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1.
The effect of bromine methanol (BM) etching and NH4F/H2O2 passivation on the Schottky barrier height between Au contact and semi-insulated (SI) p-Cd1−xZnxTe (x ≈ 0.09-0.18) was studied through current-voltage (I-V) and capacitance-voltage (C-V) measurements. Near-infrared (NIR) spectroscopy technique was utilized to determine the Zn concentration. X-ray photoelectron spectroscopy (XPS) for surface composition analysis showed that BM etched sample surface left a Te0-rich layer, however, which was oxidized to TeO2 and the surface [Te]/([Cd] + [Zn]) ratio restored near-stoichiometry after NH4F/H2O2 passivation. According to I-V measurement, barrier height was 0.80 ± 0.02-0.85 ± 0.02 eV for Au/p-Cd1−xZnxTe with BM etching, however, it increased to 0.89 ± 0.02-0.93 ± 0.02 eV with NH4F/H2O2 passivation. Correspondingly, it was about 1.34 ± 0.02-1.43 ± 0.02 eV and 1.41 ± 0.02-1.51 ± 0.02 eV by C-V method.  相似文献   

2.
We synthesized the Mn-doped Mg(In2−xMnx)O4 oxides with 0.03?x?0.55 using a solid-state reaction method. The X-ray diffraction patterns of the samples were in a good agreement with that of a distorted orthorhombic spinel phase. Their lattice parameters and unit-cell volumes decrease with x due to the substitution of the smaller Mn3+ ions to the larger In3+ ions. The undoped MgIn2O4 oxide presents diamagnetic signals for 5 K?T?300 K. The M(H) at T=300 K reveals a fairly negative-sloped linear relationship. Neither magnetic hysteresis nor saturation behavior was observed in this parent sample. For the Mn-doped samples, however, positive magnetization were observed between 5 and 300 K even if the x value is as low as 0.03. The mass susceptibility enhances with Mn content and it reaches the highest value of 1.4×10−3 emu/g Oe (at T=300 K) at x=0.45. Furthermore, the Mn-doped oxides with x=0.06 and 0.2, respectively, exhibit nonlinear magnetization curves and small hysteretic loops in low magnetic fields. Susceptibilities of the Mn-doped samples are much higher than those of MnO2, Mn2O3 oxides, and Mn metals. These results show that the oxides have potential to be magnetic semiconductors.  相似文献   

3.
Transmission and reflection measurements in the wavelength region 450-1100 nm were carried out on Tl4In3GaS8-layered single crystals. The analysis of the room temperature absorption data revealed the presence of both optical indirect and direct transitions with band gap energies of 2.32 and 2.52 eV, respectively. The rate of change of the indirect band gap with temperature dEgi/dT=-6.0×10−4 eV/K was determined from transmission measurements in the temperature range of 10-300 K. The absolute zero value of the band gap energy was obtained as Egi(0)=2.44 eV. The dispersion of the refractive index is discussed in terms of the Wemple-DiDomenico single-effective-oscillator model. The refractive index dispersion parameters: oscillator energy, dispersion energy, oscillator strength and zero-frequency refractive index were found to be 4.87 eV, 26.77 eV, 8.48×1013 m−2 and 2.55, respectively.  相似文献   

4.
In order to observe the effect of intra-band gap excitation on the photoluminescence (PL) properties of undoped InP and iron doped InP (InP:Fe), PL measurements were performed in InP crystals with thickness of 360 μm and area of about 4×3 mm2, grown by the liquid encapsulated Czochralski (LEC) technique upon excitation with both Ar-ion laser and 980 nm light. The PL intensities for InP:Fe under 980 nm wavelength light illumination relative to no illumination increased by about 52%, 33%, and 12% for the 1.337, 1.380, and 1.416 eV peaks, respectively, at 10 K, whereas there was no illumination effect for undoped InP. This is a strong indication that Fe centers play a role as non-radiative recombination centers to decrease the PL intensity. PL experiments were performed in the spectral range of 1320-1440 meV for InP in the sample temperature range of 10-160 K. The electron and hole photoionization cross-sections at 980 nm wavelength light illumination were calculated as and , respectively.  相似文献   

