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Reversible Modification of the Structural and Electronic Properties of a Boron Nitride Monolayer by CO Intercalation |
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| Authors: | Dr May Ling Ng Dr Andrey Shavorskiy Dr Christoph Rameshan Prof Anders Mikkelsen Prof Edvin Lundgren Dr Alexei Preobrajenski Dr Hendrik Bluhm |
| Affiliation: | 1. Chemical Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (USA);2. Division of Synchrotron Radiation, Lund University, 22362 Lund (Sweden);3. MAX IV Laboratory, Lund University, 22100 Lund (Sweden) |
| Abstract: | We demonstrate the reversible intercalation of CO between a hexagonal boron nitride (h‐BN) monolayer and a Rh(111) substrate above a threshold CO pressure of 0.01 mbar at room temperature. The intercalation of CO results in the flattening of the originally corrugated h‐BN nanomesh and an electronic decoupling of the BN layer from the Rh substrate. The intercalated CO molecules assume a coverage and adsorption site distribution comparable to that on the free Rh(111) surface at similar conditions. The pristine h‐BN nanomesh is reinstated upon heating to above 625 K. These observations may open up opportunities for a reversible tuning of the electronic and structural properties of monolayer BN films. |
| Keywords: | boron nitride CO electronic properties intercalation monolayers |
