High-energy ion induced physical and surface modifications in antimony sulphide thin films

Sb₂S₃ thin films prepared by electrodeposition on indium tin oxide coated glass substrate were irradiated with 150 MeV Ni¹¹⁺ ions for various fluence in the range of 10¹¹–10¹³ ions/cm². The modifications in the structure, surface morphology and optical properties have been studied as a function of ion fluence. X-ray diffraction (XRD) analysis indicates a shift in the (2 4 0) peak position towards lower diffraction angle and a decrease in grain size with increase in ion fluence. Presence of microcracks due to irradiation induced grain splitting effect has been observed from the SEM micrograph at higher ion fluence. The optical absorbance spectrum revealed a shift in the fundamental absorption edge and the band gap energy increased from a value of 1.63 eV for as-deposited films to 1.80 eV for the films irradiated with 10¹³ ions/cm².     

A competition between (0 0 1) and (0 1 1) alignments in yttria stabilized zirconia thin films fabricated by ion beam assisted deposition

Biaxially textured yttria stabilized zirconia (YSZ) thin films, were deposited on glass substrates by ion beam assisted deposition method with different deposition time. As contrasts, films were also fabricated without assisting ion beam. The orientation properties of the films were characterized by X-ray diffraction. A comparative study shows that there is a competition between (0 0 1) and (0 1 1) alignments during the growth process. Assisting ions make the films (0 0 1)-advantaged and biaxially textured. The competitive growth and the orientation development are explained by selective resputtering and anisotropic damage on growing films induced by assisting ions.     

YBCO films buffered by pyrochlore Nd2Mo2O7 layer on YSZ substrates by chemical solution deposition

A chemical solution deposition process was used to grow epitaxial Nd₂Mo₂O₇ (NMO) buffer layers on YSZ substrates to produce YBa₂Cu₃O_7?δ (YBCO) coated conductors. The NMO precursor solution prepared using metal acetylacetonates was spin-coated onto single crystal YSZ substrate of 10 mm × 10 mm in size at 3000 rpm for 30 s and heat-treated at 1000 °C for 2 h in Ar after calcinated at 550 °C for 1 h. The YBCO film was deposited by TFA-MOD route on top of the NMO/YSZ architecture. The phase purity and the crystalline orientation of NMO and YBCO films were evaluated by X-ray diffraction (XRD). Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to observe their microstructure and their surface roughness. The critical current density (J_c) of YBCO film on NMO/YSZ is 1.8 MA/cm² at 77 K in self-field, which indicates that the Nd₂Mo₂O₇ is a potential buffer for YBCO coated conductor.     

Nanocrystalline diamond thin films deposited by 35 kHz Ar-rich plasmas

We give evidence of nanometric size (5–15 nm) crystalline diamonds in carbon thin films obtained at low substrate temperature (15 °C) under the action of low pressure (0.1–0.3 Torr) 35 kHz excited CH₄/Ar (80–95%) plasmas. The decrease in Ar concentration was found to lead to higher film hardness while crystalline nanodiamonds are observed in a wide interval (1–3.5 h) of deposition times but only for very high Ar concentration (95%). The polycrystalline nanodiamond grains are found over 10–20% within an amorphous carbon matrix. It is suggested that the distribution of nanodiamond grains might be connected to the nonuniform ion energy distribution in the Ar-rich plasma generated at 35 kHz. Morphological and structural features of the deposited films were also investigated.     

Structural and optical properties of La-doped BaSnO3 thin films grown by PLD

In this study the structural and optical properties of lanthanum-doped BaSnO₃ powder samples and thin films deposited on fused silica were investigaed using laser ablation. Under an oxygen pressure of 5×10⁻⁴ mbar, phase pure BaSnO₃ films with a lattice constant of 0.417 nm and grain size of 21 nm were prepared at 630 °C. The band gap of BaSnO3 powder sample and thin films was calculated to be 3.36 eV and 3.67 eV, respectively. There was a progressive increase in conductivity for thin films of BaSnO₃ doped with 0~7 at% of La. The highest conductivity, 9 Scm⁻¹, was obtained for 7 at% La-doped BaSnO₃. Carrier concentration, obtained from Burstein-Moss (B-M) shift, nearly matches the measured values except for 3 at% and 10 at% La-doped BaSnO₃ thin films.     

