Interaction of NO with the O-rich RuO2(1 1 0) surface at 300 K

The interaction of NO with the O-rich RuO₂(1 1 0) surface, exposing coordinatively unsaturated O-bridge, O-cus, and Ru-cus atoms, was studied at 300 K by thermal desorption spectroscopy (TDS) and high-resolution electron energy-loss spectroscopy (HREELS). The conclusions are validated by isotope substitution experiments with ¹⁸O. During exposure to NO an O···N–O surface group (NO₂-cus) is formed with O-cus. Additionally, a smaller number of empty Ru-cus sites are filled by NO-cus. If one warms the sample to 400 K, NO₂-cus does not desorb but decomposes into O and NO again, the latter being either released into gas phase or adsorbed as NO-cus. With O-bridge such a surface group is not stable at 300 K. Our experiments further prove that O-cus is more reactive than O-bridge.     

Structure and reaction pathways of methyl lactate on Pd(1 1 1)

The adsorption and reaction of methyl lactate (CH₃CH(OH)COOCH₃) is studied in ultrahigh vacuum on a Pd(1 1 1) surface using temperature-programmed desorption (TPD) and reflection–absorption infrared spectroscopy (RAIRS). Methyl lactate reacts at relatively low temperatures (220 K) by O–H bond scission. This intermediate can either react with hydrogen to reform methyl lactate at 280–300 K or undergo β-hydride elimination to form flat-lying methyl pyruvate. This decomposes to form acetyl and methoxy carbonyl species as found previously following methyl pyruvate adsorption on Pd(1 1 1). These species predominantly react to form carbon monoxide, methane and hydrogen.     

Formation, stability and CO adsorption properties of PdAg/Pd(1 1 1) surface alloys

The formation, stability and CO adsorption properties of PdAg/Pd(1 1 1) surface alloys were investigated by X-ray photoelectron spectroscopy (XPS) and by adsorption of CO probe molecules, which was characterized by temperature-programmed desorption (TPD) and high resolution electron energy loss spectroscopy (HREELS). The PdAg/Pd(1 1 1) surface alloys were prepared by annealing (partly) Ag film covered Pd(1 1 1) surfaces, where the Ag films were deposited at room temperature. Surface alloy formation leads to a modification of the electronic properties, evidenced by core-level shifts (CLSs) of both the Pd(3d) and Ag(3d) signal, with the extent of the CLSs depending on both initial Ag coverage and annealing temperature. The role of Ag pre-coverage and annealing temperature on surface alloy formation is elucidated. For a monolayer Ag covered Pd(1 1 1) surface, surface alloy formation starts at ∼450 K, and the resulting surface alloy is stable upon annealing at temperatures between 600 and 800 K. CO TPD and HREELS measurements demonstrate that at 120 K CO is exclusively adsorbed on Pd surface atoms/Pd sites of the bimetallic surfaces, and that the CO adsorption behavior is dominated by geometric ensemble effects, with adsorption on threefold hollow Pd₃ sites being more stable than on Pd₂ bridge sites and finally Pd₁ a-top sites.     

Formation and characterization of Au/Pd surface alloys on Pd(1 1 1)

The formation of alloys by adsorbing gold on a Pd(1 1 1) single crystal substrate and subsequently annealing to various temperatures is studied in an ultrahigh vacuum by means of Auger and X-ray photoelectron spectroscopy. The nature of the alloy surface is probed by CO chemisorption using temperature-programmed desorption and reflection-absorption infrared spectroscopy. It is found that gold grows in a layer-by-layer fashion on Pd(1 1 1) at 300 K, and starts to diffuse into the bulk after annealing to above ∼600 K. Alloy formation results in a ∼0.5 eV binding energy decrease of the Au 4f XPS signals and a binding energy increase of the Pd 3d features of ∼0.8 eV, consistent with results obtained for the bulk alloy. The experimentally measured CO desorption activation energies and vibrational frequencies do not correlate well with the surface sites expected from the bulk alloy composition but are more consistent with significant preferential segregation of gold to the alloy surface.     

