Photoluminescence of Al x Ga1−x As/GaAs quantum well heterostructures grown by molecular beam epitaxy

Nominally undoped Al_xGa_1–xAs grown by molecular beam epitaxy from As₄ species at elevated substrate temperatures of 670°C exhibits well-resolved excitonic fine structure in the low-temperature photoluminescence spectra, if the effective As-to-(Al+Ga) flux ratio on the growth surface is kept within a rather narrow range of clearly As-stabilized conditions. In contrast to previous results on Al_xGa_1–xAs of composition 0.15not to shift in energy by changing the excitation intensity. This implies a simple freeelectron carbon-acceptor recombination mechanism for the line without any participation of a donor. In Al_xGa_1–xAs of composition close to the direct-to-indirect cross-over point, two distinct LO-phonons separated by 34 and 48 meV from the (D ⁰,C ⁰) peak position at x=0.43 were observed which were before only detectable by Raman scattering experiments. The intensity of the carbon-impurity related luminescence lines in bulk-type Al_xGa_1–xAs and GaAs layers was found to be strongly reduced, as compared to the excitonic recombination lines, if the respective active layer was covered by a very thin confinement layer of either GaAs on top of Al_xGa_1–xAs or vice versa grown in the same growth cycle.     

GaInP材料生长及其性质研究

用常压MOCVD在半绝缘GaAs衬底上生长了Ga_xIn_1-xP(x=0.476～0.52)外延层,对外延层进行了X光双晶衍射、Hall和光致发光(PL)测试.77K下电子迁移率达3300cm²/V.s(浓度为1.4×10¹⁶cm^-3).载流子浓度随生长温度升高,随Ⅴ/Ⅲ比的增大而降低,并提出P空位(V_p)是自由载流子的一个重要来源,17KPL谱中,Ga_0.5In_0.5P(Tg=650℃,Ⅴ/Ⅲ=70)的峰能为1.828eV,半峰宽为19meV.另外,在1.849eV处还有一较弱的峰,GaInP峰能和其计算的带隙最大相差113meV,这可能与GaInP中杂质或缺陷以及其中存在有序结构有关.     

Emission and elastic strain in InAs dot-in-a well InGaAs/GaAs structures

The paper presents the photoluminescence (PL) study of InAs quantum dots (QDs) embedded in the asymmetric GaAs/In_xGa_1?xAs/In_0.15Ga_0.85As/GaAs quantum wells (QWs) with the different compositions of capping In_xGa_1?xAs layers. The composition of the buffer In_0.15Ga_0.85As layer was the same in all studied QD structures, but the In content (parameter x) in the capping In_xGa_1?xAs layers varied within the range 0.10–0.25. The In concentration (x) increase in the In_xGa_1?xAs capping layers is accompanied by the variation non-monotonously of InAs QD emission: PL intensity and peak positions. To understand the reasons of PL variation, the PL temperature dependences and X ray diffraction (XRD) have been investigated. It was revealed that the level of elastic deformation (elastic strain) and the Ga/In interdiffusion at the In_xGa_1?xAs/InAs QD interface are characterized by the non-monotonous dependences versus parameter x. The physical reasons for the non-monotonous variation of the elastic strains and PL parameters in studied QD structures have been discussed.     

Structural and optical properties of In0.5Ga0.5As/GaAs quantum dots in an In0.1Ga0.9As well using repeated depositions of InAs/GaAs short-period superlattices for the application of optical communication

We report structural and optical properties of In_0.5Ga_0.5As/GaAs quantum dots (QDs) in a 100 Å-thick In_0.1Ga_0.9As well grown by repeated depositions of InAs/GaAs short-period superlattices with atomic force microscope, transmission electron microscope (TEM) and photoluminescence (PL) measurement. The QDs in an InGaAs well grown at 510 °C were studied as a function of n repeated deposition of 1 monolayer thick InAs and 1 monolayer thick GaAs for n=5–10. The heights, widths and densities of dots are in the range of 6–22.0 nm, 40–85 nm, and 1.6–1.1×10¹⁰/cm², respectively, as n changes from 5 to 10 with strong alignment along [1 −1 0] direction. Flat and pan-cake-like shape of the QDs in a well is found in TEM images. The bottoms of the QDs are located lower than the center of the InGaAs well. This reveals that there was intermixing—interdiffusion—of group III materials between the InGaAs QD and the InGaAs well during growth. All reported dots show strong 300 K-PL spectrum, and 1.276 μm (FWHM: 32.3 meV) of 300 K-PL peak was obtained in case of 7 periods of the QDs in a well, which is useful for the application to optical communications.     