Ion beam as a probe to study the behavior of hydrogen on silicon surfaces

Hydrogen adsorption and its behavior on Si surfaces is studied by ion beam techniques in the energy range of MeV–keV. Elastic recoil detection analysis employing MeV ion beams is one of the most reliable experimental techniques for direct determination of absolute hydrogen coverages on Si surfaces. Results of its application to Si(1 0 0) and Si(1 1 1) clean surfaces are described. Important new results of the role of adsorbed hydrogen on the growth process or structures of metallic thin films on Si(1 1 1) surfaces also are described. Characterization of the growth process or structure of the thin films, as well as the characterization of hydrogen, is performed by ion beam techniques.     

Optical properties and structural characteristics of ZnO thin films grown on a-plane sapphire substrates by plasma-assisted molecular beam epitaxy

We investigated structural and optical properties of ZnO thin films grown on (112?0) a-plane sapphire substrates using plasma-assisted molecular beam epitaxy. Negligible biaxial stress in ZnO thin films is due to the use of (112?0) a-plane sapphire substrates and slow substrate cooling. The 14 K photoluminescence spectrum shows a blueshift of energy positions compared with ZnO single crystal. A donor with binding energy of 43 meV and an acceptor with binding energy of ～170 meV are identified by well-resolved photoluminescence spectra. A characteristic emission band at 3.320 eV (so-called A-line) is studied. Based on analysis from photoluminescence spectra, the origin of the A-line, it seems, is more likely an (e, A°) transition, in which defect behaves as an acceptor. The room-temperature photoluminescence is dominated by the FX at 3.307 eV, which is an indication of strongly reduced defect density in ZnO thin films.     

Modifications in physical,optical and electrical properties of tin oxide by swift heavy Au8+ ion bombardment

Tin oxide thin films were deposited by a novel technique called as modified-SILAR. The preparative parameters were optimized to obtain good quality thin films. As-deposited films were annealed in O₂ atmosphere for 1 h at 500 °C. The annealed films were irradiated using Au⁸⁺ ions with energy of 100 MeV at different fluencies of 1 × 10¹¹, 1 × 10¹², 5 × 10¹² and 1 × 10¹³ ions/cm² using tandem pelletron accelerator. The irradiation-induced modifications in tin oxide thin films were studied using XRD, AFM, optical band gap, photoluminescence and I–V measurements. XRD studies showed formation of tin oxide with tetragonal structure. AFM revealed uniform deposition of the material with increase in grain size after irradiation. Decrease in band gap from 3.51 eV to 2.82 eV was seen with increases in fluency. A decrease in PL intensity, and an additional peak was observed after irradiation. I–V measurements showed a decrease in resistance with fluency.     

Quantum size effect in low energy electron diffraction of thin films

Low energy electron microscopy (LEEM) is used to study the quantum size effect (QSE) in electron reflectivity from thin films. Strong QSE interference peaks are seen below 20 eV for Cu and Ag films on the W(1 1 0) surface and Sb films on the Mo(0 0 1) surface. Simple inspection of QSE interference peaks reveals that all three metals grow atomic layer-by-atomic layer. Layer-specific I(V) spectra obtained with LEEM permit structural analysis by full dynamical multiple scattering LEED calculations for a layer-by-layer view of thin film structure.     