Formate stability and carbonate hydrogenation on strained Cu overlayers on Pt(1 1 1)

Formate (HCOO) synthesis, decomposition and the hydrogenation of carbonate (CO₃) on Cu overlayers deposited on a Pt(1 1 1) single crystal are investigated to examine the reactivity of a Cu surface under tensile strain with defects present.Formate is synthesized from a 0.5 bar mixture of 70% CO₂ and 30% H₂ at varying temperatures, and the evolution is followed with polarization modulation infrared reflection absorption spectroscopy (PM-IRRAS). Subsequent TPD reveals decomposition of the formate species into CO₂ and H₂ at 420 ± 5 K for strained Cu at sub-monolayer to monolayer coverages. This is a significantly lower decomposition temperature than obtained earlier on pristine Cu(1 1 1) (460 K), as well as for thicker Cu layers where we assign an observed decomposition peak at 440 ± 5 K to relaxed, but defect-rich Cu(1 1 1). However, the thermal stability of formate on strained and defect-rich Cu is similar to previous results obtained for supported, and lattice-strained, Cu nanoparticles.The hydrogenation of carbonate produced by 0.3 bar CO₂ exposure at room temperature was monitored with XPS and TPD showing a significant loss of carbonate when subjected to 0.2 bar H₂ at room temperature. However, the presence of formate on the surface, or any other hydrogenation product, could not be established during or after H₂ exposure by PM-IRRAS, EELS or TPD. Even so, the results suggest that carbonate and its hydrogenation may constitute a relevant pathway to methanol production.     

Interaction of atomic H and CO with Cu(1 1 0) and bimetallic Ni/Cu(1 1 0)

Co-adsorption of hydrogen and CO on Cu(1 1 0) and on a bimetallic Ni/Cu(1 1 0) surface was studied by thermal desorption spectroscopy. Hydrogen was exposed in atomic form as generated in a hot tungsten tube. The Ni/Cu surface alloy was prepared by physical vapor deposition of nickel. It turned out that extended exposure of atomic hydrogen leads not only to adsorption at surface and sub-surface sites, but also to a roughening of the Cu(1 1 0) surface, which results in a decrease of the desorption temperature for surface hydrogen. Exposure of a CO saturated Cu(1 1 0) surface to atomic H leads to a removal of the more strongly bonded on-top CO (α₁ peak) only, whereas the more weakly adsorbed CO molecules in the pseudo threefold hollow sites (α₂ peak) are hardly influenced. No reaction between CO and H could be observed. The modification of the Cu(1 1 0) surface with Ni has a strong influence on CO adsorption, leading to three new, distinct desorption peaks, but has little influence on hydrogen desorption. Co-adsorption of H and CO on the Ni/Cu(1 1 0) bimetallic surface leads to desorption of CO and H₂ in the same temperature regime, but again no reaction between the two species is observed.     

Characterization of methylidyne on Pt(1 1 1) with infrared spectroscopy

Methylidyne (CH) was prepared on Pt(1 1 1) by three methods: thermal decomposition of diiodomethane (CH₂I₂), ethylene decomposition at temperatures above 450 K, and surface carbon hydrogenation. Methylidyne and its precursors are characterized by reflection absorption infrared spectroscopy (RAIRS). The C-I bond of diiodomethane breaks upon adsorption to produce methylene (CH₂), which decomposes to methylidyne at temperatures above 130 K. Above 200 K, methylidyne is the only hydrocarbon species observed with RAIRS, although reaction channels for the formation of methane (CH₄) and ethylene (C₂H₄) are indicated by temperature programmed desorption (TPD). As is well known from numerous previous studies, ethylene decomposes to ethylidyne (CCH₃) upon exposure to Pt(1 1 1) at 410 K. Upon annealing to 450 K, ethylidyne dissociates through two reaction pathways, dehydrogenation to ethynyl (CCH) and C-C bond scission to methylidyne. Ethylene dehydrogenation on the surface at 750 K and under low ethylene exposures produces surface carbon that can be hydrogenated to methylidyne with C-H and C-D stretch frequencies of 2956 and 2206 cm⁻¹, respectively. Hydrogen co-adsorption on the surface causes these frequencies to shift to higher values. Methylidyne is stable on Pt(1 1 1) to temperatures up to 500 K.     

