The GaP(001) surface and the adsorption of Cs

GaP(001) cleaned by argon-ion bombardment and annealed at 500°C showed the Ga-stabilized GaP(001)(4 × 2) structure. Only treatment in 10^?5 Torr PH₃ at 500°C gave the P-stabilized GaP(001)(1 × 2) structure. The AES peak ratio $\text{P}\text{Ga}$ is 2 for the (4 × 2) and 3.5 for the (1 × 2) structure. Cs adsorbs with a sticking probability of unity up to 5 × 10¹⁴ Cs atoms cm^?2 and a lower one at higher coverages. The photoemission measured with uv light of 3660 Å showed a maximum at the coverage of 5 × 10¹⁴ atoms cm^?2. Cs adsorbs amorphously at room temperature, but heat treatment gives ordered structures, which are thought to be reconstructed GaP(001) structures induced by Cs. The LEED patterns showed the GaP(001)(1 × 2) Cs structure formed at 180°C for 10 h with a Cs coverage of 5 × 10¹⁴ atoms cm^?2, the GaP(001)(1 × 4) Cs formed at 210°C for 10 hours with a Cs coverage of 2.7 × 10¹⁴ atoms cm^?2, the GaP(001)(7 × 1) and the high temperature GaP(001)(1 × 4), the latter two with very low Cs content. Desorption measurements show three stability regions: (a) between 25–150°C for coverages greater than 5 × 10¹⁴ atoms cm^?2, and an activation energy of 1.2 eV; (b) between 180–200°C with a coverage of 5 × 10¹⁴ atoms cm^?2, and an activation energy of 1.8 eV; (c) between 210–400°C with a coverage of 2.7 × 10¹⁴ atoms cm^?2, and an activation energy of 2.5 eV.     

Leed,aes and photoemission measurements of epitaxially grown GaAs(001), (111)A and (1̄1̄1̄)B surfaces and their behaviour upon cs adsorption

Epitaxially grown GaAs(001), (111) and (1?1?1?) surfaces and their behaviour on Cs adsorption are studied by LEED, AES and photoemission. Upon heat treatment the clean GaAs(001) surface shows all the structures of the As-stabilized to the Ga-stabilized surface. By careful annealing it is also possible to obtain the As-stabilized surface from the Ga-stabilized surface, which must be due to the diffusion of As from the bulk to the surface. The As-stabilized surface can be recovered from the Ga-stabilized surface by treating the surface at 400°C in an AsH₃ atmosphere. The Cs coverage of all these surfaces is linear with the dosage and shows a sharp breakpoint at 5.3 × 10¹⁴ atoms cm^?2. The photoemission reaches a maximum precisely at the dosage of this break point for the GaAs(001) and GaAs(1?1?1?) surface, whereas for the GaAs(111) surface the maximum in the photoemission is reached at a higher dosage of 6.5 × 10¹⁴ atoms cm^?2. The maximum photoemission from all surfaces is in the order of 50μA Im^?1 for white light (T = 2850 K). LEED measurements show that Cs adsorbs as an amorphous layer on these surfaces at room temperature. Heat treatment of the Cs-activated GaAs (001) surface shows a stability region of 4.7 × 10¹⁴ atoms cm^?2 at 260dgC and one of 2.7 × 10¹⁴ atoms cm^?2 at 340°C without any ordering of the Cs atoms. Heat treatment of the Cs-activated GaAs(111) crystal shows a gradual desorption of Cs up to a coverage of 1 × 10¹⁴ atoms cm^?2, which is stable at 360°C and where LEED shows the formation of the GaAs(111) (√7 × √7)Cs structure. Heat treatment of the Cs-activated GaAs(1?1?1?) crystal shows a stability region at 260°C with a coverage of 3.8 × 10¹⁴ atoms cm^?2 with ordering of the Cs atoms in a GaAs(1?1?1?) (4 × 4)Cs structure and at 340°C a further stability region with a coverage of 1 × 10¹⁴ at cm^?2 with the formation of a GaAs(1?1?1?) (√21 × √21)Cs structure. Possible models of the GaAs(1?1?1?) (4 × 4)Cs, GaAs(1?1?1?)(√21 × √21)Cs and GaAs(111) (√7 × √7)Cs structures are given.     

