| 四溴化碳-二苯胺成像体系光化学反应的研究 |
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| 引用本文： | 刘奎文,朱英华,石道钧.四溴化碳-二苯胺成像体系光化学反应的研究[J].影像科学与光化学,1987,5(2):31-33. |
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| 作者姓名： | 刘奎文 朱英华 石道钧 |
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| 作者单位： | 中国科学院化学研究所, 北京 |
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| 摘 要： | 研究了CBr4-二苯胺(DPA)自由基光敏体系的光化学过程。在250-400nm区,CBr4的光分解速度随波长的增加而下降。分别用CBr4、DPA及CBr4-DPA电荷转移复合物吸收光谱最大值对应的光254、284及333nm辐照CBr4-DPA体系,发现333nm光辐照有最大的反应速度,证明此体系光激发阶段,CBr4-DPA生成的基态电荷转移复合物是主要的光敏物质。
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| 关 键 词： | 自由基成像 光谱响应 电荷转移络合物 光解 四溴化碳 二苯胺 |
| 收稿时间： | 1986-04-26 |
A STUDY OF PHOTOCHEMICAL REACTION FOR CBr4-DIPHENYLAMINE IMAGING SYSTEM |
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| LIU KUI-WEN,ZHU YIN-HUA,SHI DAO-JUN.A STUDY OF PHOTOCHEMICAL REACTION FOR CBr4-DIPHENYLAMINE IMAGING SYSTEM[J].Imaging Science and Photochemistry,1987,5(2):31-33. |
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| Authors: | LIU KUI-WEN ZHU YIN-HUA SHI DAO-JUN |
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| Affiliation: | Institute of Chemistry, Academia Sinica, Beijing |
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| Abstract: | The photochemical reaction of free radical lightsensitive system CBr4-DPA (Diphenylami-ne) is reported. The rate of the photolysis of CBr4 is decreased with the increasing wavelength in 250-400 nm. When CBr4-DPA system is radiated upon 254, 284 and 333 nm, which correspond to the maximum absorption wavelengths of CBr4, DPA, and CBr4-DPA charge transfer complex, respectively, the maximum rate of photochemical reaction is generated at 333 nm. This shows that the main lightsensitive componant, in the exciting stage, is ground state charge transfer complex consisting of CBr4 and DPA instead of CBr4 or DPA. |
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| Keywords: | free radical image formation spectral response charge transfer complex photolysis carbon tetrabromide diphenylamine |
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