Tunable Diode Laser Diagnostic Studies of H2-Ar-O2 Microwave Plasmas Containing Methane or Methanol

Tunable infrared diode laser absorption spectroscopy has been used to detect the methyl radical and ten stable molecules in H₂-Ar-O₂ microwave plasmas containing up to 7.2% of methane or methanol, under both flowing and static conditions. The degree of dissociation of the hydrocarbons varied between 30 and 90% and the methyl radical concentration was found to be in the range 10 ¹⁰ –10 ¹² molecules cm ^–3 . The methyl radical concentration and the concentrations of the stable C-2 hydrocarbons C ₂ H ₂ , C ₂ H ₄ , and C ₂ H ₆ , produced in the plasma decayed exponentially when increasing amounts of O ₂ were added at fixed methane or methanol partial pressures. In addition to detecting the hydrocarbon species, the major products CO, CO ₂ , and H ₂ O were also monitored. For the first time, formaldehyde, formic acid, and methane were detected in methanol microwave plasmas, formaldehyde was detected in methane microwave plasmas. Chemical modeling with 57 reactions was used to successfully predict the concentrations in methane plasmas in the absence of oxygen and the trends for the major chemical product species as oxygen was added.     

Quadrupole mass spectrometric study of positive ions from RF plasmas of pure CH4, CH4/H2, and CH4/Ar systems

Quadrupole mass spectrometry has been employed to characterize the ionic species in the discharges of pure CH₄, CH₄/H₂, and CH₄/Ar systems. For pure methane, the major positive ions in the discharge at low pressure (e.g., 0.15 torr) are CH ₃ ⁺ , C₂H ₃ ⁺ , CH ₂ ⁺ , C₂H ₂ ⁺ , CH ₄ ⁺ , C₂H ₄ ⁺ , and C₂H ₅ ⁺ at high pressure (e.g., 0.5 torr) the major ions are CH ₃ ⁺ , C₂H ₃ ⁺ , C₂H ₅ ⁺ , C₃H ₃ ⁺ , C H₃H ₇ ⁺ , C₄H ₇ ⁺ , C₅H ₇ ⁺ , C₆H ₅ ⁺ , and C₇H ₇ ⁺ . The relative abundances of C₁ ions decrease with increasing pressure, whereas those of higher-order ions increase with pressure. For 5% CH₄ + 95% H₂ mixture, in addition to those sampling from the pure methane plasma at the lower pressure, H _n ⁺ ions have also been detected. For 5% CH₄ +95% Ar mixture, the principal ions are CH ₃ ⁺ , CH ₂ ⁺ , CH⁺, CH ₅ ⁺ , Ar⁺, and ArH⁺; the ions containing more than two carbon atoms are negligible. In these discharges, the CH ₃ ⁺ and C₂H ₃ ⁺ are the most important positive ions in C₁ and C₂ ions, respectively. The ions detected are believed to come from the sheath between the electrode and the luminous plasma, and have high kinetic energy. An ion-molecule reaction mechanism is proposed which can well explain the observed main features of ionic products.Died June 1, 1991.     

A Correlation of the Chemistry with the Polymerization Rate in an rf Discharge of Methane

In a 150-V methane discharge, the rate of polymerization is approximately 3 times greater on the electrodes than on the walls. The sum of the C₁ and C₂ ions is 2 to 3 times higher in the dark space adjacent to the electrodes than in the space adjacent to the walls. Ethylene and acetylene are present in about equal amounts in all regions of the discharge. It is concluded that the ions C₂H₃ ⁺, C₂H₂ ⁺, CH₃ ⁺CH₈ ⁺, and CH⁺ have the greatest influence on the rate of polymerization, while the neutrals CH₄, C₂H₂, C₂H₄, and C₂H₆ have the least influence.     