Ionic conductivity in lithium imide

The ionic conductivity of polycrystalline lithium imide has been determined from -40 to 105°C using AC techniques and comples plane analysis. The ionic conductivity is 3 × 10^-4 Ω^-1 cm^-1 at 25°C, with an activation enthalpy of 56±1 kJ/mole. The stability has been estimated to be about 0.7 V.     

Evidence of complex positron-ammonia interaction in ammonia gas

Positron annihilation in ammonia gas at temperatures of ?19°C, 22,5°C, and 95°C in the density range 1.76 × 10^?4 g/cm³ to 6.63 × 10^?3 g/cm³ is investigated. ¹Z_eff for orthopositronium annihilation is 0.58 ± 0.04 Z_eff/ Z for positrons not forming positronium varies from about 117 to 1329.     

Gelatin-HCl biomembranes with ionic-conducting properties

Gelatin-HCl protonic gel polymer electrolytes were obtained by crosslinking with formaldehyde in the presence of hydrochloric acid and glycerol as plasticizer and characterized in present study. The ionic conductivity measurements revealed the best value of 5.35?×?10^?5 S cm^?1 at room temperature. Factorial design analysis showed that influence of glycerol is more pronounced than influence of acid on ionic conductivity values. Moreover, the 90 % transparent membranes evidenced a linear increase of ionic conductivity values of 5.35?×?10^?5 S cm^?1 at 26.5 °C to 5.77?×?10^?4 S cm^?1 at 82.8 °C following Arrhenius type mechanism of charge mobility.     

Evaporated a-Si films with low ESR defect density by hydrogenation under NH3 ambient

a-Si films were obtained by a reactive evaporation of Si atoms with an electron gun, under a NH₃ ambient of 5 × 10^?5 torr. The H introduced amount efficiently reduces the ESR dangling bond density from 4 × 10¹⁹ cm^?3 in pure samples to 2 × 10¹⁷ cm^?3. The hydrogen presence is evidence by both the Si-H infrared bands and the strong spin-density increase with annealing. This increase, beginning at a temperature of 350°C, is attributed to the H effusion. XPS measurements show also an incorporation of bonded nitrogen.     

Ionic transport in the lithium nitride bromides,Li6NBr3 and Li1 3N4Br

The ionic and electronic conductivities of the lithium nitride bromides Li₆NBr₃ and Li_{1 3}N₄Br have been studied in the temperature range from 50 to 220°C and 120 to 450°C, respectively. Both compounds are practically pure lithium ion conductors with negligible electronic contribution. Li₆NBr₃ has an ionic conductivity Ω of 2 × 10^-6Ω^-1cm^-1 at 100°C and an activation enthalpy for σT of 0.46 eV. Li_{1 3}N₄Br shows a phase transition at about 230°C. The activation enthalpy for σT is 0.73 eV below and 0.47 eV above this temperature. The conductivities at 150 and 300°C were found to be 3.5 × 10^-6 Ω^-1cm^-1 and 1.4 × 10^-3Ω^-1cm^-1, respectively. The crystal structure is hexagonal at room temperature with $\text{a = 7.415 (1)}\text{A}\text{?}$ and $\text{c = 3.865 (1)}\text{A}\text{?}$.     

Preparation of Li1.5Al0.5Ti1.5(PO4)3 solid electrolyte via a co-precipitation method

