Comparison of temperature measurements in ICP and MIP with Ar and He as plasma gas

Various temperature measurements have been carried out in microwave induced plasmas (MIP) generated with a surfatron and inductivcly coupled plasmas (ICP) both with argon and helium as plasma gas. Iron has been used for the determination of excitation temperature, and OH and N⁺₂ for rotational temperatures. In the case of the Ar ICP, equilibrium is attained between the various temperatures (4500 K), as previously described. On the other hand, in the He ICP and the MIPs, iron provides the highest temperature (4500 K) but discrepancies are obtained with results from N⁺₂ and OH. These two species show lower values, especially OH (2000 K).     

Gas‐Phase Reaction of Monomethylhydrazine with Ozone: Kinetics and OH Radical Formation

The gas‐phase reaction of monomethylhydrazine (CH₃NH? NH₂; MMH) with ozone was investigated in a flow tube at atmospheric pressure and a temperature of 295 ± 2 K using N₂/O₂ mixtures (3–30 vol% O₂) as the carrier gas. Proton transfer reaction–mass spectrometry (PTR‐MS) and long‐path FT‐IR spectroscopy served as the main analytical techniques. The kinetics of the title reaction was investigated with a relative rate technique yielding k_MMH+O3 = (4.3 ± 1.0) × 10^?15 cm³ molecule^?1 s^?1. Methyldiazene (CH₃N?NH; MeDia) has been identified as the main product in this reaction system as a result of PTR‐MS analysis. The reactivity of MeDia toward ozone was estimated relative to the reaction of MMH with ozone resulting in k_MeDia+O3 = (2.7 ± 1.6) × 10^?15 cm³ molecule^?1 s^?1. OH radicals were followed indirectly by phenol formation from the reaction of OH radicals with benzene. Increasing OH radical yields with increasing MMH conversion have been observed pointing to the importance of secondary processes for OH radical generation. Generally, the detected OH radical yields were definitely smaller than thought so far. The results of this study do not support the mechanism of OH radical formation from the reaction of MMH with ozone as proposed in the literature.     

Transient Spark Discharge Generated in Various N2/O2 Gas Mixtures: Reactive Species in the Gas and Water and Their Antibacterial Effects

Reactive species generated in the gas and in water by cold air plasma of the transient spark discharge in various N₂/O₂ gas mixtures (including pure N₂ and pure O₂) have been examined. The discharge was operated without/with circulated water driven down the inclined grounded electrode. Without water, NO and NO₂ are typically produced with maximum concentrations at 50% O₂. N₂O was also present for low O₂ contents (up to 20%), while O₃ was generated only in pure O₂. With water, gaseous NO and NO₂ concentrations were lower, N₂O was completely suppressed and HNO₂ increased; and O₃ was lowered in O₂ gas. All species production decreased with the gas flow rate increasing from 0.5 to 2.2 L/min. Liquid phase species (H₂O₂, NO₂￣, NO₃￣, ^·OH) were detected in plasma treated water. H₂O₂ reached the highest concentrations in pure N₂ and O₂. On the other hand, nitrites NO₂￣ and nitrates NO₃￣ peaked between 20 and 80% O₂ and were associated with pH reduction. The concentrations of all species increased with the plasma treatment time. Aqueous ^·OH radicals were analyzed by terephthalic acid fluorescence and their concentration correlated with H₂O₂. The antibacterial efficacy of the transient spark on bacteria in water increased with water treatment time and was found the strongest in the air-like mixture thanks to the peroxynitrite formation. Yet, significant antibacterial effects were found even in pure N₂ and in pure O₂ most likely due to high ^·OH radical concentrations. Controlling the N₂/O₂ ratio in the gas mixture, gas flow rate, and water treatment time enables tuning the antibacterial efficacy.

