An in situ GISAXS study of selective solvent vapor annealing in thin block copolymer films: Symmetry breaking of in-plane sphere order upon deswelling

Thin films of asymmetric poly(styrene-b-4-vinylpyridine) (PS-b-P4VP) block copolymers are studied by means of in situ grazing-incidence small-angle X-ray scattering (GISAXS) during solvent vapor annealing in tetrahydrofuran, a solvent selective for the PS majority block of the copolymer. Upon swelling, PS-b-P4VP block copolymers form hexagonal arrays of spherical P4VP microdomains in a PS matrix in films 7–9 layers thick. Deswelling the films induces a transition from hexagonal to face-centered orthorhombic (fco) symmetry, which is stable only at ∼7 layers of spherical microdomains. Dry films show co-existing hexagonal and orthorhombic symmetries when the solvent is removed slowly, whereas instantaneous solvent removal suppresses the fco structure, resulting in films with only hexagonal structure. The in-plane order of microdomains is significantly deteriorated in dry films independent of the solvent removal rate.Spherical block copolymer microdomains are known to undergo a transition from hexagonal to orthorhombic packing in isothermally annealed thin films when the number of sphere layers is increased from 4 to 5. In this paper, in situ GISAXS experiments reveal that a similar transition occurs during solvent vapor annealing in a selective solvent. Interestingly, the transition from hexagonal to orthorhombic packing of spheres occurs as solvent is removed from a thin block copolymer film. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016, 54, 331–338     

A simple method to prepare highly ordered PS-b-P4VP block copolymer template

A control strategy for tuning the film morphology of asymmetric polystyrene-b-poly(4-vinylpyridine) (PS-b-P4VP) block copolymers (BCPs) is reported. After preparation of the film by spin-coating method, the as-cast films were annealed in different solvent vapor. It is found that chloroform is a wonderful solvent for forming PS-b-P4VP regular pattern. Otherwise, with changing the concentration of PS-b-P4VP, cylindrical or parallel nanostructures could be attained. The PS-b-P4VP films with cylindrical structure are used as template to deposit FePt nanoparticles into the pores. Nanoparticles reaching the bottom of the holes form a disordered magnetic array.     

Incorporation of Dyes into Polystyrene-block-poly(4-vinylpyridine) Nanotemplates

Summary: The present study provides some basic concepts of functionalization of diblock copolymer (BC) nanotemplates for optical applications. It is focused on the polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) building medium which is suitable for hydrogen bonding, undergoes phase segregation, and is well-accessible. Two techniques are described and demonstrated on several dye complexes with PS-b-P4VP. Relation between optical properties and thin film structure is tentatively studied in dependence on solvent effects in thin films.     

PI-b-PMMA diblock copolymers: nanostructure development in thin films and nanostructuring of thermosetting epoxy systems

Poly(isoprene-block-methyl methacrylate) (PI-b-PMMA) block copolymers with different block ratios have been used to generate nanostructures both in thin films and by nanostructuring a thermosetting epoxy system. Obtained morphologies have been analyzed in terms of atomic force microscopy. The nanostructuring of thin films was carried out by thermal and solvent vapor annealing, in which the copolymer films were exposed to acetone vapors, selective solvent for methyl methacrylate (PMMA) block. By solvent vapor annealing thin films of both copolymers self-assembled into a hexagonally packed cylindrical morphology. Thermal annealing was carried out above the glass transition temperature of both blocks, obtaining worm-like and lamellar morphologies, depending on the block ratio. One of the copolymers has also been used for nanostructuring an epoxy thermosetting system. Morphologies consisting of spherical-shaped PI domains dispersed in a continuous epoxy matrix in which PMMA remained miscible were obtained, independently of the copolymer amount.     

Morphology Evolution of Block Copolymer Blend Thin Films Induced by Solvent Vapor Annealing

ABSTRACT

Self-assembly of binary block copolymer blends in thin film induced by solvent vapor annealing has been systematically studied. The diblock copolymers polystyrene-b-poly(2-vinylpyridine) with different molecular weights and volume fractions were blended with different molar ratios to cast thin films on silica substrate by spin coating. The films were annealed separately in the vapor of ethanol or toluene over time to induce morphology transformations from spheres, gyroids, and bicontinuous nanostructures, depending on the blending ratio, solvent selectivity, and annealing time, as investigated by atomic force microscopy and X-ray photoelectron spectroscopy. The formation and transformation mechanism of the self-assembly structure are discussed in the context of solvent-copolymer interactions. This study provides new insights into the simple manipulation of self-assembled nanostructures of block copolymer thin films.     

