| 弯月面涂胶及其胶厚均匀性的测量 |
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| 引用本文： | 林继平,梁榉曦,刘正坤,王庆博,宝剑光,洪义麟,付绍军.弯月面涂胶及其胶厚均匀性的测量[J].强激光与粒子束,2014,26(10):101017. |
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| 作者姓名： | 林继平 梁榉曦 刘正坤 王庆博 宝剑光 洪义麟 付绍军 |
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| 作者单位： | 1.中国科学技术大学 国家同步辐射实验室, 合肥 230029; |
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| 基金项目： | 国家自然科学基金项目(11375175) |
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| 摘 要： | 为实现大面积基片的均匀涂胶,设计组装了一台小型弯月面涂胶样机,实验了200mm×200mm基片的涂胶。利用白光干涉光谱仪扫描测量了弯月面涂胶的胶厚分布,其胶厚均匀性峰谷值偏差低于5%。对弯月面涂胶系统引起的均匀度偏差做了初步分析研究,并对比了测试系统与经校准的台阶仪胶厚测量结果,偏差小于0.8%。
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| 关 键 词： | 弯月面涂胶 大面积涂胶 白光干涉 胶厚测量 均匀性 |
| 收稿时间： | 2014-05-22 |
Meniscus coating and thickness measurement of photoresist |
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| Affiliation: | 1.National Synchrotron Radiation Lab,University of Science and Technology of China,Hefei 230029,China;2.School of Physics and Material Science,Anhui University,Hefei 230601,China |
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| Abstract: | In order to realize uniform coating of photoresist on large area substrates, a small meniscus coating applicator is designed and assembled, and it is used to coat a substrate of 200 mm200 mm. Then a thickness measurement system based on white light interference spectrometer is installed to measure the thickness distribution of the coated photoresist, the result shows that the peak value of the deviation is less than 5%. Thickness uniformity is analyzed for further optimizing the coating system and coating parameters. Finally the accuracy of the thickness measurement system is tested by comparing the measuring results with that of a surface profiler which has very high resolution and has been calibrated, and the deviation is less than 0.8%. |
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