阳极修饰层ZnPc对OLED性能影响的研究

本文采用真空蒸镀法制备了不同厚度的酞菁锌(ZnPc)超薄膜,研究了不同厚度的ZnPc缓冲层对OLEDs器件发光性能的影响,测试了器件的一系列光电性能,对相关机理进行了探讨.结果表明:含有ZnPc修饰层的器件性能明显优于不含有修饰层的器件,加入ZnPc修饰层后器件发光稳定性也得到了改善,同时不同厚度的修饰层对器件性能的影响也有所不同.分析认为,ZnPc能有效改善ITO表面的平整度和降低空穴注入势垒的性质是提高器件性能的主要原因.     

ZnO掺杂对PVK∶Ir(ppy)3体系发光特性的影响

以无机纳米颗粒ZnO作为电子传输材料,并以不同质量比掺杂到PVK∶ Ir(ppy)3体系作为发光层制成一系列磷光器件,器件结构为:ITO/PVK∶ Ir(ppy)3∶ ZnO(100∶ 1∶ x)/ BCP/Alq3/Al, ZnO的掺杂浓度x分别为0;,1;,2;,5;,10;,研究了它们的电致发光特性.结果表明:合适比例ZnO掺杂可以改善器件的发光特性,ZnO的最佳掺杂量为1;,此时器件的相对发光强度是未掺杂的器件的4倍,器件的启亮电压也由未掺杂时的15.5 V降到了10.5 V.当掺杂浓度较大时,电子传输过多在电极另一侧形成漏电流,没有在发光层内进行电子与空穴有效复合,没有对发光起到作用,导致器件的发光性能下降.     

掺杂浓度对电沉积法制备ZnS: Cu光学薄膜影响

采用阴极恒电压法在ITO(In2O3-SnO2)导电玻璃表面制备了ZnS: Cu薄膜,并用X射线衍射仪(XRD)、原子力显微镜(AFM)和光致发光谱仪(PL)研究了掺杂浓度对ZnS: Cu薄膜的物相组成、显微结构及发光性能的影响.结果表明:控制Cu2+的质量掺杂浓度在0.4;以内,并不会改变ZnS薄膜的物相组成,而且会使薄膜的结晶程度有所提高.研究还发现,在pH=4.0,沉积电压为2 V,掺杂浓度为0.3 ;的条件下,所制得的ZnS: Cu薄膜光致发光光谱峰值最大,亮度最高.     

PEDOT:PSS/ZnPc作为有机小分子太阳电池阳极修饰层的研究

采用阳极修饰法构建了基于酞菁铜(CuPc)和碳60(C60)的有机小分子太阳电池,分别研究了酞菁锌(ZnPc)、聚苯乙烯磺酸(PEDOT:PSS)和PEDOT:PSS/ZnPc作为阳极修饰层对该有机太阳电池输出性能的影响,并对三种修饰层的相关机理进行了探讨.结果表明:加入ZnPc修饰层的电池开路电压(Voc)增大,从0.372提高到0.479 V.旋涂PEDOT:PSS的电池短路电流(Jsc)提高,由1.943 mA/cm2提高到3.752 mA/cm2.而以PEDOT:PSS/ZnPc作为阳极修饰的电池Voc和Jsc均有较大的提高,Voc从 0.372 V提高到0.482 V,Jsc从1.943 mA/cm2提高到3.810 mA/ cm2,其转换效率可提高两倍以上.分析认为,ZnPc更有利于阳极空穴的输出,PEDOT:PSS能有效改善ITO表面的平整度的性质是提高太阳电池性能的主要原因.     

ITO/BZO复合薄膜制备及在非晶硅薄膜太阳能电池的应用

采用低压化学气相沉积(LPCVD)法在沉积ITO薄膜的玻璃衬底上制备了硼掺杂氧化锌(BZO)薄膜,研究了ITO缓冲层对ITO/BZO复合薄膜表观形貌、导电性能和光学性能的影响;并研究了ITO/BZO薄膜在非晶硅薄膜太阳能电池的应用.结果表明,以ITO作为缓冲层来沉积BZO薄膜,有利于BZO晶粒尺寸的长大,并可以显著提高BZO薄膜的导电能力.ITO/BZO复合薄膜具有相对较高的导电能力和光学透光率,应用在非晶硅薄膜太阳能电池时转化效率提高0.20;.     

