In situ atomic force microscopy studies of growth mechanisms and surface morphology of zinc thiourea sulfate crystals

In situ atomic force microscopy (AFM) has been utilized in studies of the growth mechanism on the (100) face of zinc tris (thiourea) sulphate (ZTS) crystals growing from solution. The growth on the (100) face of pure ZTS crystal is mainly controlled by two dimensional (2D) nucleation mechanisms, under which the hillock is formed through layer‐by‐layer growth. It is easier to form 2D nuclei at edge dislocation and the apex of steps. The growth of 2D nucleus is in accord with nucleation‐spreading mode. The growth rate along the 〈010〉 direction is faster than that along 〈001〉 direction, both of which increase firstly and then decrease with the spread of nucleus. The kinetic coefficients of one nucleus have been roughly estimated to be 3.6 × 10⁻⁴ cm/s and 1.8 × 10⁻⁴ cm/s in two directions, while the activation energy E was calculated to be 53.7 kJ/mol and 55.4 kJ/mol, respectively. The 2D nuclei can be generated under lower supersaturation with the addition of EDTA. If there are several hillocks growing together, step bunches will form when the steps moving in the same direction meet each other, while the meeting of steps that move in the inverse direction will result in the separation of steps. The ability of nucleation of edge dislocation outcrops are different even they are close to each other on the same surface. When the nucleus was generated at the edge dislocation sites, it cannot spread speedily until finishes an “incubation period”. Moreover, the detour of microsteps was observed due to the existence of pits. If the microcrystals attached on the surface block the step advancement, or leave the surface or are covered by the macrosteps, the pits are formed. If the macrosteps advanced across the pits, the pits will be covered and the liquid inclusions may form. However, if the microcrystal forming in the pit grow up and expose on the surface, the pit will not be covered by macrosteps. The formation of solid inclusions may be caused by the microcrystals being embedded into the single steps which move layer‐by‐layer.     

Effect of zinc doping on pentaerythritol tetranitrate single crystals

In this study, the effect of zinc impurity on the organic high explosive pentaerythritol tetranitrate (PETN) single crystal has been investigated with optical microscopy and ex situ atomic force microscopy (AFM). The optical images show that the crystal shape has a transition with a predictable trend from long crystal to compact one as the zinc concentration is increased. Also, the 2‐dimentional (2‐D) growth hillocks are observed clearly on (110) face with contact AFM. The crystal growth occurs on monomolecular steps generated by 2‐D nucleation and followed by layer‐by‐layer expansion, and the macro‐steps formed onto the surface before spreading laterally as step bunches. The zinc ions are incorporated in growth steps as the zinc concentration is increased. The mechanism of inorganic impurity on molecular crystallization growth is still unclear. However, the incorporation of impurities may significantly affect growth kinetics of defect structure, and the bulk properties of molecular crystals. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

In situ AFM investigation of 2D nucleation on the (100) face of KDP

Surface morphology of the (100) face of potassium dihydrogen phosphate (KDP) crystals which were grown at different supersaturations at 25 °C was investigated by in situ atomic force microscopy (AFM). Various AFM images of 2D nucleation under different growth conditions were presented. It is found that the growth of KDP is controlled by polynuclear nucleation mechanism at the high supersaturation. With reduction of the supersaturation, the growth velocity of 2D nuclei becomes very slow and shows typical anisotropy. It is found that the process of coalescence of 2D nuclei does not lead to defect. The experiments show that the growth mechanism for KDP at 25 °C changes between step flow and 2D nucleation in the supersaturation range of 4.5‐5%. The triangular nuclei which are close to equilateral triangle are observed in the experiment at the supersaturation σ = 6% for the first time, showing typical anisotropic growth. Through observing the dissolution of 2D nuclei, the dissolving process can be regarded as the reverse process of growth. We also find that the microcrystals landing on the surface at σ = 9% would grow and coalesce with each other and there is no observable defect in the coalescence. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

In situ atomic force microscopy studies of surface morphology,growth kinetics,defect structure and dissolution in macromolecular crystallization

