Superconductivity in amorphous thin films of tin–copper

The properties of the superconducting state in the amorphous Sn_1?xCu_x thin films were characterized. The concentration of copper changes in the range from 0.08 to 0.41. The calculations were conducted in the framework of the strong-coupling formalism, wherein the Eliashberg functions determined in the tunnel experiment were used. The value of the Coulomb pseudopotential equal to 0.1 was adopted. It will be shown that the critical temperature (T_C) decreases from 7 to 3.9 K. The ratio, R_Δ = 2Δ(0)/k_BT_C, differs from the BCS value: R_Δ ∈ <4.4, 3.95>, where Δ(0) represents the order parameter. Similarly behave the ratios: R_C = ΔC(T_C)/C^N(T_C) ∈ <2.2, 1.75> and R_H = T_CC^N(T_C)/H²_C(0) ∈ <0.141, 0.154>. The parameter ΔC(T_C) is the specific heat jump, C^N(T_C) denotes the specific heat of the normal state and H_C(0) is the thermodynamic critical field.     

Study on stability of hydrogenated amorphous silicon films

Hydrogenated amorphous silicon （a-Si：H） films with high and same order of magnitude photosensitivity （-10^5） but different stability were prepared by using microwave electron cyclotron resonance chemical vapour deposition system under the different deposition conditions. It was proposed that there was no direct correlation between the photosensitivity and the hydrogen content （CH） as well as H-Si bonding configurations, but for the stability, they were the critical factors. The experimental results indicated that higher substrate temperature, hydrogen dilution ratio and lower deposition rate played an important role in improving the microstructure of a-Si：H films. We used hydrogen elimination model to explain our experimental results.     

De-vitrification of nanoscale phase-separated amorphous thin films in the immiscible copper–niobium system

Copper and niobium are mutually immiscible in the solid state and exhibit a large positive enthalpy of mixing in the liquid state. Using vapour quenching via magnetron co-sputter deposition, far-from equilibrium amorphous Cu–Nb films have been deposited which exhibit a nanoscale phase separation. Annealing these amorphous films at low temperatures (~200?°C) initiates crystallization via the nucleation and growth of primary nanocrystals of a face-centred cubic Cu-rich phase separated by the amorphous matrix. Interestingly, subsequent annealing at a higher temperature (>300?°C) leads to the polymorphic nucleation and growth of large spherulitic grains of a body-centred cubic Nb-rich phase within the retained amorphous matrix of the partially crystallized film. This sequential two-stage crystallization process has been investigated in detail by combining transmission electron microscopy [TEM] (including high-resolution TEM) and atom probe tomography studies. These results provide new insights into the crystallization behaviour of such unusual far-from equilibrium phase-separated metallic glasses in immiscible systems.     

Photoconductivity in amorphous thin films of Ge22Se78−xBix

Temperature and intensity dependence of photoconductivity is studied in amorphous thin films of Ge₂₂Se_78−x Bi_x with x = 0, 2 and 10. Transient photoconductivity measurements have also been made on the same samples. Our results show that photosensitivity decreases as Bi concentration is increased from x = 0 to x = 2. However, at high concentration of Bi(x = 10), photosensitivity again increases. Transient photoconductivity also show a different behaviour at low and high concentration of Bi. Results have been explained in terms of defect states produced due to Bi incorporation in GeSe system.     

Some optical properties of Ge–S amorphous thin films

Amorphous Ge_xS_1−x films (x=0.27, 0.32, 0.36 and 0.4) were prepared by thermal evaporation. The values of the refractive index, the optical gap and the parameters of the Wemple–DiDomenico single oscillator model were determined. Using Miller's generalized rule the values of the third-order non-linear susceptibility were also estimated. Thermally induced bleaching was observed for films studied. Photobleaching was observed for sulfur rich and nearly stoichiometric films (x=0.27, 0.32) while for a germanium rich film (x=0.4) no response to the illumination was observed. The differences in photobleaching are attributed to the role of p-lone pair states and to an overall network rigidity of the films.     

