesses of about 50 Å, where pronounced alloy fluctuations in the barriers provide a strong additional lateral potential which suppresses the dissociation of hot excitons.     

Transient photoluminescence decay study of minority carrier lifetime in GaAs heteroface solar cell structures

Transient photoluminescence decay has been studied theoretically and experimentally as a technique for the investigation of GaAs solar cell materials and solar cell structures. The time-dependent continuity equation was solved using two variable boundary conditions modelling the interface between the emitter and hetero-window layer (AlGaAs) and between the emitter and space charge region, respectively. The solution was found with help of the Fourier transform method and the method of residues. There results an analytical expression for the time dependent photoluminescence (PL) intensity. The influence of various solar cell parameters on this photoluminescence transient has been studied in detail. An experimental investigation of transient PL decay was performed using a synchronously pumped mode locked and cavity dumped Nd:YAG/dye laser system for excitation and an optical sampling oscilloscope as the detector. GaAs wafers with and without surface passivation have been measured as well as hetero-window pn-structures and processed solar cells. A fit of the theoretical PL transients to the measured transients allows surface and bulk recombination parameters to be determined.Dedicated to H.-J. Queisser on the occasion of his 60th birthday     

Sb-mediated growth of high-density InAs quantum dots and GaAsSb embedding growth by MBE

Self-assembled InAs quantum dots (QDs) with high-density were grown on GaAs(0 0 1) substrates by antimony (Sb)-mediated molecular beam epitaxy technique using GaAsSb/GaAs buffer layer and InAsSb wetting layer (WL). In this Sb-mediated growth, many two-dimensional (2D) small islands were formed on those WL surfaces. These 2D islands provide high step density and suppress surface migration. As the results, high-density InAs QDs were achieved, and photoluminescence (PL) intensity increased. Furthermore, by introducing GaAsSb capping layer (CL), higher PL intensity at room temperature was obtained as compared with that InGaAs CL.     

ZnSe films deposited on crystalline GaAs and amorphous quartz substrates by means of pulsed laser ablation technique

ZnSe films were deposited by pulsed laser ablation on a crystalline GaAs substrate and on an amorphous quartz substrate. The deposition process was performed with the same growth parameters. The films were investigated by means of X-ray diffraction, reflectance and photoluminescence spectroscopy. The X-ray diffraction spectra have demonstrated that the films grow in a highly oriented way but having different orientations, i.e. the films deposited on GaAs grow (100)-oriented and the films deposited on quartz grow (111)-oriented. Reflectance spectra as a function of the temperature have been analysed by means of the classical oscillator model, in order to obtain the temperature dependence of the band gap energy. This gives results comparable to those of ZnSe single crystals for ZnSe on GaAs, but it is red-shifted for ZnSe on quartz, because of lattice and thermal strains. The photoluminescence measurements at T = 10 K confirm the better quality of ZnSe deposited on GaAs and show that pulsed laser ablation is a promising technique to grow films having intrinsic luminescence even on an amorphous substrate. Received 29 May 2002 Published online 31 October 2002 RID="a" ID="a"e-mail: giuseppe.perna@ba.infn.it     

Photoluminescence of Al x Ga1−x As/GaAs quantum well heterostructures grown by molecular beam epitaxy

Nominally undoped Al_xGa_1–xAs grown by molecular beam epitaxy from As₄ species at elevated substrate temperatures of 670°C exhibits well-resolved excitonic fine structure in the low-temperature photoluminescence spectra, if the effective As-to-(Al+Ga) flux ratio on the growth surface is kept within a rather narrow range of clearly As-stabilized conditions. In contrast to previous results on Al_xGa_1–xAs of composition 0.15not to shift in energy by changing the excitation intensity. This implies a simple freeelectron carbon-acceptor recombination mechanism for the line without any participation of a donor. In Al_xGa_1–xAs of composition close to the direct-to-indirect cross-over point, two distinct LO-phonons separated by 34 and 48 meV from the (D ⁰,C ⁰) peak position at x=0.43 were observed which were before only detectable by Raman scattering experiments. The intensity of the carbon-impurity related luminescence lines in bulk-type Al_xGa_1–xAs and GaAs layers was found to be strongly reduced, as compared to the excitonic recombination lines, if the respective active layer was covered by a very thin confinement layer of either GaAs on top of Al_xGa_1–xAs or vice versa grown in the same growth cycle.     