Interaction of the Benzenium Ion with Inert Ligands: IR Spectra of C6H7+?Ln Cluster Cations (L=Ar,N2, CH4, H2O)

IR photodissociation spectra of mass‐selected clusters composed of protonated benzene (C₆H₇⁺) and several ligands L are analyzed in the range of the C? H stretch fundamentals. The investigated systems include C₆H₇⁺? Ar, C₆H₇⁺? (N₂)_n (n=1–4), C₆H₇⁺? (CH₄)_n (n=1–4), and C₆H₇⁺? H₂O. The complexes are produced in a supersonic plasma expansion using chemical ionization. The IR spectra display absorptions near 2800 and 3100 cm^?1, which are attributed to the aliphatic and aromatic C? H stretch vibrations, respectively, of the benzenium ion, that is, the σ complex of C₆H₇⁺. The C₆H₇⁺? (CH₄)_n clusters show additional C? H stretch bands of the CH₄ ligands. Both the frequencies and the relative intensities of the C₆H₇⁺ absorptions are nearly independent of the choice and number of ligands, suggesting that the benzenium ion in the detected C₆H₇⁺? L_n clusters is only weakly perturbed by the microsolvation process. Analysis of photofragmentation branching ratios yield estimated ligand binding energies of the order of 800 and 950 cm^?1 (≈9.5 and 11.5 kJ mol^?1) for N₂ and CH₄, respectively. The interpretation of the experimental data is supported by ab initio calculations for C₆H₇⁺? Ar and C₆H₇⁺? N₂ at the MP 2/6‐311 G(2df,2pd) level. Both the calculations and the spectra are consistent with weak intermolecular π bonds of Ar and N₂ to the C₆H₇⁺ ring. The astrophysical implications of the deduced IR spectrum of C₆H₇⁺ are briefly discussed.     

Pyrolysis and Oxidation of Methane in a RF Plasma Reactor

The chemical kinetic effects of RF plasma on the pyrolysis and oxidation of methane were studied experimentally and computationally in a laminar flow reactor at 100 Torr and 373 K with and without oxygen addition into He/CH₄ mixtures. The formation of excited species as well as intermediate species and products in the RF plasma reactor was measured with optical emission spectrometer and Gas Chromatography and the data were used to validate the kinetic model. The kinetic analysis was performed to understand the key reaction pathways. The experimental results showed that H₂, C₂ and C₃ hydrocarbon formation was the major pathways for plasma assisted pyrolysis of methane. In contrast, with oxygen addition, C₂ and C₃ formation dramatically decreased, and syngas (H₂ and CO) became the major products. The above results revealed oxygen addition significantly modified the chemistry of plasma assisted fuel pyrolysis in a RF discharge. Moreover, an increase of E/n was found to be more beneficial for the formation of higher hydrocarbons while a small amount of oxygen was presented in a He/CH₄ mixture. A reaction path flux analysis showed that in a RF plasma, the formation of active species such as CH₃, CH₂, CH, H, O and O (¹D) via the electron impact dissociation reactions played a critical role in the subsequent processes of radical chain propagating and products formation. The results showed that the electronically excitation, ionization, and dissociation processes as well as the products formation were selective and strongly dependent on the reduced electric field.     

Structure and formation of gaseous [C4H6O]+˙ ions: 1—The enolic ions [CH2C(OH)?CHCH2]+˙ and [CH2CH?CHCH(OH)]+˙ and their relationship with their keto counterparts

The [C₄H₆O]^+˙ ion of structure [CH₂?CHCH?CHOH]^+˙ (a) is generated by loss of C₄H₈ from ionized 6,6-dimethyl-2-cyclohexen-1-ol. The heat of formation ΔH_f of [CH₂?CHCH?CHOH]^+˙ was estimated to be 736 kJ mol^?1. The isomeric ion [CH₂?C(OH)CH?CH₂]^+˙ (b) was shown to have ΔH_f, ? 761 kJ mol^?1, 54 kJ mol^?1 less than that of its keto analogue [CH₃COCH?CH₂]^+˙. Ion [CH₂?C(OH)CH?CH₂]^+˙ may be generated by loss of C₂H₄ from ionized hex-1-en-3-one or by loss of C₄H₈ from ionized 4,4-dimethyl-2-cyclohexen-1-ol. The [C₄H₆O]^+˙ ion generated by loss of C₂H₄ from ionized 2-cyclohexen-1-ol was shown to consist of a mixture of the above enol ions by comparing the metastable ion and collisional activation mass spectra of [CH₂?CHCH?CHOH]^+˙ and [CH₂?C(OH)CH?CH₂]^+˙ ions with that of the above daughter ion. It is further concluded that prior to their major fragmentations by loss of CH₃˙ and CO, [CH₂?CHCH?CHOH]⁺˙ and [CH₂?C(OH)CH?CH₂]^+˙ do not rearrange to their keto counterparts. The metastable ion and collisional activation characteristics of the isomeric allenic [C₄H₆O]^+˙ ion [CH₂?C?CHCH₂OH]^+˙ are also reported.     

