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1 550 nm陷波滤光片制备工艺技术研究
引用本文:龚勋,杭凌侠,黄发彬.1 550 nm陷波滤光片制备工艺技术研究[J].应用光学,2016,37(1):118-123.
作者姓名:龚勋  杭凌侠  黄发彬
作者单位:1.西安工业大学,陕西 西安710021;
摘    要:陷波滤光片在抗激光损伤、激光防护和光电对抗领域应用广泛,如何提高其通带透过率,降低陷波点透过率是研究热点之一。基于Rugate理论设计了400 nm~2 500 nm波段1 550 nm陷波滤光片,分析了Rugate折射率函数各参数对光谱性能的影响。采用PECVD技术在K9玻璃基底上镀制了单面的1 550 nm陷波滤光片,通带的平均透过率达到88.54%,在1 550 nm处的透过率为3.62%。

关 键 词:PECVD    Rugate    陷波滤光片

Preparation technology of 1 550 nm notch filter
Affiliation:1.Xi’an Technological University,Xi’an 710021,China;2.Shaanxi Province Key Laboratory of Thin Film Technology and Optical Test,Xi’an 710021,China
Abstract:Notch filter has been widely applied in laser damage resistance, laser protection and optoelectronic countermeasure fields, how to improve the passband transmittance and lower the notch transmittance is one of the hot research topics. A Rugate notch filter with a central wavelength of 1 550 nm was designed at the band of 400 nm~2 500 nm, a sensitivity analysis was undertaken in which several reflectance spectra were generated as a function of variations in the refractive index profile. Moreover,the designed filter was deposited on a single surface K9 substrate by plasma enhanced chemical vapor deposition (PECVD) technology. The experimental filter has 3.62% transmittance at 1 550 nm and 88.54% average transmittance at the pass band.
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