Materials and device properties of pseudomorphic In x Ga1−x As/Al0.3Ga0.7As/GaAs high electron mobility transistors (0<x<0.5)

Modulation doped Al_0.3Ga_0.7As/In _x Ga_1–x As/GaAs high electron mobility transistor structures for device application have been grown using molecular beam epitaxy. Initially the critical layer thickness for InAs mole fractions up to 0.5 was investigated. For InAs mole fractions up to 0.35 good agreement with theoretical considerations was observed. For higher InAs mole fractions disagreement occurred due to a strong decrease of the critical layer thickness. The carrier concentration for Al_0.3Ga_0.7As/In _x Ga_1–x As/GaAs high electron mobility transistor structures with a constant In _x Ga_1–x As quantum well width was investigated as a function of InAs mole fraction. If the In _x Ga_1–x As quantum well width is grown at the critical layer thickness the maximum carrier concentration is obtained for an InAs mole fraction of 0.37. A considerable higher carrier concentration in comparison to single-sided -doped structures was obtained for the structures with -doping on both sides of the In _x Ga_1–x As quantum well. Al_0.3Ga_0.7As/In _x Ga_1–x As/GaAs high electron mobility transistor structures with InAs mole fractions in the range 0–0.35 were fabricated for device application. For the presented field effect transistors best device performance was obtained for InAs mole fractions in the range 0.25–0.3. For the field effect transistors with an InAs mole fraction of 0.25 and a gate length of 0.15 m a f _T of 115 GHz was measured.Dedicated to H.-J. Queisser on the occasion of his 60th birthday     

Mobility enhancement in MBE-grown InxGa1−xAs/In0.52Al0.48As modulation-doped heterostructures

Pseudomorphic In_xGa_1−xAs/In_0.52Al_0.48As modulation-doped heterostructures were grown by molecular beam epitaxy (MBE) on InP (100) substrates over a range of indium compositions fromx=0.53 to 0.75. Low temperature photoluminescence (PL) measurements show a prominent reduction in the InGaAs linewidth due to the quantum-size effect as the indium composition is increased from its lattice-matched value of 0.53. The lowest linewidth of 6.8 meV was achieved at an indium composition of 0.65, above which an increase in the linewidth was observed due to the overwhelming effects of interfacial strain. The Hall mobilities at 300 K and 77 K increase in correspondence to the PL linewidth reduction as the indium composition is increased. Although initial signs of mobility saturation can be seen at an indium composition of 0.65, the peak mobility at 77 K of 8.9×10⁴cm²V s⁻¹was achieved at an indium composition of 0.70. There is experimental evidence to indicate that the mobility enhancement at increasing indium composition is due to an effect of a reduction in the alloy scattering and in the effective mass of the carriers. It was found that the insertion of an additional In_0.53Ga_0.47As interface smoothing layer between the strained InGaAs channel and the In_0.52Al_0.48As spacer layer did not have a significant effect on the mobility enhancement in the heterostructures.     

(Al0.1Ga0.9)0.5In0.5P材料的MOCVD生长温度窗口研究

用来制作光电子器件的(Al0.1Ga0.9)0.5 In0.5P为直接带隙的四元合金材料,对应的发光波长为630 nm,在其LP-MOCVD (low press-metalorganic chemical vapor deposition)外延生长过程中温度的高低成为影响其质量的关键,找到合适的生长温度窗口很有必要.实验中分别在700℃,680℃,670℃和660℃的条件下生长出作为发光二极管有源区的(Al0.1Ga0.9)0.5 In0.5P多量子阱结构,通过PL谱的测试对比分析,找出最佳生长温度在670℃附近.之后对比各外延片的PL谱、表面形貌,并对反应室的气流场进行了模拟,对各温度下生长状况的原因作出了深入分析.分析得到,高温下In组分的再蒸发会引起晶格失配并导致位错;低温下O杂质的并入会形成大量非辐射复合中心影响晶体质量,因此导致了(Al0.1Ga0.9)0.5In0.5P生长温度窗口较窄,文章最后提出In源有效浓度的提高是解决高温生长的一条有效途径.     

