Selective Metal‐vapor Deposition on Organic Surfaces |
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| Authors: | Tsuyoshi Tsujioka |
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| Affiliation: | Department of Arts and Sciences, Osaka Kyoiku University, Kashiwara, Japan |
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| Abstract: | Selective metal‐vapor deposition signifies that metal‐vapor atoms are deposited on a hard organic surface, but not on a soft (low glass transition temperature, low Tg) surface. In this paper, we introduce the origin, extension, and applications of selective metal‐vapor deposition. An amorphous photochromic diarylethene film shows light‐controlled selective metal‐vapor deposition, which is caused by a large Tg change based on photoisomerization, but various organic surfaces, including organic crystal and polymers, can be utilized for achieving selective metal‐vapor deposition. Various applications of selective metal‐vapor deposition, including cathode patterning of organic light‐emitting devices, micro‐thin‐film fuses, multifunctional diffraction gratings, in‐plane electrical bistability for memory devices, and metal‐vapor integration, have been demonstrated. |
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| Keywords: | amorphous materials metal patterning metal‐vapor deposition photochromism polymers |
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