Effect of methane on magnetron sputtering graphite target deposited films and tribological properties of a-C:H:Ti/a-C:H friction pairs

In this study, we prepared a-C:H films with different nanostructures at different methane flow rates. The effect of the methane flow rate on the tribological properties of 440 steel/a-C:H friction pairs and a-C:H:Ti/a-C:H friction pairs in an atmospheric environment was studied by a reciprocating friction machine. The results show that there is no relationship between the tribological properties of 440 steel/a-C:H friction pair and methane flow rate. The tribological performance of the a-C:H:Ti/a-C:H friction pair was greatly improved. In particular, in the friction pair of a-C:H:Ti/a-C:H with a methane flow rate of 20 sccm, superlubricity is shown, and the wear rate is only 4.04 × 10⁻⁹ mm³/Nm. After tribological experiments, Raman spectroscopy, XPS, and other characterization methods were used to study the relationship between the nanostructure and tribological properties of a-C:H:Ti films and a-C:H prepared with different methane flow rates. This study is great significance to the application of a-C:H:Ti/a-C:H friction pair in mechanical parts under atmospheric environment.     

Characteristics of Ti–Nb,Ti–Zr and Ti–Al containing hydrogenated carbon nitride films

Nanocomposite Me–C–N:H coatings (Me is TiNb, TiZr or TiAl), with relatively high non-metal/metal ratios, were prepared by cathodic arc method using TiNb, TiZr and TiAl alloy cathodes in a CH₄ + N₂ atmosphere. For comparison purposes, a-C–N:H films were also produced through evaporating a graphite cathode in a similar atmosphere. The films were characterized in terms of elemental and phase compositions, chemical bonds, texture, hardness, adhesion and friction behavior by GDOES, XPS, Raman spectroscopy and XRD techniques, surface profilometry, hardness and scratch adhesion measurements, and tribological tests. The nanocomposite films consisted of a mixture of crystalline metal carbonitride and amorphous carbon nitride. The non-metal/metal ratio in the films composition was found to range between 1.8 and 1.9. For the metal containing nanocomposites, grain size in the range 7–23 nm, depending on the metal nature, were determined. As compared with the a-C–N:H, the Me–C–N:H films exhibited a much higher hardness (up to about 39 GPa for Ti–Zr–C–N:H) and a better adhesion strength, while the coefficients of friction were somewhat higher (0.2–0.3 for Me–C–N:H and 0.1 for a-C–N:H).     

Tribological behaviour of nanostructured Ti-C:H coatings for biomedical applications

The development of a mechanically stable, functionally graded Ti-doped a-C:H interface layer in combination with a functional a-C:H coating requires a reduction of the brittle phases which induce generally problems in the transitions from Ti to TiC/a-C:H. The core objective of this study was to develop an optimum interlayer between the substrate and the functional top layer for biomedical applications, namely for tooth implants. Since the interlayer may be exposed to the sliding process, in the case of local failure of the top layer it has to fulfil the same criteria: biocompatibility, high wear resistance and low friction.The functional Ti-C:H layers with thickness in the range 2.5–3.5 μm were deposited by a magnetron sputtering/PECVD hybrid process by sputtering a Ti-target in a C₂H₂ + Ar atmosphere in dc discharge regime. The sets of coating samples were prepared by varying the C and H concentrations controlled by the C₂H₂ flow during the deposition process. The tribological properties were evaluated on a pin-on-disc tribometer at room temperature (RT) and at 100 °C using 440C balls with a diameter of 6 mm. The tests at 100 °C were performed to investigate the effect of the sterilization temperature on the tribological properties and the coating lifetime as well. The tribological performance was examined with respect to the friction coefficient, the wear rates of the coating and the counter-parts and the analysis of the wear debris. The Ti/C ratio decreased almost linearly from 4.5 to 0.1 with increasing C₂H₂ flow; the hydrogen content showed a minimum of 5 at.% at C₂H₂ flow of 30 sccm, while for lower flows it was about 10 at.%. The coatings could be divided into three groups based on the C₂H₂ flow: (i) 10–15 sccm, exhibiting severe abrasive damage during the sliding tests, (ii) 20–45 sccm, showing the highest hardness and friction values, and (iii) 52–60 sccm, with moderate hardness and minimal values of the friction coefficient and the wear rate.     

