The kinetics and the mechanism of the thermal gas-phase reaction between bis(trifluoromethyl)trioxide,CF3O3CF3 and 1,1-dichlorodifluoroethylene,CF2CCI2

The thermal addition of CF₃O₃CF₃(T) to CF₂CCl₂(E) has been investigated between 49.6 and 69.5°C. The initial pressure of CF₃O₃CF₃ was varied between 7 and 240 torr and that of CF₂CCl₂ between 4 and 600 torr. Four products of formula CF₃O(E)_j OOCF₃, where j = 1 → 4 are formed. The sum of the products Σ CF₃O(E)_jOOCF₃ is equal to the amount of trioxide decomposed. The reaction is homogeneous. Its rate is not affected by the total pressure and the presence of inert gas. It is a free radical telomerization with four basic steps: thermal decomposition of CF₃O₃CF₃ into CF₃O^. and CF₃O₂^., chain initiation by addition of CF₃O^. to olefin incorporated in, and telomeric radicals termination. The consumption of alkene is well represented by the equation: where (d[E]/d[T]) = is the mean chain length of telomerization. varies from 1.45 at 1.5 torr of E to 3.3 at 400 torr of E. Above this pressure E has no influence on . The estimated value of the constant for the addition of telomeric radicals to alkene is:      

Some hydrogen abstraction reactions of the CF3CCl2 radical

The gas phase photolysis of CF₃CCl₃ in the presence of several alkanes has been used to obtain Arrhenius parameters for the abstraction of hydrogen atoms by the CF₃CCl₂ radical: Activation energies of 9.6 and 8.0 kcal/mole are found for abstraction from secondary and tertiary C–H bonds, respectively. The Arrhenius parameters are compared to those for CCl₃ and CF₃ radicals.     

The kinetics of the reactions of i-C3F7 radicals with BR2 and HBr

The reactions have been studied competitively in the vapor phase over the range of 52–204°C. The i-C₃F₇ radicals were generated by means of the reaction It was found that where θ = 2.303RT J/mol. Absolute Arrhenius parameters are derived for the reactions where R = CF₃, C₂F₅, and i-C₃F₇.     

Kinetics of the thermal decomposition of CF3CHCL2 in a single-pulse shock tube

The pyrolysis of 2,2-dichloro-1,1,1-trifluoroethane was studied over the temperature range of 1120–1260°K at total reflected shock pressures from ～2800 to 3100 torr. Below 1260°K, the decomposition leads to three reaction products which were identified as CF₂CFCl, CF₂CFH, and CF₃CCl₃. The results are interpreted in terms of a parallel C? Cl bond rupture process which becomes competitive with the molecular HCI elimination. The rate constant for the α,α-elimination process has been deduced to be It was also possible to obtain the overall rate constant for the formation of CF₂CFH, which is given by Some evidence for hydrogen fluoride elimination was found at temperatures above 1260°K. However, at these higher temperatures C? C bond scission also occurs and the kinetics of the system become untractable.     

The reactions of CF3 and CD3 radicals with boron trimethyl

Hydrogen abstraction from boron trimethyl has been studied using the abstracting radicals CF₃ and CD₃, from the photolysis of the corresponding ketones over the temperature range of 150° to 300°C. The following Arrhenius parameters were obtained: The difference E – E in the case of BMe₃ is considered due, in part, to polar effects. An exchange reaction is proposed for both CF₃ and CD₃ in collisions with BMe₃: Radical combination of CF₃ and CH₂BMe₂ leads to a hot molecule which undergoes a β-fluoro rearrangement elimination process, or a stabilized molecule which can thermally decompose:      

The kinetics of the thermal bromination of CF3I. Determination of the bond dissociation energy D(CF3−I)

The kinetics of the thermal bromination reaction have been studied in the range of 173–321°C. For the step we obtain where θ=2.303RT cal/mole. From the activation energy for reaction (11), we calculate that This is compared with previously published values of D(CF₃?I). The relevance of the result to published work on k_c for a combination of CF₃ radicals is discussed.     

