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Effects of annealing temperature on the electrical property and microstructure of aluminum contact on n-type 3C–SiC
引用本文:代冲冲,刘学超,周天宇,卓世异,石彪,施尔畏.Effects of annealing temperature on the electrical property and microstructure of aluminum contact on n-type 3C–SiC[J].中国物理 B,2014(6):452-456.
作者姓名:代冲冲  刘学超  周天宇  卓世异  石彪  施尔畏
基金项目:supported by the Shanghai Rising-Star Program,China(Grant No.13QA1403800);the Young Scientists Fund of the National Natural Science Foundation of China(Grant No.51002176);the Innovation Program of the Chinese Academy of Sciences(Grant No.KJCX2-EW-W10);the Industry–Academic Joint Technological Innovations Fund Project of Jiangsu Province,China(Grant No.BY2011119);the National High Technology Research and Development Program of China(Grant Nos.2013AA031603 and 2014AA032602)
摘    要:The 3C-SiC thin films used herein are grown on Si substrates by chemical vapor deposition. A1 contacts with differ- ent thickness values are deposited on the 3C-SiC/Si (100) structure by the magnetron sputtering method and are annealed at different temperatures. We focus on the effects of the annealing temperature on the ohmic contact properties and mi- crostructure of A1/3C-SiC structure. The electrical properties of A1 contacts to n-type 3C-SiC are characterized by the transmission line method. The crystal structures and chemical phases of A1 contacts are examined by X-ray diffraction, Raman spectra, and transmission electron microscopy, respectively. It is found that the A1 contacts exhibit ohmic contact behaviors when the annealing temperature is below 550 ℃, and they become Schottky contacts when the annealing tem- perature is above 650 ℃. A minimum specific contact resistance of 1.8 × 10-4 Ω cm2 is obtained when the A1 contact is annealed at 250 ℃.

关 键 词:3C-SiC  退火温度  微观结构  n型  电特性  化学气相沉积  透射电子显微镜  磁控溅射法

Effects of annealing temperature on the electrical property and microstructure of aluminum contact on n-type 3C-SiC
Abstract:A1/3C-SiC, ohmic contact, specific contact resistance
Keywords:A1/3C-SiC  ohmic contact  specific contact resistance
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