Wear resistance of the ion-modified surface of zirconium-alloy tubes irradiated by He+ and Ar+ ion beams with wide energy spectra

The results of investigating the wear resistance of E110 alloy samples irradiated by a He⁺ + Ar⁺ beam with a wide energy spectrum are presented. Surface modification under irradiation by an Ar⁺ beam at doses higher than 2 × 10¹⁸ ion/cm² is shown to cause substantial enhancement of the wear resistance of samples because the structural homogeneity of near surface layers increases, the surface roughness decreases, and its microhardness increases. The application of a mechanical-geometrical wear model based on the experimental wear characteristics determined during accelerated tests indicates that the thinning of an alloy cladding can reach rates of 10⁻⁶–10⁻³ mm/s, which agree satisfactorily with data obtained in other simulation experiments. The presence of an oxide film changes a wear process characterized by an abrasive component.     

Ar+, He+，S+离子轰击n-InP单晶表面的机理研究

通过X射线光电子能谱和低能电子衍射实验研究了10～180 eV的Ar⁺、 He⁺、S⁺离子轰击n-InP(100)表面, 发现S⁺离子轰击可以产生In-S组分,减轻离子轰击对表面的物理损伤.对于Ar⁺离子轰击后的表面,经过S⁺离子处理和加热过程以后,表面损伤得到了修复,最终得到了2×2的InP表面,进一步验证了S⁺离子对InP表面的修复作用.     

X-ray photoelectron spectroscopic studies of PbO surfaces bombarded with He+, Ne+, Ar+, Xe+ and Kr+

The surface composition of PbO has been studied with X-ray photoelectron spectroscopy after bombardment with several inert gas ions of 400 eV. The results show reduction of PbO to metallic Pb with the degree of damage following the order He⁺ > Ne⁺ >Ar⁺. Both Kr⁺ and Xe⁺ did not reduce the oxide. The depth of damage varied from ≈9 Å for He⁺ to ≈1 Å for Ar⁺ bombardment. The results were compared to a collisional and a thermal model of the sputtering process.     

Modification of thin oxide films on Be,Si, Al,Ti, Zr,and W under bombardment by He<Superscript>+</Superscript> and Ar<Superscript>+</Superscript> ion beams with a broad energy spectrum

Data on the distribution of Be, Al, Ti, Fe, Cu, Zr, Mo, and W atoms implanted in oxide film on metal substrates by ion mixing under the action of He⁺ and Ar⁺ ion beams with a broad energy spectrum, with average energy of 10 keV, and with radiation doses up to 1 × 10²¹ ion/cm² are presented. It is shown that layers with different concentration gradients of implanted atoms form in a thin oxide layer due to simultaneous implantation, but their concentration decreases dramatically to the background value at the oxide-metal interface. Analysis of experimental data suggests that the migration of implanted atoms takes place by means of the diffusion mechanism and is determined by the parameters of physicochemical interaction of implanted atoms with substrate atoms.     

Study of optical band gap and carbon cluster sizes formed in 100 MeV Si8+ and 145 MeV Ne6+ ions irradiated polypropylene polymer

A wide variety of material modifications in polymers have been studied by using ion irradiation techniques. Extensive research has focused on to Swift Heavy Ions (MeV’s energy), probably because of good controllability and the large penetration length in polymers. High energy ion irradiation tends to damage polymers significantly by electronic excitation and ionization. It may result into the creation of latent tracks and can also cause formation of radicals such as ablation, sputtering, chain scission and intermolecular cross-linking, creation of triple bonds and unsaturated bonds and loss volatile fragments. Polypropylene polymer films of thickness 50 μm were irradiated to the fluences of 1 × 10¹⁰, 3 × 10¹⁰, 1 × 10¹¹, 3 × 10¹¹, 6 × 10¹¹ and 1 × 10¹² ions/cm² with Si⁸⁺ ions of 100 MeV energy from Pelletron accelerator at Inter University Accelerator Centre (IUAC), New Delhi and Ne⁶⁺ ions of 145 MeV to the fluences of 10⁸, 10¹⁰, 10¹¹, 10¹² and 10¹³ ions/cm³ from Variable Energy Cyclotron Centre, Kolkata. Optical modifications were characterized by UV towards the red end of the spectrum with the increase of the fluence. Value of optical band gap E _g shows a decreasing trend with ion fluence irradiated with both kinds of ions. Cluster size N, the number of carbon atoms per conjugation length increases with increasing ion dose. Cluster size also increases with the increase of electronic stopping power.      