     

Production mechanisms of NH and NH2 radicals in N2-H2 plasmas

We measured the densities of NH and NH(2) radicals by cavity ring-down spectroscopy in N(2)-H(2) plasmas expanding from a remote thermal plasma source and in N(2) plasmas to which H(2) was added in the background. The NH radical was observed via transitions in the (0,0), (1,1), and (2,2) vibrational bands of the A(3)Pi <-- X(3)Sigma- electronic transition and the NH(2) radical via transitions in the (0,9,0) <-- (0,0,0) band of the A(2)A(1) <-- X(2)B(1) electronic transition. The measurements revealed typical densities of 5 x 10(18) m(-3) for the NH radical in both plasmas and up to 7 x 10(18) m(-3) for the NH(2) radical when N(2) and H(2) are both fed through the plasma source. In N(2) plasma with H(2) injected in the background, no NH(2) was detected, indicating that the density is below our detection limit of 3 x 1016 m-3. The error in the measured densities is estimated to be around 20%. From the trends of the NH(x) radicals as a function of the relative H(2) flow to the total N(2) and H(2) flow at several positions in the expanding plasma beam, the key reactions for the formation of NH and NH(2) have been determined. The NH radicals are mainly produced via the reaction of N atoms emitted by the plasma source with H(2) molecules with a minor contribution from the reaction of N+ with H(2). The NH(2) radicals are formed by reactions of NH(3) molecules, produced at the walls of the plasma reactor, and H atoms emitted by the plasma source. The NH radicals can also be produced by H abstraction of NH(2) radicals. The flux densities of the NH(x) radicals with respect to the atomic radicals are appreciable in the first part of the expansion. Further downstream the NH(x) radicals are dissociated, and their densities become smaller than those of the atomic radicals. It is concluded that the NH(x) radicals play an important role as precursors for the N and H atoms, which are key to the surface production of N(2), H(2), and NH(3) molecules.     

Quenching of the OH and nitrogen molecular emission by methane addition in an Ar capacitively coupled plasma to remove spectral interference in lead determination by atomic fluorescence spectrometry

A new method is proposed to remove the spectral interference on elements in atomic fluorescence spectrometry by quenching of the molecular emission of the OH radical (A²Σ⁺ → X²Π) and N₂ second positive system (C³Π_u → B³Σ_g) in the background spectrum of medium power Ar plasmas. The experiments were carried out in a radiofrequency capacitively coupled plasma (275 W, 27.12 MHz) by CH₄ addition. The quenching is the result of the high affinity of OH radical for a hydrogen atom from the CH₄ molecule and the collisions of the second kind between nitrogen excited molecules and CH₄, respectively. The decrease of the emission of N₂ second positive system in the presence of CH₄ is also the result of the deactivation of the metastable argon atoms that could excite the nitrogen molecules. For flow rates of 0.7 l min^− 1 Ar with addition of 7.5 ml min^− 1 CH₄, the molecular emission of OH and N₂ was completely removed from the plasma jet spectrum at viewing heights above 60 mm. The molecular emission associated to CH and CH₂ species was not observed in the emission spectrum of Ar/CH₄ plasma in the ultraviolet range. The method was experimented for the determination of Pb at 283.31 nm by atomic fluorescence spectrometry with electrodeless discharge lamp and a multichannel microspectrometer. The detection limit was 35 ng ml^− 1, 2–3 times better than in atomic emission spectrometry using the same plasma source, and similar to that in hollow cathode lamp microwave plasma torch atomic fluorescence spectrometry.     

Insight into detailed mechanism of the atmospheric reaction of imidogen with hydroxyl: a computational study

The details of reaction mechanism of imidogen (NH) and hydroxyl radicals are explored at the UMP2(FC)/cc–pVDZ and PMP4(FC,SDTQ)/cc–pVQZ//UMP2 + ZPE levels, theoretically. The initial association between NH and OH radicals leads to the formation of the intermediates, NH…OH, HN…HO, cis HNOH, and trans HNOH, through the barrierless and exothermic processes. By starting from the initial intermediates, all possible paths for the formation of H + HNO, H₂ + NO, H₂O + ⁴N, H₂N + ³O, and H + ³HON products are investigated on potential energy surface. The results reveal that H₂O + ⁴N is the main product involved in the mechanism of hydrogen atom abstraction of NH by OH radical through the intermediate NH…OH.     

Pulsed Electrical Discharges in Water: Can Non-volatile Compounds Diffuse into the Plasma Channel?

