| Analysis of X-Ray Photoelectron Spectroscopy of Polymethyl Methacrylate Etched by a KrF Excimer Laser |
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| 作者姓名： | 朱效立 刘世炳 陈涛 蒋毅坚 左铁钏 |
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| 作者单位： | CollegeofLaserEngineering,BeijingUniversityofTechnology,Beijing100022 |
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| 摘 要： | The C ls and 0 ls electrons in polymethyl methacrylate etched by different incident laser intensities are analysed by x-ray photoelectron spectroscopy. The results show that when the incident laser fluence increases gradually,the percentage of carbon atoms in C-C bonds decreases while the one in carbonyl group (C=O) and alkoxy group (C-O) increases, and the percentage of oxygen atoms in C=O bonds increases while the one in C-O bonds decreases. Based on the analysis of the chemical structure, the energy level transition, energy diversion, and dissociation of bonds are theoretically examined, which is consistent with the experimental results.
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| 关 键 词： | X-射线光电子分光镜 有机玻璃 KrF受激准分子激光 刻蚀工艺 |
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