Surface morphologies of thaumatin, catalase, lysozyme and xylanase crystals were investigated using in situ atomic force microscopy. For thaumatin, lysozyme and xylanase crystals, growth steps having a height equal to the unit cell parameter were produced both by screw dislocations and two-dimensional nuclei. Growth of catalase crystals proceeded in alternating patterns exclusively by two-dimensional nucleation and the successive deposition of distinctive growth layers, each having a step height equal to half the unit cell parameter. The shapes of islands on successive layers were related by 2-fold rotation axes along the 〈0 0 1〉 direction. Experiments revealed that step bunching on crystalline surfaces occurred either due to two- or three-dimensional nucleation on the terraces of vicinal slopes or as a result of uneven step generation by complex dislocation sources. Growth kinetics for thaumatin and catalase crystals were investigated over wide supersaturation ranges. Strong directional kinetic anisotropy in the tangential step growth rates in different directions was seen. From the supersaturation dependencies of tangential step rates and the rates of two-dimensional nucleation, the kinetic coefficients of the steps and the surface free energy of the step edge were calculated. Adsorption of impurities which formed filaments on the surfaces of catalase and thaumatin crystals was recorded. Cessation of growth of xylanase and lysozyme crystals was also observed and appeared to be a consequence of the formation of dense impurity adsorption layers. Crystal growth resumed upon scarring of the impurity adsorption layer and clearing of the crystal surface with the AFM tip. Adsorption of three-dimensional clusters, which consequently developed into either properly aligned multilayer stacks or misaligned microcrystals was recorded. For catalase crystals, incorporation of misoriented microcrystals as large as 50×3×0.1 μm³ produced elastic deformations in growth layers of ≈0.6%, but did not result in the defect formation. Etching experiments on catalase crystals revealed high defect densities.     

Effect of pH value on the growth morphology of KH2PO4 crystal grown in defined crystallographic direction

KH₂PO₄ single crystals were grown in aqueous solution at different pH values by using “point seeds” with a defined crystallographic direction at 59 degree to the Z axis. Atomic Force Microscope (AFM) was applied to observe the surface morphology of (100) face. It was found that at the same supersaturation, the larger steps appeared at the lower pH value before appearance of 2D nucleus. We found that 2D nucleus was occurred at σ ≤ 0.04 when pH value is <2.8. The occurrence of 2D nucleus was caused by the decreasing step‐edge free energy with the decreasing of pH value in the growth solution. In this paper, we observed the morphologies of (100) faces of KDP crystals which grew in solutions with different pH values. 2D nucleuses appeared on the terrace of growth steps when pH value down to 2.8 and 3.2 at supersaturation of 0.04, while pH value down to 2.4, only 2D nucleation control the growth. Therefore, the pH value can change the growth mechanism of KDP crystals.     

Distinct Growth Phenomena Observed on Zinc Cadmium Thiocyanate Crystals by Atomic Force Microscopy

Atomic force microscopy is used to investigate the surface morphology of the prismatic (100) face of ZCTC crystal grown at 30°C at a supersaturation of 0.16. This surface is distinctly formed by periodic “macrosteps” that advance along different directions and join with each other leading to the interlaced growth layers with an inclination of about 137°. These two “macrostep” trains well correspond to the pyramidal faces of (0 ) and (01 ) in orientation, therefore they probably propagate from the edges of these faces. The “macrosteps” are practically formed by highly dense steps at the front with regular elementary steps in between. The alternation of “macrosteps” and elementary steps vividly reflects Chernov's “kinematic waves of steps” theory (Chernov , (1984)) on a nanometer scale. Wide indentations and long clefts are generated at the “macrosteps”. The former is generated by twodimensional nucleation growth at a relatively faster growth rate than that of the underlying layer. The latter is probably caused by step trains generated by individual growth sources that have not merged.     

Characterization of the carrot defect in 4H-SiC epitaxial layers

Characterization of the epitaxial defect known as the carrot defect was performed in thick 4H-SiC epilayers. A large number of carrot defects have been studied using different experimental techniques such as Nomarski optical microscopy, KOH etching, cathodoluminescence and synchrotron white beam X-ray topography. This has revealed that carrot defects appear in many different shapes and structures in the epilayers. Our results support the previous assignment of the carrot defect as related to a prismatic stacking fault. However, we have observed carrot defects with and without a visible threading dislocation related etch pit in the head region, after KOH etching. Polishing of epilayers in a few μm steps in combination with etching in molten KOH and imaging using Nomarski optical microscope has been used to find the geometry and origin of the carrot defects in different epilayers. The defects were found to originate both at the epi-substrate interface and during the epitaxial growth. Different sources of the carrot defect have been observed at the epi-substrate interface, which result in different structures and surfaces appearance of the defect in the epilayer. Furthermore, termination of the carrot defect inside the epilayer and the influence of substrate surface damage and growth conditions on the density of carrot defects are studied.     