Effect of Al-doping on optical and electrical properties of spray pyrolytic nano-crystalline CdO thin films

CdO and Al-doped CdO nano-crystalline thin films have been prepared on glass at 300 °C substrate temperature by spray pyrolysis. The films are highly crystalline with grain size (18–32 nm) and found to be cubic structure with lattice constant averaged to 0.46877 nm. Al-doping increased the optical transmission of the film substantially. Direct band gap energy of CdO is 2.49 eV which decreased with increasing Al-doping. The refractive index and dielectric constant varies with photon energy and concentration of Al as well. The conductivity of un-doped CdO film shows metallic behavior at lower temperature region. This behavior dies out completely with doping of Al and exhibits semiconducting behavior for whole measured temperature range. Un-doped and Al-doped CdO is an n-type semiconductor having carrier concentration is of the order of ∼10²¹ cm⁻³, confirmed by Hall voltage and thermo-power measurements.     

Influence of growth temperature and deposition duration on the structure,surface morphology and optical properties of InN/YSZ (1 0 0)

InN films with the wurtzite structure have been grown directly on YSZ (1 0 0) substrate by the RF-magnetron sputtering technique. Strongly (0 0 2) oriented films with smooth surfaces (0.7–2.9 nm surface roughness depending on substrate temperature), were grown within 30 min. Films deposited for 60 min developed three-dimensional (3D) pyramidal islands on top of their surfaces, which diminished the residual elastic strain. The optical absorption edge and PL peak energy around 1.7 eV were found to redshift with increasing film thickness and substrate temperature.     

Inclusion of polyaniline in electrodeposited bismuth sulphide thin films: Synthesis and characterization

Structural, electrical and optical properties of polyaniline (PAni) doped Bi₂S₃ composite thin films prepared by electrodeposition method are reported. X-ray diffraction pattern indicates its polycrystalline nature and crystallite size increases with increase in the concentration of PAni. FTIR studies reveal that the dopant PAni has affected the absorption phenomenon in the IR region of the Bi₂S₃ thin films. The optical band gap energy is found to be 1.91 eV for as-deposited Bi₂S₃ thin film and it decreases with increase in the concentration of PAni. The morphology of the doped films changes due to the addition of PAni. Electrical studies indicate that the conductivity increases with increase in the concentration of PAni. The conduction results from a hopping due to localized states in the temperature range 300–358 K. Above 358 K, the conduction process is explained by the traps at grain boundaries of partially depleted grains.     

Radio frequency source power-induced ion energy impact on SiN films deposited by using a pulsed-PECVD in SiH4–N2 plasma at room temperature

Using a radio frequency (rf) pulsed-plasma enhanced chemical vapor deposition system, silicon nitride (SiN) films were deposited in a SiH₄–N₂ inductively coupled plasma. Effect of duty ratio and rf source powers on deposition rate at room temperature were investigated in the ranges 50–90% and 600–900 W, respectively. Plasma diagnostics on ion energy was conducted and rf source power-induced ion energy impact on SiN films were studied as well as some correlations between deposition rate and ion energy. High and low energies ranged from 17.8 to 22.6 eV, and from 23.6 to 33.8 eV, respectively. Higher ion energies observed at lower duty ratios or lower rf powers was attributed to a lower plasma density. Ion energy flux variation was opposite to that for ion energy. Meanwhile, the deposition rate increased with decreasing the duty ratio at all powers but 900 W. This was not clear as a function of rf source power. The deposition rate ranged from 17.0 to 26.5 nm/min.     

The effect of annealing temperature on structural and optical properties of undoped and Cu doped CdS thin films

Cadmium sulphide (CdS) thin films were prepared chemical bath deposition technique. The films were doped with copper using the direct method consisting in the addition of a copper salt in the deposition bath of CdS. The doped films were annealed in air, at 250, 300 and 350 °C, for 1 h. The deposition films were characterized with X-ray diffraction (XRD), scanning electron microscope (SEM), energy dispersive analysis by X-rays (EDAX) and optical properties of CdS thin films before and after Cu doping. XRD analysis shows that the films are polycrystalline in nature with cubic crystalline structure. The various parameters such as crystallite size, micro strain and dislocation density were evaluated. SEM study shows that the total substrate surface is well covered by uniformly distributed spherical shaped grains. Optical transmittance study shows the presence of direct transition with band gap energy decrease 2.5–2.2 eV.     

