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1.
The compounds (a) and (b) have been synthesized, and their reactions with Br2, HBr, HSiCl3 and HSime2Br (me = CH3) are described. The synthesis of (a) and (b) can be achieved by cycloaddition of Hme2Si? CH2? Sime2? CH2? Sime2? C?CH (c). (a) is also formed by cyclisation of (d) and (e) with Li. (d) and (e) can be prepared by ?SiH addition to HC?C? Si? compounds (cat. H2PtCl6 · 6 H2O). With Br2 (a) yields (f). whereas (b) yields the trans compound (g). The subsequent reactions of (f) and (g) with Br2 and their decomposition via β-elimination to (i) (j) are reported. Both (a) and (b) react with HBr to (h), changing the size of the ring in the case of (b). (h) decomposes via β-elimination. HSiCl3 and HSime2Br addition to (a) yields 1,1,2-trisila-ethane derivates. All intermediate compounds of these syntheses and their NMR data are given.  相似文献   

2.
Formation of Organosilicon Compounds. LVIII. Synthesis of a Carbosilane with Propellane Structure 1 (· ? C resp. CH2; x ? Si(CH3)2 resp. Si) is formed by a coupling reaction of BrSi(CH2? Sime2? CH2? Sime2Br)3 2 with CCl4 and Li. The reaction of C6H5me2Si? CH2Li with Clme2Si? CH2Br leads to C6H5me2Si? CH2? Sime2? CH2Br. Metallation with lithium and succeeding reaction with Cl3SiC6H5 produces compound C6H5Si(CH2? Sime2? CH2? Sime2C6H5)3, which than forms 2 by cleavage with bromine.  相似文献   

3.
The synthesis of C6H5me2Si? CH2? Sime2? C?C? Sime2? CH2? Sime2C6H5 (a) is described, which forms Brme2Si? CH2? Sime2? C?C? Sime2? CH2-Sime2Br(b) with HBr. The reaction of (b) with HBr (1–4 moles at ?78°C) yields Brme2Si? CH2? Sime2Br, as well as 1,2-dibromo-ethane (main products) and Brme2Si? CH2/? Sime2CH = CHBr, Brme2Si? CH2? Sime2CH2? CHBr2.  相似文献   

4.
Formation of organosilicon compounds. 84. Synthesis and thermal rearrangement of some substituted linear and cyclic silanes In part IR we report on the synthesis of substituted silanes, and in part II on their thermal rearrangement. I: me3i--Sime3(me = CH3) is formed by dropwise addition of THF to a suspension of Li powder in me3SiCl; yield ~ 80%. The mixture me3Si--Sime2Cl, me3SiCl, Li powder and THF reacts analogously to form me2Si(Sime3)2; yield 80%. By the same type of reaction the following compounds are obtained: compound 1 from Brme2Si? CH2? Sime2Br, 1 from Brme2Si? CH2? Sime2Br, 2 from Brme2Si? Sime2? CH2? Sime2Br 16 and 3 from Bret2Si? CH2? CH2? Siet2Br (et = C2H5). 2 decomposes during its isolation from THF. 16 is formed from phme2Si? Sime2? CH2? Sime2ph 17 (ph = C6H5) by reaction with HBr, 17 either from phme2SiLi and Clme2SiCH2Cl or from phme2Si? Sime2Br and LiCH2? Sime2ph. II: me2Si(Sime3)2 rearranges at 440 °C (56 h) with insertion of the CH2 group (Si? H formation) into the Si? Si bond and the formation of me3Si? Sime2? CH2? Sime2H, me2HSi? CH2? Sime2? CH2? SiHme2, and me3Si? CH2? Sime? CH2? Sime2H. 1 reacts analogously. Methylated halogenated disilanes like Brme2Si? Sime2Br react with separation of: Sime2 and its insertion into the Si-halogen bond to form trisilanes. Different from both are the phenylated derivatives, though phme2Si? Sime2ph still forms phme2Si? Sime2? Sime2ph. 3 reacts with separation of C2H4, formation of the Si? H group and insertion of C2H4 into the Si? Si bond.  相似文献   