The objective of this research effort is to develop a more comprehensive understanding of how molecules get degraded in plasma during an electrical discharge in water. The study correlates the intensity of hydroxyl (OH) radicals in the plasma and physicochemical properties of aqueous solutions of methanol, ethanol, acetonitrile, acetone, dimethyl sulfoxide (DMSO), dimethyl formamide (DMF), phenol, hydroquinone, caffeine, and bisphenol A (BPA). To determine the tendency of the used compounds to penetrate the plasma, their vapor pressures, Henry’s constants, aqueous solubilities, reaction rate constants with OH radicals, and octanol–water partition coefficients are compared and correlated with plasma spectroscopic and hydrogen peroxide (H₂O₂) measurements. OH radicals are precursors to the formation of hydrogen peroxide and any compound that diffuses into the plasma will react with and lower the intensity of OH radicals and therefore the concentration of hydrogen peroxide in the bulk liquid. Optical emission spectroscopy (OES) reveals that all the used compounds diffuse inside the plasma channel regardless of their vapor pressure where they get oxidized (primarily by OH radicals) and thermally degraded. Results also indicate that hydrophobicity (i.e., octanol–water partition coefficient) is the most important property that determines a compound’s tendency to diffuse inside the plasma channel; hydrophobic compounds readily penetrate the plasma whereas hydrophilic compounds tend to stay in the bulk liquid. The rate of formation of hydrogen peroxide is independent of the type of the compound present in the bulk liquid which confirms that this molecule is formed at the plasma interface.     

The use of different plasma gases (Ar, N 2 and air) for CMP-OES: figures of merit and temperature measurements

A comparative study of a 600 W capacitively coupled microwave plasma (CMP) operated with different plasma gases (Ar, N₂ and air) with respect to the achieved detection limits for Fe, Cr, Zn, Ca and Mg have been carried out. Radially and axially resolved rotational temperatures (T_rot), excitation temperatures (T_exc) and electron number densities (n_e) of these plasmas have been determined using OH (T_rot), Fe (T_exc) and Mg (n_e) as thermometric species. The influence of different gas flow rates on T_rot, T_exc and n_e, and of Li as an easily ionized element on T_exc has been investigated.     

Microwave assisted synthesis and characterization of N,N′-bis(salicylaldehydo)ethylenediimine complexes of Mn(II), Co(II), Ni(II), and Zn(II)

Microwave chemistry is a green chemical method that improves reaction conditions and product yields while reducing solvent amounts and reaction times. The main aim of this article is to synthesize the tetradentate N₂O₂ ligand [HO(Ar)CH=N–(CH₂)₂–N=CH(Ar)OH] and manganese(II), cobalt(II), nickel(II), and zinc(II) complexes of the type ML by classical and microwave techniques. The resulting Schiff base and its complexes are characterized by ¹H NMR, infrared, elemental analysis, and electronic spectral data. The ligand and its Co(II) and Mn(II) complexes were further identified by X-ray diffraction and mass spectra to confirm the structure. The results suggest that the metal is bonded to the ligand through the phenolic oxygen and the imino nitrogen.     

Nitrogen Fixation as NOx Enabled by a Three-Level Coupled Rotating Electrodes Air Plasma at Atmospheric Pressure

In this paper, a three-level coupled rotating electrodes air plasma at atmospheric pressure is developed for evaluation of nitrogen fixation. Factors influencing the NO_x production rate and energy cost, including airflow rate, the input H₂O concentration, blade numbers at each rotating electrode and rotating speed, are examined. Air flow rates prove to have no effect on the rotational temperature of N₂ 337.1 nm and the emission intensities of N₂⁺ and N₂, but specific energy input (SEI) and species’ residence time can be shorter with higher air flow rates, resulting in lower NO_x concentration and energy cost. The addition of H₂O also has a positive effect on both NO_x concentration and energy cost. Optical emission spectrum (OES) shows that air?+?H₂O plasma has stronger 336 nm (NH) and 309 nm (OH) emission lines than air plasma, suggests NH and OH are the key species in NO_x enhancement. The most energy efficient conditions are found at airflow rate of 15 l min^?1, 12% H₂O concentration, with 4 blades on each rotating speed. Under these conditions, the lowest energy cost is observed to be 165 GJ/tN.