Role of amorphous silicon domains of Er^3＋ emission in the Er—doped hydrogenated amorphous silicon suboxide film

An investigation on the correlation between amorphous Si (a-Si) domains and Er^{3+} emission in the Er-doped hydrogenated amorphous silicon suboxide (a-Si:O:H) film is presented. On one hand, a-Si domains provide sufficient carriers for Er^{3+} carrier-mediated excitation which has been proved to be the highest excitation path for Er^{3+} ion; on the other hand, hydrogen diffusion from a-Si domains to amorphous silicon oxide (a-SiO_x) matrix during annealing has been found and this possibly decreases the number of nonradiative centres around Er^{3+} ions. This study provides a better understanding of the role of a-Si domains on Er^{3+} emission in a-Si:O:H films.     

Compositional dependence of the optical properties of amorphous Se100– x Te x thin films

Thin films of amorphous Se_{100 –x} Te _x with different compositions (x = 10, 20, 30 and 40 at%) were deposited on glass substrates by thermal evaporation. Transmission spectra T(λ) of the films at normal incidence were obtained in the spectral region from 400 to 2500 nm. A straightforward analysis proposed by Swanepoel [J. Phys. E: Sci. Instrum. 17 896 (1984)], using of the maxima and minima of the interference fringes, was applied to derive the real and imaginary parts of the complex index of refraction plus film thickness. The dispersion of the refractive index is discussed in terms of the single-oscillator Wemple and DiDomenico model [Phys. Rev. B 3 1338 (1971)]. The optical band gap was determined from the spectral dependence of the absorption coefficient using the Tauc formula [in The Optical Properties of Solids, edited by F. Abeles (North Holland, Amsterdam, 1970), p. 227]. The refractive index increases and the optical band gap decreases with increasing tellurium content.     

Determination of the thickness and optical constants of amorphous Ge–Se–Bi thin films

The effect of varying bismuth concentration on the optical constants of amorphous Ge₂₀Se_{80? x} Bi _x (where x = 0, 3, 6, 9 and 12 at%) thin films prepared by thermal evaporation has been investigated. The transmission spectra T(λ) of the films at normal incidence were obtained in the spectral region from 400 to 2500 nm. An analysis proposed by Swanepoel [J. Phys. E: Sci. Instrum. 16 (1983) p.1214], based on the use of the maxima and minima of the interference fringes, was applied to derive the real and imaginary parts of the complex index of refraction and also the film thickness. Increasing bismuth content was found to affect the refractive index and extinction coefficient of the Ge₂₀Se_{80? x} Bi _x films. Optical absorption measurements show that the fundamental absorption edge is a function of composition. With increasing bismuth content, the refractive index increases while the optical band gap decreases.     

UV–visible spectral characterization and density functional theory simulation analysis on laser-induced crystallization of amorphous silicon thin films

The effect of laser energy density on the crystallization of hydrogenated intrinsic amorphous silicon （a-Si：H） thin films was studied both theoretically and experimentally. The thin films were irritated by a frequency-doubled （λ= 532 nm） Nd：YAG pulsed nanosecond laser. An effective density functional theory model was built to reveal the variation of bandgap energy influenced by thermal stress after laser irradiation. Experimental results establish correlation between the thermal stress and the shift of transverse optical peak in Raman spectroscopy and suggest that the relatively greater shift of the transverse optical （TO） peak can produce higher stress. The highest crystalline fraction （84.5%） is obtained in the optimized laser energy density （1000 mJ/cm2） with a considerable stress release. The absorption edge energy measured by the UV- visible spectra is in fairly good agreement with the bandgap energy in the density functional theory （DFT） simulation.     

Effect of Ge doping on the electrical properties of amorphous Zn–Sn–O thin films

We report the effect of germanium doping on the active layer of amorphous Zinc–Tin-Oxide (a-ZTO) thin film transistor (TFT). Amorphous thin film samples were prepared by RF magnetron sputtering using single targets composed of Zn₂Ge_0.05Sn_0.95O₄ and Zn₂SnO₄ with variable oxygen contents in the sputtering gases. In comparison with undoped, Ge-doped a-ZTO films exhibited five order of magnitude lower carrier density with a significantly higher Hall-mobility, which might be due to suppressed oxygen vacancies in the a-ZTO lattice since the Ge substituent for the Sn site has relatively higher oxygen affinity. Thus, the bulk and interface trap densities of Ge-doped a-ZTO film were decreased one order of magnitude to 7.047 × 10¹⁸ eV⁻¹cm⁻³ and 3.52 × 10¹¹ eV⁻¹cm⁻², respectively. A bottom-gate TFT with the Ge-doped a-ZTO active layer showed considerably improved performance with a reduced SS, positively shifted V_th, and two orders of magnitude increased I_on/I_off ratio, attributable to the doped Ge ions.     