5.
Temperature dependent current-voltage (I-V) and capacitance-voltage (C-V) measurements have been performed on Pd/ZnO Schottky barrier diodes in the range 60-300 K. The room temperature values for the zero bias barrier height from the I-V measurements (ΦI-V) was found to be 0.52 eV and from the C-V measurements (ΦC-V) as 3.83 eV. From the temperature dependence of forward bias I-V, the barrier height was observed to increase with temperature, a trend that disagrees with the negative temperature coefficient for semiconductor material. The C-V barrier height decreases with temperature, a trend that is in agreement with the negative temperature coefficient of semiconductor material. This has enabled us to fit two curves in two regions (60-120 K and 140-300 K). We have attributed this behaviour to a defect observed by DLTS with energy level 0.31 eV below the conduction band and defect concentration of between 4×1016 and 6×1016 cm−3 that traps carriers, influencing the determination of the barrier height.  相似文献   

6.
Characteristics of two green emission bands, G(I) and G(II), and their origin were investigated within 0.4-300 K under photoexcitation in the 3.4-6.0 eV energy range for undoped and Mo6+-, Mo6+ , Y3+-, Mo6+, Nb5+-, Mo6+, Ce3+-, Cr6+-, La3+-, Ba2+- and Cd2+-doped PbWO4 crystals with different concentrations of impurity and intrinsic defects, grown by different methods and annealed at different conditions. The G(I) emission band, observed at low temperatures, located around 2.3-2.4 eV and excited around 3.9 eV, is usually a superposition of many closely positioned bands. The G(I) emission of undoped crystals is assumed to arise from the WO42− groups located in the crystal regions of lead-deficient structure. In Mo6+-doped crystals, this emission arises mainly from the MoO42− groups themselves. The G(II) emission band located at 2.5 eV is observed only in the crystals, containing the isolated oxygen vacancies — WO3 groups. This emission appears at T>160 K under excitation around 4.07 eV as a result of the photo-thermally stimulated disintegration of localized exciton states and subsequent recombination of the produced electron and hole centres near WO3 groups. The G(II) emission accompanies also thermally stimulated recombination processes in PbWO4 crystals above 150 K. Mainly the G(II) emission is responsible for the slow decay of the green luminescence in PbWO4 crystals.  相似文献   

7.
High-quality LaCuO2, elaborated by solid-state reaction in sealed tube, crystallizes in the delafossite structure. The thermal analysis under reducing atmosphere (H2/N2: 1/9) revealed a stoichiometric composition LaCuO2.00. The oxide is a direct band-gap semiconductor with a forbidden band of 2.77 eV. The magnetic susceptibility follows a Curie-Weiss law from which a Cu2+ concentration of 1% has been determined. The oxygen insertion in the layered crystal lattice induces p-type conductivity. The electrical conduction occurs predominantly by small polaron hopping between mixed valences Cu+/2+ with an activation energy of 0.28 eV and a hole mobility (μ300 K=3.5×10−7 cm2 V−1 s−1), thermally activated. Most holes are trapped in surface-polaron states upon gap excitation. The photoelectrochemical study, reported for the first time, confirms the p-type conduction. The flat band potential (Vfb=0.15 VSCE) and the hole density (NA=5.8×1017 cm−3) were determined, respectively, by extrapolating the curve C−2 versus the potential to their intersection with C−2=0 and from the slope of the linear part in the Mott-Schottky plot. The valence band is made up of Cu-3d orbital, positioned at 4.9 eV below vacuum. An energy band diagram has been established predicting the possibility of the oxide to be used as hydrogen photocathode.  相似文献   

8.
The absorption edge of undoped Tl2Ga2S3Se crystals have been studied through transmission and reflection measurements in the wavelength range 440–1100 nm and in the temperature range 10–300 K. The absorption edge was observed to shift toward lower energy values with increasing temperature. As a result, the rate of the indirect band gap variation with temperature γ=−2.6×10−4 eV/K and the absolute zero value of the band gap energy Egi(0)=2.42 eV were obtained.  相似文献   

9.
EPR probed the zincblende (γ) to cubic (α) AgI structural phase transition in AgI at 423 K through two intrinsic paramagnetic centers: an Ag2+-based hole center (signal ‘A’) and an Ag0-based conduction electron center (signal ‘B’) associated with AgI nanocrystallites. Sudden drops in intensity (IPP), <g>, and ΔHPP observed at 423 K for pure AgI nanocrystals. Addition of Cu in AgI increases the thermal stability of the cation sublattice as seen from the increase in the transition temperature from 423 K (undoped AgI) to 453 K. Abrupt jumps in the number of spins (N) and reciprocal susceptibility (1/χ) observed at increased phase transition temperatures in Cu-substituted AgI relative to that in undoped AgI reflects progressively strengthened local bonding configuration of γ-AgI structure induced by Cu.  相似文献   

