Structural and electronic properties of group III Rich In0.53Ga0.47As(001)

The structural and electronic properties of group III rich In_0.53Ga_0.47As(001) have been studied using scanning tunneling microscopy/spectroscopy (STM/STS). At room temperature (300 K), STM images show that the In_0.53Ga_0.47As(001)–(4 × 2) reconstruction is comprised of undimerized In/Ga atoms in the top layer. Quantitative comparison of the In_0.53Ga_0.47As(001)–(4 × 2) and InAs(001)–(4 × 2) shows the reconstructions are almost identical, but In_0.53Ga_0.47As(001)–(4 × 2) has at least a 4× higher surface defect density even on the best samples. At low temperature (77 K), STM images show that the most probable In_0.53Ga_0.47As(001) reconstruction is comprised of one In/Ga dimer and two undimerized In/Ga atoms in the top layer in a double (4 × 2) unit cell. Density functional theory (DFT) simulations at elevated temperature are consistent with the experimentally observed 300 K structure being a thermal superposition of three structures. DFT molecular dynamics (MD) show the row dimer formation and breaking is facilitated by the very large motions of tricoodinated row edge As atoms and z motion of In/Ga row atoms induced changes in As–In/Ga–As bond angles at elevated temperature. STS results show there is a surface dipole or the pinning states near the valence band (VB) for 300 K In_0.53Ga_0.47As(001)–(4 × 2) surface consistent with DFT calculations. DFT calculations of the band-decomposed charge density indicate that the strained unbuckled trough dimers being responsible for the surface pinning.     

Dark current simulation of InP/In0.53Ga0.47As/InP p-i-n photodiode

We report on 2D simulations of dark current for InP/In_0.53Ga_0.47aAs/InP p-i-n photodiode. Our simulation result is in good agreement with experiment confirming that generation-recombination effect is the dominant source of the dark current at low bias. Effects of the thickness and doping concentration of the absorption layer on the dark current are discussed in detail.     

Observation of confined states in anIn0.53Ga0.47As/In0.52Al0.48Asmulti-quantum wells structure by quantum confined Stark effects

Photocurrent spectra in an In_0.53Ga_0.47As /In_0.52Al_0.48As multi-quantum wells structure containing 9.4 nm wide wells were measured at room temperature in electric fields. The exciton peaks of ground-state transitions shifted fairly in 167 kV cm ^− 1as the quantum confined Stark effect. Stark shifts were calculated by using the Runge–Kutta method using the effective mass equation with our experimental band parameters. Our parameters are the hole effective masses and valence band offset derived from saturation of a highest eigen energy, electron effective mass depending on energies and the conduction band offset derived from observed quantum number. It was possible to sufficiently use our experimental band parameters for the calculation of the Stark shift in the electric field.     

Manganite heterojunction photodetectors for femtosecond pulse laser measurements

We report a sensitive photodetector, based on a manganite junction La_2/3Ca_1/3MnO₃/Si, for femtosecond (fs) pulse laser energy per pulse and average power measurements. The La_2/3Ca_1/3MnO₃/Si photodetector exhibits D^? (normalized detectivity) greater than 5.229×10⁹ cm Hz^1/2 W^?1. The open-circuit photovoltage and short-circuit photocurrent responsivities reach ～268 V/mJ and ～275 A/mJ for single pulse irradiation, respectively, and the open-circuit photovoltage responsivity reaches ～1.7 V/W for average power illumination. The experimental results make the manganite junction a promising fs laser measurement detector and reference standard for calibrating fs lasers.     

InGaAsP/InP photodetectors targeting on 1.06 μm wavelength detection

InP-based InGaAsP photodetectors targeting on 1.06 μm wavelength detection have been grown by gas source molecular beam epitaxy and demonstrated. For the detector with 200 μm mesa diameter, the dark current at 10 mV reverse bias and R₀A are 8.89 pA (2.2 × 10⁻⁸ A/cm²) and 3.9 × 10⁵ Ω cm² at room temperature. The responsivity and detectivity of the InGaAsP detector are 0.30 A/W and 1.45 × 10¹² cm Hz^1/2 W⁻¹ at 1.06 μm wavelength. Comparing to the reference In_0.53Ga_0.47As detector, the dark current of this InGaAsP detector is about 570 times lower and the detectivity is more than ten times higher, which agrees well with the theoretical estimation.     