Enhanced photoluminescence from gallium arsenide semiconductor coated with Au nanoparticles

We demonstrate a method for improving photoluminescence of gallium arsenide semiconductor by simply coating a thin layer of Au nanoparticles on its surface. Further focused ion beam bombardment at the sputter-coated Au film was conducted to control the size, the distribution, and the morphology of the Au nanoparticles via the changes of the focused ion-beam irradiation conditions. Photoluminescence of GaAs coated with the Au nanoparticles with average size of 5 nm in diameter is enhanced to about threefold relative to that of pure GaAs. Numerical calculations were conducted based on finite-different time-domain method. Results indicated that the enhancement is mainly attributed to the contribution of local surface plasmon resonance of Au nanoparticles.     

Carrier spin polarization in ferromagnet-semiconductor (Ga,Mn)As/GaAs structures

The effect of ferromagnetic layers on the spin polarization of holes and electrons in ferromagnet-semiconductor superlattices with a fixed Mn δ-layer thickness of 0.11 nm and different GaAs interlayer thicknesses varying in the range from 2.5 to 14.4 nm and a fixed number of periods (40) is studied by means of hot-electron photoluminescence (HPL). Here, our study of the HPL demonstrates that the holes in δ-layers of (Ga,Mn)As DMS occupy predominantly the Mn acceptor impurity band. The width of the impurity band decreases with the increase of the interlayer distance. We also found that an increase in the GaAs interlayer thickness softens the magnetic properties of the ferromagnetic layers as well as reduces the carrier polarization. It is demonstrated that the hole spin polarization in the DMS layers and spin polarization of electrons in nonmagnetic GaAs are proportional to the sample magnetization.     

Effect of thermal annealing in the microstructural and the optical properties of uncapped InAs quantum dots grown on GaAs buffer layers

The effect of thermal annealing on self-assembled uncapped InAs/GaAs quantum dots (QDs) has been investigated using transmission electron microscopy (TEM) and photoluminescence (PL) measurements. The TEM images showed that the lateral sizes and densities of the InAs QDs were not changed significantly up to 650 °C. When the InAs/GaAs QDs were annealed at 700 °C, while the lateral size of the InAs QDs increased, their density decreased. The InAs QDs disappeared at 800 °C. PL spectra showed that the peaks corresponding to the interband transitions of the InAs QDs shifted slightly toward the high-energy side, and the PL intensity decreased with increasing annealing temperature. These results indicate that the microstructural and the optical properties of self-assembled uncapped InAs/GaAs can be modified due to postgrowth thermal annealing.     

Excitation transfer in novel self-organized quantum dot structures

We report on studies of excitation transfer processes in vertically self-organized pairs of unequal-sized quantum dots (QDs), created in InAs/GaAs bilayers having differing InAs deposition amounts in the first (seed) and subsequent layer. The former and latter enable independent control, respectively, of the density and the size distribution of the second layer QDs. This approach allows us to enhance the average volume and improve the uniformity of InAs QDs, resulting in low-temperature photoluminescence at 1.028 eV with a linewidth of 25 meV for 1.74 ML (seed)/3.00 ML InAs stacking. The optical properties of the formed pairs of unequal-sized QDs with clearly discernible ground-state transition energy depend on the spacer thickness and composition. Photoluminescence results provide evidence for nonresonant energy transfer from the smaller QDs in the seed layer to the larger QDs in the second layer in such asymmetric QD pairs. Transfer times down to 20 ps (36 ML GaAs spacer) are estimated, depending exponentially on the GaAs spacer thickness.     

Photo production of surface recombination centers in gallium arsenide

The near band edge photoluminescence (–870 nm) at 300 K of semi-insulating and p-type GaAs, a potentially useful tool for GaAs wafer mapping, decreases with time under illumination from the 514 nm line of an Ar⁺ laser. The photoluminescence bleaching has been studied by optical and photo Hall-effect techniques. It recovers only partially on a time scale of days and does not show a distinct intensity threshold behavior. From lifetime measurements and experiments on samples covered with epitaxial layers of GaAs _x P_1–x or Si₃N₄ it is concluded that creation of surface recombination centers causes the PL bleaching.     