Rate constants for the elementary reactions between CN radicals and CH4, C2H6, C2H4, C3H6, and C2H2 in the range: 295 ⩽ T/K ⩽ 700

Pulsed laser photolysis, time-resolved laser-induced fluorescence experiments have been carried out on the reactions of CN radicals with CH₄, C₂H₆, C₂H₄, C₃H₆, and C₂H₂. They have yielded rate constants for these five reactions at temperatures between 295 and 700 K. The data for the reactions with methane and ethane have been combined with other recent results and fitted to modified Arrhenius expressions, k(T) = A′(298) (T/298)ⁿ exp(?θ/T), yielding: for CH₄, A′(298) = 7.0 × 10^?13 cm³ molecule^?1 s^?1, n = 2.3, and θ = ?16 K; and for C₂H₆, A′(298) = 5.6 × 10^?12 cm³ molecule^?1 s^?1, n = 1.8, and θ = ?500 K. The rate constants for the reactions with C₂H₄, C₃H₆, and C₂H₂ all decrease monotonically with temperature and have been fitted to expressions of the form, k(T) = k(298) (T/298)ⁿ with k(298) = 2.5 × 10^?10 cm³ molecule^?1 s^?1, n = ?0.24 for CN + C₂H₄; k(298) = 3.4 × 10^?10 cm³ molecule^?1 s^?1, n = ?0.19 for CN + C₃H₆; and k(298) = 2.9 × 10^?10 cm³ molecule^?1 s^?1, n = ?0.53 for CN + C₂H₂. These reactions almost certainly proceed via addition-elimination yielding an unsaturated cyanide and an H-atom. Our kinetic results for reactions of CN are compared with those for reactions of the same hydrocarbons with other simple free radical species. © John Wiley & Sons, Inc.     

A computational study of the radical–radical reaction of O(<Superscript>3</Superscript>P) + C<Subscript>2</Subscript>H<Subscript>5</Subscript> with comparisons to gas-phase kinetics and crossed-beam experiments

We present density functional theory (DFT) and complete basis set (CBS) calculations of the prototypical radical–radical reaction of ground–state atomic oxygen [O(³P)] with ethyl (C₂H₅) radicals. The respective reaction mechanisms and dynamics were investigated on the doublet potential energy surfaces using the DFT method and CBS model. In the title reaction, the barrierless addition of O(³P) to C₂H₅ led to the formation of energy-rich intermediates that underwent subsequent isomerization and decomposition to yield various products. The products predicted to be found were: H₂CO + CH₃, CH₃CHO + H, c–CH₂OCH₂ + H, ^1,3CH₃COH + H, ^1,3HCOH + CH₃, CH₂CHOH + H, C₂H₃ + H₂O, and CH₂CH₂ + OH. In particular, unlike previous kinetic results, proposed to proceed only through the direct H-atom abstraction process, two distinctive pathways to the formation of CH₂CH₂ + OH were predicted to be in competition: direct, barrierless H-atom abstraction mechanism versus addition process. The competition was consistent with the recent crossed-beam investigations, and their microscopic dynamic characteristics are discussed at the molecular level.     

Neutral and ion chemistry in a C2H4-SiH4 discharge

This paper reports on a mass spectrometric study of the neutral and ionic species in a low-pressure rf discharge sustained in a C₂H₄-SiH₄ mixture diluted in helium. It is shown that C₂H₄ is readily decomposed into C₂H ₂ ^* and C₂H₃. The formation of secondary products such as C₄H₂, C₄H₄, and C₄H₆ is observed and confirms the presence of C₂H₂ in the discharge. Methylsilane (CH₃SiH₃) and ethylsilane (C₂H₅SiH₃) are also synthesized in this discharge. It is also observed that the major ions C₂H ₄ ⁺ , C₃H ₅ ⁺ , SiH ₃ ⁺ , Si₂H ₄ ⁺ , SiCH ₃ ⁺ , SiC₂H ₃ ⁺ , and SiC₂H ₇ ⁺ are not representative of the direct ionization of neutral species. Their formation is thus interpreted on the basis of ion-molecule reactions.     