5.
me3Si? CCl2?Sime2Cl (me ? CH3) läßt sich mit n-buLi (bu ? C4H9) bei–100°C (Lösungsmittel THF/Äther) in me3Si? CCl(Li)? Sime2Cl a überführen. das mit meJ me3Si? CClme? Sime2Cl bildet. Wird a in Abwesenheit eines Abfangreagenzes langsam erwärmt, so bildet sich unter Abspaltung von LiCl (Cl aus der SiCl-Gruppe) über eine reaktive Zwischenstufe des Bicyclobutans b . Die Struktur von b ist durch NMR-Untersuchung, Röntgenstrukturanalyse und Abbaureaktionen gesichert. Mit HBr bzw. CH3OH werden die Si? C-Bindungen der Dreiringe in b gespalten, so daß sich me3Si? CH2? C(Sime2X)2Sime3 (X ? Br, OCH3) bildet. Formation of Organosilicon Compounds. 85. Formation, Reactions, and Structure of 1,1,3,3-Tetramethyl-2,4-bis(trimethylsilyl)-1,3-disilabicyclo[1, 1, 0]butane me3Si? CCl2? Sime2Cl (me ? CH3) with n-buLi (bu ? C4H9) at –100°C (solvent: THF/ether) yields me3Si? CCl(Li)? Sime2Cl a , which forms me3Si? CClme? Sime2Cl with meI. By warming a slowly in absence of any trapping reagent the bicyclobutane b is obtained via a reactive intermediate under elimination of LiCl (Cl from the SiCl group). The structure of b is established by nmr investigations, X-ray structure determination and chemical derivatisation.  相似文献   

6.
Formation of Organosilicon Compounds. 88. SiH-Addition of 1,3,5-Trisilacyclohexanes to Silylalkynes Catalyzed by means of H2PtCl6 the SiH addition of 1,1,3,3,5-pentamethyl-1,3,5-trisilacyclohexane to HC?C? Sime2CH2Cl, and of 1,1,3,3,5-pentaphenyl-1,3,5-trisilacyclohexane to HC?C? Sime2CH2Br yields a and b , or c and d , resp. (Formulae see Inhaltsübersicht), whereas 1,3,5-trisilacyclohexanes with more SiH groups preferrably yield polymers. The c/d ratio is strongly governed by the solvent: 38% c in n-hexane, 72% c in CCl4/cyclohexane. Treatment of c and d with HCl/AlCl3 under cleavage of all of the phenyl groups, addition of HCl to the vinyl group and subsequent β-elimination leads to (Cl2Si? CH2)3 ClSime2? CH2Br and compound e , whereas HBr at ?78°C only cleaves one phenyl group per Si atom.  相似文献   

7.
Formation of Organosilicon Compounds. 89. Selective Photobromination of Si-methylated Carbosilanes A selective photobromination of the C atoms in the skeleton of Si-methylated carbosilanes is reported. (me3Si? CH2)2Sime2 reacts to me3Si? CBr2? Sime2? CH2? Sime3 in good yields (me = CH3); the second CH2 group is considerably slower brominated. Photobromination of (me2Si? CH2)3 consecutively yields a and b . Also from (me2Si? CH2)4 the derivative with one CBr2 group is accessible. Bromination of tertiary CH groups is highly preferred; this is shown by the selective formation of c . The C-bromination of SiBr-substituted carbosilanes is significantly more difficult; nevertheless (Brme2Si)2CH2 selectively forms (Brme2Si)2CBr2. Brme2Si? CH2? Sime2? CH2? Sime3 forms Brme2Si? CH2? Sime2? CBr2? Sime3, i. e., only the CH2 group non-adjacent to SiBr is attacked. The formation of CHBr groups could not be detected. Higher temperatures and longer reaction times increase the formation of polymers.  相似文献   

8.
Formation of Organosilicon Compounds. 86. Si-phenyl and Si-butyl Substituted 1,3,5-Trisilacyclohexanes By treating (BrHSi? CH2)3 with phMgBr or t-buLi, resp., and subsequent separation of the isomers, the pure cis-cis substituted 1,3,5-trisilacyclohexanes I are accessible which yield II (Formula see Inhaltsübersicht) by reaction with Br2. (F2Si? CH2)3 8 can be transferred into (ph2Si? CH2)3 7 with phLi. With HCl/AlCl3 7 forms (Cl2Si? CH2)3, whereas even with an excess of Br2 it only yields (phBrSi? CH2)3. Cleavage of 7 with one equivalent of Br2 yields (H2C? Si)3ph5Br 14, which with LiAlH4 forms (H2C? Si)3ph5H 10. 10 is not so easy to obtain via (H2C? Si)3ph5F 9 from the reaction of 8 with 5 equivalents of phLi. All of the SiH and SiBr groups in I and II, resp., occupy axial positions as well as the Br atom in 14 the H atom at Si in 10 and the F atom in 9.  相似文献   