Excitation mechanism in polymer layers doped with tetra-methylester of perylene tetracarboxylicacid: influences of doping concentration and external bias

A spin-coated layer of poly(N-vinylcarbazole) (PVK) doped with tetra-methyl ester of perylene-3,4,9,10-tetracarboxylicacid (TMEP) is prepared, and the effects of dopant concentration and bias voltages on excitation mechanisms are studied through analyzing its emission characteristics. The investigation indicates that in photoluminescence (PL) cases energy and charge transfers between PVK and TMEP are cooperated for low dopant concentration, whereas the electroluminescence (EL) spectra imply that energy transfer is more important than charge trapping and transfer in these devices. For high dopant concentration, charge transfer is dominated in PL spectra but has a minor effect on EL spectra, and the external bias has less influence on the EL characteristics. A kinetic analysis is given to rationalize the experiment results.     

Energy transfer from organic surface adsorbate-polyvinyl pyrrolidone molecules to luminescent centers in ZnS nanocrystals

Multi-colour emitting doped ZnS nanocrystals surface capped with pyridine (P-ZnS) or polyvinyl pyrrolidone (PVP-ZnS) have been synthesized by wet chemical methods. The photoluminescence studies show that the dopant related emission from P-ZnS nanocrystals are caused by the energy transfer from band-to-band excitation of the host lattice. However, in the case of PVP capped ZnS, considerable enhancement in the emission intensity was observed and the corresponding excitation spectra appeared dramatically broadened due to the presence of multiple excitation bands with peak maxima at 235, 253, 260, 275, and 310 nm. The bands from 235 to 275 nm are assigned to the electronic transitions in the chemisorbed PVP molecules whereas the excitation maximum around 310 nm corresponds to the band-to-band transition within the nanocrystalline ZnS host. The presence of PVP related energy bands in the excitation spectrum indicates the process of energy transfer from the surface adsorbed PVP molecules to dopant centers in ZnS nanocrystals. This study brings out a heterogeneous sensitizer-activator relation between organic surface adsorbate and doped semiconducting nanocrystals.     

Bevel fabrication for depth resolved studies of multiple quantum well structures

Beveled cross-sections of semiconductors with inclination angles down to 0.25 min of arc have been produced with a special ion beam etching process. We applied this technique to the depth resolved characterization of GaAs/GaAlAs multiple quantum well structures by photoluminescence spectroscopy. The depth dependent incorporation of impurities during the growth of the first quantum well layers is clearly revealed.     

Hot carrier cooling in gaas quantum wells

The cooling of a hot electron-hole plasma in undoped, p-doped, and n-doped GaAs/AlGaAs quantum wells of three different thicknesses (3, 9, and 20 nm) is investigated by picosecond luminescence spectroscopy. The energy loss of holes due to the Fröhlich interaction is at low excitation densities independent of well width and close to the value obtained by a simple theory. The rate strongly decreases with increasing excitation density. For electrons, the energy loss is even at low densities strongly reduced compared to the simple theory of the Fröhlich interaction. The reduction of the energy loss at high densities is independent of dimensionality and well width and not caused by screening or degeneracy effects. The energy loss due to acoustic deformation potential scattering depends on well width.     

Influence of the cap layer thickness on photoluminescence properties in strained InGaAs/GaAs single quantum wells

The influence of the GaAs cap layer thickness on the luminescence properties in strained In_0.20Ga_0.80As/GaAs single quantum well (SQW) structures has been investigated using temperature-dependent photoluminescence (PL) spectroscopy. The luminescence peak is shifted to lower energy as the GaAs cap layer thickness decreases, which demonstrates the effect of the GaAs cap layer thickness on the strain of InGaAs/GaAs single quantum wells (SQW). We find the PL quenching mechanism is the thermal activation of electron hole pairs from the wells into the GaAs cap layer for the samples with thicker GaAs cap layer, while in sample with thinner GaAs cap layer exciton trapping on misfit dislocations is dominated.     

Low-temperature photoluminescence of MBE-grown GaAs subject to an electric field

Low-temperature photoluminescence of GaAs has been investigated in MBE-grown Al _x Ga_1–x As-GaAs single heterojunctions subject to an electric field. No peak energy shift is observed in the emission lines due to free excitons and excitons bound to isolated centers when the electric field is applied. In contrast, the excitonic lines arising from the previously described defect-induced bound exciton (DIBX) transitions exhibit a prominent low-energy shift when the electric field is increased. We attribute these lines to excitons bound to acceptor pairs. The excitons bound to distant pairs have smaller binding energies than those bound to closer pairs. They are, therefore, easily dissociated in a weak electric field. The electrons and holes thus dissociated may again be trapped by closer pairs, which results in a low-energy shift of the overall spectrum. The photocurrent measured as a function of the electric field supports Dingle's rule for the valence bandedge discontinuity.