Texture analysis of RF-sputtered CeO2 buffer layers and superconducting MOD-YBCO films

CeO₂ buffer layers were deposited on YSZ single-crystal substrates using an RF-sputtering method. The development of crystalline textures of sputtered CeO₂ films at different sputtering pressure and their effects on YBCO films, deposited by Metal Organic Deposition (MOD), were investigated. Both CeO₂ and subsequent YBCO films grew well epitaxially. The relative XRD peak intensities of CeO₂ (2 0 0) to substrate YSZ (2 0 0) increased with deposition pressure in the range of 3–5 mTorr and were inversely proportional to the θ–2θ scan FWHM values of CeO₂ (2 0 0). Also, the reaction layers of BaCeO₃ were thicker in the samples with lower CeO₂ (2 0 0) intensities and poor out-of-plane alignment when CeO₂ were deposited at the lower pressure of 3.3 mTorr. It is noted, however, that the superconducting layer grew well epitaxially on these BaCeO₃ layers, possibly due to the epitaxial relation between CeO₂ and YBCO. The superconducting critical currents of MOD-YBCO films showed an increasing tendency as both the Δ2θ (CeO₂) and BaCeO₃ peak intensities decreased.     

Influence of substrate temperature on physical properties of sprayed Zn0.85Mn0.15O films

Zn_1−xMn_xO thin films have been synthesized by chemical spray pyrolysis at different substrate temperatures in the range, 250–450 °C for a manganese composition, x = 15%, on corning 7059 glass substrates. The as-grown layers were characterized to evaluate their chemical and physical behaviour with substrate temperature. The change of dopant level in ZnO films with substrate temperature was analysed using X-ray photoelectron spectroscope measurements. The X-ray diffraction studies revealed that all the films were strongly oriented along the (0 0 2) orientation that correspond to the hexagonal wurtzite structure. The crystalline quality of the layers increased with the increase of substrate temperature up to 400 °C and decreased thereafter. The crystallite size of the films varied in the range, 14–24 nm. The surface morphological studies were carried out using atomic force microscope and the layers showed a lower surface roughness of 4.1 nm. The optical band gap of the films was ∼3.35 eV and the electrical resistivity was found to be high, ∼10⁴ Ω cm. The films deposited at higher temperatures (>350 °C) showed ferromagnetic behaviour at 10 K.     

Ionic and electronic conductivity of nitrogen-doped YSZ single crystals

The ionic and electronic charge transport was studied for single crystals of 9.5 mol% yttria-stabilized zirconia with additional nitrogen doping (YSZ:N) of up to 7.5 at.% (referred to the anion sublattice and formula unit Zr_0.83Y_0.17O_1.91) as a function of temperature and nitrogen content. The total conductivity being almost equivalent to the oxygen ion conductivity has been measured by AC impedance spectroscopy under vacuum conditions in order to prevent re-oxidation and loss of nitrogen. The electronic conductivity has been determined by Hebb–Wagner polarization using ion-blocking Pt microelectrodes in N₂ atmosphere. The ionic conductivity of YSZ:N decreases in the presence of nitrogen at intermediate temperatures up to 1000 °C. The mean activation energy of ionic conduction strongly increases with increasing nitrogen content, from 1.0 eV for nitrogen-free YSZ up to 1.9 eV for YSZ containing 7.3 at.% N. Compared to nitrogen-free YSZ, the electronic conductivity first decreases at nitrogen contents of 2.17 and 5.80 at.%, but then increases again for a sample with 7.53 at.%. At temperatures of 850 °C and above, the presence of the N^3? dopant fixes the electrode potential and thus the oxygen partial pressure at the Pt electrode to very low values. This corresponds to a pinning of the Fermi level at a relatively high energy in the upper half of the band gap. At 7.53 at.% N and 950 °C, the oxygen partial pressure in YSZ:N corresponds to p_O2 = 3 × 10^? 18 bar. At temperatures above 850 °C, even in the presence of a very small oxygen concentration in the surrounding gas phase, the nitrogen ion dopant becomes highly mobile and thus diffuses to the surface where it is oxidized to gaseous N₂. The results are discussed in terms of the ionic and electronic defect structures and the defect mobilities in YSZ:N.     

