| Pulsed Ion Sheath Dynamics in a Cylindrical Bore for Inner Surface Grid—Enhanced Plasma Source Ion Implantation |
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| 引用本文： | 王久丽,杨思泽,等.Pulsed Ion Sheath Dynamics in a Cylindrical Bore for Inner Surface Grid—Enhanced Plasma Source Ion Implantation[J].中国物理快报,2002,19(10):1473-1475. |
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| 作者姓名： | 王久丽 杨思泽 |
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| 作者单位： | [1]InstituteofPhysics,ChineseAcademyofSciences,Beijing100080 [2]StateKeyLaboratoryforMaterialsModificationbyLaser,Ion,andElectronBeams,DalianUniversityofTechnology,Dalian116024 |
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| 摘 要： | Based on our recently proposed grid-enhanced plasma source ion implantation(GEPSII) technique for inner surface modification of materials with cylindrical geometry,we present the corresponding theoretical studies of the temporal evolution of the plasma ion sheath between the grid electrode and the target in a cylindrical bore.Typical results such as the ion sheath evolution,time-dependent ion density and time-integrated ion energy distribution at the target are calculated by solving Poisson‘s equation coupled with fluid equations for collisionless ions and BOltzmann assumption for electrons using finite difference methods.The calculated results can further verifty the feasibility and superiority of this new technique.
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| 关 键 词： | 等离子体 脉冲离子动力学 离子移植 |
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