Investigation of nucleation kinetics and crystal defects of HMX

The nucleation kinetics of HMX (cyclotetramethylene tetranitramine, C₄H₈N₈O₈) in γ‐butyrolactone was studied in cooling process by induction time method. The laser scattering method was used to measure the solubility data and metastable region of HMX in γ‐butyrolactone. The induction time was measured over a range of supersaturation at different temperatures. Then, the nucleation mechanism of HMX in γ‐butyrolactone was investigated by analysis the relationships between induction time and supersaturation. The results indicated homogeneous nucleation dominated at high supersaturation of S >1.35, while the heterogeneous nucleation dominated at low supersaturation of S < 1.35. The values of interfacial tension at different final temperatures were calculated to indicate the ability of HMX to be crystallized. The growth mechanism of HMX was investigated by the data fitting applying different growth mechanism models and identified as two‐dimensional nucleation‐mediated (2D) growth. Finally, the effects of supersaturation and temperature on the crystal defects were analyzed based on the nucleation kinetics. When the temperature is below 303.15K, homogeneous nucleation dominated the nucleation process at higher supersaturation. Fine HMX crystals with more defects were produced. On the contrary, heterogeneous nucleation mechanism dominated at lower supersaturation. large regular HMX crystals with fewer defects were formed when the temperature is above 318.15K.     

Atomic force microscopy studies on liquid inclusions and induced defects of cadmium mercury thiocyanate crystal

Liquid inclusions and various defects accordingly induced on a nonlinear optical material of CMTC crystal were investigated by atomic force microscopy. Liquid inclusions are chiefly caused by formation of macrosteps, which result from impurity‐induced inhibiting of step growth and meeting of step trains advancing along different directions. Liquid inclusions induce generation of dislocations and even cracks within the crystal by three‐dimensional nucleation growth. Liquid inclusions also provide screw dislocation growth sources, leading to formation of spiral hillock trains with ridged tails. Etching experiments reveal circular hollow cores, indicative of screw dislocation growth, and negative crystals resulting from further crystallization in the liquid inclusions. (© 2003 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

LICVD法纳米硅制备过程中的成核及生长

自行设计制备了激光诱导化学气相沉积法(LICVD)纳米制粉装置,利用该装置制备的纳米硅粉其粒度波动在30～60nm之间.通过对不同反应气体流量条件下的激光能量阈值研究表明,随反应气体流量的增加,所需激光能量阈值大致成线性增加.利用透射电镜和高分辨电镜对其形貌进行了表征,并对其成核与生长进行了分析,在成核长大初期,晶核周围的Si原子浓度较高,纳米硅晶应以层状长大方式为主.当纳米晶中有螺型位错等晶体缺陷形成时,会为Si原子的"落座"提供生长所需的台阶源,晶粒将以螺旋状生长方式长大.在长大过程中,纳米晶会发生跳跃式长大现象.以跳跃方式长大的晶粒通常在两晶粒的结合面处伴有晶体缺陷发生或亚晶界产生.较低的反应气体流速条件下,纳米硅的择优生长方向为<112>晶向;而在较高的反应气体流速条件下其择优生长方向变为<111>晶向.     

Dual action of Impurities in Crystal Growth from Solutions

A dual action of impurities becomes evidently in growth kinetic of prismatic faces of KDP. At higher supersaturation two-dimensional nucleation mechanism due to impurities prevails. At smaller supersaturation the blocking effect of the steps created by the dislocation mechanism of growth become efficient. The limit of the “dead” growth zone depending on the impurity's concentration and the solution pH is a result of this last effect and agrees with the Cabrera-Vermilyea mechanism.     

L-丙氨酸掺杂下ZTS晶体(100)面台阶动力学实时研究

利用光学显微镜对L-丙氨酸掺杂下ZTS晶体(100)面台阶推移进行了实时观察。测量了不同掺杂浓度、过饱和度及生长温度下的台阶平均推移速度。实验结果表明:随掺杂浓度的增加,台阶平均推移速度先增加后减小,在掺杂浓度为2mol%时,台阶平均推移速度最大;而随过饱和度的增加,台阶平均推移速度线性增加。计算了台阶动力学系数与单台阶的活化能,得到掺杂后,台阶动力学系数增大,单台阶活化能减小。运用台阶动力学系数的定义,计算得到掺杂与未掺杂ZTS晶体台阶活化能的范围。同时用红外光谱实验分析了L-丙氨酸在ZTS晶体生长过程中进入晶格,进而影响台阶推移速度。     

On the nature of growth hillocks on sodium chlorate crystals

Optical examination of as-grown {100} surfaces of sodium chlorate crystals grown from aqueous solution revealed the presence of elliptical growth hillocks. The hillocks were present on both enantiomorphous forms and originated from dislocations, inclusions, and microcrystals attached to the growing surface. The value of the surface entropy factor equal to 4.55 at 313 K suggests that crystals grow via/or with the participation of dislocation mechanism, and the hillocks are dislocation growth centers. Compound mechanism controlled growth of some crystals because edge nucleation and dislocation centers operated simultaneously on the same surfaces.     