A simple route to ordered metal oxide nanoparticle arrays using block copolymer thin films

Oxide nanoparticles arrays are easily synthesized in a 3-steps method including (i) the deposition of poly(styrene)-b-poly(4-vinylpyridine) (PS-b-PVP) thin films, (ii) the selective deposition of inorganic precursors and (iii) the synthesis of oxide nanoparticles and the elimination of the polymer scaffold by thermal annealing. The specific staining of the PVP domains by inorganic precursors is obtained in this study thanks to a simple and fast spin coating process using an alcoholic solution of the precursors. This simple lab-procedure is used to synthesize a wide range of metallic (silicon, titanium, cerium, ruthenium, zinc and manganese) oxides, showing that this method can be extended to the synthesis of all kinds of oxides with all kinds of precursors as long as the precursor is soluble in P4VP solvent. It is shown that this strategy can be extended to the synthesis of oxide nanorods.     

Nanoparticle directed domain orientation in thin films of asymmetric block copolymers

We investigated the thin film morphology of two different asymmetric block copolymers (BCP), polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) and poly(n-pentyl methacrylate)-block-poly(methyl methacrylate) (PPMA-b-PMMA), loaded with pre-synthesized iron oxide nanoparticles (NP). The chemical composition of the BCP constituents determines the strength of the interaction between polymer chains and nanoparticles. In the case of NP/PS-b-P4VP system, the nanoparticles interact preferentially with the P4VP block and hence localize selectively in the P4VP cylindrical microdomains. However, for the NP/PPMA-b-PMMA system, the nanoparticles have no significant preference for the copolymer blocks and segregate at the polymer/substrate interface. Interestingly, this changes the effective substrate surface energy and hence leads to a remarkable change in domain orientation from parallel to perpendicular with respect to the substrate. These results clearly demonstrate the importance of both enthalpic and entropic factors which determine spatial distribution of NP in BCP films and influence domain orientation.     

Effect of molecular weight and film thickness on the crystallization and microphase separation in polystyrene-<Emphasis Type="Italic">block</Emphasis>-poly(L-lactic acid) thin films at the early stage

We investigated the effects of molecular weight and film thickness on the crystallization and microphase separation in semicrystalline block copolymer polystyrene-block-poly(L-lactic acid) (PS-b-PLLA) thin films, at the early stage of film evolution (when T _g < T < T _ODT) by in situ hot stage atomic force microscopy. For PS-b-PLLA 1 copolymer which had lower molecular weight and higher PLLA fraction, diffusion-controlled break-out crystallization started easily. For PS-b-PLLA 2 with higher molecular weight, crystallization in nanometer scales occurs in local area. After melting of the two copolymer films, islands were observed at the film surface: PS-b-PLLA 1 film was in a disordered phase mixed state while PS-b-PLLA 2 film formed phase-separated lamellar structure paralleling to the substrate. Crystallization-melting and van der Waals forces drove the island formation in PS-b-PLLA 1 film. Film thickness affected the crystallization rate. Crystals grew very slowly in much thinner film of PS-b-PLLA 1 and remained almost unchanged at long time annealing. The incompatibility between PS and PLLA blocks drove the film fluctuation which subsequently evolved into spinodal-like morphology.     

Microphase separation in thin films of supramolecular assemblies composed of a triblock copolymer and low-molecular-weight additive