9.
Crystal Structure of (PPh4)2[Mo2(O2C? Ph)4Br2] · 2 CH2Br2 The title compound, prepared by the reaction of Mo2(O2C? Ph)4 with PPh4Br and PPh4N3, respectively, under the assistance of CH2Br2, was characterized by an X-ray structure determination. Space group P21/n, Z = 2, R = 0.074 (5261 independent observed reflexions). The lattice dimensions are at ?70°C: a = 1562.9, b = 1406.2, c = 1662.1 pm, β = 94.11°. the compound consists of PPh4 ions, CH2Br2 molecules, and centrosymmetric anions [Mo2(O2C? Ph)4Br2]2?. The axis Br? Mo?Mo–Br is nearly linear (bond angle 175.6°) with bond lengths MoMo = 212.3 pm and Mo? Br = 303 pm, corresponding with a weak electrostatic Mo? Br bond. In the FIR spectrum the Mobr stretching vibration is found at 85 cm?1, which corresponds with the low value of the force constant of 0.24 N · cm?1.  相似文献   

10.
Formation of Organosilicon Compounds. LVI. Reactions of Si- and C-Chlorinated 1,3,5-Trisilapentanes with CH3MgCl (Cl3Si? CCl2)2SiCl2 (1) reacts with an excess of meMgCl (me = CH3) forming me3Si? C?C? Sime3 (2), Sime4, H2C?C(Sime3)[CH(Sime3)2] (3) as main products and (me3Si)2C? CH(Sime3) and as by-products. The cleavage reaction of (1) to (2) and (3) does not occur when the meMgCl-concentration is lowered. The reaction is started by the formation of a GRIGNARD reagent at a CCl-group in compound (1). Cl3Si? CCl2? SiCl2? CH2? SiCl3 forms with ; me3Si? CCl2? SiCl2? CHCl? SiCl3 forms (me3Si)2C?CH(Sime3). A reaction sequence is given.  相似文献   

11.
The Formation of Disilylphosphino-Element Compounds of C, Si, P The reactions of (me3Si)2PLi · OR2 a (OR2 = 1 monoglyme or 2 THF; me = CH3) with CH3Cl, CH2Cl2, ClCH2CH2Cl and ClCH2? C6H5 give the compounds (me3Si)2Pme, (me3Si)2P? CH2? P(Sime3)2, (me3Si)2P? CH2CH2Cl, (me3Si)2P? CH2CH2? P(Sime3)2 and (me3Si)2P? CH2C6H5 respectively. In the same manner a reacts with me2SiCl2 in a molar ratio 1:1 to (me3Si)2P? Sime2Cl and in a molar ratio 2:1 to (me3Si)2P? Sime2? P(Sime3)2 b . The compound b decomposes to [me3SiP? Sime2]2 and (me3Si)3P at 220°C. In the reactions of a with ClP(C6H5)2 and ClPme2 the compounds (me3Si)2P? P(C6H5)2 and (me3Si)2P? Pme2, respectively, are obtained. a reacts with HgCl2 to (me3Si)2P? P(Sime3)2. (me3Si)3P can be cleaved with ClP(C6H5)2 and ClPme2 yielding (me3Si)2P? P(C6H5)2 and (me3Si)2P? Pme2, respectively. The 1H- and 31P-n.m.r. and mass spectroscopic data are reported.  相似文献   

12.
Formation of Organosilicon Compounds. 74. Synthesis and NMR-Spectra of Si-methylated and -chlorinated 2,2-Dichloro-1,3-disilapropanes and 2-Methyl-2-chloro-1,3-disilapropanes The compounds me3Si? CCl2? SimenCl3?n (n = 1–3; me = CH3) are synthesized by reaction of me3Si? CCl2Li (formed from me3Si? CCl2H with n-buLi, bu = butyl) with the appropriate methylchlorosilanes. The compounds Clme2Si? CCl2? SimenCl3?n are obtained by analogous reactions of (C6H5)me2Si? CCl2Li, cleavage of the Si-phenyl group with bromine and conversion of the Si? Br to the Si? Cl group with HCl in PCl3. The 2-methyl-2-chloro-1,3-disilapropanes are synthesized by lithination of the CCl2 group of 2,2-dichloro-1,3-disilapropanes, followed by reaction with meI. (Clme2Si)2CmeCl is obtained from (C6H5me2Si)2CCl2 by reaction with n-buLi to (C6H5me2Si)2 CClLi, which forms (C6H5me2Si)CClme with meI. Cleavage with bromine to (Brme2Si)2CClme and reaction with HCl/PCl3 leads to the expected compound. The influence of the substitution on the 1H, 13C and 29Si NMR spectra is investigated.  相似文献   

