首页 | 官方网站   微博 | 高级检索  
     


Gas‐phase fluorine migration reactions in the radical cations of pentafluorosulfanylbenzene (Aryl―SF5) and benzenesulfonyl fluoride (Aryl―SO2F) derivatives and in the 2,5‐xylylfluoroiodonium ion
Authors:Ying Gao  Hao‐Yang Wang  Xiang Zhang  Jia‐Shun Cheng  Fang Zhang  Yin‐Long Guo
Affiliation:1. Shanghai Mass Spectrometry Center, Shanghai Institute of Organic Chemistry, Chinese Academy of Sciences, , Shanghai, China;2. Department of Applied Chemistry, Zhejiang Gongshang University, , Hangzhou, China;3. State Key Laboratory of Organometallics Chemistry, Shanghai Institute of Organic Chemistry, Chinese Academy of Sciences, , Shanghai, China
Abstract:The gas‐phase reactions of Aryl―SF5·+ and Aryl―SO2F·+ have been studied with the electron ionization tandem mass spectrometry. Such reactions involve F‐atom migration from the S‐atom to the aryl group affording the product ion Aryl―F·+ by subsequent expulsion of SF4 or SO2, respectively. Especially, the 4‐pentafluorosulfanylphenyl cation 4‐SF5C6H4+ (m/z 203) from 4‐NO2C6H4SF5·+ by loss of ·NO2 could occur multiple F‐atom migration reactions to the product ion C6H4F3+ (m/z 133) by loss of SF2 in the MS/MS process. The gas‐phase reactions of 2,5‐xylylfluoroiodonium (pXyl―I+F, m/z 251) have also been studied using the electrospray tandem mass spectrometry, which involve a similar F‐atom migration process from the I‐atom to the aryl group giving the radical cation of 2‐fluoro‐p‐xylene (or its isomer 4‐fluoro‐m‐xylene, m/z 124) by reductive elimination of an iodine atom. All these gas‐phase F‐atom migration reactions from the heteroatom to the aryl group led to the aryl―F coupling product ions with a new formed CAryl―F bond. Density functional theory calculations were performed to shed light on the mechanisms of these reactions. Copyright © 2014 John Wiley & Sons, Ltd.
Keywords:fluorine migration reaction  pentafluorosulfanylbenzene  benzenesulfonyl fluoride  F‐λ  3‐iodanes  tandem mass spectrometry
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司    京ICP备09084417号-23

京公网安备 11010802026262号