Investigation of defect-related optical properties in AlxInyGa1−x−yN quaternary alloys with different Al/In ratios

Al_xIn_yGa_1?x?yN quaternary alloys with different ratios of Al/In were grown by metal-organic chemical vapor deposition on GaN/Al₂O₃ substrates. The structural and emission properties of the as-grown samples were investigated, respectively, by high-resolution X-ray diffraction and photoluminescence (PL) measurements. The PL emission character is related to the two prominent quenching bands, which have been determined to be located at around 1.1 eV and 1.7 eV above the valence band, respectively, by the method of optical quenching of photoconductivity. PL emission is most intense when the Al/In ratio is 7.5 for the Al_xIn_yGa_1?x?yN layer. In addition, a stronger quenching phenomenon with Al/In ratio of 5.0 in Al_xIn_yGa_1?x?yN is observed in accordance with a reduction of the intensity of Al_xIn_yGa_1?x?yN-related emission peak.     

Photoluminescence scanning on InAs/InGaAs quantum dot structures

The photoluminescence spectra of InAs quantum dots (QDs) embedded into four types of In_xGa_1−xAs/GaAs (x = 0.10, 0.15, 0.20 and 0.25) multi quantum well MBE structures have been investigated at 300 K in dependence on the QD position on the wafer. PL mapping was performed with 325 nm HeCd laser (35 mW) focused down to 200 μm (110 W/cm²) as the excitation source. The structures with x = 0.15 In/Ga composition in the In_xGa_1−xAs capping layer exhibited the maximum photoluminescence intensity. Strong inhomogeneity of the PL intensity is observed by mapping samples with the In/Ga composition of x ≥ 0.20-0.25. The reduction of the PL intensity is accompanied by a gradual “blue” shift of the luminescence maximum at 300 K as follows from the quantum dot PL mapping. The mechanism of this effect has been analyzed. PL peak shifts versus capping layer composition are discussed as well.     

The emission wavelength tuning of InAs/InP quantum dots with thin GaAs, InGaAs, InP capping layers by MOCVD

InAs quantum dots (QDs) were grown on InP substrates by metalorganic chemical vapor deposition. The width and height of the dots were 50 and 5.8 nm, respectively on the average and an areal density of 3.0×10¹⁰ cm⁻² was observed by atomic force microscopy before the capping process. The influences of GaAs, In_0.53Ga_0.47As, and InP capping layers (5–10 ML thickness) on the InAs/InP QDs were studied. Insertion of a thin GaAs capping layer on the QDs led to a blue shift of up to 146 meV of the photoluminescence (PL) peak and an InGaAs capping layer on the QDs led to a red shift of 64 meV relative to the case when a conventional InP capping layer was used. We were able to tune the emission wavelength of the InAs QDs from 1.43 to 1.89 μm by using the GaAs and InGaAs capping layers. In addition, the full-width at half-maximum of the PL peak decreased from 79 to 26 meV by inserting a 7.5 ML GaAs layer. It is believed that this technique is useful in tailoring the optical properties of the InAs QDs at mid-infrared regime.     

Semiempirical tight-binding modelling of III-N-based heterostructures

In this work, we present a second nearest neighbour sp³s^* semi-empirical tight-binding theory to calculate the electronic band structure of heterostructures based on group III-N binary semiconductors and their ternaries. The model Hamiltonian includes the second nearest neighbour (2nn) interactions, the spin–orbit splitting and the nonlinear variations of the atomic energy levels and the bond length with ternary mole fraction. Using this sp³s^* tight-binding approach, we investigated the electronic band structure of Al_1−xGa_xN/GaN and In_1−xGa_xN/GaN heterostructures as a function of composition and interface strain for the entire composition range (0≤x≤1). There is an excellent agreement between the model predictions and experiment for the principal bandgaps at Γ, L and X symmetry points of the Brillouin zone for AlN, GaN and InN binaries and Al_1−xGa_xN and In_1−xGa_xN ternaries. The model predicts that the composition effects on the valence band offsets is linear, but on the conduction band offsets is nonlinear and large when the interface strain and deformation potential is large.     