     

Microwave‐Hydrothermal Preparation and Visible‐Light Photoactivity of Plasmonic Photocatalyst Ag‐TiO2 Nanocomposite Hollow Spheres

Visible‐light‐driven plasmonic photocatalyst Ag‐TiO₂ nanocomposite hollow spheres are prepared by a template‐free chemically‐induced self‐transformation strategy under microwave‐hydrothermal conditions, followed by a photochemical reduction process under xenon lamp irradiation. The prepared samples are characterized by using scanning electron microscopy, transmission electron microscopy, X‐ray diffraction, N₂ adsorption‐desorption isotherms, X‐ray photoelectron spectroscopy, UV/Vis and Raman spectroscopy. Production of ?OH radicals on the surface of visible‐light illuminated TiO₂ was detected by using a photoluminescence method with terephthalic acid as the probe molecule. The photocatalytic activity of as‐prepared samples was evaluated by photocatalytic decolorization of Rhodamine B (RhB) aqueous solution at ambient temperature under visible‐light irradiation. The results show that the surface plasmon absorption band of the silver nanoparticles supported on the TiO₂ hollow spheres was red shifted, and a strong surface enhanced Raman scattering effect for the Ag‐TiO₂ nanocomposite sample was observed. The prepared nanocomposite hollow spheres exhibits a highly visible‐light photocatalytic activity for photocatalytic degradation of RhB in water, and their photocatalytic activity is higher than that of pure TiO₂ and commercial Degussa P25 (P25) powders. Especially, the as‐prepared Ag‐TiO₂ nanocomposite hollow spheres at the nominal atomic ratio of silver to titanium ( R ) of 2 showed the highest photocatalytic activity, which exceeds that of P25 by a factor of more than 2.     

Deposition of Gallium Nitride Thin Films by MOCVD in Microwave Plasma

The deposition of GaN thin films in a nitrogen–hydrogen microwave plasma using Ga(CH ₃ ) ₃ as a gallium precursor was investigated. The deposit was identified as stoichiometric GaN by XPS and XRD. The substrate was dielectrically heated in the microwave discharge and the substrate temperature was lower than that in usual thermal MOCVD. The NH radicals, which were the primary N-atoms precursors, and fragments of Ga(CH ₃ ) ₃ were identified in the plasma by OES. The NH radical formation and the decomposition of Ga(CH ₃ ) ₃ in the plasma may be one of the reasons for the lower deposition temperature of GaN. The position dependence of the substrate temperature showed similar tendency as the position dependence of the electron temperature. The plasma state contributes to the deposition of GaN thin films. The deposited GaN exhibited a wide optical band gap of 3.4eV. Material highly oriented along the c axis was detected in the deposit, and a PL spectrum which has the band head at about 450 mm was obtained.     

Determination of C-atom density downstream an Ar-CH4 rf plasma torch

Nitrogen, oxygen, and carbon atoms have been detected by optical emission spectroscopy in a common flowing post-discharge of an Ar-x CH₄ rf plasma torch and an Ar-2%N₂ microwave discharge. Gas temperature as determined from CN and N₂ rotational svstems is 3200 ± 200 K in the rf torch and 700 ± 100 K in the post-discharge at a time 3 X10^–2 s after the rf plasma torch. From the intensities of the N₂ 1st positive system, of NO, and of CN violet hands, the atom densities have been determined as 2 X 10¹⁶ cm³ for N, 10¹⁵ cm³ for O, and 6 X 10¹² cm³ for C in the post-discharge at p=650 torr, with 10³ of CH₄ in the Ar torch.     

Introduction of Primary Amino Groups on Poly(ethylene terephthalate) Surfaces by Ammonia and a Mix of Nitrogen and Hydrogen Plasma

With the aim of introducing primary amino groups on the surface of poly(ethylene terephthalate) (PET), two methods were compared—the use of ammonia or a combination of nitrogen and hydrogen low-pressure microwave plasma. Several plasma parameters were optimized on the reactor to increase the –NH₂ surface density, which was estimated by colorimetric titration and X-ray photoelectron spectroscopy (XPS). These techniques show that whatever the plasma treatment, almost 2 –NH₂/nm2 are incorporated on PET films. Emission spectroscopy highlighted a correlation between the density of primary amino groups and the ratio between an NH peak intensity and an Ar peak intensity (I_NH/I_Ar). Variation in surface hydrophilicity with aging in air after plasma treatment was monitored with contact angle measurements and showed a hydrophobic recovery. This was confirmed by XPS, which suggests also that surfaces treated by NH₃ plasma are more stable than surfaces treated by N₂/H₂.     