10.
A new compound, K4(SO4)(HSO4)2(H3AsO4) was synthesized from water solution of KHSO4/K3H(SO4)2/H3AsO4. This compound crystallizes in the triclinic system with space group P1¯ and cell parameters: a=8.9076(2) Å, b=10.1258(2) Å, c=10.6785(3) Å; α=72.5250(14)°, β=66.3990(13)°, γ=65.5159(13)°, V=792.74(3) Å3, Z=2 and ρcal=2.466 g cm−3. The refinement of 3760 observed reflections (I>2σ(I)) leads to R1=0.0394 and wR2=0.0755. The structure is characterized by SO42−, HSO4 and H3AsO4 tetrahedra connected by hydrogen bridge to form two types of dimer (H(16)S(3)O4?S(1)O42− and H(12)S(2)O4?H3AsO4). These dimers are interconnected along the [1¯ 1 0] direction by the hydrogen bonds O(3)-H(3)?O(6). They are also linked by the hydrogen bridge assured by the hydrogen atoms H(2), H(3) and H(4) of the H3AsO4 group to build the chain S(1)O4?H3AsO4 which are parallel to the “a” direction. The potassium cations are coordinated by eight oxygen atoms with K-O distance ranging from 2.678(2) to 3.354(2) Å.Crystals of K4(SO4)(HSO4)2(H3AsO4) undergo one endothermic peak at 436 K. This transition detected by differential scanning calorimetry (DSC) is also analyzed by dielectric and conductivity measurements using the impedance spectroscopy techniques. The obtained results show that this transition is protonic by nature.  相似文献   

11.
The compounds [3,3-(CO)2-3-NO-closo-3,1,2-ReC2B9H11] and [NEt4][3,3,3-(CO)3-8-I-closo-3,1,2-ReC2B9H10] have been shown to be emissive in MeTHF at 77 K, with λmax in the blue region of the visible spectrum. Emission from [3,3,3-(CO)3-8-I-closo-3,1,2-ReC2B9H10]-, which has been structurally characterized, is phosphorescent with a single exponential decay lifetime, τ=1.65 ms. The complex [3,3-(CO)2-3-NO-closo-3,1,2-ReC2B9H11] also emits in the solid state at 298 K and has been shown by diffuse-reflectance UV-vis measurement to have a band gap of 2.66 eV.  相似文献   

12.
An infrared absorption study of the Zn vacancy passivated by two hydrogen atoms (VZnH2) is reported. The ground state of the defect VZnH2 consists of the inequivalent O–H bonds, which are aligned parallel and perpendicular to the c-axis, respectively. A metastable state of the defect was detected with two equivalent O–H bonds oriented perpendicular to the c-axis (VZnH2?). VZnH2? has two local vibration modes at 3329.0 and 3348.4 cm−1 which are the antisymmetric and symmetric combinations of the two O–H stretch modes. The metastable state of the defect is 75±9 meV above the ground state of VZnH2. An activation energy of 0.96±0.12 eV for the transition from metastable to the ground state was determined.  相似文献   

13.
The transport properties of Sr0.98La0.02SnO3−δ in the system Sr1−xLaxSnO3−δ, after which the pyrochlore La2Sn2O7 appears, were investigated over the temperature range 4.2-300 K. The oxide was found to be n-type semiconductor with concomitant reduction of Sn4+ into Sn2+. The magnetic susceptibility was measured down to 4.2 K and is less than 3×10−5 emu cgs mol−1 consistent with itinerant electron behavior. The electron is believed to travel in a narrow band of Sn:5s character with an effective mass ∼4 mo. The highest band gap is 4.32 eV and the optical transition is directly allowed. A further indirect transition occurs at 4.04 eV. The electrical conductivity follows an Arrhenius-type law with a thermal activation of 40 meV and occurs by small polaron hopping between nominal states Sn4+/2+. The linear increase of thermo-power with temperature yields an electron mobility μ300 K (2×10−4 cm2 V−1 s−1) thermally activated. The insulating-metal transition seems to be of Anderson type resulting from random positions of lanthanum sites and oxygen vacancies. At low temperatures, the conduction mechanism changes to a variable range hopping with a linear plot Ln ρ−1 vs. T−4. The photo electrochemical (PEC) measurements confirm the n-type conductivity and give an onset potential of −0.46 VSCE in KOH (1 M). The Mott-Schottky plot C−2-V shows a linear behavior from which the flat band potential Vfb=+0.01 VSCE at pH 7 and the doping density ND=1.04×1021 cm−3 were determined.  相似文献   