Preferential sputtering of TIC under keV Ar+ ion bombardment: Simultaneous sputtering-ISS measurement with He+ and Ar+ ions

The composition change of the outermost atom layer of TiC(110) under ion bombardment with 1.5–3 keV He⁺ and He⁺ + Ar⁺ ions has been measured by ion scattering spectroscopy with He⁺ ions at different sample temperatures. It has been found that the preferential sputtering of C atoms takes place for both the He⁺ and Ar⁺ ion bombardment, however the preferred sputtering is more pronounced for Ar⁺ ions than for He⁺ ions. The ion bombardment with He⁺ ions at elevated sample temperatures hardly results in any change in surface composition below ～800°C, while Ar⁺ ion bombardment results in C enrichment for elevated temperatures as reported so far.     

Formation of ordered helium pores in amorphous silicon subjected to low-energy helium ion irradiation

Thin transparent (for transmission electron microscopy, TEM) self-supported Si(001) films are irradiated on the (110) end face by low-energy (E=17 keV) He⁺ ions at doses ranging from 5×10¹⁶ to 4.5×10¹⁷ cm⁻² at room temperature. The TEM study of the irradiated Si films along the ion range shows that an a-Si layer forms in the most heavily damaged region and helium pores (bubbles) with a density of up to 3×10¹⁷ cm⁻³ and 2–5 nm in diameter nucleate and grow across the entire width of this layer. The growth of nanopores in the a-Si layer is accompanied by their linear ordering into chains oriented along the ion tracks. The absence of pores in the region that remains crystalline and has the maximal concentration of implanted helium is explained by the desorption of helium atoms from the thin film during the irradiation. After annealing at 600°C, the volume of immobile pores in the remaining a-Si layer increases owing to the capture of helium atoms from the amorphous matrix. Solid solution is shown to be the prevalent state of the helium implanted into the amorphous silicon. Linear features with a diameter close to 1 nm and density of about 10⁷ cm⁻¹ discovered in the helium-doped a-Si layer are identified as low-energy He⁺ ion tracks.     

Radiation defects introduced by MeV electrons in argon implanted MOS structures

The influence of MeV electron irradiation on the interface states of argon implanted thin oxide MOS samples has been studied by the thermally stimulated current (TSC) method. The oxide thickness of the structures is 18 nm. Two groups of n-type MOS structures non-implanted and implanted with 20 keV Ar⁺ ions and a dose of 5×10¹² cm⁻² are examined. Both groups are simultaneously irradiated by 23 MeV electrons with doses of 1.2×10¹⁶, 2.4×10¹⁶ or 6.0×10¹⁶ el/cm². The energy position and density of the interface states (generated by electron irradiation, ion implantation or both treatments of the samples) are determined. It is shown that MeV electron irradiation decreases the concentration of interface states (like an oxygen-vacancy and di-vacancy) slightly and creates additional interface states (like an impurity-vacancy) at the Si–SiO₂ interface of argon implanted MOS structures.     