溅射制备Zn(O,S)薄膜及其在CIGS电池中的应用

通过射频磁控溅射(MS)工艺,在不同溅射功率下制备Zn(O,S)薄膜,并将其应用于CIGS异质结器件结构中.采用XRD、XRF、台阶仪、透反射光谱仪、SEM以及wxAMPS仿真软件对Zn(O,S)薄膜以及MS-Zn(O,S)/CIGS异质结器件进行研究.结果表明,低功率条件下(<80 W),Zn(O,S)薄膜内S/Zn明显降低,带隙减小,所制备的微晶或非晶结构Zn(O,S)薄膜材料中生成闪锌矿结构ZnS (α-ZnS);高溅射功率下(>100 W),薄膜内S/Zn增加并趋于稳定,Zn(O,S)材料结晶性能改善,α-ZnS消失,带隙增加.器件仿真结果表明,低功率条件下,缓冲层与吸收层(AB)界面导带失调值(CBO)增大,空间电荷区(SCR)复合加剧;高功率条件下,器件品质因子升高明显,主要是由于高功率引起的异质结界面类受主缺陷浓度增加.     

电沉积法制备CdS薄膜及其性能研究

采用电沉积法制备了CdS薄膜.分别用XRD及SEM分析了薄膜的结构和表面形貌.研究了不同温度和不同沉积电压对薄膜表面硫与镉的化学成分比的影响.最佳的沉积电压为2.5～3V之间.制作了ITO/n-CdS/p-SnS/Ag结构的太阳能电池,在100mW/cm2的光强下其开路电压0.2V,短路电流13.2mA/cm2,填充因子0.31,转换效率0.81;.     

同质缓冲层对氧化铟锡薄膜特性的影响

采用射频磁控溅射法在玻璃衬底上制备出了具有不同厚度ITO同质缓冲层的ITO薄膜.利用X射线衍射、半导体特性测试仪、紫外-可见光分光光度计等测试了薄膜的特性.结果表明:与单层ITO薄膜相比,具有厚度16nm ITO同质缓冲层的ITO薄膜的电阻率下降了30;,薄膜的电阻率达到2.65×10-4 Ω·cm,可见光范围内的平均透过率为91.5;.     

ZnO纳米棒的电致发光研究

采用化学浴沉积法在ITO导电玻璃衬底上制备了ZnO纳米棒膜层,构建了无绝缘层和添加Alq3为绝缘层的两类ZnO发光器件,测试和比较了两类器件的光致发光与电致发光特性.结果表明,在ZnO和Alq3混合体系的PL谱中,观察到ZnO的380nm发光减弱而Alq3的520 nm发光增强,这表明在ZnO的激子态和Alq3分子之间发生了能量转移.ZnO纳米棒的EL谱表现为随机激光,这主要是由于光在纳米棒内谐振,及纳米棒长短不一、阵列不整齐所致.加入Alq3后,器件的Ⅰ-Ⅴ曲线上出现了约为1.6V的阈值电压,工作电压由30 V降为18 V,且器件的发光颜色由黄绿区移到蓝紫区.     

紫光对外延掺锰铁酸铋薄膜物性的影响

采用溶胶-凝胶的方法在(001)取向的SrRuO3/SrTiO3 (SRO/STO)异质结上制备了外延BiFen95 Mn0.05O3(BFMO)薄膜,并以氧化铟锡(ITO)作为上电极构架了ITO/BFMO/SRO型电容器.研究表明,BFMO薄膜为良好的外延生长,当波长为404 nm的紫光入射到电容器表面,产生光电导,漏电流密度变大;测试电压为5V时,无光和光照时的漏电流密度分别为2.92 mA/cm2和10.10 mA/cm2.通过对电流密度的拟合发现:欧姆传导为外延ITO/BFMO/SRO电容器的主要漏电机制,并且光照没有改变电容器的导电机制.在紫光照射下,外延ITO/BFMO/SRO电容器的电滞回线发生变化,这是由于光照在薄膜内部产生光生载流子的缘故.由于光辐射的作用,外延ITO/BFMO/SRO电容器的电容增大.     