The phase behavior of supramolecular assemblies (SMAs) formed by poly(4-vinylpyridine)-block-polystyrene-block-poly(4-vinylpyridine) (P4VP-b-PS-b-P4VP) triblock copolymer with 2-(4′-hydroxybenzeneazo)benzoic acid (HABA) was investigated with respect to the molar ratio (X) between HABA and 4VP monomer unit in bulk as well as in thin films. The results were compared with SMAs formed by a PS-b-P4VP diblock copolymer of similar composition as the triblock but half the molecular weight to ascertain the effect of molecular architecture on microphase separation. In bulk, both the di- and triblock SMAs showed composition-dependent morphological transitions, which could be tuned by HABA/4VP molar ratio. The domain spacing of the SMA was not significantly affected by the molecular architecture of the constituting block copolymers. In thin films also, both the di- and triblock SMAs showed more or less similar morphological transitions depending on X. Interestingly, the domain orientation of the cylindrical or lamellar microdomains in the SMAs was influenced by the molecular architecture of the block copolymer. After chloroform annealing, although the diblock SMAs showed in-plane orientation of the domains, triblock SMAs showed perpendicular domain orientation. The perpendicular orientation of the microdomains in triblock was favored because it allowed the mid-PS blocks to acquire normal distribution of loop and bridged conformations. Furthermore, the orientation of the lamellar and cylindrical microdomains of the diblock SMAs was found to switch to perpendicular orientation after annealing in 1,4-dioxane vapors. © 2010 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 48: 1594–1605, 2010     

Reversible Morphology Control in Block Copolymer Films via Solvent Vapor Processing: An In Situ GISAXS study

The real time changes occurring within films of cylinder-forming poly(α-methylstyrene-block-4-hydroxystyrene) (PαMS-b-PHOST) were monitored as they were swollen in tetrahydrofuran (THF) and acetone solvent vapors. In situ information was obtained by combining grazing incidence small angle X-ray scattering (GISAXS) with film thickness monitoring of the solvent vapor swollen films. We show that for self assembly to occur, the polymer thin film must surpass a swollen thickness ratio of 212% of its original thickness when swollen in THF vapors and a ratio of 268% for acetone vapor annealing. As the polymer becomes plasticized by solvent vapor uptake, the polymer chains must become sufficiently mobile to self assemble, or reorganize, at room temperature. Using vapors of a solvent selective to one of the blocks, in our case PHOST-selective acetone, an order-order transition occured driven by the shift in volume fraction. The BCC spherical phase assumed in the highly swollen state can be quenched by rapid drying. Upon treatment with vapor of a non-selective solvent, THF, the film maintained the cylindrical morphology suggested by its dry-state volume fraction. In situ studies indicate that self-assembly occurs spontaneously upon attaining the threshold swelling ratios.     

Synthesis and characterization of Fe(II)-coordinated PS-b-P[NIPAM-co-(VBC-Fe-DMAP)] block copolymers

In this work,a new type of block polymers,polystyrene-b-poly[(N-isopropyl acrylamide)-co-(vinyl benzyl chloride)](PS-b-P(NIPAM-co-VBC)),was prepared via reversible addition fragmentation transfer polymerization,then pentacyano(4-(dimethylamino pyridine))ferrate(Fe-DMAP) was attached to VBC units through a quaternization process.The Fe(Ⅱ)-coordinated PS-b-P[NIPAM-co-(VBC-Fe-DMAP)]block copolymers were characterized by ~1H-NMR,FT-IR and TGA.The self-assembly behavior of the block copolymers was also investigated and the micelle morphology was characterized by TEM.It was found that the PS-b-P(NIPAM-co-VBC) block polymer and Fe-coordinated block copolymer could both form spherical micelles in DMF/MeOH mixed solvent.     

One-step route to the fabrication of highly porous polyaniline nanofiber films by using PS-b-PVP diblock copolymers as templates

We report a new method to control both the nucleation and growth of highly porous polyaniline (PANI) nanofiber films using porous poly(styrene-block-2-vinylpyridine) diblock copolymer (PS-b-P2VP) films as templates. A micellar thin film composed of P2VP spheres within a PS matrix is prepared by spin coating a PS-b-P2VP micellar solution onto substrates. The P2VP domains are swollen in a selective solvent of acetic acid, which results in the formation of pores in the block copolymer film. PANI is then deposited onto the substrates modified with such a porous film using electrochemical methods. During the deposition, the nucleation and growth of PANI occur only at the pores of the block copolymer film. After the continued growth of PANI by the electrochemical deposition, a porous PANI nanofiber film is obtained.     