Yields of H+ and He+ at the energy for elastic scattering from H2+3He+ incident on Ag and Pd

Yields, Y, of H⁺ and He⁺ emerging specularly with the energy for single binary elastic collisions have been measured from polycrystalline Ag and Pd surfaces bombarded with mixed monoenergetic (300 < E₀ < 2600 eV) beams of H₂⁺³He⁺ impinging at an angle of 45° from the surface normal. The surfaces were exposed to H₂⁺ at a dynamic pressure of 8 × 10^?3 Pa (6 × 10^?5 Torr) during the measurements. The He⁺ yields from Pd are slightly larger than from Ag, and the H⁺ yields from Pd are 10 to 40 times as large as those from Ag. These results suggest that differences between Pd and Ag in the amount of hydrogen adsorbed and in the character of the hydrogen-metal bond may be responsible for the yield differences through shadowing by, and possibly the sputtering of, adsorbed hydrogen. The Y versus E₀ curves for all four systems have qualitatively the same singly peaked shape which implies that reactive and noble gas ions undergo similar neutralization processes during elastic surface collisions. The ratios of the yields from Ag and Pd do not exhibit the theoretically expected exponential dependence on collision time over the entire range studied, but at the lowest energies the ratios lead to estimates of the difference of neutralization constants which do agree with theory. The potential utility of the large difference in proton yields from Ag and Pd for studying the Ag-Pd alloy system is noted.     

He+离子和Ar原子碰撞过程中激发态的研究

在He⁺离子和Ar原子碰撞过程中,同样存在着电子俘获激发和直接激发两种过程。本文把实验结果同He⁺离子和Ne原子碰撞体系进行了比较,发现:在入射离子速度较小时,实验所得到的Hel三重态发射截面要大得多;当入射离子He⁺的速度大于一个原子单位(2.2×10⁸cm/s)时,情况则相反。因此,在俘获电子过程中,势能亏损同He⁺离子的入射速度是两个非常重要的因素,而且它们之间存在一个竞争过程。入射离子He 关键词：     

Blistering of rhenium irradiated with 21keV helium ions

This paper describes blistering of rhenium following 21 keV He⁺-ion irradiation at temperatures between 300 K and 1200 K. Blistering starts at 300 K at a dose of 3×10¹⁷ ions/cm². The most probable blister diameter varies from 4400 ? at 300 K to 10100 ? at 1200 K. The blister depth τ _bl , the blister diameter φ _bl and the blister heighth _bi show a distribution. From the observations one could derive the following relationships:h _bl = 0.35φ _bl ; τ _bl =3.43φ _bl ^2/3 . The erosion yieldE _y due to blistering is function of doseE _y =0.51 atoms/ion at 3×10¹⁷ ions/cm²,E _y =0.56 atoms/ion at 6×10¹⁷ ions/cm² andE _y =0.14 atoms/ion at 3×10¹⁸ ions/cm². The sputtering yieldS (21 keV) is estimated to be ∼0.1 atom/ion. The corresponding surface regression is 44? at 3×10¹⁷ ions/cm² and 1323 ? at 9×10¹⁸ ions/cm². Surface regression has therefore little influence on the observations at low doses. Work performed at the Mathematicals Science Department of S.C.K./C.E.N. at Mol (Belgium)     

Mixing of Au in Si induced by secondary and high-order recoil implantation

The mixing of Au in Si induced by secondary and high-order recoil implantation was investigated using 350 keV Ar⁺ and 350 keV Kr⁺ ions to fluences from 1?×?10¹⁶ to 3?×?10¹⁶ ions/cm² at room temperature. The thickness of the Au layer evaporated on Si substrate was ～2400 Å.The ranges of the Ar and Kr ions were chosen to be lower than the thickness of the Au layer in order to avoid the ballistic mixing produced by the primary knock-on atoms. Rutherford backscattering spectrometry (RBS) experiments were carried out to study the effects induced by Ar and Kr irradiation at the interface of Au–Si system. We observed that in the case of the irradiation with Ar⁺ ions, a broadening of the Au–Si interface occurred only at the fluence of 3?×?10¹⁶ Ar⁺/cm² and it is attributed to the surface roughening induced by ion bombardment. In contrast, the RBS analysis of a sample irradiated with 2?×?10¹⁶ Kr⁺/cm² clearly showed, in addition to the broadening effect, the formation of a mixed zone of Au and Si atoms at the interface. The mixing of Au in Si atoms can be explained by the secondary and high-order recoil implantation followed by subsequent collision cascades.     

