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P和As掺杂Mn4Si7第一性原理计算
引用本文:钟义,张晋敏,王立,贺腾,肖清泉,谢泉.P和As掺杂Mn4Si7第一性原理计算[J].人工晶体学报,2021,50(2):273-277.
作者姓名:钟义  张晋敏  王立  贺腾  肖清泉  谢泉
作者单位:贵州大学大数据与信息工程学院,新型光电子材料与技术研究所,贵阳 550025
基金项目:国家自然科学基金(61264004);贵州省科学技术基金(黔科合基础1028);贵州大学研究生重点课程(贵大研026);贵州省高层次创新型人才培养项目(黔科合人才4015);贵州省留学回国人员科技活动择优资助项目 (黔人项目资助合同09)
摘    要:采用第一性原理计算方法,对本征Mn4Si7以及P和As掺杂的Mn4Si7的电子结构和光学性质进行计算解析。计算结果表明本征Mn4Si7是带隙值为0.810 eV的间接带隙半导体材料,P掺杂Mn4Si7的带隙值增大为0.839 eV,As掺杂Mn4Si7的带隙值减小为0.752 eV。掺杂使得Mn4Si7的能带结构和态密度向低能方向移动,同时使得介电函数的实数部分在低能区明显增大,虚数部分几乎全部区域增加且8 eV以后趋向于零。此外掺杂还增加了高能区的消光系数、吸收系数、反射系数以及光电导率,明显改善了Mn4Si7的光学性质。

关 键 词:第一性原理  Mn4Si7  掺杂  能带结构  态密度  光学性质  
收稿时间:2020-11-26

First-Principles Calculations of P and As Doped Mn4Si7
ZHONG Yi,ZHANG Jinmin,WANG Li,HE Teng,XIAO Qingquan,XIE Quan.First-Principles Calculations of P and As Doped Mn4Si7[J].Journal of Synthetic Crystals,2021,50(2):273-277.
Authors:ZHONG Yi  ZHANG Jinmin  WANG Li  HE Teng  XIAO Qingquan  XIE Quan
Affiliation:Institute of New Optoelectronic Materials and Technology, College of Big Data and Information Engineering, Guizhou University, Guiyang 550025, China
Abstract:The electronic structure and optical properties of intrinsic and P, As doped Mn4Si7 were calculated with the fisrt-principles calculation method. The result shows that the intrinsic Mn4Si7 is an indirect semiconductor material with a gap of 0.810 eV, the P doped Mn4Si7 band gap increases to 0.839 eV, and the As doped Mn4Si7 band gap decreases to 0.752 eV. Doping causes a shift to the low energy region, and causes an increase of the real part of dielectric function notably in the low energy region and an increase of the imaginary part in almost all region, imaginary part decreases to zero after 8 eV. Besides, doping obviously increases the extinction coefficient, absorption coefficient reflection coefficient and photoconductivity in the high energy region, and improves the optical properties of the Mn4Si7.
Keywords:first-principle  Mn4Si7  doping  band structure  density of state  optical property  
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