The morphology and structure of PS‐b‐P4VP block copolymer films by solvent annealing: effect of the solvent parameter

Lamellae (symmetric) forming polystyrene‐b‐poly(4‐vinylpyridine) (PS‐b‐P4VP) block copolymers (BCPs) were used to produce nanostructured thin films by solvent (toluene) casting (spin‐coating) onto silicon substrates. As expected, strong micellization of PS‐P4VP in toluene results in poorly ordered hexagonally structures films. Following deposition the films were solvent annealed in various solvents and mixtures thereof. A range of both morphologies including micelle and microphase separated structures were observed. It was found that nanostructures typical of films of regular thickness (across the substrate) and demonstrating microphase separation occurred only for relatively few solvents and mixtures. The data demonstrate that simple models of solvent annealing based on swelling of the polymer promoting higher polymer chain mobility are not appropriate and more careful rationalization is required to understand these data. Analysis suggests that regular phase separated films can only be achieved when the copolymer Hildebrand solubility parameter is very similar to the value of the solvent. It is suggested that the solvent anneal method used is best considered as a liquid phase technique rather than a vapor phase method. The results show that solvent annealing methods can be a very powerful means to control structure and in some circumstances dominate other factors such as surface chemistry and surface energies. Copyright © 2009 John Wiley & Sons, Ltd.     

Hydrogen bond mediated supramolecular micellization of diblock copolymer mixture in common solvents

We report a new approach toward preparing self-assembled hydrogen-bonded complexes having vesicle and patched spherical structures from two species of block copolymers in nonselective solvents. Two diblock copolymers, poly(styrene-b-vinyl phenol) (PS-b-PVPh) and poly(methyl methacrylate-b-4-vinylpyridine) (PMMA-b-P4VP), were synthesized through anionic polymerization. The assembly of vesicles from the intermolecular complex formed after mixing PS-b-PVPH with PMMA-b-P4VP in THF was driven by strong hydrogen bonding between the complementary binding sites on the PVPH and P4VP blocks. In contrast, well-defined patched spherical micelles formed after blending PS-b-PVPh with PMMA-b-P4VP in DMF: the weaker hydrogen bonds formed between the PVPh and P4VP blocks in DMF, relative to those in THF, resulted in the formation of spherical micelles having compartmentalized coronas consisting of PS and PMMA blocks.     

In situ grazing incidence small‐angle X‐ray scattering study of solvent vapor annealing in lamellae‐forming block copolymer thin films: Trade‐off of defects in deswelling

Solvent vapor annealing (SVA) is one route to prepare block copolymer (BCP) thin films with long‐range lateral ordering. The lattice defects in the spin‐coated BCP thin film can be effectively and rapidly reduced using SVA. The solvent evaporation after annealing was shown to have a significant impact on the in‐plane ordering of BCP microdomains. However, the effect of solvent evaporation on the out‐of‐plane defects in BCPs has not been considered. Using grazing‐incidence x‐ray scattering, the morphology evolution of lamellae‐forming poly(2‐vinlypyridine)‐b‐polystyrene‐b‐poly(2vinylpyridine) triblock copolymers, having lamellar microdomains oriented normal to substrate surface during SVA, was studied in this work. A micelle to lamellae transformation was observed during solvent uptake. The influence of solvent swelling ratio and solvent removal rate on both the in‐plane and out‐of‐plane defect density was studied. It shows that there is a trade‐off between the in‐plane and out‐of‐plane defect densities during solvent evaporation. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2017 , 55, 980–989     

Controlled co‐solvent vapor annealing and the importance of quenching conditions in thin‐film block copolymer self‐assembly

A controlled co‐solvent vapor annealing system was designed and constructed to investigate the effects of solvent vapor activity during the rapid ambient quenching process on the morphology of a cylinder‐forming poly(styrene)‐b‐poly (ethylene oxide) (PS‐PEO) annealed in toluene and water vapor. A phase transformation from cylinders in the bulk to close‐packed spheres in swollen thin films occurred, which was reversed upon quenching with dry nitrogen. Quenching with humidified nitrogen preserved the spherical morphology but could significantly alter domain spacing and reduce long‐range order in the dried films under some circumstances. Specifically, long‐range order in the quenched films was found to decrease as the quenching humidity decreased from the humidity used during annealing, and the best long‐range order was obtained when the humidity remained consistent throughout both annealing and quenching. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2017 , 55, 1125–1130     