Influence of stoichiometry on the luminescent properties of InAs quantum dots grown on a heterostructure

We report photoluminescence (PL) spectra of InP/In_xGa_1-xAs/InAs/InP dot-in-a-well structures grown by MOVPE, with different compositions of the ternary layer. Measurements with atomic force microscopy showed that the largest quantum dot (QD) height is obtained when the InAs QDs are grown on the In_xGa_1-xAs layer with a mismatch of 1000 ppm, and the height decreases as the mismatch departs from this value. PL spectra of the QDs showed an asymmetric band, which involves transitions between dot energy levels and can be deconvoluted into two peaks. The highest energy PL peak of this band was observed for the sample with the QDs grown on top of the lattice-matched In_xGa_1-xAs layer and it shifted to lower energies for strained samples as the degree of mismatch increased. Theoretical calculations of the energy levels of the entire structure were used to interpret the obtained PL spectra and determine the possible detection tunability range.     

Extremely narrow luminescence linewidth in GaAs single quantum wells by insertion of thin AlAs smoothing layers

We propose a new method to considerably reduce the overall growth interruption for high-quality GaAs single quantum wells during molecular beam epitaxy. The insertion of ultrathin AlAs smoothing layers at the constituent GaAs/Al _x Ga_1–x As heterointerfaces and growth interruptions of not more than 15 s yields an improvement of the luminescence linewidth (FWHM) to 0.56 meV for a 13 nm wide GaAs well and to a value as low as 0.195 meV for a 27 nm wide GaAs well. In addition, no Stokes shift between absorption and emission and no line splitting due to monolayer fluctuations in the well width is observed.     

Band offset calculations applied to III–V nitride quantum well device engineering

Band offset calculations for zinc-blende pseudomorphically strained Al_1−xGa_xN/Al_1−yGa_yN and In_xGa_1−xN/In_yGa_1−yN interfaces have been performed on the basis of the model solid theory combined with ab initio calculations. From the results obtained, we have calculated, separately, the valence and conduction band discontinuities of In_xGa_1−xN/GaN and GaN/Al_1−xGa_xN as a function of the indium and gallium contents respectively. Using the latter results, we have extended our study to simulate band discontinuities for strained Ga_1−xIn_xN/relaxed Al_1−yGa_yN heterointerfaces. Information derived from this investigation will be useful for the design of lattice mismatched heterostructures in modeling optoelectronic devices emitting at ultraviolet to near infrared wavelengths.     

Magnetotransport, optical, and electronic subband properties in AlxGa1−xN/AlN/GaN heterostructures

The Shubnikov-de Haas (S-dH) results at 1.5 K for Al_xGa_1−xN/AlN/GaN heterostructures and the fast Fourier transformation data for the S-dH data indicated the occupation by a two-dimensional electron gas (2DEG) of one subband in the GaN active layer. Photoluminescence (PL) spectra showed a broad PL emission about 30 meV below the GaN exciton emission peak at 3.474 eV that could be attributed to recombination between the 2DEG occupying in the AlN/GaN heterointerface and photoexcited holes. A possible subband structure was calculated by a self-consistent method taking into account the spontaneous and piezoelectric polarizations, and one subband was occupied by 2DEG below the Fermi level, which was in reasonable agreement with the S-dH results. These results can help improve understanding of magnetotransport, optical, and electronic subband properties in Al_xGa_1−xAs/AlN/GaN heterostructures.     

Highly strained InxGa(1−x)As−InyAl(1−y)As (x>0.8,y<0.3) layers for short wavelength QWIP and QCL structures grown by MBE

Highly strained quantum cascade laser (QCL) and quantum well infrared photodetector (QWIPs) structures based on In_xGa_(1−x)As−In_yAl_(1−y)As (x>0.8,y<0.3) layers have been grown by molecular beam epitaxy. Conditions of exact stoichiometric growth were used at a temperature of 420°C to produce structures that are suitable for both emission and detection in the 2–5 μm mid-infrared regime. High structural integrity, as assessed by double crystal X-ray diffraction, room temperature photoluminescence and electrical characteristics were observed. Strong room temperature intersubband absorption in highly tensile strained and strain-compensated In_0.84Ga_0.16As/AlAs/In_0.52Al_0.48As double barrier quantum wells grown on InP substrates is demonstrated. Γ–Γ intersubband transitions have been observed across a wide range of the mid-infrared spectrum (2–7 μm) in three structures of differing In_0.84Ga_0.16As well width (30, 45, and 80 Å). We demonstrate short-wavelength IR, intersubband operation in both detection and emission for application in QC and QWIP structures. By pushing the InGaAs–InAlAs system to its ultimate limit, we have obtained the highest band offsets that are theoretically possible in this system both for the Γ–Γ bands and the Γ–X bands, thereby opening up the way for both high power and high efficiency coupled with short-wavelength operation at room temperature. The versatility of this material system and technique in covering a wide range of the infrared spectrum is thus demonstrated.     