An Analysis of Low Frequency Discharge in a CH3SiCl3-Ar-H2 Mixture by Optical Emission Spectroscopy and Actinometry

Low frequency (100 kHz) discharge in Ar-H₂ and CH₃SiCl₃-Ar-H₂ mixtures was studied to obtain information on the processes involved in plasma deposition of Si_xC_y:H films from CH₃SiCl₃-Ar-H₂ plasma once the properties of Ar-H₂ plasma are known. The plasmas were studied using optical emission spectroscopy. The addition of small amounts of nitrogen to the plasma mixtures also permitted the use of an actinometry technique. First, plasma parameters (electron density and temperature) and actinometric concentrations of atomic hydrogen in an argon–hydrogen plasma were investigated as a function of the hydrogen content in the feed. Second, the emission intensities of Si, Si⁺, CH, H, Ar and Ar⁺ species produced in the CH₃SiCl₃-Ar-H₂ discharge were analysed as a function of time following the introduction of CH₃SiCl₃ (methyltrichlorosilane, MTCS) to the argon–hydrogen plasmas with various proportions of the feed gasses. The results reveal a rapid decay of the Si-excited state number density versus time, while those of Si⁺ and CH fell off more slowly. The emission of atomic silicon was believed to be a result of electron impact dissociative and excitation processes occurring in the bulk of the discharge, whereas the Si⁺ and CH seemed to originate mainly from products of sputtering of the growing film surface. The fragmentation of the MTCS associated with HCl formation and enhanced atomic hydrogen production as a result of HCl dissociation are proposed. Variations in the radical densities of H and CH₃ were determined using an actinometry technique. The results indicate a significant role for H₂ in gas-phase reactions occurring in the CH₃SiCl₃-Ar-H₂ plasma, as well as in gas-surface interactions, leading to competition between deposition and chemical sputtering of already deposited material.     

The role of dissociative attachment from Rydberg states in enhancing H concentration in moderate- and low-pressure H2 plasma sources

A numerical code, recently developed for describing the kinetics of H₂ microwave discharges obtained in diamond deposition plasma reactors, was used to estimate the importance of dissociative attachment from H₂ Rydberg states in enhancing the production of H⁻ in this kind of discharge. It was also used to investigate H⁻ production in multicusp low-pressure magnetic plasmas. Results show that the dissociative attachment from Rydberg states can be as important as the mechanism involving vibrationally excited molecules in both types of plasmas.     

The distonic ions HO+CHCH2C˙H2 and CH3C(O+H)CH2C˙H2

The distonic ions HO⁺?CHCH₂C^˙H₂ (1) and CH₃C(?O⁺H)CH₂C^˙H₂ (2) were directly generated, their decompositions characterized and their appearance energies determined by photoionization. Heats of formation derived from the appearance energies were 757 kJ mol^?1 for 1 and 692 kJ mol^?1 for 2. Deuterium labeling demonstrates that both ions decompose at low energies in the same ways as their isomers with the same skeletal structures, consistent with proposals that 1 and 2 are intermediates in the decompositions of those systems. Surprisingly, the values of the translational energy releases accompanying the formation of CH₃CO⁺ and C₂H₅CO⁺ from 2 appear to be inversely proportional to the available excess energy. The 1,2-H-shift RC(?O⁺H)CH₂C˙H₂ → RC(?O₊H)C˙HCH₃ is compared to the corresponding, non-occurring 1,2-H-shift in alkyl free radicals.     

Thermal Activation of CH4 and H2 as Mediated by the Ruthenium Oxide Cluster Ions [RuOx]+ (x=1–3): On the Influence of Oxidation States