Size effect in the titanium/diamond‐like carbon bilayer films: effect of relative thickness on their structure and mechanical properties

Titanium/diamond‐like carbon (Ti/DLC) bilayer films with different relative thickness were fabricated by direct‐current and pulsed cathode arc plasma method. Microstructure, morphological characteristics, and mechanical properties of the films were investigated in dependence of the thickness of Ti and DLC layers by Raman spectroscopy, atomic force microscopy, Knoop sclerometer, and surface profilometer. Raman spectra of Ti/DLC bilayers show the microstructure evolution (the size and ordering degree of sp²‐hybridized carbon clusters) with varying the thicknesses of Ti interlayer and DLC layer. Nano‐scaled Ti interlayer of 12–20 nm thickness presents the largest size effect. The catalytic effect of the sublayer is most pronounced in the carbon layer of less than 106 nm. In these thickness ranges, the bilayer films possessed the highest micro‐hardness and reactivity between atoms at interface. Internal stress in the bilayer monotonically decreases, with the thickness of Ti interlayer increasing to 30 nm and then becomes stable with the thickness. These results are associated with the occurrence of atomic diffusion process at Ti/C interface, and they are of cardinal significance to optimize the structure and mechanical properties of carbon‐based multilayer films. Copyright © 2016 John Wiley & Sons, Ltd.     

Synthesis and characterization of Ti and N binary‐doped ɑ‐C films deposited by pulse cathode arc with ionic source assistant

Using ionic source assistant, Ti and N co‐doped amorphous C (α‐C:N:Ti) thin films were prepared by pulse cathode arc technique. Microstructure, composition, elemental distribution, morphology, and mechanical properties of α‐C:N:Ti films were investigated in dependence of nitrogen source, pulse frequency, and target current by Raman spectroscopy, X‐ray diffraction, scanning electron microscopy, X‐ray photoelectron spectroscopy, atomic force microscopy, nanoindentation, and surface profilometer. The results show the presence of titanium carbide and nitride in a‐C:N:Ti films. The α‐C:N⁺:Ti film (6 Hz, 60 A) shows the smaller size and the higher disordering degree of Csp² clusters. The α‐C:N⁺:Ti films present smoother surface and smaller particle size than for α‐C:N₂:Ti films. N ions facilitate the formation of N‐sp³C bonds in the α‐C:N⁺:Ti films, and α‐C:N⁺:Ti (10 Hz, 80 A) film possesses the more graphite‐like N bonds. Higher hardness and lower residual stress present in the α‐C:N₂:Ti (10 Hz, 80 A) film.     

The influence of Ti plasma etching pre-treatment on mechanical properties of DLC film on cemented carbide

The pre-treatment of substrate surface had been a key part of DLC film preparation to improve mechanical and tribological properties. Ti plasma etching pre-treatment was investigated in this paper as a new effective surface pre-treatment method to substitute transition layer. This pre-treatment used high-energy Ti plasma to impact substrate surface. Ti plasma etched the substrate to a depth of 407 nm and increased the roughness from 1.36 to 40.39 nm. A trace layer of substrate, together with cobalt, oxides, and other impurities, was removed. Ti plasma broke some top WC crystals and combined with the free carbon ions separating from the substrate. A DLC film was deposited on the etched surface. Compared with DLC films deposited on the untreated substrate and Ti transition layer, the DLC film on the Ti plasma etched substrate had best adhesion strength of 34.14 N. The three DLC films had the same sp³ bonding carbon content, but Ti plasma etching treatment could promote the formation of sp³ bonds on the interface of substrate and DLC film. This DLC film had low friction coefficient of 0.12 and low wear rate of 5.11 × 10⁻⁷ mm³/m·N. In summary, Ti plasma etching pre-treatment could significantly improve the adhesion of DLC film and keep its excellent tribological properties.     