14.
The electronic structures and absorption spectra for both the perfect PbWO4 (PWO) crystal and the three types of PWO crystals, containing VPb2−, VO2+ and a pair of VPb2−-VO2+, respectively, have been calculated using CASTEP codes with the lattice structure optimized. The calculated absorption spectra indicate that the perfect PWO crystal does not occur absorption band in the visible and near-ultraviolet region. The absorption spectra of the PWO crystal containing VPb2− exhibit seven peaks located at 1.72 eV (720 nm), 2.16 eV (570 nm), 2.81 eV (440 nm), 3.01 eV (410 nm), 3.36 eV (365 nm), 3.70 eV (335 nm) and 4.0 eV (310 nm), respectively. The absorption spectra of the PWO crystal containing VO2+ occur two peaks located at 370 nm and 420 nm. The PWO crystal containing a pair of VPb2−-VO2+ does not occur absorption band in the visible and near-ultraviolet region. This leads to the conclusions that the 370 and 420 nm absorption bands are related to the existence of both VPb2− and VO2+ in the PWO crystal and the other absorption bands are related to the existence of the VPb2− in the PWO crystal. The existence of the pair of VPb2−-VO2+ has no visible effects on the optical properties. The calculated polarized optical properties are well consistent with the experimental results.  相似文献   

15.
Both single-barrier magnetic tunnel junctions (SBMTJs) and double-barrier magnetic tunnel junctions (DBMTJs) with an amorphous hardcore structure of Co60Fe20B20/Al–O/Co60Fe20B20 were microfabricated. A high TMR ratio of 102.2% at 4.2 K was observed in the SBMTJs after annealing at 265 °C for 1 h. High TMR ratio of 56.2%, low junction resistance-area product RS of 4.6 kΩ μm2, small coercivity HC=25 Oe, and relatively large bias-voltage-at-half-maximum TMR with the value V1/2 greater than 500 mV at room temperature (RT) had been achieved in such Co–Fe–B SBMTJs. Whereas, high TMR ratio of 60% at RT and 89% at 30 K, low junction resistance-area product RS of 7.8 kΩ μm2 at RT and 8.3 kΩ μm2 at 30 K, low coercivity HC=8.5 Oe at RT and HC=14 Oe at 30 K, and relatively large bias-voltage-at-half-maximum TMR with the value V1/2 greater than 1150 mV at RT had been achieved in the Co–Fe–B DBMTJs. Temperature dependence of the TMR ratio, resistance, and coercivity from 4.2 K to RT, and applied voltage dependence of the TMR ratio and resistance at RT for such amorphous MTJs were also investigated.  相似文献   

16.
In this work we have investigated the dependence of optical and electrical properties of RF sputtered undoped a-Si:H films and B or P doped a-Si:H films on hydrogen flow rate (FH). Low deposition temperature of 95 °C was used, a process compatible with low-cost plastic substrates. FTIR spectroscopy and ESR measurements were used for the investigation of Si-Hx bonding configurations, and concentrations of hydrogen and dangling bonds. We found that there is a strong correlation between the total hydrogen concentration, the dangling bonds density and the optoelectronic properties of the films. The best photosensitivity value was found to be 1.4 × 104 for the undoped films. The dark conductivity (σD) of the doped layers varied from 5.9 × 10−8 to 6.5 × 10−6 (Ω cm)−1 for different ratios FAr/FH. These variations are attributed to both the different B and P concentrations in the films (according to SIMS measurements) and the enhanced disorder of the films introduced by the large number of inactive impurities. The B doping efficiency is lower compared to the P one. A small photovoltaic effect is also observed in n-i-p solar cells fabricated on polyimide (PI) substrates having ITO as antireflective coating, with an efficiency of 1.54%.  相似文献   

