首页 | 官方网站   微博 | 高级检索  
     

Determination of Tungsten Layer Profiles in Bilayer Structures Using X-Ray Reflectivity Method
作者姓名:徐垚  王占山  王蓓  王洪昌  吴文娟  张淑敏  张众  王风丽  秦树基  陈玲燕
作者单位:Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092
基金项目:Supported by the National Natural Science Foundation of China under Grant Nos 60378021 and 10435050, the National 863-804-7 Sustentation Pund, and the Programme for New Gentury Excellent Talents in University of Ghina under Grant No NGET-04-037.
摘    要:An effectual method is presented to determine the profiles of a tungsten (W) layer, such as the density, the thickness and the roughness in the multilayer structures, using the x-ray reflectivity technique. To avoid oxidation effects of tungsten, a B4 C capping layer is deposited onto to the W layer. To observe the profiles of the tungsten layer with different thicknesses, three groups of W/B4 C bilayers with different thicknesses are prepared by using ultra high vacuum dc magnetron sputtering and measured by an x-ray diffractometer. A type of genetic algorithm called the differential evolution is used to simulate the measurement data so as to obtain the parameters of bilayers. According to the simulation, it is shown that the W layer density varies from 95.26% to 97.51% compared to the bulk. In our experiment, the deposition rate is 0.044 nm/s, and the thickness is varied in the range of 9.8-19.4 nm.

关 键 词:X射线  反射率  双分子结构  
收稿时间:2006-5-15
修稿时间:2006-05-15

Determination of Tungsten Layer Profiles in Bilayer Structures Using X-Ray Reflectivity Method
XU Yao,WANG Zhan-Shan,WANG Bei,WANG Hong-Chang,WU Wen-Juan,ZHANG Shu-Min,ZHANG Zhong,WANG Feng-Li,QIN Shu-Ji,CHEN Ling-Yan.Determination of Tungsten Layer Profiles in Bilayer Structures Using X-Ray Reflectivity Method[J].Chinese Physics Letters,2007,24(2):366-369.
Authors:XU Yao  WANG Zhan-Shan  WANG Bei  WANG Hong-Chang  WU Wen-Juan  ZHANG Shu-Min  ZHANG Zhong  WANG Feng-Li  QIN Shu-Ji  CHEN Ling-Yan
Affiliation:Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092
Abstract:An effectual method is presented to determine the profiles of a tungsten (W) layer, such as the density, the thickness and the roughness in the multilayer structures, using the x-ray reflectivity technique. To avoid oxidation effects of tungsten, a B4C capping layer is deposited onto to the W layer. To observe the profiles of the tungsten layer with different thicknesses, three groups of W/B4C bilayers with different thicknesses are prepared by using ultra high vacuum dc magnetron sputtering and measured by an x-ray diffractometer. A type of genetic algorithm called the differential evolution is used to simulatethe measurement data so as to obtain the parameters of bilayers. According to the simulation, it is shown that the W layer density varies from 95.26% to 97.51% compared to the bulk. In our experiment, the deposition rate is .044nm/s, and the thickness is varied in the range of 9.8--19.4nm.
Keywords:07  85  Jy  68  65  Ac  78  20  Bh
本文献已被 维普 等数据库收录!
点击此处可从《中国物理快报》浏览原始摘要信息
点击此处可从《中国物理快报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司    京ICP备09084417号-23

京公网安备 11010802026262号