Adsorption of glycine on a NiAl(1 1 0) alloy surface

The adsorption and desorption of glycine (NH₂CH₂COOH), vacuum deposited on a NiAl(1 1 0) surface, were investigated by means of Auger electron spectroscopy (AES), low energy electron diffraction (LEED), temperature-programmed desorption, work function (Δφ) measurements, and ultraviolet photoelectron spectroscopy (UPS). At 120 K, glycine adsorbs molecularly forming mono- and multilayers predominantly in the zwitterionic state, as evidenced by the UPS results. In contrast, the adsorption at room temperature (310 K) is mainly dissociative in the early stages of exposure, while molecular adsorption occurs only near saturation coverage. There is evidence that this molecularly adsorbed species is in the anionic form (NH₂CH₂COO⁻). Analysis of AES data reveals that upon adsorption glycine attacks the aluminium sites on the surface. On heating part of the monolayer adsorbed at 120 K is converted to the anionic form and at higher temperatures dissociates further before desorption. The temperature-induced dissociation of glycine (<400 K) leads to a series of similar reaction products irrespective of the initial adsorption step at 120 K or at 310 K, leaving finally oxygen, carbon and nitrogen at the surface. AES and LEED measurements indicate that oxygen interacts strongly with the Al component of the surface forming an “oxide”-like Al-O layer.     

Formation and hydrogenation of p(2 × 2)-N on Pt(1 1 1)

The formation of a well-ordered p(2 × 2) overlayer of atomic nitrogen on the Pt(1 1 1) surface and its reaction with hydrogen were characterized with reflection absorption infrared spectroscopy (RAIRS), temperature programmed desorption (TPD), low energy electron diffraction (LEED), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS). The p(2 × 2)-N overlayer is formed by exposure of ammonia to a surface at 85 K that is covered with 0.44 monolayer (ML) of molecular oxygen and then heating to 400 K. The reaction between ammonia and oxygen produces water, which desorbs below 400 K. The only desorption product observed above 400 K is molecular nitrogen, which has a peak desorption temperature of 453 K. The absence of oxygen after the 400 K anneal is confirmed with AES. Although atomic nitrogen can also be produced on the surface through the reaction of ammonia with an atomic, rather than molecular, oxygen overlayer at a saturation coverage of 0.25 ML, the yield of surface nitrogen is significantly less, as indicated by the N₂ TPD peak area. Atomic nitrogen readily reacts with hydrogen to produce the NH species, which is characterized with RAIRS by an intense and narrow (FWHM ∼ 4 cm⁻¹) peak at 3322 cm⁻¹. The areas of the H₂ TPD peak associated with NH dissociation and the XPS N 1s peak associated with the NH species indicate that not all of the surface N atoms can be converted to NH by the methods used here.     

Adsorption of methanol on Ni3Al(1 1 1) and NiAl(1 1 0): A high resolution PES study

The adsorption of methanol on Ni₃Al(1 1 1) and NiAl(1 1 0) has been studied using high resolution photoemission spectroscopy (HR-PES) and density functional theory (DFT). Both methanol and methoxy are formed on these surfaces after the initial methanol exposure at low temperatures. Heating to 200 K leads to further formation of methoxy. On NiAl(1 1 0) two different methoxy species are observed where the first is formed upon methanol adsorption, and the other results from methanol decomposition during heating. The DFT calculations show that methanol and methoxy interacts with the Al atoms on both surfaces. Methanol is found to bond through the oxygen atom to the Al on-top site on Ni₃Al(1 1 1) and NiAl(1 1 0) with the C–O axis tilted with respect to the surface normal. On Ni₃Al(1 1 1) methoxy is situated in a 2Ni+Al hollow site, whereas on NiAl(1 1 0) the Al–Al bridge site is preferred.     