The co-precipitation method can make the materials react uniformly at molecular level and has the advantages of lower polycrystalline synthesized temperature and shorter sintering time. Therefore, it is expected that the mass production of Li_1.5Al_0.5Ti_1.5(PO₄)₃ (LATP) solid electrolyte would be possible by application of the co-precipitation method for LATP preparation. In this study, an application of the co-precipitation method for a preparation of LATP solid electrolyte is attempted. Crystallized LATP powder is obtained by heating precipitant containing Li, Al, Ti, and PO₄ at 800 °C for 30 min. The LATP bulk sintered pellet is successfully prepared using the crystallized LATP powder by calcinating at 1,050 °C. The cross-sectional SEM images show that many crystal grains exist, and the grains are in good contact with each other, i.e., there is no void space. All diffraction peaks of the pellet are attributed to LATP in XRD pattern. The sintered pellet is obtained by calcinating at 1,050 °C, which is more than 150 °C lower than that of conventional method. The LATP solid electrolyte shows a good conductivity which is 1.4?×?10^?3 S cm^?1 for bulk and 1.5?×?10^?4 S cm^?1 for total conductivities, respectively.     

Ionic conductivity of Zr1−xIn2xO2−x

As x in Zr(In)O_2?x is increased from 0.08 to 0.16 (9–19 mole per cent In₂O₃) the activation energy E(x) for ionic conduction increases from 1.05 to 1.51 eV; the concuctivity decreases from 2 × 10^?5 to 3 × 10^?6Ω^?1cm^?1at 400°C, is composition-independent at about 580°C, and increases from 1 × 10^?2 to 4 × 10^?2Ω^?1cm^?1 at 800°C. The pre-exponential term of the Boltzmann-type conductivity equation depends exponentially on E(x), a much stronger dependence on x than theoretically expected with a model for ionic conductivity that includes nearest-neighbor defect interactions. Analysis of reported conductivity data for Zr(M)O_2?x (M = Sc, Y, Ca and rare earth metals) and other doped oxide electrolytes with fluorite-type structure reveals that the same relationship is observed with these materials when x γ0.08. It is shown that ionic conduction in these oxides is consistent with nearest neighbor vacancy-cation defect interaction forx < 0.08 but that an additional complex interaction with composition-dependent free energy ΔG(x) occurs when xγ 0.08.The lattice constant of Zr(In)O_2?x with the cubic fluorite-type structure is independent of composition, 5.114 ± 0.002 Å, in agreement with ionic size considerations.     

Ionic conductivity of alkali metal chloroaluminates

The electrical conductivity of three alkali metal chlorluminates has been investigated from room temperature to above the melting point. Ionic conductivities at 25°C are 1.2 × 10^?6, 3.5 × 10^?7 and 3.2 × 10^?9omh^?1 cm^?1, and activation enthalpies are 0.47, 0.46 and 0.53 eV for LiAlCl₄, NaAlCl₄ and KAlCl₄.     

Bromide ion conductivities of eutectic mixtures of quaternary ammonium bromides possessing long alkyl chains

Several quaternary ammonium bromides possessing long alkyl chains and their mixtures were found to be bromide ion conductors. The ionic conductivities of quaternary ammonium bromides themselves were lower than 10^?9 S cm^?1 at a room temperature. On the other hand, the eutectic mixtures of the quaternary ammonium bromides showed large increase of ionic conductivity. The best bromide ion conductors were found for the eutectic of Q₅, Q₇, Q₈, and Q₁₂: 4×10^?8 S cm^?1 at 30°C, and 6.3×10^?6 S cm^?1 at 50°C. Addition of asymmetric quarternary ammonium bromides had a negative effect on the ionic conductivity. These results were explained by a space filling factor in the solid.     

Beam transport

Abstract

Dopant distribution, electrical activity and damage annealing of high-dose (～5 × 10¹⁵ cm²) Ga-implanted silicon samples annealed by conventional thermal annealing have been studied by alpha particle back-scattering, differential Hall effect and ellipsometry measurements. Back-scattering spectra show that there is no long tail of Ga atoms in the as-implanted samples. Upon annealing these samples the damaged amorphous layer recrystallizes at about 570°C by solid phase epitaxy. During the epitaxial regrowth the dopant atom distribution seems to be modified. Further, very high levels of electrical activaton of Ga-atoms (～3 × 10²⁰ cm^?3), much higher than the maximum solubility limit of Ga in Si (4.5 × 10¹⁹ cm^?3), is achieved by thermal annealing of the sample at ～570°C. This is comparable to the doping achieved by laser annealing of the Ga implanted Si. All the above three measurements show that there is residual damage in the high dose (?10¹⁵cm^?2) implanted samples after the recrystallization at about 570°C. This may be related to strain in the lattice at the high concentrations of metastable substitutional Ga atoms. Annealing at higher temperature reduces the electrical activity of Ga atoms, possibly by driving out the metastably high substitutional concentrations of Ga-atoms into electrically inactive clusters or precipitates.     