The effects of energetic ion irradiation on metal-to-polymer adhesion

In this study, the simple and effective surface modification of polymers through ion irradiation is described to improve metal-to-polymer adhesion. The surface of polymer films was irradiated with 150 keV Xe⁺ ions at various fluences, and copper (Cu) was then deposited onto the surface-modified polymer films. The surface properties of the modified films were investigated in terms of their wettability, chemical composition, and surface morphology. The metal-to-polymer adhesion strength was estimated using a nano-indenter. As a result, the surface environment of the polymer films was physiochemically changed by ion irradiation, which could have a significant effect on the metal-to-polymer adhesion. The irradiated polymer films exhibited a higher adhesion strength than the control film, and the strength depended on the fluence. The maximum adhesion strength (8.45 mN) of the Cu deposited on the irradiated PEN films was obtained at a fluence of 5×10¹⁴ ions/cm².     

Investigating Pb diffusion across buried interfaces in Pb(Zr0.2Ti0.8)O3 thin films via time‐of‐flight secondary ion mass spectrometry depth profiling

The diffusion of Pb through Pb(Zr_0.2Ti_0.8)O₃(PZT)/Pt/Ti/SiO₂/Si thin film heterostructures is studied by using time‐of‐flight secondary ion mass spectrometry depth profiling. The as‐deposited films initially contained 10 mol% Pb excess and were thermally processed at temperatures ranging from 325 to 700°C to promote Pb diffusion. The time‐of‐flight secondary ion mass spectrometry depth profiles show that increasing processing temperature promoted Pb diffusion from the PZT top film into the buried heterostructure layers. After processing at low temperatures (eg, 325°C), Pb⁺ counts were low in the Pt region. After processing at elevated temperatures (eg, 700°C), significant Pb⁺ counts were seen throughout the Pt layer and into the Ti and SiO₂ layers. Intermediate processing temperatures (400, 475, and 500°C) resulted in Pb⁺ profiles consistent with this overall trend. Films processed at 400°C show a sharp peak in PtPb⁺ intensity at the PZT/Pt interface, consistent with prior reports of a Pt₃Pb phase at this interface after processing at similar temperatures.     

Detection of layer‐by‐layer self‐assembly multilayer films by low‐temperature plasma mass spectrometry

The detection of layer‐by‐layer self‐assembly multilayer films was carried out using low‐temperature plasma (LTP) mass spectrometry (MS) under ambient conditions. These multilayer films have been prepared on quartz plates through the alternate assembling of oppositely charged 4‐aminothiophenol (4‐ATP) capped Au particles and thioglycolic acid (TGA) capped Ag particles. An LTP probe was used for direct desorption and ionization of chemical components on the films. Without the complicated sample preparation, the structure information of 4‐ATP and TGA on films was studied by LTP‐MS. Characteristic ions of 4‐ATP (M) and TGA (F), including [M]^+?, [M‐NH₂]⁺, [M‐HCN‐H]⁺, and [F + H]⁺, [F‐H]⁺, [F‐OH]⁺, [F‐COOH]⁺ were recorded by LTP‐MS on the films. However, [M‐CS‐H]⁺ and [F‐SH]⁺ could not be observed on the film, which were detected in the neat sample. In addition, the semi‐quantitative analysis of chemical components on monolayer film was carried out, and the amounts of 4‐ATP and TGA on monolayer surface were 45 ng/mm² and 54 ng/mm², respectively. This resulted the ionization efficiencies of 72% for 4‐ATP and 54% for TGA. In order to evaluate the reliability of present LTP‐MS, the correlations between this approach and some traditional methods, such as UV–vis spectroscopy, atomic force microscope and X‐ray photoelectron spectroscopy were studied, which resulted the correlation coefficients of higher than 0.9776. The results indicated that this technique can be used for analyzing the films without any pretreatment, which possesses great potential in the studies of self‐assembly multilayer films. Copyright © 2013 John Wiley & Sons, Ltd.     