Dewetting Behavior of Random Copolymer Films Induced by Solvent Vapor Annealing

In recent years, the dewetting behavior of block copolymer films has been studied a lot, but that of random copolymer films was rarely studied. In this study, effects of film thickness and solvent vapor annealing duration (0 s–24 h) on the dewetting behavior of the spin-coated poly(styrene-co-acrylonitrile) (SAN) random copolymer films were mainly investigated by atomic force microscopy and contact angle method for the first time. The film thicknesses of the SAN films prepared at different concentrations were characterized by X-ray reflectometry to be 6–34 nm. With the annealing of acetone vapor, the SAN films first appear holes and then rupture into droplets which fuse and break periodically. The periodic evolutions of the droplets are due to the preferred affinity of acetone molecules with the AN segments and the change of surface energy. This phenomenon is different from the single evolutions in the spin-coated polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) block copolymer films. This illustrates the interactions between AN segments and the substrate are stronger than those between PMMA segments and the substrate in the spin-coated films.     

Formation of gold nanoparticles in diblock copolymer micelles with various reducing agents

Gold nanoparticles (Au NPs) were prepared by the reduction of HAuCl₄ acid incorporated into the polar core of poly(styrene)-block-poly(2-vinylpyridine) (PS-b-P2VP) copolymer micelles dissolved in toluene. The formation of Au NPs was controlled using three reducing agents with different strengths: hydrazine (HA), triethylsilane (TES), and potassium triethylborohydride (PTB). The formation of Au NPs was followed by transmission electron microscopy, UV–Vis spectroscopy, isothermal titration calorimetry (ITC), and dynamic light scattering (DLS). It was found that the strength of the reducing agent determined both the size and the rate of formation of the Au NPs. The average diameters of the Au NPs prepared by reduction with HA, TES, and PTB were 1.7, 2.6, and 8 nm, respectively. The reduction of Au(III) was rapid with HA and PTB. TES proved to be a mild reducing agent for the synthesis of Au NPs. DLS measurements demonstrated swelling of the PS-b-P2VP micelles due to the incorporation of HAuCl₄ and the reducing agents. The original micellar structure rearranged during the reduction with PTB. ITC measurements revealed that some chemical reactions besides Au NPs formation also occurred in the course of the reduction process. The enthalpy of formation of Au NPs in PS-b-P2VP micelles reduced by HA was determined.     

Adsorption of poly(N-isopropylacrylamide-co-4-vinylpyridine) onto core-shell poly(styrene-co-methylacrylic acid) microspheres

Adsorption of the thermoresponsive copolymer of poly(N-isopropylacrylamide-co-4-vinylpyridine) (PNIPAM-co-P4VP) onto the core-shell microspheres of poly(styrene-co-methylacrylic acid) (PS-co-PMAA) is studied. The core-shell PS-co-PMAA microspheres are synthesized by one-stage soap-free polymerization in water. The copolymer of PNIPAM-co-P4VP is synthesized by free radical polymerization of N-isopropylacrylamide and 4-vinylpyridine in the mixture of DMF and water using K₂S₂O₈ as initiator. Adsorption of PNIPAM-co-P4VP onto the core-shell PS-co-PMAA microspheres results in formation of the composite microspheres of PS/PMAA-P4VP/PNIPAM. The driven force to adsorb the copolymer of P4VP-co-PNIPAM onto the core-shell PS-co-PMAA microspheres is ascribed to hydrogen-bonding and electrostatic affinity between the P4VP and PMAA segments. The resultant composite microspheres of PS/PMAA-P4VP/PNIPAM with surface chains of PNIPAM are thermoresponsive in water and show a cloud-point temperature at about 33 °C.     

Morphologies in solvent-annealed thin films of symmetric diblock copolymer

We have systematically studied the thin film morphologies of symmetric poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer after annealing to solvents with varying selectivity. Upon neutral solvent vapor annealing, terraced morphology is observed without any lateral structures on the surfaces. When using PS-selective solvent annealing, the film exhibits macroscopically flat with a disordered micellar structure. While PMMA-selective solvent annealing leads to the dewetting of the film with fractal-like holes, with highly ordered nanoscale depressions in the region of undewetted films. In addition, when decreasing the swelling degree of the film in the case of PMMA-selective solvent annealing, hills and valleys are observed with the coexistence of highly ordered nanoscale spheres and stripes on the surface, in contrast to the case of higher swelling degree. The differences are explained qualitatively on the basis of polymer-solvent interaction parameters of the different components.