The kinetics and the mechanism of the thermal gas-phase reaction between NO2 and 1,1-dichlorodifluoroethylene,CF2CCl2

The kinetics of the gas phase reaction between NO₂ and CF₂CCl₂ has been investigated in the temperature range from 50 to 80°C. The reaction is homogeneous. Three products are formed: O₂NCF₂CCl₂NO₂ and equimolecular amounts of CINO and of O₂NCF₂C(O)Cl. The rate of consumption of the reactants is independent of the total pressure, the reaction products, and added inert gases and can be represented by a second-order reaction: However, the distribution of the products is influenced by the pressure of the present gases, which favor the formation of the dinitro-compound in a specific way. The effect of CF₂CCl₂ is the greatest. In the absence of added gases, the ratio of O₂NCF₂CCl₂NO₂ to that of O₂NCF₂C(O)Cl is proportional to (CF₂CCl₂ + γ_P products). The experimental results can be explaned by the following mechanism: P and X represent the products and the added gases:      

The kinetics of free radical chain reactions in solutions of trichlorofluorethylene in cyclohexane

The kinetics of the gamma-radiation-induced free radical chain reaction in solutions of C₂Cl₃F in cyclohexane (RH) was investigated over a temperature range of 87.5–200°C. The following rate constants and rate constant ratios were determined for the reactions: In competitive experiments in ternary solutions of C₂Cl₄ and C₂Cl₃F in cyclohexane the rate constant ratio k_2c/k_2a was determined By comparing with previous data for the addition of cyclohexyl radicals to other chloroethylenes it is shown that in certain cases the trends in activation energies for cyclohexyl radical addition can be correlated with the C? Cl bond dissociation energies in the adduct radicals.     

Flash photolysis of biacetyl in gas phase. Rate constants of reactions between methyl and acetyl radicals

The flash photolysis of biacetyl produces CO, C₂H₆, and CH₃COCH₃ as main products, and in small amounts CO₂, C₂H₄, and CH₃CHO. The rate constants of reactions (2) and (3) of thermally equilibrated radicals were calculated from the amounts of products: .     

Reaction of CF3 radicals with H2S

Hydrogen abstration from H₂S by CF₃ radicals, generated by the photolysis of both CF₃COCF₃ and CF₃I, has been studied in the temperature range 314–434 K. The rate constant, based on the value of 10^13.36 cm³/mol · s for the recombination of CF₃ radicals, is given by with CF₃COCF₃ as the radical source, and with CF₃I as the radical source, where k₂ is in cm³/mol · s and E is in J/mol. These results resolve a previously existing controversy concerning the values of the rate constants for this reaction. They show that CF₃ radicals are less reactive than CH₃ radicals in attacking H₂S, and this behavior indicates that polar effects play a significant role in the hydrogen transfer reactions of CF₃ radicals.     

Radiation-induced dehalogenation of 1,1,1,2 tetrachloroethane and 1,1,2 trichloro-1 bromoethane reactions of 1,1,2 trichloroethyl radicals

The kinetics of the radiation-induced free radical chain reactions in solutions of CCl₃CClH₂ and CCl₂BrCH₂Cl in cyclohexane (RH) were studied in the temperature range of 90–225°C. 1,1,2 trichloroethyl and 1,1,1,2 tetrachloroethyl radicals were produced by the reaction of radiolytically generated cyclohexyl (R) radicals with solutes. The reactions studied were The following rate expressins were obtained: where θ = 2.303RT in kcal/mole. From the activation parameters of the k₄/k₅ rate constant ratio and the assumption that E₄ = E, E₅ was calculated to be 20.2 ± 0.2 kcal/mole. The Arrhenius parameters for the Cl atom elimination reaction from chloroethyl radicals derived from liquid and gas-phase studies are compared.     

Reaction of CF3 radicals with group IV tetramethyls

Arrhenius parameters have been measured for the abstraction of hydrogen from the C Si, Ge, and Sn tetramethyls: The rate constants correlate with the proton chemical shift, which is related to a polar effect. In all cases except carbon, a hot-molecule β-fluorine rearrangement-elimination reaction occurs following radical combination: We suggest the occurrence of a radical exchange reaction for the Si, Sn, and Ge systems, with k_exchange (CF₃ + Sn(Me)₄) ～ 10⁷ ml m^?1 s^?1.     

Reaction of CF3 radicals with H2O and D2O

The reaction of CF₃ radicals with H₂O (D₂O) has been studied over the range of 533–723 K using the photolysis and the pyrolysis of CF₃I as the free radical source. Arrhenius parameters for the reactions where X = H or D, relative to CF₃ radical recombination are given by where k/k is in cm^3/2/mol^1/2·s^1/2 and θ = 2.303RT/cal/mol. The activation energy and the primary kinetic isotope effect have been compared with those derived from the BEBO method.     