Exploring the mechanism of NO–C2H4 reactions on the surface of stepped Pt(3 3 2)

Fourier transform infra red reflection–absorption spectroscopy (FTIR-RAS), thermal desorption spectroscopy (TDS), and auger electron spectroscopy (AES), were employed to explore the mechanism of NO reduction in the presence of C₂H₄ on the surface of stepped Pt(3 3 2). Both NO–Pt and C₂H₄–Pt interactions are enhanced when NO and C₂H₄ are co-adsorbed on Pt(3 3 2). As a result, C₂H₄ is dissociated at surface temperatures as low as 150 K, and the N–O stretch band is weakened. The presence of post-exposed C₂H₄ leads NO desorption from steps to decrease significantly, but the same effect on NO desorption from terraces becomes appreciable only at higher post-exposures of C₂H₄, e.g., 0.6 L and 1.2 L, and proceeds to a much slighter extent. Auger spectra indicate that as a result of the reaction with O from NO dissociation, the amount of surface C species is greatly reduced when NO is post-exposed to a C₂H₄ adlayer. It is concluded that reduction of NO in the presence of C₂H₄ proceeds very effectively on the surface of the Pt(3 3 2), through a mechanism of NO dissociation and subsequent O removal. Following this mechanism, the significant dissociation of adsorbed NO molecules on steps at surface temperatures below 400 K, and subsequent rapid reaction between the resultant O and C-related species, accounts for the considerable amount of N₂ desorption at temperatures below 400 K.     

Sulphur overlayers on the Au(1 1 0) surface: LEED and TPD study

The adsorption and desorption of sulphur on the clean reconstructed Au(1 1 0)-(1 × 2) surface has been studied by low energy electron diffraction, Auger electron spectroscopy and temperature programmed desorption. The results obtained show a complex behaviour of the S/Au(1 1 0) system during sulphur desorption at different temperatures. Two structures of the stable ordered sulphur overlayer on the Au(1 1 0) surface, p(4 × 2) and c(4 × 4), were found after annealing the S/Au(1 1 0) system at 630 K and 463 K, respectively. The corresponding sulphur coverage for these overlayers was estimated by AES signal intensity analysis of the Au NOO and S LMM Auger lines to be equal to 0.13 ML and 0.2 ML, respectively. Both sulphur structures appear after removing an excess of sulphur, which mainly desorbs at 358 K as determined from TPD spectra. Furthermore, it was not possible to produce the lower coverage p(4 × 2) sulphur structure by annealing the c(4 × 4) surface. In the case of the p(4 × 2) S overlayer on the Au(1 1 0)-(1 × 2) surface it is proposed that the sulphur is attached to “missing row” sites only. The c(4 × 4) S overlayer arises via desorption of S₂ molecules that are formed on the surface due to mobility of sulphur atoms after a prolonged anneal.     

The adsorption of CCl4 on Ag(1 1 1): Carbene and CC bond formation

The adsorption of CCl₄ on Ag(1 1 1) has been investigated from 100 K to 300 K using absolute sticking probability measurement, temperature programmed desorption, Auger electron spectroscopy, low energy electron diffraction, ultra-violet photoelectron spectroscopy and X-ray photoelectron spectroscopy. At 100 K, CCl₄ adsorbs molecularly with a sticking probability of 1.0, forming a (3 × 3) adsorption structure. At 300 K the following overall reaction occurs,

2CCl_4(g)→4Cl_(chem)+C₂Cl_4(g),     

Photon-induced chemical vapor deposition of molybdenum on Pt(1 1 1)

Temperature-programmed desorption (TPD) and X-ray photoelectron spectroscopy (XPS) have been employed to study the adsorption and photon-induced decomposition of Mo(CO)₆. Mo(CO)₆ adsorbs molecularly on a Pt(1 1 1) surface with weak interaction at 100 K and desorbs intact at 210 K without undergoing thermal decomposition. Adsorbed Mo(CO)₆ undergoes decarbonylation to form surface Mo(CO)_x (x ? 5) under irradiation of ultraviolet light. The Mo(CO)_x species can release further CO ligands to form Mo adatoms with CO desorption at 285 K. In addition, a fraction of the released CO ligands transfers onto the Pt surface and subsequently desorbs at 350-550 K. The resulting Mo layer deposited on the Pt surface is nearly free of contamination by C and O. The deposited Mo adatoms can diffuse into the bulk Pt at temperatures above 1070 K.     