Thermal gas-phase reactions of the ruthenium-oxide clusters [RuO_x]⁺ (x=1–3) with methane and dihydrogen have been explored by using FT-ICR mass spectrometry complemented by high-level quantum chemical calculations. For methane activation, as compared to the previously studied [RuO]⁺/CH₄ couple, the higher oxidized Ru systems give rise to completely different product distributions. [RuO₂]⁺ brings about the generations of [Ru,O,C,H₂]⁺/H₂O, [Ru,O,C]⁺/H₂/H₂O, and [Ru,O,H₂]⁺/CH₂O, whereas [RuO₃]⁺ exhibits a higher selectivity and efficiency in producing formaldehyde and syngas (CO+H₂). Regarding the reactions with H₂, as compared to CH₄, both [RuO]⁺ and [RuO₂]⁺ react similarly inefficiently with oxygen-atom transfer being the main reaction channel; in contrast, [RuO₃]⁺ is inert toward dihydrogen. Theoretical analysis reveals that the reduction of the metal center drives the overall oxidation of methane, whereas the back-bonding orbital interactions between the cluster ions and dihydrogen control the H−H bond activation. Furthermore, the reactivity patterns of [RuO_x]⁺ (x=1–3) with CH₄ and H₂ have been compared with the previously reported results of Group 8 analogues [OsO_x]⁺/CH₄/H₂ (x=1–3) and the [FeO]⁺/H₂ system. The electronic origins for their distinctly different reaction behaviors have been addressed.     

Loss of methyl from [H2CC(OH)?CH3]+˙ ions prepared by electron impact ionization of unstable 2-hydroxypropene

Unstable 2-hydroxpropene was prepared by retro-Diels-Alder decomposition of 5-exo-methyl-5-norbornenol at 800°C/2 × 10^?6 Torr. The ionization energy of 2-hydroxypropene was measured as 8.67±0.05 eV. Formation of [C₂H₃O]⁺ and [CH₃]⁺ ions originating from different parts of the parent ion was examined by means of ¹³C and deuterium labelling. Threshold-energy [H₂C?C(OH)? CH₃]^+˙ ions decompose to CH₃CO⁺+CH₃^˙ with appearance energy AE(CH₃CO⁺) = 11.03 ± 0.03 eV. Higher energy ions also form CH₂?C?OH⁺ + CH₃ with appearance energy AE(CH₂?C?OH⁺) = 12.2–12.3 eV. The fragmentation competes with hydrogen migration between C(1) and C(3) in the parent ion. [C₂H₃O]⁺ ions containing the original methyl group and [CH₃]⁺ ions incorporating the former methylene and the hydroxyl hydrogen atom are formed preferentially, compared with their corresponding counterparts. This behaviour is due to rate-determining isomerization [H₂C?C(OH)? CH₃]^+˙ →[CH₃COCH₃]^+˙, followed by asymmetrical fragmentation of the latter ions. Effects of internal energy and isotope substitution are discussed.     

Neutral counterparts of the C2H7O+ isomers

The neutral counterparts of the C₂H₇O⁺ isomers CH₃O⁺ (H)CH₃, CH₃CH₂OH₂⁺ and $ {\rm C}_2 \,{\rm H}_4 \,\, \cdot \cdot \cdot \mathop {\rm H}\limits^ + \, \cdot \cdot \cdot {\rm OH}_2 $ were studied by neutralization-reionization mass spectrometry. Protonated dimethyl ether and its —O(D)⁺ analogue were produced by protonation (deuteration) of dimethyl ether and also generated as a fragment ion from (labeled) ionized CH₃OCH₂CH(OH)CH₃ by loss of CH₃CO?. It was observed that the dissociation characteristics of the ions and the stability of their neutral counterpart depended on the internal energy of the protonated ether ions. Stable neutral CH₃?(H)CH₃ was only produced from energy-rich ions. The classical protonated ethanol ion CH₃CH₂OH₂⁺ (a) was produced at threshold by the loss of CH₃CO?. from ionized butane-2,3-diol. Mixtures of a with the non-classical ion $ {\rm C}_2 \,{\rm H}_4 \,\, \cdot \cdot \cdot \mathop {\rm H}\limits^ + \, \cdot \cdot \cdot {\rm OH}_2 $ (b) were produced by reaction of C₂H₅⁺ ions with H₂O. As for the protonated ether, only high-energy a and/or b ions yielded stable hypervalent radicals. It is suggested that the stable C₂H₇?O radicals are Rydberg states.     

Rearrangements and fragmentations of [C2H5S]+ ions

[C₂H₅S]⁺ ions (m/e 61) with different initial structures were generated in the mass spectrometer from twelve precursor ions. Abundance ratios of competing metastable ion decompositions were used to determine whether these ions decompose through the same or different reaction channels. It was concluded that all [C₂H₅S]⁺ ions isomerize to a common structure or mixture of structures prior to decomposition in the first field free region. From ¹³C labelling experiments it was concluded that [C₂H₅S]⁺ ions generated from the molecular ions of 2-propanethiol-2-[¹³C], partially rearrange to a symmetrical structure before decomposition to [CHS]⁺ and CH₄, whereas in [C₂H₅S]⁺ ions generated from the the molecular ions of 1,2-bis-(thiomethoxy-[¹³C]) ethane, the two carbon atoms become fully equivalent before CH₄ loss occurs.     