Rotating Gliding Arc Assisted Water Splitting in Atmospheric Nitrogen

In this study, hydrogen production from water splitting in N₂ using an atmospheric pressure rotating gliding arc plasma was investigated. The effect of input H₂O concentration and total flow rate on the performance of the plasma water splitting process (e.g., H₂ and O₂ yield, H₂ production rate, and energy yield of H₂) was investigated. N₂ showed a pronouncedly facilitating effect on the H₂O splitting and H₂ production process due to the reactions of the excited N₂ species [e.g., electronically excited metastable N₂(A)] with the H₂O molecules. The maximum H₂ production rate reached up to 41.3 μmols^?1, which is much higher than that of other typical non-thermal plasmas (e.g., ~0.2 μmols^?1 for a dielectric barrier discharge). Optical emission diagnostics has shown that in addition to the NO, N₂, and N₂ ⁺ that were observed in the pure N₂ spectra, strong OH and NH emission lines also appeared in the H₂O/N₂ spectra. OH radical is considered as a key intermediate species that could contribute to the formation of H₂, O₂, and H₂O₂. The increase of the H₂O concentration could lead to a continuous enhancement of the OH intensity. The rotational temperature of N₂ ⁺ dropped drastically from 2875 ± 125 to 1725 ± 25 K with the addition of 1 % (mol/mol) H₂O into the N₂ plasma.     

Surface characterization of plasma‐modified poly(ethylene terephthalate) film surfaces

Poly(ethylene terephthalate) (PET) film surfaces were modified by argon (Ar), oxygen (O₂), hydrogen (H₂), nitrogen (N₂), and ammonia (NH₃) plasmas, and the plasma‐modified PET surfaces were investigated with scanning probe microscopy, contact‐angle measurements, and X‐ray photoelectron spectroscopy to characterize the surfaces. The exposure of the PET film surfaces to the plasmas led to the etching process on the surfaces and to changes in the topography of the surfaces. The etching rate and surface roughness were closely related to what kind of plasma was used and how high the radio frequency (RF) power was that was input into the plasmas. The etching rate was in the order of O₂ plasma > H₂ plasma > N₂ plasma > Ar plasma > NH₃ plasma, and the surface roughness was in the order of NH₃ plasma > N₂ plasma > H₂ plasma > Ar plasma > O₂ plasma. Heavy etching reactions did not always lead to large increases in the surface roughness. The plasmas also led to changes in the surface properties of the PET surfaces from hydrophobic to hydrophilic; and the contact angle of water on the surfaces decreased. Modification reactions occurring on the PET surfaces depended on what plasma had been used for the modification. The O₂, Ar, H₂, and N₂ plasmas modified mainly CH₂ or phenyl rings rather than ester groups in the PET polymer chains to form C? O groups. On the other hand, the NH₃ plasma modified ester groups to form C? O groups. Aging effects of the plasma‐modified PET film surfaces continued as long as 15 days after the modification was finished. The aging effects were related to the movement of C?O groups in ester residues toward the topmost layer and to the movement of C? O groups away from the topmost layer. Such movement of the C?O groups could occur within at least 3 nm from the surface. © 2004 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 42: 3727–3740, 2004     

Reactions of hydrogen peroxide vapor dissociated in a microwave plasma

Analysis of the plasma emission from a low-pressure microwave cavity discharge through flowing hydrogen peroxide vapor showed that both H and OH were produced in proportions which varied with the applied power. When the dissociated vapor was condensed at 195 K only water was obtained; at 77 K, H₂O₂ and H₂O₄ were also obtained. Their formation could not be increased by increasing the H atom or OH radical concentration in the plasma. When the reaction time of the dissociated vapor between the plasma exit and the cold surface was increased, the rate of H₂O₂ formation increased mostly at the expense of water formation. It appears that, as in the case of the reaction of H with O₂, the rate of H₂O₂ formation is dependent on the concentration of O₂ produced in the spatial afterglow by the gas-phase reactions of the hydroxyl radicals.     