13.
The analytical potential of negative ion chemical ionization (NICI) mass spectrometry utilizing dibromodifluoro-methane (CF2Br2) and iodomethane (CH3I)/methane (CH4) as reagent gases is examined. The NICI mass spectrum of CF2Br2 contains Br?, [HBr2]? and [CF2Br3]? anions. Weak acids (i.e. those acids with approximately ΔH°(acid) values between 1674 and 1464 kJ mol?1) react with Br? to produce minor yields of the hydrogen?bonded bromide attachment [MH + Br]? anion or are unreactive. Strong acids (i.e. those acids with approximately ΔH°(acid) > 1464 kJ mol?1) produce primarily [MH + Br]? anions with a minor yield of proton transfer [M ? H]? anion. The NICI spectrum of CH3I/CH4 is dominated by I?. Weak acids react with I? to yield minor amounts of [MH + 1]? or are unreactive. Strong acids produce only [MH + l]? anions. From a consideration of the gas-phase basicity of the halide anion and the binding energy of the hydrogen-bonded halide attachment adduct, thermochemical data are used as a potential guide to rationalize or predict the ions observed in NICI mass spectra.  相似文献   

14.
Formation of Organosilicon Compounds. 66. (H2Si? CH2)2 and Si-substituted Derivatives (H2Si? CH2)2 1 is formed in the reaction of (Cl2Si? CH2)2 with LiAlH4. In 1 , the halogenation of the SiH bond is so much preferred compared to the ring cleavage reaction, that 1 reacts with Cl2 or Br2 to form successively all compounds form 1-monochlor-1,3-disilacyclobutane to (X2Si? CH2)2 (X = Cl, Br). The stability of the 1,3-disilacyclobutane skeleton towards HBr or Br2 increases as the electronegativity of the Si-substituents increases. Thus, (Cl2Si? CH2)2 is cleaved neither by HBr nor by Br2, whereas e. g. [H(C6H5)Si? CH2]2 reacts to [Br(C6H5)Si? CH2]2 with Br2, but yields meH(C6H5)Si? CH2? SiBr(C6H5)H (me = CH3) with HBr. In [me(C6H5)Si? CH2]2, the four-membered ring is cleaved by Br2 as well as by HBr. The 1H-, 29Si- and 13C-n.m.r. data are reported.  相似文献   

15.
(CH3)2SBr2 – Reactions and Structures (CH3)2SBr2 ( 1 ) is a donor acceptor complex (8-S-3 + 10-Br-2) which reacts with (CH3)2S(?O)NSi(CH3)3 to yield [(CH3)2S(O)?N? S(CH3)2]+Br? ( 2 ). With SbBr3 (CH3)2SBr+SbBr4? ( 3 ) can be isolated. 1 crystallizes monoclinic in the space group P21/c with a = 733.8, b = 734.2, c = 1132.7 pm, β = 92.8° and Z = 4. 2 crystallizes in the orthorhombic space group Pnma with a = 967.2, b = 793.3, c = 1168.3 pm and Z = 4. The SBr and BrBr force constants of 1 are compared with those of S2Br2, 3 and Br2 resp. The nmr and mass spectra of 1 and 2 are communicated.  相似文献   

16.
Formation of Organosilicon Compounds. 70. Reactions of Si-fluorinated 1,3,5-Trisilapentanes with CH3MgCl and LiCH3 F3Si? CCl2? SiF2? CH2? SiF3 3 reacts with meMgCl. (me = Ch3 starting with a Si-methylation and not with a C-metallation as in the corresponding Si- and C-chlorinated compounds, e. g. (Cl3Si? CCl2)2SiCl2 [2]. A CCl-hydrogenation is observed too, which in the case of F3Si? CCl2? SiF2? CHCl? SiF3 4 gives meS3Si? CCl2? Sime2? CH2? Sime3. (F3Si? CCl2)2 5 reacts with meMgCl to form preferentially 1,2-Disilapropanes by cleaving a Si? Cbond. The isolation of F3Si? CCl2H and meF2Si? CCl2? SiF2me allows to locate the bond where 5 is cleaved at the beginning of the reaction. With meLi 5 reacts to form mainly me3Si? C?C? Sime3, showing that in the reaction of meLi, being a stronger reagent than meMgCl, and 5 a C-metallation occurs, following the same mechanism as in the reaction with (Cl3Si? CCl2)2)SiCl2 [2]. The reaction conditions for the synthesis of Si-fluroinated and C-chlorinated 1,3,5-Trisilapentanes in a 0.1 mol scale are reported. N.m.r. data of all investigated compounds are tabulated.  相似文献   