失配性质对面心立方外延晶体失配位错结构及其形核机制的影响

运用三维分子动力学方法模拟了外延铝薄膜晶体中失配位错的形成过程.结果显示:失配度为fx=4;时,位错是通过薄膜表层原子的相对滑移来形核,形成一个伯格斯矢量为1/2[10 1]的刃型位错,该位错形成后会迅速向界面滑移,并稳定在离界面1～2个原子层上不动,同时在薄膜表面留下一个台阶.而失配度为fx=-4;时,位错形核是通过挤出一个四面体构型的原子团开始,形成一个伯格斯矢量为1/2[110]的刃型位错,该位错只能平行于界面滑移,位错稳定后离界面的距离比正失配度时的距离和热力学临界厚度都要大.     

Crystal growth rate limited by step length — the case of oxygen-deficient TiO2 exposed to oxygen

We study how an oxygen-deficient crystal of TiO₂ crystal grows when exposed to O₂. While the O flux is external to the crystal, the Ti flux necessary for growth comes from internal (bulk) interstitials (Phys. Rev. Lett. 76 (1996) 791). We address where the reaction between O and Ti to form new crystal takes place in the regime of pure step flow (i.e., surface steps advancing without new-layers nucleating). The detailed partitioning of the growth flux among individual surface steps is studied using low-energy electron microscopy for two geometries on the (110) surface—an array of islands on a terrace and an island stack generated from a dislocation source. For both geometries, the areas of islands larger than the critical size grow at rates strictly proportional to their perimeter length, independent of the local step configuration. In addition, we find that the growth rate is proportional to the O₂ pressure. The step flow represents a simple limiting case of crystal growth (Phil. Trans. R. Soc. A. 243 (1951) 299)—only the growth species near a step edge becomes incorporated into the crystal. That is, only Ti and O reactions near the step edge lead to crystal growth. This case is in marked contrast to crystal growth controlled by species attaching to terraces and diffusing to steps, for which the growth rates depend upon the local step environment. Indeed, simulating the island array as if the growth flux was partitioned among the individual islands by concentration gradients (i.e., diffusion-controlled growth) totally failed to reproduce the experimental rates.     

Controlled crystallization of GeS2–Sb2S3–CsCl glass for fabricating infrared transmitting glass-ceramics

The crystallization of selected glasses from the GeS₂–Sb₂S₃–CsCl ternary system has been studied under non-isothermal condition. The nucleation and crystal growth mechanisms have been investigated and proved to be dependant on the glass composition. It has been found that the 80GeS₂–10Sb₂S₃–10CsCl is a good candidate for controlled crystallization. The best nucleation temperature and time have been determined. Crystals of about 20–30 nm have been uniformly generated in the glass and the obtained glass-ceramics have the same transmission in the mid and far infrared transmission.     

Theoretical and Practical Studies on Effects of External Electrostatic Electric Field on Nucleation and Growth Kinetics of Protein Crystals

The crystallization technique where an electric field is applied is an extremely powerful tool to control the crystallization processes of various materials. In particular, the method with application of an external electrostatic electric field can have a significant effect on the phase equilibrium of the liquid and solid phases. This review demonstrates that the crystallization processes of proteins are significantly impacted by the application of an external electrostatic electric field: (1) Control of both the increase and decrease in the nucleation rate can be achieved by changing the applied frequency of the external electrostatic electric field. (2) The effect of the external electrostatic electric field on the nucleation rate can be controlled by regulating the thickness of the electric double layer (EDL) formed at the interface. (3) The quality of the grown crystals can be improved by an increase in the step free energy under application of an external electrostatic electric field at 1 MHz. The effect of the external electrostatic electric field on nucleation and growth kinetics during crystal growth of proteins is also discussed based on a thermodynamic perspective.     

Effect of organic impurities on the surface morphology and growth mechanism of KBP crystals (C8H5O4K)

The surface morphology of the (010) face of potassium biphthalate (KBP) crystals grown from aqueous solutions under the supersaturation ranging within 0.029–0.04 has been studied by the methods of optical and electron microscopies. It was revealed that the (010) surface has polygonal growth macrohills of the dislocation nature, small hillocks developing by the mechanism of successive two-dimensional nucleation, and numerous two-dimensional nuclei. The density of small hillocks (10⁴–10⁵ cm^?2) exceeds the dislocation density in KBP crystals by one to two orders of magnitude. It is shown that at low supersaturations, the (010) face grows simultaneously by the dislocation mechanism and the mechanism of successive two-dimensional nucleation. It is also established that the tangential velocity of growth-step motion on the (010) face increases in the presence of organic impurities. This effect can be used as one of the factors increasing the growth rates of crystal faces at low impurity concentrations (the so-called catalytic effect of impurities).     

