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基于光场调制的纳秒激光图案化石墨烯研究
引用本文:李阳龙,吴凌远,沈欢欢,刘国栋,王伟平.基于光场调制的纳秒激光图案化石墨烯研究[J].强激光与粒子束,2018,30(12):129001-1-129001-4.
作者姓名:李阳龙  吴凌远  沈欢欢  刘国栋  王伟平
作者单位:1.中国工程物理研究院 流体物理研究所, 四川 绵阳 621900
基金项目:中国工程物理研究院高能激光科学与技术实验室项目2018HEL-16
摘    要:激光加工技术在石墨烯制备领域得到了许多应用。目前激光图案化石墨烯的方法多为激光逐点扫描, 而单次辐照实现图案化加工的方法鲜有报道。通过间光调制器改变激光的光场, 使光束聚焦成图案, 单次辐照直接在石墨烯样品上烧蚀实现图案化。控制激光能量为合适的值时可将石墨烯清晰地图案化而不损伤硅基底。通过拉曼光谱扫描成像发现石墨烯加工边缘清晰, 精度达到μm量级, 具有加工速度快、无需移动样品等特点。

关 键 词:石墨烯    激光    拉曼光谱    激光加工    图案化
收稿时间:2018-06-01

Patterning of graphene by light field modulated nanosecond laser
Affiliation:1.Institute of Fluid Physics, CAEP, Mianyang 621900, China2.Key Laboratory of Science and Technology in High Energy Laser, China Academy of Engineering Physics, Mianyang 621900, China
Abstract:Laser-based approaches for graphene synthesis, reduction, modification, cutting and micro-patterning have been developed and applied to the fabrication of various electronic devices.General method utilized in direct laser writing and patterning of graphene was realized by controlling the movement of the sample or the laser reflecting mirror, while patterning by single shot laser is rarely reported.In the present study, a single shot laser patterning graphene method via light field modulating is proposed.Via controlling the light field by special light modulator (SLM), nanosecond laser pulses focused by objective lens were modulated to the desired pattern.The 4layer graphene in the laser irradiate region was damaged when laser energy was lager than 0.03 mJ.When the laser energy reached 0.06 mJ, clear pattern formed in graphene while no damage occurred in silicon base.The characteristics of graphene patterns were measured using Raman spectra imaging technology.The experimental results revealed that the light field modulated nanosecond laser remains potentially advantageous in graphene micro pattern processing with no need of moving the sample, quick processing and micrometer precision.
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