Magnetotransport in modulation-doped In0.53Ga0.47As/In0.52Al0.48As heterojunctions: in-plane effective mass,quantum and transport mobilities of 2D electrons

Shubnikov–de Haas (SdH) and Hall effect measurements, performed in the temperature range between 3.3 and 20 K and at magnetic fields up to 2.3 T, have been used to investigate the electronic transport properties of lattice-matched In_0.53Ga_0.47As/In_0.52Al_0.48As heterojunctions. The spacer layer thickness (t_S) in modulation-doped samples was in the range between 0 and 400 Å. SdH oscillations indicate that two subbands are already occupied for all samples except for that witht_S =  400 Å. The carrier density in each subband, Fermi energy and subband separation have been determined from the periods of the SdH oscillations. The in-plane effective mass (m ^* ) and the quantum lifetime (τ_q) of 2D electrons in each subband have been obtained from the temperature and magnetic field dependences of the amplitude of SdH oscillations, respectively. The 2D carrier density (N₁) in the first subband decreases rapidly with increasing spacer thickness, while that (N₂) in the second subband, which is much smaller thanN₁ , decreases slightly with increasing spacer thickness from 0 to 200 Å. The in-plane effective mass of 2D electrons is similar to that of electrons in bulk In_0.53Ga_0.47As and show no dependence on spacer thickness. The quantum mobility of 2D electrons is essentially independent of the thickness of the spacer layer in the range between 0 and 200 Å. It is, however, markedly higher for the samples with a 400 Å thick spacer layer. The quantum mobility of 2D electrons is substantially smaller than the transport mobility which is obtained from the Hall effect measurements at low magnetic fields. The transport mobility of 2D electrons in the first subband is substantially higher than that of electrons in the second subband for all samples with double subband occupancy. The results obtained for transport-to-quantum lifetime ratios suggest that the scattering of electrons in the first subband is, on average, forward displaced in momentum space, while the electrons in the second subband undergo mainly large-angle scattering.     

Modeling of electrical and optical characteristics of near room-temperature CdS/ZnSe based NIR photodetectors

Results of modeled photodetector characteristics in (CdS/ZnSe)/BeTe multi-well diode with p–i–n polarity are reported. The dark current density (J–V) characteristics, the temperature dependence of zero-bias resistance area product (R₀A), the dynamic resistance as well as bias dependent dynamic resistance (R_d) and have been analyzed to investigate the mechanisms limiting the electrical performance of the modeled photodetectors. The quantum efficiency, the responsivity and the detectivity have been also studied as function of the operating wavelength. The suitability of the modeled photodetector is demonstrated by its feasibility of achieving good device performance near room temperature operating at 1.55 μm wavelength required for photodetection in optical communication. Quantum efficiency of ∼95%, responsivity ∼0.6 A/W and D^* ∼ 5.7 × 10¹⁰ cm Hz^1/2/W have been achieved at 300 K in X BeTe conduction band minimum.     

InAs/GaSb strained layer superlattice detectors with nBn design

We have investigated the electrical and optical properties of an nBn based Type-II InAs/GaSb strained layer superlattice detector as a function of absorber region background carrier concentration. Temperature-dependent dark current, responsivity and detectivity were measured. At T = 77 K and V_b = 0.1 V, with two orders of magnitude change in doping concentration, the dark current density increased from ～0.3 mA/cm² to ～0.3 A/cm². We attribute this to a depletion region that exists at the AlGaSb barrier and the SLS absorber interface. The device with non-intentionally doped absorption region demonstrated the lowest dark current density (0.3 mA/cm² at 0.1 V) with a specific detectivity D¹ at zero bias equal to 1.2 × 10¹¹ Jones at 77 K. The D¹ value decreased to 6 × 10¹⁰ cm Hz^1/2/W at 150 K. This temperature dependence is significantly different from conventional PIN diodes, in which the D¹ decreases by over two orders of magnitude from 77 K to 150 K, making nBn devices a promising alternative for higher operating temperatures.     

Effect of temperature on the current–voltage characteristics of GaAs/AlGaAs quantum cascade photodetectors

Transport of electrons within a quantum cascade photodetector structure takes place with the help of the scattering of electrons by phonons. By calculating scattering rates of the electrons mediated by longitudinal optical phonons (the dominant scattering mechanism), current–voltage characteristic of a quantum cascade photodetector is calculated. The results indicate that with the increase of bias voltage dark current increases rapidly, then the increase becomes slow at higher voltages, whilst photocurrent remains approximately constant with only slight variations in its magnitude. With the increase of temperature from 80 K to 160 K dark current increases by about two orders of magnitude while photocurrent varies slightly, so that at the illuminating power of 1 mW/m² photocurrent density increases in mean from 1.10×10⁻⁹ A/cm² at 80 K to 1.14×10⁻⁹ A/cm² at 160 K and then decreases to 1.03×10⁻⁹ A/cm² at 240 K. Thus the responsivity of the detector varies only slightly with temperature. However owing to the decrease in the resistivity of the photodetector with the increase of temperature, Johnson noise limited detectivity decreases considerably.     