Mechanism for generating interstitial atoms by thermal stress during silicon crystal growth

It has been known that, in growing silicon from melts, vacancies (Vs) predominantly exist in crystals obtained by high-rate growth, while interstitial atoms (Is) predominantly exist in crystals obtained by low-rate growth. To reveal the cause, the temperature distributions in growing crystal surfaces were measured. From this result, it was presumed that the high-rate growth causes a small temperature gradient between the growth interface and the interior of the crystal; in contrast, the low-rate growth causes a large temperature gradient between the growth interface and the interior of the crystal. However, this presumption is opposite to the commonly-accepted notion in melt growth. In order to experimentally demonstrate that the low-rate growth increases the temperature gradient and consequently generates Is, crystals were filled with vacancies by the high-rate growth, and then the pulling was stopped as the extreme condition of the low-rate growth. Nevertheless, the crystals continued to grow spontaneously after the pulling was stopped. Hence, simultaneously with the pulling-stop, the temperature of the melts was increased to melt the spontaneously grown portions, so that the diameters were restored to sizes at the moment of pulling-stop. Then, the crystals were cooled as the cooling time elapsed, and the temperature gradient in the crystals was increased. By using X-ray topographs before and after oxygen precipitation in combination with a minority carrier lifetime distribution, a time-dependent change in the defect type distribution was successfully observed in a three-dimensional manner from the growth interface to the low-temperature portion where the cooling progressed. This result revealed that Vs are uniformly introduced in a grown crystal regardless of the pulling rate as long as the growth continues, and the Vs agglomerate as a void and remain in the crystal, unless recombined with Is. On the other hand, Is are generated only in a region where the temperature gradient is large by low-rate growth. In particular, the generation starts near the peripheral portion in the vicinity of the solid–liquid interface. First, the generated Is are recombined with Vs introduced into the growth interface, so that a recombination region is always formed which is regarded as substantially defect free. Excessively generated Is after the recombination agglomerate and form a dislocation loop region. Unlike conventional Voronkov's diffusion model, Is hardly diffuse over a long distance. Is are generated by re-heating after growth.[In a steady state, the crystal growth rate is synonymous with the pulling rate. Meanwhile, when an atypical operation is performed, the pulling rate is specifically used.]This review on point defects formation intends to contribute further silicon crystals development, because electronic devices are aimed to have finer structures, and there is a demand for more perfect crystals with controlled point defects.     

Defect Structure of Strained Heteroepitaxial In(1—x)Al(x)P Layers Deposited by MOVPE on (001) GaAs Substrates

Weak-beam, large angle convergent beam electron diffraction and high resolution transmission electron microscope experiments have revealed, that after strain relaxation due to plastic deformation dislocation networks can be observed in In_(1—x)Al_(x)P heteroepitaxial layers grown on (001) GaAs substrates under compressive stress. The 60° slip dislocations are mostly dissociated into partials of Shockley type whereas in the particular case of layers grown under tension twins are predominantly formed by successive nucleation and slip of 90° Shockley partials on adjacent {111} glide planes lying inclined to the (001) surface. When a few 90° Shockley partials pile up during extension of twins, then planar incoherent twin boundaries with {112} coincidence planes have been formed during strain relaxation. Due to the space group symmetry ((InAl)P belongs to the space group F4-3m) there is a striking asymmetry in defect formation, i.e. defect nucleation and slip on the planes (111) and (1-1-1) slip of the [1-10] zone are preferred to nucleation and slip on the {111} planes of the [110] zone. Apparently, the occupacy of the atomic sites in the dislocation core with either group-III or group-V atoms is responsible for this behaviour. The nature of the defects implies that their spontaneous nucleation should have taken place at the growing surface. Under tensile strain the 90° Shockley partial is nucleated first and the 30° one trails. Under compressive strain this sequence is reversed. It is evident, for dissociated dislocations lying at the interface always the 30° partial, i.e. the partial with less mobility or with higher friction force, is detained near or directly in the interface. Thus, in layers grown under tension the stacking fault associated with the dissociated 60° dislocation lies inside the GaAs substrate. For layers grown under compression it is located inside the ternary layer.