Epitaxial growth of well-ordered ultra-thin Al2O3 film on NiAl (1 1 0) by a single-step oxidation

Well-ordered ultra-thin Al₂O₃ films were grown on NiAl (1 1 0) surface by exposing the sample at various oxygen absorption temperatures ranging from 570 to 1100 K at dose rates 6.6 × 10⁻⁵ and 6.6 × 10⁻⁶ Pa. From the results of low-energy electron diffraction (LEED), Auger electron spectrometer (AES) and X-ray photon spectroscopy (XPS) observations, it was revealed that oxidation mechanism above 770 K is different from well-known two-step process. At high temperature, oxidation and crystallization occurred simultaneously while in two-step process oxidation and crystallization occurred one after another. At high-temperature oxidation well-ordered crystalline oxide can be formed by a single-step without annealing. Well-ordered Al₂O₃ layer with thickness over 1 nm was obtained in oxygen absorption temperature 1070 K and a dose rate 6.6 × 10⁻⁶ Pa at 1200 L oxygen.     

Observation of charge transfer states of F4-TCNQ on the 2-methylpropene chemisorbed Si(1 0 0)(2 × 1) surface

We have investigated the valence electronic states of 2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane (F₄-TCNQ) on the 2-methylpropene chemisorbed Si(1 0 0)(2 × 1) surface using valence photoelectron spectroscopy. Since the electron affinity of condensed F₄-TCNQ is 5.24 eV and the energy from the valence band maximum of the 2-methylpropene saturated Si(1 0 0)(2 × 1) surface to the vacuum level is 4.1 eV, spontaneous charge transfer would be expected in the present system. At sub-monolayer coverage of F₄-TCNQ, characteristic peaks are observed at 1.1 and 2.5 eV below Fermi energy. The former peak is assigned to a singly occupied affinity level, and the latter is ascribed to a relaxed highest occupied molecular orbital of adsorbed F₄-TCNQ. The work function change is increased up to +1.3 eV as a function of F₄-TCNQ coverage. These results support the occurrence of charge transfer into F₄-TCNQ on the 2-methylpropene saturated Si(1 0 0)(2 × 1) surface.     

Thermal decomposition mechanisms of tungsten nitride CVD precursors on Cu(1 1 1)

Chemisorption and thermal decomposition of metallorganic chemical vapor deposition precursors, (t-BuN)₂W(NHBu-t)₂, bis(tert-butylimido)bis(tert-butylamido)tungsten (BTBTT) and (t-BuN)₂W(NEt₂)₂, bis(tert-butylimido)bis(diethylamido)tungsten (BTBDT), on Cu(1 1 1) have been investigated by means of thermal desorption spectroscopy (TDS) and synchrotron-based X-ray photoelectron spectroscopy (SR-XPS) under ultrahigh vacuum conditions. The precursors remain intact upon chemisorption on Cu(1 1 1) at 100 K, and at 300 K both precursors decompose readily via the characteristic hydride abstraction/elimination pathways to produce two stable surface intermediates for each precursor. For BTBTT, one species is W(=NBu-t)₃ and the other is proposed to be a bridged amido complex, [(t-BuN)₂W(μ-NBu-t)]₂. In comparison, a W-imine complex and a W-N-C metallacycle are two intermediates produced from BTBDT. Annealing toward 800 K further decomposes the intermediates and the detectable desorption species are completely derived from the ligands. The desorption products from BTBTT include t-butylamine generated from α-H abstraction, isobutylene from γ-H elimination, acetonitrile from β-methyl elimination, and molecular hydrogen. In addition to these desorption species, BTBDT produces hydrogen cyanide and imine (EtN = CHMe) via β-H elimination, not possible with BTBTT due to the absence of β-H in the ligands. Eventually, tungsten nitrides incorporating oxygen atoms and a small amount of graphitic carbons are formed and the stoichiometry is approximated as WN_1.5O_0.1. Oxygen incorporation, driven by a large oxide formation enthalpy, is sensitively dependent on the moisture exposure in UHV environment.     