In situ transmission electron microscopy observations of?the?crystallization of?amorphous?Ge?films

The crystallization of amorphous Ge films has been studied as a function of annealing temperature between 400 and 700°C by in situ transmission electron microscopy (TEM). It is found that crystallization does not occur until the annealing temperature reaches 650°C, which is nearly 250°C higher than the crystallization temperature in previous reports. The high crystallization temperature and average crystal size obtained by in situ TEM are in agreement with those from Raman spectroscopy and X-ray diffraction measurement. The kinetics analysis indicates that homogeneous nucleation is the dominant crystallization mode and the activation energy is up to about 3.1 eV.     

Crystallization temperatures of thin Co−Zr amorphous alloy films from electron diffraction

The transformation of amorphous thin alloy films of Co–Zr to the crystalline state was observed with an electron microscope in the diffraction mode. This investigation elucidates the crystallization temperatures,T _x , of thin films as opposed to theT _x presented for thicker samples; usually melt-quenched in the thickness range of 20–50 m. TheT _x of the thin films are compared also with theT _x for sputtered alloys of Co–Zr at 5 m.     

Influence of implantation dose on electroluminescence from Si-implanted silicon nitride thin films

Strong visible electroluminescence (EL) with electrically tunable colors from violet to white has been observed from Si-implanted silicon nitride thin films. Influence of the implanted Si ion dose on both the current conduction and EL properties has been studied. With a larger excess Si concentration, the carrier transport is enhanced leading to a higher EL intensity, but the light emission efficiency is reduced. On the other hand, the increase of the excess Si concentration causes redshifts in the major EL bands and improves the transition of the EL colors with increasing current. The excess Si concentration is also found to have a significant influence on the EL degradation. These findings are important to the application of the Si-implanted thin films in light emitting devices.     

Can the crystallization rate be independent from the crystallization enthalpy? The case of amorphous silicon

The crystallization enthalpy measured in a large series of amorphous silicon (a-Si) materials varies within a factor of 2 from sample to sample (Kail et al 2011 Phys. Status Solidi RRL 5 361). According to the classical theory of nucleation, this variation should produce large differences in the crystallization kinetics leading to crystallization temperatures and activation energies exceeding 550?°C and 1.7 eV, respectively, the 'standard' values measured for a-Si obtained by self-implantation. In contrast, the observed crystallization kinetics is very similar for all the samples studied and has no correlation with the crystallization enthalpy. This discrepancy has led us to propose that crystallization in a-Si begins in microscopic domains that are almost identical in all samples, independently of their crystallization enthalpy. Probably the existence of microscopic inhomogeneities also plays a crucial role in the crystallization kinetics of other amorphous materials and glasses.     

Heat “superemission” and nucleation-front propagation under laser-induced crystallization of thin amorphous films

The laser-induced solid-state explosive nucleation in amorphous media is studied analytically. The shapes of the temperature switching wave and that of the nucleation front as well as the formula for the front velocity are derived considering also self-consistent medium deformation. Two conditions of explosive nucleation reflecting the roles of latent heat emission and of deformation are formulated. It is shown that, in explosive nucleation, the rate of internal heat emission is proportional to the square of the latent crystallization heat (superemission) in analogy to photon superradiance in initially inverted two-level atomic systems.     

On the short-range order of amorphous Al−Au films

Al_100–x Au _x films (20x71) are produced by quench condensation. The analysis of electron diffraction patterns as well as resistivity measurements reveal the liquid-like structure of these films. In contrast to amorphous Al–Cu films the amorphous Al–Au filsm exhibit prepeaks in their interference functions. Atomic distances as large as the smallest Au–Au separations existing in the compound Al₂Au are responsible for these prepeaks. The CaF₂-type structure of this particular compound is due to an ionic bonding contribution in Al₂Au. This bonding contribution, probably caused by the large electronegativity difference between Al and Au, seems to be responsible for the pronounced chemical short-range order in amorphous Al–Au films.