Highly Luminescent Red Phosphorescent OLED with Interfacial Layers for Hole Transport and Electron Injection

Four kinds of red phosphorescent organic light-emitting devices were fabricated and compared to investigate the effect of interfacial layers for hole transport and electron injection. 1 nm-thick LiF in the device A and C and 1 nm-thick Cs₂CO₃ in the device B and D were deposited as an electron injection layer between the anode and the electron transport layer, and 5 nm-thick layer of dipyrazion[2,3-f:2′,2′-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile[HATCN] was inserted as a hole transport interfacial layer between the hole injection layer and the hole transport layer only in the device C and D. Under a luminance of 1000 cd/m², the power efficiencies were 7.6 lm/W and 8.5 lm/W in the device A and B, and 8.6 lm/W and 13.4 lm/W in the device C and D. The quantum efficiency of the device D was 15.8% under 1000 cd/m² which was somewhat lower than those of the device A and C, but a little higher than that of the device B. The luminance of the device D was much higher than those of the other devices at a given votage. The luminance of the device D at 7 V was 23,710 cd/m², which was 13.0, 3.4, and 4.0 times higher than those of the device A, B, and C at the same voltage, respectively.     

基底加热温度对ITO薄膜的性能影响研究

氧化铟锡(ITO)薄膜被广泛用作光电器件中的透明导电电极,其透光率、导电性、表面粗糙度、与基底的功函数匹配及其电流传输特性都会对光电器件的性能造成影响。本文采用射频(RF)磁控溅射方法制备ITO薄膜,系统研究了基底加热温度对其各方面性能的影响,并确认了最佳基底温度。实验采用锡掺氧化铟陶瓷为靶材,组分摩尔比为m(In₂O₃)∶m(SnO₂)=90∶10。采用XRD、SEM对所制备的薄膜进行表征,系统分析不同基底温度对ITO薄膜结晶性能、形貌的影响;采用紫外可见分光光度计、霍尔效应测试仪、紫外光电子谱仪(UPS)、电流电压曲线系统研究了基底温度对薄膜光电特性、载流子浓度、薄膜功函数以及电流传输特性的影响。研究结果表明,基底温度200 ℃为最佳,此时ITO薄膜结晶良好、表面平整、可见光波段平均透过率超过80%,导电性能和电流传输特性均较佳,且薄膜组分与靶材组分一致。     

溅射温度对ITO/Ag/ITO多层复合薄膜的结构和光电性能的影响

本文采用直流磁控溅射分层溅射制备了氧化铟锡(ITO)/银(Ag)/ITO多层复合薄膜。系统研究了溅射温度对ITO/Ag/ITO多层复合薄膜的结构和光电性能影响。采用ITO(m(In₂O₃)∶m(SnO₂)=9∶1;直径60 mm)靶材和Ag(纯度99.999%;直径60 mm)靶材分层溅射,使ITO薄膜和Ag薄膜依次沉积在钠-钙玻璃基片上。结果表明,溅射温度对该薄膜的形貌和结构具有显著的影响。在中间Ag薄膜和顶层ITO薄膜的溅射温度均为120 ℃时,薄膜表面晶粒形貌由类球形转变为菱形,此时薄膜方阻为3.68 Ω/Sq,在488 nm处透射率为88.98%,且品质因数为0.03 Ω^-1,实现了低方阻高可见光透射率ITO/Ag/ITO多层复合薄膜的制备。     

Effects of SiO2 overlayer at initial growth stage of epitaxial Y2O3 film growth

We investigated the dependence of the Y₂O₃ film growth on Si surface at initial growth stage. The reflection high-energy electron diffraction, X-ray scattering, and atomic force microscopy showed that the film crystallinity and morphology strongly depended on whether Si surface contained O or not. In particular, the films grown on oxidized surfaces revealed significant improvement in crystallinity and surface smoothness. A well-ordered atomic structure of Y₂O₃ film was formed on 1.5 nm thick SiO₂ layer with the surface and interfacial roughness markedly enhanced, compared with the film grown on the clean Si surfaces. The epitaxial film on the oxidized Si surface exhibited extremely small mosaic structures at interface, while the film on the clean Si surface displayed an island-like growth with large mosaic structures. The nucleation sites for Y₂O₃ were provided by the reaction between SiO₂ and Y at the initial growth stage. The SiO₂ layer known to hinder crystal growth is found to enhance the nucleation of Y₂O₃, and provides a stable buffer layer against the silicide formation. Thus, the formation of the initial SiO₂ layer is the key to the high-quality epitaxial growth of Y₂O₃ on Si.     