Core level photoemission and STM characterization of Ta/Si(1 1 1)-7 × 7 interfaces

We present the results of scanning tunneling microscopy (STM) and photoemission spectroscopy (PES) of the Ta/Si(1 1 1)-7 × 7 system after deposition of Ta at substrate temperatures from 300 to 1250 K. The coverage of Ta varied from 0.05 up to 2.5 of a monolayer (ML). STM shows that at 300 K and coverage less than 1 ML, a disordered chemisorbed phase is formed. Deposition on a hot surface (above 500 K) produces round 3D clusters randomly distributed on the surface. Cluster height and their diameter are found to change drastically with annealing temperature and the Ta coverage. Analysis of photoemission data of the Si 2p core levels shows that at room temperature and at coverage ?1 ML core level binding energy shifts and intensity variations of Si surface related components are observed, which clearly indicate that the reaction starts already at 300 K. Shifts in the binding energy, changes of the peak shapes and intensity of the Ta 4f doublet at higher temperatures can be explained by the formation of stable silicide on the surface.     

Growth of epitaxial thin Pd(1 1 1) films on Pt(1 1 1) and oxygen-terminated FeO(1 1 1) surfaces

Thin Pd films (1-10 monolayers, ML) were deposited at 35 K on a Pt(1 1 1) single crystal and on an oxygen-terminated FeO(1 1 1) monolayer supported on Pt(1 1 1). Low energy electron diffraction, Auger electron spectroscopy, and Kr and CO temperature programmed desorption techniques were used to investigate the annealing induced changes in the film surface morphology. For growth on Pt(1 1 1), the films order upon annealing to 500 K and form epitaxial Pd(1 1 1). Further annealing above 900 K results in Pd diffusion into the Pt(1 1 1) bulk and Pt-Pd alloy formation. Chemisorption of CO shows that even the first ordered monolayer of Pd on Pt(1 1 1) has adsorption properties identical to bulk Pd(1 1 1). Similar experiments conducted on FeO(1 1 1) indicate that 500 K annealing of a 10 ML thick Pd deposit also yields ordered Pd(1 1 1). In contrast, annealing of 1 and 3 ML thick Pd films did not result in formation of continuous Pd(1 1 1). We speculate that for these thinner films Pd diffuses underneath the FeO(1 1 1).     

Adsorption, ordering, and chemistry of nitrobenzene on Si(1 0 0)-2 × 1

Surface chemistry of nitrobenzene on Si(1 0 0)-2 × 1 has been investigated using multiple internal reflection Fourier-transform infrared spectroscopy (MIR-FTIR), Auger electron spectroscopy (AES) and thermal desorption mass spectrometry. Molecular adsorption of nitrobenzene at submonolayer coverages is dominating at cryogenic temperatures (100 K). As the surface temperature is increased to 160 K, chemical reaction involving nitro group occurs, while the phenyl entity remains intact. Thus, a barrier of approximately 40.8 kJ/mol is established for the interaction of the nitro group of nitrobenzene with the Si(1 0 0)-2 × 1 surface. Further annealing of the silicon surface leads to the decomposition of nitrobenzene. The concentration of nitrogen and oxygen remains constant on a surface within the temperature interval studied here. AES studies also suggest that the majority of carbon-containing products remain bound to the surface at temperatures as high as 1000 K. The only chemical reaction leading to the release of the gaseous products is benzene formation around 670 K. The amount of benzene accounts only for a few percent of the surface species, while the rest of the phenyl groups connected to the silicon surface via a nitrogen linker remain stable even at elevated temperatures, opening an opportunity for stable surface coatings.