Electron beam epitaxy of alloy semiconductors

Abstract

It was investigated that, when an Al evaporated layer on a GaP (GaAs, GaAs_1?y P _y ) substrate was bombarded with total fluences of 0.1?1.0 × 10¹⁸ electrons cm^?2 at 7 MeV and at 50°C, a thin heteroepitaxial layer of Al _x Ga_1?x P (Al _x Ga_1?x As, Al _x Ga_1?x As_1?y P _y ) crystal was grown on S-doped (111), (100) and (110) GaP [(110) Cr, O-doped GaAs, (100) Te-doped GaAS_1?y P _y ] substrates.

Evidence for the creation of the epilayers before annealing was obtained from measurements using an X-ray diffractometer, an X-ray photoelectron spectrometer, a reflection high-energy electron diffractometer, a transmission electron microscope and a scanning transmission electron microscope. In the case of Al/GaP, the epitaxial layers of Al_～0.25Ga_～0.75P, Al_～0.5Ga_～0.5P and Al_～0.75Ga_～0.25P were grown on (111), (100) and (110) GaP substrates, respectively. Their compositions did not vary with the total electron fluence.     

Effect of hydrogen on modulation-doped AlGaAs/InGaAs/GaAs heterostructures: a photoluminescence study

The effect of hydrogen on donors and interface defects in silicon modulation doped Al_xGa_1−xAs/In_yGa_1−yAs/GaAs heterostructures has been investigated by photoluminescence (PL). Hydrogenation was carried out on two sets of samples, one set consists of high quality pseudomorphic heterostructures and another set having partially lattice relaxed structures prone to the defects. On exposure of high quality pseudomorphic structures to hydrogen plasma above 150 °C, a significant blue shift in the PL peak positions as well as bandwidth narrowing is observed. This indicates, the reduction in two-dimensional electron gas in the In_yGa_1−yAs quantum well due to hydrogen passivation of silicon donors in the Al_xGa_1−xAs supply layer. The reactivation of the donors is observed upon annealing the hydrogenated sample for 1 h at 250 °C under hydrogen ambient. Another interesting feature is a significant improvement in the PL of lattice-relaxed structures upon hydrogenation of the samples above 250 °C, which is attributed to the hydrogen passivation of interface defects due to the misfit dislocations.     

High-temperature operation of AlGaInAs/InP lasers1994

We discuss the design of uncooled lasers which minimizes the change in both threshold current and slope efficiency over the temperature range from–40 to +85°C [1]. To prevent carrier overflow under high-temperature operation, the electron confinement energy is increased by using the Al _x Ga _y In_1–x–y As/InP material system [1] instead of the conventional Ga _x In_1–x As _y P_1–y /InP material system. Experimentally, we have investigated strained quantum well lasers with three different barrier layers and confirmed that the static and dynamical performance of the lasers with insufficient carrier confinement degrades severely under high-temperature operation [2]. With an optimized barrier layer, the Al _x Ga _y In_1–x–y As/InP strained quantum well lasers show superior hightemperature performance, such as a small drop of 0.3 dB in slope efficiency when the heat sink temperature changes from 25 to 100°C [3], a maximum CW operation temperature of 185°C [4], a thermally-limited 3-dB bandwidth of 13.9 GHz at 85°C [2], and a mean-time-to-failure of 33 years at 100°C and 10 mW output power [5].     

Electron ionization rate in III–V ternary semiconductors

Theoretical calculations are presented for the ionization rate of electrons in III–V ternary semiconductor compounds considering alloy scattering and carrier-carrier interaction, in addition to optical phonon scattering and ionization scattering. However, alloy scattering is found to be a weak interaction. Fairly good agreement is obtained for Ga_1–x In _x As withx=0.14 and 0.53 with the experimental results and for Ga_0.5 Al_0.5 As with the existing theoretical result which used an indirect method. The alloy scattering potential has been taken in the form of energy band-gap difference. The calculations can be used for any ternary semi-conductor.