Chlorine-photosensitized reactions in the Cl2 + O2 + 1,1,1,2-C2H2Cl4 system

The gas-phase photochlorination (λ = 436 nm) of the 1,1,1,2-C₂H₂Cl₄ has been studied in the absence and the presence of oxygen at temperatures between 360 and 420°K. Activation energies have been estimated for the following reaction steps: The dissociation energy D(CCl₃CHCl? O₂) ± (24.8 ± 1.5) kcal/mole has also been estimated from the difference in activation energy of the direct and reverse reactions The mechanism is discussed and the rate parameters are compared to those obtained for a series of other chlorinated ethanes.     

The reactions of C2F5 radicals with benzene in the vapor phase

C₂F₅ radicals were generated in the presence of benzene vapor by the reaction The radicals react with the benzene by addition and pseudo H abstraction The rate constant k_add for the addition reaction (7) is given by where θ = 2.303RT cal/mole and k_c is the rate constant for combination of C₂F₅ radicals. The addition becomes reversible above 110°C. The reactions of CF₃ and C₂F₅ radicals with benzene vapor are compared.     

Kinetics of CH radical reactions with N2O,SO2, OCS,CS2, and SF6

Pulsed laser photolysis/laser-induced fluorescence (LIF) is utilized to measure absolute rate constants of CH radical reactions as a function of temperature and pressure. Multiphoton dissociation of CHBr₃ at 266 nm is employed for the generation of CH (X²Π) radicals. The CH radical relative concentration is monitored by exciting fluorescence on the R₁(2) line of the (A²Δ – X²Π) transition at 429.8 nm. A resistively heated cell allows temperature studies to be performed from room temperature to ≈?670 K. The following Arrhenius equations are derived: With the exception of SF₆, the reactions of sulfur containing species proceed at rates that are near the theoretical gas kinetic collision frequency. Additionally, these reactions all have activation energies that are near zero or slightly negative. These observations are consistent with an insertion-decomposition mechanism being dominant under these conditions.     

Kinetics and mechanism of the gas-phase thermal reaction between bis(fluoroxy) difluoromethane CF2(OF)2 and carbon monoxide

The kinetics of the gas-phase thermal reaction between CF₂(OF)₂ and CO has been studied in a static system at temperatures ranging between 110 and 140°C. The only reaction products were CF₂O and CO₂, giving the following stoichiometry: The reaction is homogeneous. The rate is strictly second order in CF₂(OF)₂ and CO, and is not affected by the total pressure or by the presence of reaction products. Oxygen promotes a sensitized oxidation of CO and inhibits the formation of CF₂O. The experimental results in the absence of oxygen can be explained by a chain mechanism similar to that proposed for the reaction between F₂O and CO with an overall rate constant of From the experimental data obtained on the oxygen-inhibited reaction, the rate constant for the primary process can be calculated: The chain length v = 2.5 is independent of the temperature. Taking for collision diameters σ = 6 Å and σ_CO = 3.74 Å, a value α = 5.3 × 10^?3 for the steric factor is obtained.     

Kinetics and the mechanism of the thermal reaction between trifluoromethylhypofluorite and hexafluoropropene

The kinetics of the thermal reaction between CF₃OF and C₃F₆ have been investigated between 20 and 75°C. It is a homogeneous chain reaction of moderate length where the main product is a mixture of the two isomers 1-C₃F₇OCF₃ (68%) and 2-C₃F₇OCF₃ (32%). Equimolecular amounts of CF₃OOF₃ and C₆F₁₄ are formed in much smaller quantities. Inert gases and the reaction products have no influence on the reaction, whereas only small amounts of oxygen change the course of reaction and larger amounts produce explosions. The rate of reaction can be represented by eq. (I): The following mechanism explains the experimental results: Reaction (5) can be replaced by reactions (5a) and (5b), without changing the result: Reaction (4) is possibly a two-step reaction: For ∣CF₃ = ∣C₃F₆∣, ν_20°C = 36.8, ν_50°C = 24.0, and ν_70°C = 14.2.     

The Competitive dehydrohalogenation of 1,1,1-trifluoro-2-chloroethane in reflected shock waves

The thermal decomposition of 1,1,1-trifluoro-2-chloroethane has been investigated in the single-pulse shock tube between 1120° and 1300deg;K at total reflected shock pressures from ～2610 to 3350 torr. Under these conditions, the major reaction is the α,α-elimination of hydrogen chloride, with The decomposition also involves the slower α,β-elimination of hydrogen fluoride, with the first-order rate constant given by At temperatures above 1270°K, two additional minor products were observed. These were identified as CF₂CFCl and CF₃CHCl₂ and suggest C? Cl rupture as a third reaction channel leading to complicated kinetics.