Comparison of the influence of titanium and chromium adhesion layers on the properties of sol–gel derived NKN thin films

Lead-free (Na_0.5K_0.5)NbO₃ (NKN) thin films were prepared on Pt/X/SiO₂/Si substrates (with the adhesion promoters X = Ti, Cr) by a sol–gel process with and without post-annealing treatment. The effect of the diffusion of the adhesion layer elements Ti and Cr into the NKN film was analysed by secondary ion mass spectrometry, scanning electron microscopy pictures, X-ray diffraction (XRD), and leakage current measurements. It turned out that Cr diffuses into the films to a higher extent than Ti. The high amount of Cr diffusion led to the formation of a secondary phase, as seen in the XRD pattern, and to pore formation on the surface of the NKN films. In contrast, the films with Ti adhesion layer were single phase NKN without pore formation. Also, the leakage current measurements showed a strong influence of the Cr diffusion. The leakage current of the films with Cr adhesion layer was about four orders of magnitude higher than that of the films with Ti adhesion layer. The study shows the strong influence of the adhesion layer of the substrate on the properties of NKN films.     

One-step approach for nano-crystalline hydroxyapatite coating on titanium via micro-arc oxidation

Nano-crystalline hydroxyapatite (HAp) films were formed at the surface of Ti by a single-step micro-arc oxidation (MAO) using Ca²⁺ and P⁵⁺ ion-containing electrolytes. The HAp films were 10–25 μm thick, showing strong crystallinity dependence on the CaCl₂ concentration in the electrolytes. Also, the formation of an amorphous CaTiO₃ interlayer was identified to exist between the HAp and Ti substrates. In contrast to the previous researches using K₂HPO₄ for the electrolytes, KH₂PO₄ was used in this study, and this could allow the formation of the crystalline HAp layer. It is suggested as the most probable mechanism for the HAp formation that the high-density hydroxyl groups of TiO(OH)₂, formed by the reactions between the amorphous CaTiO₃ interlayer and the H⁺ ions from the dissolution of the KH₂PO₄, can play a key role in the nucleation and crystal growth of HAp by attracting Ca²⁺ and P⁵⁺ ions in the electrolytes.     

Raman characterization of C60 salts electroformed in aqueous media

Electrochemical intercalation of C₆₀ films from aqueous LiOH, KOH, NaOH, RbOH and CsOH solutions was studied by electrochemical methods and Raman spectroscopy. The intercalation of these alkali metals cations gives rise to reduction peaks at different applied potentials depending on the chemical nature of the cation used. Reduction of the C₆₀ films was observed to rather different extents depending on the composition of the working solution. Electrochemical and Raman experiments show that K⁺ and Cs⁺ ions form the most stables and active salts, while Li⁺, Na⁺ and Rb⁺ are not significantly intercalated. Furthermore, Raman characterization of the K⁺ and Cs⁺ doped films leads to the identification of the its main components, namely the K₂C₆₀ and CsC₆₀ species.     

Gas transport properties of asymmetric polyimide membranes prepared by ion‐beam irradiation

Ion beam irradiation has been widely used to modify the structure and properties of membrane surface layers. In this study, the gas permeability and selectivity of an asymmetric polyimide membrane modified by He ion irradiation were investigated using a high vacuum apparatus equipped with a Baratron absolute pressure gauge at 76 cmHg and 35 °C. Specifically, we estimated the effects of the gas diffusion and solubility on the gas permeation properties of the asymmetric membranes with the carbonized skin layer prepared by ion irradiation. The asymmetric polyimide membranes were prepared by a dry–wet phase inversion process, and the surface skin layer on the membrane was irradiated by He ions at fluences of 1 × 10¹⁵ to 5 × 10¹⁵ ions/cm² at 50 keV. The increase in the gas permeability of the He⁺‐irradiated asymmetric polyimide membrane is entirely due to an increase in the gas diffusion, and the gas selectivity increases of the membranes were responsible for the high gas diffusion selectivities. © 2006 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 45: 262–269, 2007.     

