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银纳米颗粒/聚(乙撑二氧噻吩)修饰的硅纳米线阵列的合成及可见光催化性能研究
引用本文:段春阳,王辉,李凡,张晓宏.银纳米颗粒/聚(乙撑二氧噻吩)修饰的硅纳米线阵列的合成及可见光催化性能研究[J].影像科学与光化学,2015,33(2):108-116.
作者姓名:段春阳  王辉  李凡  张晓宏
作者单位:中国科学院 理化技术研究所 纳米有机光电子实验室, 北京 100190
摘    要:硅纳米线阵列由于其较强的光吸收能力及硅材料的丰富储量,被认为是最具大规模应用潜力的可见光光催化剂.针对硅材料在水相环境中不稳定这一瓶颈问题,本文提出了对硅纳米线阵列"先稳定、再活化"的修饰策略.通过在硅纳米线表面修饰聚(乙撑二氧噻吩)使其稳定,之后再修饰银纳米颗粒以提高光催化效率,得到了高效、稳定的可见光光催化剂.并通过研究聚(乙撑二氧噻吩)的厚度及银纳米颗粒的担载量对光催化剂性能的影响,得到了最佳的修饰条件.

关 键 词:硅纳米线阵列  银纳米颗粒  聚(乙撑二氧噻吩)  可见光光催化性能  
收稿时间:2014-05-05

Fabrication and Visible Light Photocatalytic Study of AgNPs/PEDOT Decorated Si Nanowires Array
DUAN Chunyang,WANG Hui,LI Fan,ZHANG Xiaohong.Fabrication and Visible Light Photocatalytic Study of AgNPs/PEDOT Decorated Si Nanowires Array[J].Imaging Science and Photochemistry,2015,33(2):108-116.
Authors:DUAN Chunyang  WANG Hui  LI Fan  ZHANG Xiaohong
Affiliation:Nano-organic Photoelectronic Laboratory, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, P.R. China
Abstract:Silicon nanowires array has been considered as a promising photocatalyst for large-scale application due to their enhanced photo-absorption ability and silicon's abundance. However, Si is indirect semiconductor and susceptible to photocorrosion in aqueous solution, which hinders it from photocatalytic application. In the present work, we construct a stable photocatalyst based on robust polymer and plasmonic metal nanoparticles decorated SiNWs array and investigated the influential factors of the decoration constituents on the SiNWs' surfaces through an organic dyestuff photocatalytic decomposition process. With the elaborate analysis of decomposition results' variation caused by the difference of the semiconductor's decoration and scavenger agent, the thickness of the cover layer and the plasmonic metal nanoparticles loading are shown to be influence the photocatalytic ability essentially.
Keywords:silicon nanowires array  plasmonic AgNPs  PEDOT  visible light photocatalysis
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