| 高玻璃化温度化学增幅光致抗蚀剂的制备 |
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| 引用本文： | 王慧,游凤祥,陈明,李元昌,卢建平,洪啸吟,黄志齐,胡德甫.高玻璃化温度化学增幅光致抗蚀剂的制备[J].影像科学与光化学,1998,16(3):245-249. |
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| 作者姓名： | 王慧 游凤祥 陈明 李元昌 卢建平 洪啸吟 黄志齐 胡德甫 |
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| 作者单位： | 1. 清华大学化学系, 北京 100084;2. 北京化学试剂所, 北京 100022 |
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| 基金项目： | 国家自然科学基金(批准号:59633110,59773007) |
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| 摘 要： | 本文合成了一种具有高玻璃化温度的苯乙烯和N-(4-羟基苯基)马来酰亚胺的共聚体,并将其应用于紫外负性水型化学增幅抗蚀剂中,并初步确定了该光致抗蚀剂的光刻工艺操作条件,得到了分辨率为1.39µm的光刻图形。
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| 关 键 词： | 光致抗蚀剂 光刻 苯乙烯和N-(4-羟基苯基)马来酰亚胺共聚体 |
| 收稿时间： | 1997-12-08 |
PREPARATION OF WATER BASED NEGATIVE CHEMICAL AMPLIFIED PHOTORESIST WITH HIGH GLASS TRANSITION TEMPERATURE |
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| WANG Hui,YOU Fengxiang,CHEN Ming,LI Yuanchang,LU Jianping,HONG Xiaoyin,HUANG Zhiqi,HU Defu.PREPARATION OF WATER BASED NEGATIVE CHEMICAL AMPLIFIED PHOTORESIST WITH HIGH GLASS TRANSITION TEMPERATURE[J].Imaging Science and Photochemistry,1998,16(3):245-249. |
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| Authors: | WANG Hui YOU Fengxiang CHEN Ming LI Yuanchang LU Jianping HONG Xiaoyin HUANG Zhiqi HU Defu |
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| Affiliation: | 1. Department of Chemistry, Tsinghua University, Beijing 100084, P. R. China;2. The Institute of Chemical Reagent, Beijing 100022, P. R. China |
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| Abstract: | A water-based near-UV negative chemical amplified photoresist was developed,consisting of styrene-co-N-(4-hydroxyphenyl)maleimide with high glass transition temperature (Tg), hexamethoxymethylmelamine (HMMM) triphenyl sulfonium salt.The conditions of photolithograpy process were preliminarily defined.Based on our research,the pattern with 1.39 µm lines and spaces was obtained by the conventional UV photolithography under the optimum parameters. |
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| Keywords: | photoresist photolithography polystyrene-co-N-(4-hydroxypheny1)maleimide |
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