Structure and magnetic properties of 300-nm-thick FePt films with Hf underlayer

Structure, microstructure, magnetic properties of 300-nm-thick FePt films with 10-nm-thick Hf underlayer have been studied. The experimental results showed that the very thin Hf underlayer could promote the ordering at reduced temperatures by facilitating the nucleation of the order phase, leading to refined grain size and magnetic domain size. Therefore, the permanent magnetic properties of FePt films were enhanced. (BH)_max and H_c of FePt films were greatly enhanced from 5.0–21.0 MGOe and 1.4–11.0 kOe for single layer to 10.2–23.6 MGOe and 4.5–13.2 kOe for Hf-underlayered films annealed in T_a region of 400–600 °C, respectively. Nevertheless, the severe interdiffusion between the Hf and FePt layers at T_a=800 °C resulted in the decreased S, coarsened surface morphology, grain and magnetic domain sizes, and therefore the slightly decreased (BH)_max to 18.0 MGOe.     

Changes in the optical properties of as-deposited plasma polymerized 2,6-diethylaniline thin films by iodine doping

In this study, plasma polymerized 2, 6-diethylaniline (PPDEA) thin films of different thicknesses were synthesized using a glow discharge plasma polymerization method. Scanning electron microscopy showed that the surface morphology of an as-deposited PPDEA thin film was comparatively smooth after iodine doping. The iodine-doped PPDEA was found to be thermally stable up to ca about 560 K, which was slightly lower than that observed for as-deposited PPDEA. Ultraviolet-visible spectroscopic analyses demonstrated that iodine doping resulted in a significant decrease in the optical energy gap. As the doping period increased, the direct optical transition energy gap was reduced from 3.56 to 2.79 eV and the indirect optical transition energy gap was decreased from 2.23 to 1.97 eV. Thus it is observed that, the optical parameters of as-deposited PPDEA thin films with different thicknesses can be modified with different iodine doping periods.     

Photoluminescence studies of ZnO thin films on R-plane sapphire substrates grown by sol–gel method

Zinc oxide (ZnO) thin films on R-plane sapphire substrates were grown by the sol–gel spin-coating method. The optical properties of the ZnO thin films were investigated using photoluminescence. In the UV range, the asymmetric near-band-edge emission was observed at 300 K, which consisted of two emissions at 3.338 and 3.279 eV. Eight peaks at 3.418, 3.402, 3.360, 3.288, 3.216, 3.145, 3.074, and 3.004 eV, which respectively correspond to the free exciton (FX), bound exciton, transverse optical (TO) phonon replica of FX recombination, and first-order longitudinal optical phonon replica of FX and the TO (1LO+TO), 2LO+TO, 3LO+TO, 4LO+TO, and 5LO+TO, were obtained at 12 K. From the temperature-dependent PL, it was found that the emission peaks at 3.338 and 3.279 eV corresponded to the FX and TO, respectively. The activation energy of the FX and TO emission peaks was found to be about 39.3 and 28.9 meV, respectively. The values of the fitting parameters of Varshni's empirical equation were α=4×10^?3 eV/K and β=4.9×10³ K, and the S factor of the ZnO thin films was 0.658. With increasing temperature, the exciton radiative lifetime of the FX and TO emissions increased. The temperature-dependent variation of the exciton radiative lifetime for the TO emission was slightly higher than that for the FX emission.