X-ray spectra induced in highly charged 40Arq+ interacting with Au surface

By use of optical spectrum technology, the spectra of X-ray induced by highly charged ⁴⁰Ar ^q+ ions interacting with Au surface have been studied. The results show that the argon Kα X-ray were emitted from the hollow atoms formed below the surface. There is a process of multi-electron exciting in neutralization of the Ar¹⁶⁺ion, with electronic configuration 1s² in its ground state below the solid surface. The yield of the projectile Kα X-ray is related to its initial electronic configuration, and the yield of the target X-ray is related to the projectile kinetic energy.     

Structural features of aluminium alloy 1441 irradiated by Ar+ ions

Using electron microscopy it was found that irradiation of clad cold-worked specimens made of commercial aluminium-lithium alloy 1441 by the Ar ⁺ ions of energy 40 keV at low doses of irradiation (10¹⁵ cm⁻², irradiation time 1 s, T < 70 °C) and ion-current density of about 100 μA/cm² results in the transformation of the cellular structure formed in the alloy under deformation. As the dose of irradiation is increased up to 10¹⁶ cm⁻², a transition from a cellular to a subgrain structure close to a polygonal one is observed. The efficiency of the process is increased with ion-current density. Furthermore, under ion irradiation at increased ion-current densities, the β′(Al ₃ Zr) and Al ₈ Fe ₂ Si particles present in the deformed alloy dissolve, and disperse particles of a new Al ₂ LiMg phase of platelet shape are formed. The changes in the dislocation structure and phase composition in alloy 1441 are observed several seconds after irradiation not only in the surface layer adjacent to the ion incorporation band but also through the thickness of the specimen tens of thousands times greater than ion projective ranges. __________ Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 2, pp. 73–81, February, 2007.     

Resonance Raman study of He+ ion implanted nanostructured ZnS

ZnS nanocrytsals of size ∼2.5 nm were prepared by chemical precipitation technique. Pressed pellets of nanostructured ZnS were implanted with He⁺ ions at doses of 5 × 10¹⁴, 1 × 10¹⁵ and 5 × 10¹⁵ ions/cm². Raman spectra of both unimplanted and He⁺ ion implanted samples were recorded with ultraviolet (UV) excitation. LO, 2LO, 2TO, (LO + TA) and (2TO − TA) modes of ZnS were observed in the resonance Raman spectra of the unimplanted nanostructured ZnS samples. In addition, a surface mode was observed at 294 cm⁻¹. With the implantation of He⁺ ions, the 2TO mode disappeared and 2LO mode became prominent and this observation was attributed to the decrease in band gap of ZnS nanocrytsals due to ion implantation. The exciton–LO phonon coupling strength was determined from the intensity ratio of 2LO to LO modes and it was observed that the exciton–LO phonon coupling strength increases with increase in implantation dose. In the present work, we report for the first time the observation of 2TO mode in the resonance Raman spectrum of nanostructured ZnS and also the modification of exciton–LO phonon coupling strength of semiconductor nanoparticles by ion implantation. Copyright © 2008 John Wiley & Sons, Ltd.     

钴离子注入对二氧化钛晶体的结构和光学性能的影响

采用离子注入法制备了钴离子掺杂的金红石相TiO₂样品;离子注入能量、注量分别为40 keV(1×10¹⁶cm^-2),80 keV(5×10¹⁵,1×10¹⁶,5×10¹⁶,1×10¹⁷cm^-2),120 keV(1×10¹⁶cm^-2). 通过XRD,XPS和UV-Vis等手段对掺杂前后样品的结构和光学性能进行了表征,分析了掺杂元素在金红石TiO₂中的存在形式. XRD测试表明随着注入能量的增加晶体的损伤程度增加. UV-Vis测试表明掺杂后所有样品在可见光区的吸收增强; 并且随着注量的增加,注量为5×10¹⁵cm^-2到5×10¹⁶cm^-2范围内注入样品的光学带隙逐渐变小. 关键词： 钴 二氧化钛 离子注入 掺杂     