50 keV H+ ion beam irradiation of Al doped ZnO thin films: Studies of radiation stability for device applications

Thin films of Al doped ZnO (Al:ZnO) were deposited on two substrates (Si and glass) at room temperature and 300°C using DC magnetron sputtering. These films were bombarded with 50 keV H⁺ beam at several fluences. The pristine and ion beam irradiated films were analysed by X‐ray diffraction, Raman spectroscopy, scanning electron microscopy, and UV‐Vis spectroscopy. The X‐ray diffraction analysis, Hall measurements, Raman and UV‐Vis spectroscopy confirm that the structural and transport properties of Al:ZnO films do not change substantially with beam irradiation at chosen fluences. However, in comparison to film deposited at room temperature, the Al:ZnO thin film deposited at 300°C shows increased transmittance (from 70% to approximately 90%) with ion beam irradiation at highest fluence. The studies of surface morphology by scanning electron microscopy reveal that the ion irradiation yields smoothening of the films, which also increases with ion fluences. The films deposited at elevated temperature are smoother than those deposited at room temperature. In the paper, we discuss the interaction of 50 keV H⁺ ions with Al:ZnO films in terms of radiation stability in devices.     

Quadrupole mass spectrometric study of positive ions from RF plasmas of pure CH4, CH4/H2, and CH4/Ar systems

Quadrupole mass spectrometry has been employed to characterize the ionic species in the discharges of pure CH₄, CH₄/H₂, and CH₄/Ar systems. For pure methane, the major positive ions in the discharge at low pressure (e.g., 0.15 torr) are CH ₃ ⁺ , C₂H ₃ ⁺ , CH ₂ ⁺ , C₂H ₂ ⁺ , CH ₄ ⁺ , C₂H ₄ ⁺ , and C₂H ₅ ⁺ at high pressure (e.g., 0.5 torr) the major ions are CH ₃ ⁺ , C₂H ₃ ⁺ , C₂H ₅ ⁺ , C₃H ₃ ⁺ , C H₃H ₇ ⁺ , C₄H ₇ ⁺ , C₅H ₇ ⁺ , C₆H ₅ ⁺ , and C₇H ₇ ⁺ . The relative abundances of C₁ ions decrease with increasing pressure, whereas those of higher-order ions increase with pressure. For 5% CH₄ + 95% H₂ mixture, in addition to those sampling from the pure methane plasma at the lower pressure, H _n ⁺ ions have also been detected. For 5% CH₄ +95% Ar mixture, the principal ions are CH ₃ ⁺ , CH ₂ ⁺ , CH⁺, CH ₅ ⁺ , Ar⁺, and ArH⁺; the ions containing more than two carbon atoms are negligible. In these discharges, the CH ₃ ⁺ and C₂H ₃ ⁺ are the most important positive ions in C₁ and C₂ ions, respectively. The ions detected are believed to come from the sheath between the electrode and the luminous plasma, and have high kinetic energy. An ion-molecule reaction mechanism is proposed which can well explain the observed main features of ionic products.Died June 1, 1991.     