17.
Formation of Organosilicon Compounds. 67. Studies of Metallorganic Synthesis of Si-methylated and C-chlorinated Carbosilanes Using Chlorocarbenoids Synthesis and reactions of C6H5me2Si? CCl2H (A), (H5C6me2Si)2CCl2 (B), and me2Si(CCl2H)2 (C) were investigated in order to find conditions for the synthesis of C-functional carbosilanes via chlorocarbenoids. (A) and (B) react with n-butyl-Li(buLi) (?100°C/THF/ether/pentane) yielding H5C6me2Si? CCl2Li and (H5C6me2Si)CClLi, respectively. These lithium reagents form (B) and(H5C6me2Si)3CCl with H5C6me2SiCl. In the reaction of (H5C6me2Si)3CCl with lithium (H5C6me2Si)3CLi (D) is obtained. (D) forms with H2O/HCl the compound (H5C6me2Si)3CH which is cleaved by HBr yielding (Brme2Si)3CH. (C) gives LiCCl2? Sime2(CCl2H) with buLi (molar ratio 1:1) in a low temperature reaction. Clme2Si? CCl2? Sime2(CCl2H) is formed in the reaction of LiCCl2? Sime2? CCl2H with Sime2CCl2 (yield >90%). Reacting (C) and buLi (1:3) and treating this solution with Sime2CI2 gives (ClSime2)2C?CH Sime2Cl (>85%) via a monosilacyclopropane intermediate. In the inverse reaction, if (C) is added to buLi, (HCCl2)me2SiC?Sime2(CCl2H) is one of the isolated reaction products. If buLi is added to (C) (2:l) and this solution is treated with Sime3Cl, compounds me3Si? CCL2? Sime2? CCL2H, me3Si? CClH? Sime2(CCl2H), (me3Si? CC12)2Sime2, me3Si? CHCI? Sime2? CC12? Sime3 are isolated. The same products were obtained in the reaction of me3Si? CCl2? Sime2? CCl2H with buLi and me3SiCl.  相似文献   

18.
The nature of halogen bonding is examined via experimental and computational characterizations of a series of associates between electrophilic bromocarbons R? Br (R? Br=CBr3F, CBr3NO2, CBr3COCBr3, CBr3CONH2, CBr3CN, etc.) and bromide anions. The [R? Br, Br?] complexes show intense absorption bands in the 200–350 nm range which follow the same Mulliken correlation as those observed for the charge‐transfer associates of bromide anions with common organic π‐acceptors. For a wide range of the associates, intermolecular R? Br???Br? separations decrease and intramolecular C? Br bond lengths increase proportionally to the Br?→R? Br charge transfer; and the energies of R? Br???Br? bonds are correlated with the linear combination of orbital (charge‐transfer) and electrostatic interactions. On the whole, spectral, structural and thermodynamic characteristics of the [R? Br, Br?] complexes indicate that besides electrostatics, the orbital (charge‐transfer) interactions play a vital role in the R? Br???Br? halogen bonding. This indicates that in addition to controlling the geometries of supramolecular assemblies, halogen bonding leads to electronic coupling between interacting species, and thus affects reactivity of halogenated molecules, as well as conducting and magnetic properties of their solid‐state materials.  相似文献   

19.
Based on an FTIR-product study of the photolysis of mixtures containing Br2? CH3CHO and Br2? CH3CHO? HCHO in 700 torr of N2, the rate constant for the reaction Br + CH3CHO → HBr + CH3CO was determined to be 3.7 × 10?12 cm3 molecule?1 s?1. In addition, the selective photochemical generation of Br at λ > 400 nm in mixtures containing Br2? CH3CHO? 14NO2 (or 15NO2)? O2 was shown to serve as a quantitative preparation method for the corresponding nitrogen-isotope labeled CH3C(O)OONO2 (PAN). From the dark-decay rates of 15N-labeled PAN in large excess 14NO2, the rate constant for the unimolecular reaction CH3C(O)OO15NO2 → CH3C(O)OO + 15NO2 was measured to be 3.3 (±0.2) × 10?4 s?1 at 297 ± 0.5 K.  相似文献   

20.
The crystal packing of the title compound, C8H11BrN+·Br?, involves three types of secondary interaction: a classical N—H?Br? hydrogen bond, a `weak' but short C—H?Br? interaction (normalized H?Br distance of 2.66 Å) and a cation–anion Br?Br contact of 3.6331 (4) Å. The hydrogen bonds connect two cations and two anions to form rings of graph set R(14). The Br?Br contacts link these rings to form layers parallel to the bc plane.  相似文献   

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