Interplay of native defect-related photoluminescence response of ZnO nanosticks subjected to 80 keV Ar ion irradiation

We report on the effect of 80 keV Ar⁺ ion irradiation on the luminescence response of zinc oxide (ZnO) nanosticks synthesized using a simple microemulsion route. The formation of nanoscale rods was confirmed from the transmission electron microscopy, whereas the hexagonal wurtzite phase of the nanorods was detected in an X-ray diffraction pattern. The photoluminescence pattern of the nanorods was dominated by various native defect states of ZnO, which are responsible for the quenching of the typical band edge emission of ZnO. Under Ar⁺ ion irradiation at a fluence of 1×10¹³ ions/cm², the band edge emission was recovered owing to the suppression of oxygen vacancy defects. In addition, the formation of new zinc vacancy and ionized zinc interstitial defects were also evident. Conversely, the band edge emission was found to be quenched as a result of the creation of more oxygen vacancy (V_O) defects due to ion irradiation (fluence: 1×10¹⁵ ions/cm²). The nuclear energy loss of the Ar⁺ ions in ZnO is responsible for the formation of point (vacancy-related) defects, while relatively small amount of electronic energy loss of the Ar⁺ ion results in the ionization of the neutral zinc interstitial (Zn_i) defects. The energy deposition scheme of the energetic ions has been elaborated with the help of theoretical modeling that explains the observed features quite satisfactorily.     

ISS measurement of surface composition of AuCu alloys by simultaneous ion bombardments with Ar+ and He + ions

Surface composition of Au-Cu(43 at%) alloy under 1.5–5 keV argon ion bombardment has been investigated by ion scattering spectroscopy (ISS). In this experiment, we adopted a specific technique to use mixed He⁺ and Ar⁺ ions as primary beam in order to perform sputtering (Ar⁺) and ISS measurement (He⁺) simultaneously. The outermost atom layer of Au-Cu alloys under Ar⁺ ion bombardment is Au-rich leading to the conclusion that Ar⁺ ion bombardment of AuCu alloys causes the preferential sputtering of Cu atoms, resulting in a Au-rich outermost atom layer and a depletion layer of Au atoms beneath the outermost atom layer due to ion-beam-enhanced surface segregation. This result explains the experimental results obtained by AES as well.     

Search for direct CP violating charge asymmetries in K±→π±π+π- and K±→π±π0π0 decays

A measurement of the direct CP violating charge asymmetries of the Dalitz plot linear slopes A_g=(g⁺-g^-)/(g⁺+g^-) in K^±→π^±π⁺π^- and K^±→π^±π⁰π⁰ decays by the NA48/2 experiment at CERN SPS is presented. A new technique of asymmetry measurement involving simultaneous K⁺ and K^- beams and a large data sample collected allowed a result of an unprecedented precision. The charge asymmetries were measured to be A^c _g=(-1.5±2.2)×10^-4 with 3.11×10⁹K^±→π^±π⁺π^- decays, and Aⁿ _g=(1.8±1.8)×10^-4 with 9.13×10⁷K^±→π^±π⁰π⁰ decays. The precision of the results is limited mainly by the size of the data sample.     

Study of structure and optical luminescence of C+6 (80 MeV) ion irradiated CdS: Fe system

Iron doped CdS nanocrystals have been synthesized by using aqueous solution precipitation method. Samples of CdS:Fe have been subjected to irradiation using C⁺⁶ (80 MeV) under of 1×10¹³ ions/cm². For characterization, X-ray diffraction (XRD), Photoluminescence (PL) and Optical absorption studies have been performed. The system has been found in hexagonal phase having particle size distribution 18–20 nm. Photoluminescence intensity has been found to decrease, while optical band gap has been found to increase in irradiated samples.