17.
A high-quality ferromagnetic GaMnN (Mn=2.8 at%) film was deposited onto a GaN buffer/Al2O3(0 0 0 1) at 885 °C using the metal-organic chemical vapor deposition (MOCVD) process. The GaMnN film shows a highly c-axis-oriented hexagonal wurtzite structure, implying that Mn doping into GaN does not influence the crystallinity of the film. No Mn-related secondary phases were found in the GaMnN film by means of a high-flux X-ray diffraction analysis. The composition profiles of Ga, Mn, and N maintain nearly constant levels in depth profiles of the GaMnN film. The binding energy peak of the Mn 2p3/2 orbital was observed at 642.3 eV corresponding to the Mn (III) oxidation state of MnN. The presence of metallic Mn clusters (binding energy: 640.9 eV) in the GaMnN film was excluded. A broad yellow emission around 2.2 eV as well as a relatively weak near-band-edge emission at 3.39 eV was observed in a Mn-doped GaN film, while the undoped GaN film only shows a near-band-edge emission at 3.37 eV. The Mn-doped GaN film showed n-type semiconducting characteristics; the electron carrier concentration was 1.2×1021/cm3 and the resistivity was 3.9×10−3 Ω cm. Ferromagnetic hysteresis loops were observed at 300 K with a magnetic field parallel and perpendicular to the ab plane. The zero-field-cooled and field-cooled curves at temperatures ranging from 10 to 350 K strongly indicate that the GaMnN film is ferromagnetic at least up to 350 K. A coercive field of 250 Oe and effective magnetic moment of 0.0003 μB/Mn were obtained. The n-type semiconducting behavior plays a role in inducing ferromagnetism in the GaMnN film, and the observed ferromagnetism is appropriately explained by a double exchange mechanism.  相似文献   

18.
High-resolution Fourier transform absorption and luminescence spectroscopy reveal axial and rhombic zero-field splittings of the spin-forbidden electronic origins of V3+ in NaMgAl(ox)3·9H2O (ox=oxalate) single crystals below 25 K. The temperature dependence of the integrated absorption of the split features display behavior consistent with a Boltzmann distribution within the zero-field split 3Â2 ground state of V3+. Weak luminescence is observed in the near-IR from the lowest energy spin-forbidden transition with a luminescence lifetime of less than 0.5 μs at 11 K and an estimated quantum efficiency of the order of 10−5.  相似文献   

19.
The current-voltage (I-V) and capacitance-voltage (C-V) characteristics of metal-insulator-semiconductor (Al/Si3N4/p-Si) Schottky barrier diodes (SBDs) were measured in the temperature range of 80-300 K. By using the thermionic emission (TE) theory, the zero-bias barrier height ΦB0 calculated from I-V characteristics was found to increase with increasing temperature. Such temperature dependence is an obvious disagreement with the negative temperature coefficient of the barrier height calculated from C-V characteristics. Also, the ideality factor decreases with increasing temperature, and especially the activation energy plot is nonlinear at low temperatures. Such behaviour is attributed to Schottky barrier inhomogeneties by assuming a Gaussian distribution of barrier heights (BHs) at interface. We attempted to draw a ΦB0 versus q/2kT plot to obtain evidence of a Gaussian distribution of the BHs, and the values of ΦBo = 0.826 eV and αo = 0.091 V for the mean barrier height and standard deviation at zero-bias, respectively, have been obtained from this plot. Thus, a modified ln(Io/T2) − q2σo2/2(kT)2 versus q/kT plot gives ΦB0 and Richardson constant A* as 0.820 eV and 30.273 A/cm2 K2, respectively, without using the temperature coefficient of the barrier height. This value of the Richardson constant 30.273 A/cm2 K2 is very close to the theoretical value of 32 A/cm2 K2 for p-type Si. Hence, it has been concluded that the temperature dependence of the forward I-V characteristics of the Al/Si3N4/p-Si Schottky barrier diodes can be successfully explained on the basis of TE mechanism with a Gaussian distribution of the barrier heights. In addition, the temperature dependence of energy distribution of interface state density (NSS) profiles was determined from the forward I-V measurements by taking into account the bias dependence of the effective barrier height and ideality factor.  相似文献   

20.
We have investigated the temperature and composition dependent photoluminescence (PL) spectra in Ga1−xMnxN layers (where x ≈ 0.1-0.8%) grown on sapphire (0 0 0 1) substrates using the plasma-enhanced molecular beam epitaxy technique. The efficient PL is peaked in the red (1.86 eV), yellow (2.34 eV), and blue (3.29 eV) spectral range. The band-gap energy of the Ga1−xMnxN layers decreased with increasing temperature and manganese composition. The band-gap energy of the Ga1−xMnxN layers was modeled by the Varshni equation and the parameters were determined to be α = 2.3 × 10−4, 2.7 × 10−4, 3.4 × 10−4 eV/K and β = 210, 210, and 230 K for the manganese composition x = 0.1%, 0.2%, and 0.8%, respectively. As the Mn concentration in the Ga1−xMnxN layers increased, the temperature dependence of the band-gap energy was clearly reduced.  相似文献   

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