Light scattering by single magnons in FeF3

Scattering of laser light from single magnons has been observed in the canted antiferromagnet FeF₃ as a function of temperature (260 – 360°K) and wave-vector (2 × 10⁵ ? 3 × 10⁴cm^?1). Measured magnon energies ranging up to 3.3 cm^?1 (260°K) and line widths are in good agreement with data from microwave resonance work.     

Enhancement in electrochemical properties of ionic liquid-based nanocomposite polymer electrolytes by 100 MeV Si9+ swift heavy ion irradiation

Swift heavy ion (SHI) irradiation has been used as a tool to enhance the electrochemical properties of ionic liquid-based nanocomposite polymer electrolytes dispersed with dedoped polyaniline (PAni) nanorods; 100 MeV Si⁹⁺ ions with four different fluences of 5?×?10¹⁰, 1?×?10¹¹, 5?×?10¹¹, and 1?×?10¹² ions cm^?2 have been used as SHI. XRD results depict that with increasing ion fluence, crystallinity decreases due to chain scission up to fluence of 5?×?10¹¹ ions cm^?2, and at higher fluence, crystallinity increases due to cross-linking of polymer chains. Ionic conductivity, electrochemical stability, and dielectric properties are enhanced with increasing ion fluence attaining maximum value at the fluence of 5?×?10¹¹ ions cm^?2 and subsequently decrease. Optimum ionic conductivity of 1.5?×?10^?2 S cm^?1 and electrochemical stability up to 6.3 V have been obtained at the fluence of 5?×?10¹¹ ions cm^?2. Ac conductivity studies show that ion conduction takes place through hopping of ions from one coordination site to the other. On SHI irradiation, amorphicity of the polymer matrix increases resulting in increased segmental motion which facilitates ion hopping leading to an increase in ionic conductivity. Thermogravimetric analysis (TGA) measurements show that SHI-irradiated nanocomposite polymer electrolytes are thermally stable up to 240–260 °C.     

Elastic scattering of the conduction electrons by adsorbed hydrogen

The cross section of adsorbed hydrogen for the conduction electrons is evaluated according to the Boltzmann-Fuchs equation, the Greene and Soffer theories for surface scattering of the conduction electrons and to the change of the electrical resistivity due to hydrogen adsorbed on evaporated nickel films obtained experimentally by Suhrmann et al. The calculated cross sections are 2.0 × 10^?15 cm² and 1.8 × 10^?15 cm² at 273°K and 90°K respectively at a low coverage of hydrogen, which are consistent with the theoretical value 3.0 × 10^?15 cm² by Toya and reasonable compared with 0.9 × 10^?15 cm², the cross section of a gaseous hydrogen atom. The cross section decreases with increase of the coverage. This change is considered to be closely related to that of the heat of adsorption.     

Annealing characteristics of highly doped ion implanted phosphorus layers in silicon

A combination of sheet resistance, stripping and Hall effect measurements have been made on phosphorus layers implanted into silicon at 40 and 100 keV with doses between 1 × 10¹⁵ and 5 × 10¹⁶ atoms/cm². The implants were made at room temperature and 450°C. After annealing at 650°C, the profile of electrically active phosphorus following a high dose room temperature implant, was found to be flat topped with a concentration of approximately 5 × 10²⁰/cm³. Very little diffusion occurred when annealing to 850°C where the free electron concentration increased to approximately 1.5 × 10²¹/cm³. Highly doped channeled tails were found when implanting at 450°C along the 〈110〉 direction and damage was being continuously annealed out preventing the formation of an amorphous phase. The rapid diffusion of the profile into the bulk found when annealing between 650°C and 850°C was speculated to be due to the presence of a dense dislocation entanglement in these layers following a hot implant.     