Liquid crystal properties of dimers having two identical terminal units and a central oxyethylene spacers

ABSTRACT

In this research, we designed and synthesized blue emitting materials based on aminofluorene-substituted pyrene derivatives. Organic light-emitting diodes (OLEDs) devices using these materials were fabricated in the following sequence; ITO/N,N′-diphenyl-N,N′-(2-napthyl)-(1,1′-phenyl)-4,4′-diamine (NPB) (500 Å)/Blue emitters 1 or 2 (300 Å)/4,7-diphenyl-1,10-phenanthroline (BPhen) (300 Å)/lithium quinolate (Liq) (20 Å)/Al (1000 Å). These devices showed efficient blue emissions. Particularly, a device A using 7-(1-(2-(diphenylamino)-9,9-diethyl-9H-fluoren-7-yl)pyren-6-yl)-9,9-diethyl-N,N-diphenyl-9H-fluoren-2-amine (1) as blue emitter exhibited luminous efficiency, power efficiency, and external quantum efficiency of 2.20 cd/A, 0.80 lm/W, 1.62% at 100 mA/cm², respectively, with Commission Internationale d’Énclairage (CIE) coordinates of (0.17, 0.24) at 8.0 V.     

Properties of flexible heterojunction based on ITO/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)/pentacene/Al

The organic solar cell based on poly(3,4-ethylenedioxythiophene)–poly(styrenesulfonate) (PEDOT:PSS)/pentacene (Pc) was fabricated using a flexible polyethyleneterephthalate (PET) substrate coated with conductive ITO layer and aluminum contact film formed on a Pc layer by electron beam deposition. The performed investigations of current–voltage characteristics indicate that the devices operate like Schottky diodes. Under illumination of an ITO/PEDOT:PSS/Pc/Al multilayer structure the photovoltaic effect is measured with open circuit voltages up to 0.5 V, short circuit current of 0.6 μA and fill factor 0.2. The spectral-photocurrent excitation profile covers a full range of visible light (380–700 nm).     

Investigations on the effect of InSb and InAsSb step-graded buffer layers in InAs0.5Sb0.5 epilayers grown on GaAs (0 0 1)

We report the structural and electrical properties of InAsSb epilayers grown on GaAs (0 0 1) substrates with mid-alloy composition of 0.5. InSb buffer layer and InAs_xSb_1−x step-graded (SG) buffer layer have been used to relax lattice mismatch between the epilayer and substrate. A decrease in the full-width at half-maximum (FWHM) of the epilayer is observed with increasing the thickness of the InSb buffer layer. The surface morphology of the epilayer is found to change from 3D island growth to 2D growth and the electron mobility of the sample is increased from 5.2×10³ to 1.1×10⁴ cm²/V s by increasing the thickness of the SG layers. These results suggest that high crystalline quality and electron mobility of the InAs_0.5Sb_0.5 alloy can be achieved by the growth of thick SG InAsSb buffer layer accompanied with a thick InSb buffer layer. We have confirmed the improvement in the structural and electrical properties of the InAs_0.5Sb_0.5 epilayer by quantitative analysis of the epilayer having a 2.09 μm thick InSb buffer layer and 0.6 μm thickness of each SG layers.     

Blue electroluminescent materials based on indeno[1,2-a]arene derivatives for Organic Light-Emitting Diodes

Abstract

In this study, as a continuous effort for searching efficient blue-emitting materials, we designed and synthesized materials based on indeno[1,2-a]arene. OLED devices using these materials were fabricated in the following sequence; ITO (180?nm)/N,N'-diphenyl-N,N'-(2-napthyl)-(1,1'-phenyl)-4,4'-diamine (NPB) (50?nm)/emitting materials (30?nm)/4,7-diphenyl-1,10-phenanthroline (Bphen) (30?nm)/Liq/Al (2/100?nm). Particularly, a device using 7,7-dimethyl-7H-indeno[1,2-a]pyrene as emitter showed maximum values of luminous efficiency, power efficiency, and external quantum efficiency of 1.10?cd/A, 0.49?lm/W, 1.47% at 20?mA/cm², respectively with CIE (x,y) coordinates of (0.15, 0.08) at 6.0V.