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Influence of O2 Flux on Compositions and Properties of ITO Films Deposited at Room Temperature by Direct-Current Pulse Magnetron Sputtering
Authors:WANG Hua-Lin  DING Wan-Yu  LIU Chao-Qian  CHAI Wei-Ping
Affiliation:[1]School of Materials Science and Engineering, Dalian diaotong University, Dalian 116028 [2]Engineering Research Center of Optoelectronic Materials and Devices, Education Department of Liaoning Province, Dalian 116028
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