The antioxygen radiation properties of the nanocomposite film consisted of hydrogenated amorphous carbon (a-C:H) and MoS2

MoS₂/a-C:H multilayer film and MoS₂/a-C:H composite film exhibit excellent tribological properties in vacuum, which can be used as the potential space lubricant. The radiation-protective properties of these two films in atomic oxygen (AO) are evaluated. The influences of AO radiation on structure, morphology, and tribological properties of the films were investigated. The results show that AO radiation mainly causes oxidation and increases sp² C content in both of the films. Furthermore, the MoS₂ sublayer on the surface of the multilayer film is oxidized heavily, whereas both the MoS₂ and the a-C:H matrix on the surface were oxidized in the composite film. As a result of this, the multilayer film exhibits high friction coefficient and short sliding lifetime in vacuum after AO radiation. Compared with that, the composite film exhibits lower friction and longer sliding time more than 3600 seconds in vacuum, which illustrates it has a good AO radiation protection. This indicates that MoS₂/a-C:H composite film is more likely to be used as a potential space lubricant.     

Patterning of cells on a PVC film surface functionalized by ion irradiation

Micropatterns of cells on a poly(vinyl chloride) (PVC) film surface were created by using ion irradiation. A PVC film was irradiated with H⁺ ions through a pattern mask in order to create patterns of the hydrophilic/hydrophobic regions on the PVC surface. The effect of ion irradiation on the surface properties of the PVC film was characterized by using Fourier transform‐infrared spectroscopy (FT‐IR), water contact angle measurement, and X‐ray photoelectron spectroscopy (XPS). The results revealed that the chemical environment of the PVC film surface was effectively changed by ion irradiation due to dehydrochlorination and oxidation. The in vitro cell culture on the patterned PVC film surface showed selective adhesion and proliferation of the cells on the ion‐irradiated regions. Well‐defined 50 µm patterns of the cells were obtained on the PVC film surface irradiated to 1 × 10¹⁵ ions/cm². Copyright © 2009 John Wiley & Sons, Ltd.     

Depth profiling of polymer samples using Ga+ and C60+ ion beams

In this contribution, we focus on the use of C₆₀⁺ ions for depth profiling of model synthetic polymers: polystyrene (PS) and poly(methylmethacrylate) (PMMA). These polymers were spin coated on silicon wafers, and the obtained samples were depth‐profiled both with Ga⁺ ions and C₆₀⁺ ions. We observed an important yield enhancement for both polymers when C₆₀⁺ ions are used. More specifically, we discuss here the decrease in damage obtained with C₆₀, which is found to be very sensitive to the nature of the polymer. During the C₆₀⁺ sputtering of the PMMA layer, after an initial decrease, a steady state is observed in the secondary ion yield of characteristic fragments. In contrast, for PS, an exponential decrease is directly observed, leading to an initial disappearance cross section close to the value observed for Ga⁺. Though there is a significant loss of characteristic PS signal when sputtering with C₆₀⁺ ions beams, there are still significant enhancements in sputter yields when employing C₆₀⁺ as compared to Ga⁺. Copyright © 2008 John Wiley & Sons, Ltd.     

Achieving ultra-low friction of a-C:H film grown on 9Cr18Mo steel for industrial application via programmable high power pulse magnetron sputtering

Owing to the high hardness and hydrogen passivation of carbon bonds, hydrogenated diamond-like carbon (a-C:H) film has shown promising potential to achieve ultra-low friction and wear on steel surfaces. Here, a-C:H film was successfully deposited on 9Cr18Mo steel via programmable high power pulse magnetron sputtering and potential application for industrial was evaluated. The a-C:H films against different mating materials of GCr15 steel balls, Al₂O₃, Si₃N₄, ZrO₂, and a-C:H-coated GCr15 balls all showed ultra-low friction under a normal load of 5 N in a dry ambient air environment. Among them, self-mating tribo-system a-C:H films on steel surfaces and a-C:H-coated steel balls achieve best friction performance; the principal reason is that both contacting surfaces coated with a-C:H film have the lower electron affinities compared with other tribo-systems. However, the differences of coefficient of friction (COF) for uncoated-GCr15, Al₂O₃, ZrO₂, Si₃N₄, and a-C:H(GCr15) balls can be attributed to different sizes of clustering in wear debris. This work provides new insights on synthesis and industry application of the a-C:H films with ultra-low friction properties.