Recrystallization of hexagonal silicon carbide after gold ion irradiation and thermal annealing

Silicon carbide (SiC) single crystals with the 6H polytype structure were irradiated with 4.0-MeV Au ions at room temperature (RT) for increasing fluences ranging from 1?×?10¹² to 2?×?10¹⁵ cm^?2, corresponding to irradiation doses from ~0.03 to 5.3 displacements per atom (dpa). The damage build-up was studied by micro-Raman spectroscopy that shows a progressive amorphization by the decrease and broadening of 6H-SiC lattice phonon peaks and the related growth of bands assigned to Si–Si and C–C homonuclear bonds. A saturation of the lattice damage fraction deduced from Raman spectra is found for ~0.8?dpa (i.e. ion fluence of 3?×?10¹⁴ cm^?2). This process is accompanied by an increase and saturation of the out-of-plane expansion (also for ~0.8?dpa), deduced from the step height at the sample surface, as measured by phase-shift interferometry. Isochronal thermal annealing experiments were then performed on partially amorphous (from 30 to 90%) and fully amorphous samples for temperatures from 200 °C up to 1500 °C under vacuum. Damage recovery and densification take place at the same annealing stage with an onset temperature of ~200 °C. Almost complete 6H polytype regrowth is found for partially amorphous samples (for doses lower than 0.8 dpa) at 1000 °C, whereas a residual damage and swelling remain for larger doses. In the latter case, these unrelaxed internal stresses give rise to an exfoliation process for higher annealing temperatures.     

The influence of neutron and proton irradiation on the magnetization of biotite

This paper reports on the results of investigations into the field dependences of the magnetization for biotite in the initial state, after heat treatment at a temperature of 1000°C for 15 min, and after irradiation with 14-MeV neutrons at a dose of 1.2×10¹³ cm^?2 or with 3-MeV protons at a dose of 2.2×10¹⁴ cm^?2. It is demonstrated that the magnetization of biotite drastically increases after neutron and proton irradiation. This effect can be associated with the formation of oxide melt at radiation-induced thermal peaks and the freezing of high-temperature phase states corresponding to magnetite or magnetite-hematite solid solutions.     

Electrical conduction mechanism and carrier trapping in β-metal free phthalocyanine single crystals

The dark electrical conductivity of β-metal free phthalocyanine single crystals has been investigated over the temperature range 273–600°K, at a reduced pressure of 10^?7 torr. The results obtained are in accordance with the model proposed by Barbe and Westgate[5] for this material, in which the energy gap between the top of the valence band and the bottom of the conduction band is determined to be 2·00 eV. At temperatures below about 410°K, the conduction process is consistent with the presence of an electron trapping level located 0·32 eV below the conduction band edge, with a density of 7×10¹⁶ cm^?3, and a donor level of density 2×10⁷ cm^?3 at the same energy. Above about 410°K, there is evidence to suggest that the conduction process is intrinsic.     

Fundamental absorption edge of evaporated amorphous WO3 films

The fundamental absorption edge of evaporated WO₃ films is investigated. The optical gap of the virgin film is estimated to be 3.41 eV at room temperature and it decreases with increase of annealing temperature up to 200°C. Annealing at 300°C leads to change in the spectral shape, which is caused by crystallization. For the films annealed at 200°C, temperature coefficient of the optical gap is estimated to be ?2×10^?4 eV/K and the slope of Urbach's tail is found to be independent of measuring temperature up to 200°C. With electrolytic coloration, shift of the optical gap toward higher energy is observed. Magnitude of this shift is estimated to be 0.05 eV at the color center concentration of 7.5×10²¹ cm^?3 when H⁺ electrolyte is used. If Li⁺ electrolyte is used, the magnitude of this shift is about three times larger than in the case of H⁺ electrolyte. This fact is interpreted by a small change in the host matrix structure owing to the injection of proton or Li⁺ during coloration.