Unimolecular reactions of the isolated immonium ions CH3CH = NH+C4H9, CH3CH2Ch = NH+C4H9 and (CH3)2C = NH+C4H9

The reactions of ten metastable immonium ions of general structure R¹R²C?NH⁺C₄H₉ (R¹ = H, R² = CH₃, C₂H₅; R¹ = R² = CH₃) are reported and discussed. Elimination of C₄H₈ is usually the dominant fragmentation pathway. This process gives rise to a Gaussian metastable peak; it is interpreted in terms of a mechanism involving ion-neutral complexes containing incipient butyl) cations. Metastable immonium ions ontaining an isobutyl group are unique in undergoing a minor amount of imine (R¹R²C?NH) loss. This decomposition route, which also produces a Gaussian metastable peak, decreases in importance as the basicity of the imine increases. The correlation between imine loss and the presence of an isobutyl group is rationalized by the rearrangement of the appropriate ion-neutral complexes in which there are isobutyl cations to the isomeric complexes containing the thermodynamically more stable tert-butyl cations. A sizeable amount of a third reaction, expulsion of C₃H₆, is observed for metastable n-C₄H₉ ⁺NH?CR¹R² ions; in contrast to C₄H₈ and R¹R²C?NH loss, C₃H₆ elimination occurs with a large kinetic energy release (40–48 kJ mol^?1) and is evidenced by a dish-topped metastable peak. This process is explained using a two-step mechanism involving a 1,5-hydride shift, followed by cleavage of the resultant secondary open-chain cations, CH₃CH⁺ CH₂CH₂NHCHR¹R².     

Structure of [C3H5O]+ ions produced from unimolecular decomposition of several [C4H8O]+˙ metastable ions

It is demonstrated by means of collisionally activated decomposition (CAD) that [C₃H₅O]⁺ originating from metastable [C₄H₈O]^+˙ ions are either acylium [C₂H₅CO]⁺ (a) or hydroxycarbenium [CH₂CHCHOH]⁺ (b). Butanone gives exclusively a but 2-methyl-2-propen-1-ol, 2-buten-1-ol, 3-buten-1-ol, butanal and 2-methylpropanal lead to ion b. Both structures a and b are produced from 3-buten-2-ol. These results are discussed in conjunction with experimental and calculated (MINDO/3) thermodynamic data.     

Identification of Fragment Ions by Their Kinetic Energy Gained During Dissociative Ionization by Electron Impact

A technique is described, which supports the plasma mass spectrometry to distinguish possible sources of ion peaks found in the mass spectrum of the neutral gas. The proposed method is based on the measurement of the kinetic energy which the fragment ions gain during dissociative ionization by electron impact inside the ion source of the spectrometer. This approach is of special interest for applications in plasma processes such as plasma assisted deposition or etching techniques where complicated molecules are involved. The principle of the method is demonstrated and discussed for the examination of various fragment ions as CH₃ ⁺, C₂H₂ ⁺, C₂H₃ ⁺, C₂H₅ ⁺ and CH₃O⁺ in the neutral gas spectrum of an 13.56 MHz rf discharge in an Argon-Tetraethoxysilane (TEOS) mixture.     

Kinetics and mechanism for the reactions of H atoms with CH3SH and C2H5SH

A kinetic study of the reactions of H atoms with CH₃SH and C₂H₅SH has been carried out at 298 K by the discharge flow technique with EPR and mass spectrometric analysis of the species. The pressure was 1 torr. It was found: k₁ = (2.20 ± 0.20) × 10^?12 for the reaction H + CH₃SH (1) and k₂ = (2.40 ± 0.16) × 10^?12 for the reaction H + C₂H₅SH (2). Units are cm³ molecule^?1 s^?1. A mass spectrometric analysis of the reaction products and a computer simulation of the reacting systems have shown that reaction (1) proceeds through two mechanisms leading to the formation of CH₃S + H₂ (1a) and CH₃ + H₂S (1b).