| Dust Charging in Electronegative SiH4 Plasmas |
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| 作者姓名： | 段萍 王正汹 刘悦 刘金远 王晓钢 |
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| 作者单位： | [1]DepartmentofPhysics,DalianUniversity,Dalian116622／／StateKeyLaboratoryofMaterialsModificationbyLaser,ElectronandIonBeams,DalianUniversityofTechnology,Dalian116024 [2]StateKeyLaboratoryofMaterialsModificationbyLaser,ElectronandIonBeams,DalianUniversityofTechnology,Dalian116024 |
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| 摘 要： | We theoretically investigate the dust charging in electronegative silane (SiH4) plasmas, taking into account the effects of UV photodetachment. It is found that UV photodetachment could significantly lower the dust negative charge and even makes dust grains be positively charged under some special conditions. In addition, the other parameters, involving the negative ion and dust number densities, electron temperature and dust radius, have great effects upon the dust charging.
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| 关 键 词： | SiH4 负电荷等离子体 尘埃带电 离子分布 光电子 |
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