Incorporation behaviour of manganese in MBE grown Ga0.47In0.53As

Acceptor doping of MBE grown Ga_0.47In_0.53As on InP:Fe substrates utilizing manganese is investigated as an alternative for overcoming problems related to beryllium doping. The incorporation behaviour of manganese is analyzed in detail with respect to its application in optoelectronic device structures. Special emphasis is put on low-level and maximum-level doping relevant for use in buffer and contact layers, respectively. The dependence of activation energy and the degree of ionization on acceptor concentration is determined. At high doping levels the free-hole concentration is markedly lower than the doping concentration. It is attributed to the diffusion of acceptor species across the heterointerface into the substrate. Manganese diffusion is demonstrated to be an important effect for the interpretation of the measurement results. Manganese doping is applied in p⁺/n/p^–-layer structures for junction field effect transistor applications. The intended abruptness of acceptor profiles is deteriorated by diffusion of manganese in the Ga_0.47In_0.53As material. The degraded device characteristics obtained are attributed to the acceptor diffusion behaviour established.     

Optical properties of GaAs/Ga 1-xAlxAs ridge quantum wire: Third-harmonic generation

In this paper, the third-harmonic generation (THG) in GaAs/Ga_1 ? xAl_xAs ridge quantum wires is studied in detail. An analytic expression for the THG is obtained using a compact density matrix approach and an iterative procedure. Numerical calculations are performed for the typical GaAs/Ga_1 ? xAl_xAs ridge quantum wire. The results show that the maximum THG over 10^? 9_? m²_?/V²_? can be obtained. Another important point is that the structural parameters have great influence on the THG in this system.     

Maskless photoassisted etching of N-type Ga0.47In0.53As in basic solutions

The maskless photoassisted etching of n-type Ga_0.47In_0.53As is examined for basic KOH solutions in comparison with GaAs and InP material. The etch rate increases with laser intensity and with carrier concentration up to a saturation value. The best etch rate is obtained with molar KOH in ethyl alcohol (7 ms^–1 for laser intensity 10⁴ W cm^–2). Selective etching have been realized on heterojunction in order to isolate p-n junctions without the help of masks.     

Simulation of dark current suppression in p–i–n InGaAs photodetector with In0.66Ga0.34As/InAs superlattice electron barrier

An InGaAs–based photodetector with different periods of inserting strain–compensated In_0.66Ga_0.34As/InAs superlattice (SL) electron barrier in the In_0.83Ga_0.17As absorption layer has been investigated. The band diagram, electron concentration and electric field intensity of the structure were analyzed with numerical simulation. It was found that the period of SL has a remarkable influence on the properties of the photodetectors. With the decrease of the period of In_0.66Ga_0.34As/InAs SL, the dark current density is suppressed significantly, which is reduced to 2.46 × 10⁻³ A/cm² at 300 K and a reverse bias voltage of 1 V when the period is 2.5 nm.     

Electrical properties of p +/n + In0.53Ga0.47As tunnel diodes grown by liquid phase epitaxy

p ⁺/n ⁺ In_0.53Ga_0.47As tunnel diodes were prepared by liquid phase epitaxy and their electrical properties were characterized. These devices exhibit large forward conductances (2.59×10^{3 –1} cm^–2), high peak current densities (793 A/cm²) and large peak to valley current ratios (16.2). These devices offer great promise as intercell ohmic contacts (IOCs) for InP-based, onolithic multijunction solar cells.     

Ion-irradiated In0.53Ga0.47As photoconductive antennas for THz generation and detection at 1.55 μm wavelength

We present a detailed study of the photoconductive antennas made from heavy-ion-irradiated In_0.53Ga_0.47As material. The optical and transport properties of ion-irradiated In_0.53Ga_0.47As material are characterized. The terahertz waveforms emitted and detected by ion-irradiated In_0.53Ga_0.47As photoconductive antennas excited by 1.55 μm wavelength femtosecond laser pulses are reported and the effect of the carrier lifetime on the terahertz signal characteristics emitted by such devices is analysed. The performances of ion-irradiated In_0.53Ga_0.47As photoconductive antennas excited by 1.55 μm and also by 0.8 μm wavelength femtosecond laser pulses are compared to those of similar low-temperature-grown GaAs photoconductive antennas. To cite this article: J. Mangeney, P. Crozat, C. R. Physique 9 (2008).     

