| 真空电弧等离子体发射光谱诊断 |
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| 引用本文： | 张晋,袁召,陈立学,刘姗.真空电弧等离子体发射光谱诊断[J].强激光与粒子束,2021,33(6):065014-1-065014-6. |
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| 作者姓名： | 张晋 袁召 陈立学 刘姗 |
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| 作者单位： | 1.华中科技大学 强电磁工程与新技术国家重点实验室，武汉 430074 |
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| 基金项目： | 国家重点研发计划项目（2018YFB0904300）；国家自然科学基金青年科学基金项目（51807069） |
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| 摘 要： | 真空断路器的开断容量限制其在高压大电流开断领域的应用，获取燃弧过程中的等离子体参数对于提高真空断路器的开断容量至关重要。利用发射光谱法对真空电弧内的等离子体参数进行了诊断，研究了在不同电流幅值条件下真空电弧内电子温度、电子密度、谱线强度的轴向分布规律，结合真空电弧高速图片对真空电弧内不同粒子的扩散过程与弧柱直径之间的关系进行了分析。得到的电子温度在8000～10 000 K量级，电子密度在1019～1020 m?3量级，电子温度与电子密度从阴极向阳极逐渐下降，同时铜原子谱线强度主要集中在两极而一价铜离子谱线强度由阴极向阳极逐渐升高。铜原子谱线强度的径向分布呈现类平顶波分布、一价铜离子谱线强度的径向分布呈现类高斯分布的特点，且铜原子的谱线范围略大于弧柱直径，一价铜离子的谱线范围略小于弧柱直径，两种粒子的扩散速度存在差异。
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| 关 键 词： | 真空电弧 发射光谱 电子温度 电子密度 谱线强度 |
| 收稿时间： | 2021-03-29 |
Vacuum arc plasma emission spectroscopy diagnosis |
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| Affiliation: | 1.State Key Laboratory of Advanced Electromagnetic Engineering and New Technology, Huazhong University of Science and Technology, Wuhan 430074, China2.Key Laboratory of Pulsed Power Technology (Huazhong University of Science and Technology), Ministry of Education, Wuhan 430074, China |
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| Abstract: | The breaking capacity of vacuum circuit breakers limits its application in the field of high-voltage and high-current breaking. Obtaining plasma parameters in the arcing process is very important for improving the breaking capacity of VCB. The emission spectroscopy is used to diagnose the plasma parameters in the vacuum arc in this paper. The axial distribution of electron temperature, electron density, and spectral line intensity in the vacuum arc under different current amplitude conditions is studied. The relationship between the diffusion process of different particles in the vacuum arc and the diameter of the arc column is analyzed based on the high-speed pictures of the vacuum arc. The electron temperature is 8000?10 000 K, and the electron density is 1019?1020 m?3. The electron temperature and electron density gradually decrease from the cathode to the anode. The intensity of the copper atomic line is mainly concentrated at the two poles, while the intensity of the monovalent copper ion line gradually increases from the cathode to the anode. The radial distribution of the copper atomic line intensity presents a flat-top wave distribution, and the monovalent copper ion line intensity presents a Gaussion-like distribution. The spectral range of copper atoms is slightly larger than the diameter of the arc column, and the spectral range of monovalent copper ions is slightly smaller than the diameter of the arc column. The diffusion speed of the two particles is different. |
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