State‐state transitions for CCl2(X1A1, A1B1, a3B1) radical and collisional quenching of CCl2(A1B1 and a3B1) by O2, N2, NO,N2O,NH3, and various aminated molecules

CCl₂ free radicals were produced by a pulsed dc discharge of CCl₄ in Ar. Ground electronic state CCl₂(X) radicals were electronically excited to the A¹B₁ (0,4,0) vibronic state with an Nd:YAG laser pumped dye laser at 541.52 nm. Experimental quenching data of excited CCl₂(A¹B₁ and a³B₁) by O₂, N₂, NO, N₂O, NH₃, NH(CH₃)₂, NH(C₂H₅)₂, and N(C₂H₅)₃ molecules were obtained by observing the time‐resolved total fluorescence signal of the excited CCl₂ radical in a cell, which showed a superposition of two exponential decay components under the presence of quencher. The quenching rate constants k_A of CCl₂(A) state and k_a of CCl₂(a) state were derived by analyzing the experimental data according to a proposed three‐level model to deal with the CCl₂(X¹A₁, A¹B₁, a³B₁) system. The formation cross sections of complexes of electronically excited CCl₂ radicals with O₂, N₂, NO, N₂O, NH₃, and aminated molecules were calculated by means of a collision‐complex model. © 2002 Wiley Periodicals, Inc. Int J Chem Kinet 34: 351–356, 2002     

Active Species Generated by a Pulsed Arc Electrohydraulic Discharge Plasma Channel in Contaminated Water Treatments

Pulsed arc electrohydraulic discharge (PAED) direct plasma technique was applied for various types of contaminated water treatment. The experimental system consists of a spark-gap switch type pulse power supply (0.5 kJ/pulse) and a 3 L stainless steel reactor with eccentrically configured rod-to-rod electrodes. The current and voltage waveforms are fundamentally different for different conductivity water. Double pulse current discharges were observed for pond water with relatively higher conductivity (637 mS/m) while a single pulse current discharge was observed for lake water with relatively lower conductivity (78 mS/m). From the optical emission spectrum and UV dosimeters, UV-A, UV-B, excited molecules and radicals including N₂*, O, H, OH, O₃ etc. were observed during the discharge period. Both optical emission and UV intensities in pond water are slightly lower than lake water. The decay time of the UV-A, N₂*, OH, H and O radicals were around 0.6 ms, where the discharge period ended around 0.4 ms. The results indicate that the radicals existed longer than the discharge period. The pH, dissolved oxygen and conductivity were changed during the course of PAED treatment. The ions and radicals such as H·, O·, H⁺, OH· etc. generated by PAED may cause alterations density decay time and the active species in water were present for a longer period. The reduction of total organic carbon (TOC) in pond water reached 80% after 5 min of PAED treatment. Based on local thermal plasma equilibrium (LTE) model, LTE thermal plasma chemical composition model for 1 mol water vapour was used to compare to present experiments. PAED discharge in contaminated pond water generated peak concentration of OH = 28% and O₂H = 0.012% mol in gas-phase and migrated to water-phase via gas–liquid interfaces generated by arc and micro-bubbles to form more stable O₃, H₂O₂, H₂ and O₂. The model suggested that the reduction of TOC occurred in gas/plasma phases or liquid-phase side of gas liquid interfaces.     

Derivatives of Cyclic Inorganic Sulfur Imides

Abstract

1) Cyclic inorganic sulfur imides, S₇NH, S₆(NH)₂ 1.3 S₅(NH)₃1.3.5 and S₄(NH)₄1.3.5.7. in solution in polar solvents (acetone, acetonitrile, etc.) release the radicals S₇N-, S₆N₂ ^2- and S₅N^3- under the action of alkali. Their study by near UV spectroscopy reveals unstable radicals which rapidly pass into the more stable S₄N^- radical. The latter in turn gives, by charge transfer with the solvent (acetone), the blue complex [S₄N–OC(CH₃)₂]. Non polar solvents (CCl₄) do not give this charge transfer complex (C.T.C.).

2) The sulfur imides mentioned above react with a solution of S₈ to give, via hydrogen bonds, crystalline C.T.C's of formula [3 S₈–S₇NH.] or [2 S₈–S₆(NH)₂1.3]. X-ray examination reveals that these complexes are isotypes of the sulfurs S₈β and S ₈γ whose crystals are stabilized by intermolecular hydrogen bonds.

3) The reaction of the sulfur imides with formic aldehyde gives primary cyclic polyalcohols, such as S₅(N-CH₂OH)₃ or S₄(N-CH₂OH)₄, which form typical molecular cages through intramolecular hydrogen bonds.

4) Examination of Van der Waals bonds of the crystallized sulfur imides enables their comparison with molecules of these compounds containing other types of bonds.