XPS data for sputter-cleaned In0.53Ga0.47As,GaAs, and InAs surfaces

Core level binding energies and Auger parameters were determined for In, Ga, and As in the three compounds In_0.53Ga_0.47As, GaAs, and InAs. The surfaces were cleaned by 1.5 keV Ar ion bombardment. Under this condition the radiation-induced defects are small. In the case of GaAs the Ga and As3d levels become comparable with available data for chemically cleaned surfaces. The high Ga deficiency of chemically cleaned In_0.53Ga_0.47As surfaces could not be observed. Sputter cleaned surfaces seem to be closer to the bulk composition.     

Metamorphic In0.53Ga0.47As p-I-n photodetector grown on GaAs substrates by low-pressure MOCVD

Top-illuminated metamorphic In0.53Ga0.47As p-i-n photodetectors are grown on the ultrathin lowtemperature InP buffered GaAs substrates. Photodetectors with the 300-nm-thick In0.53Ga0.47As absorption layer show a typical responsivity of 0.12 A/W to 1.55-μm optical radiation, corresponding to an external quantum efficiency of 9.6%. Photodetectors with the active area of 50 × 50 (μm) exhibit the -3 dB bandwidth up to 6 GHz. These results are very encouraging for the application of this metamorphic technology to opto-electronic integrated circuit (OEIC) devices.     

Performance improvement of long-wave infrared InAs/GaSb strained-layer superlattice detectors through sulfur-based passivation

We report on effective sulfur-based passivation treatments of type-II InAs/GaSb strained layer superlattice detectors (100% cut-off wavelength is 9.8 μm at 77 K). The electrical behavior of detectors passivated by electrochemical sulfur deposition (ECP) and thioacetamide (TAM) was evaluated for devices of various sizes. ECP passivated detectors with a perimeter-to-area ratio of 1600 cm^?1 exhibited superior performance with surface resistivity in excess of 10⁴ Ω cm, dark current density of 2.7 × 10^?3 A/cm², and specific detectivity improved by a factor of 5 compared to unpassivated devices (V_Bias =  ? 0.1 V, 77 K).     

Synchrotron radiation photoemission study of interface formation between MgO and the atomically clean In0.53Ga0.47As surface

The evolution of interface formation between MgO and the atomically clean In_0.53Ga_0.47As is studied by synchrotron radiation based photoemission. The deposition of MgO in a step wise fashion on the decapped In_0.53Ga_0.47As surface at room temperature results in the growth of an ultrathin interfacial oxide layer. Subsequent thermal annealing at 400 °C led to the reduction of the As and In oxides and the appearance of a Ga oxide component. The deposition of metallic Mg resulted in the further removal of the interfacial oxide and the out diffusion of In into the overlayer indicating severe disruption of the interface. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Engineering of AlON interlayer in Al2O3/AlON/In0.53Ga0.47As gate stacks by thermal atomic layer deposition

The presence of an AlN interfacial layer in high-k/In_0.53Ga_0.47As gate stacks improves the interfacial properties and enhances the electrical performance of devices. However, pure AlN is rarely grown by atomic layer deposition (ALD) because of the low reactivity of NH₃ toward the common Al-precursor and the predisposition to oxidation of the grown AlN layer. Although a plasma-enhanced ALD technique significantly suppresses the oxygen content in the grown AlN layer, the deterioration of the interface properties by plasma-damage is a critical issue. In this work, an AlON interlayer was engineered by optimizing the NH₃ feeding time in thermal ALD to improve the interface quality in Al₂O₃/AlON/In_0.53Ga_0.47As capacitors. It was determined that a mere increase in the NH₃ feeding time during the ALD of the AlON film resulted in a higher nitrogen incorporation into the AlON interlayer, leading to a reduction in the interface trap density. Furthermore, the out-diffusion of elements from the In_0.53Ga_0.47As layer was effectively suppressed by increasing the NH₃ feeding time. This work demonstrates that simple process optimization can improve the interface quality in high-k/In_0.53Ga_0.47As gate stacks without the use of any plasma-activated nitrogen source.