| 氯硅烷残液水解制备二氧化硅团聚的机理研究 |
| |
| 引用本文： | 黄兵,董森林,陈樑,杨杰,赵义,徐卜刚,蔡吉祥.氯硅烷残液水解制备二氧化硅团聚的机理研究[J].人工晶体学报,2017,46(5):874-879. |
| |
| 作者姓名： | 黄兵 董森林 陈樑 杨杰 赵义 徐卜刚 蔡吉祥 |
| |
| 作者单位： | 昆明理工大学环境科学与工程学院,昆明,650500 |
| |
| 基金项目： | 国家自然科学基金(41261079) |
| |
| 摘 要： | 多晶硅生成工艺中的副产物氯硅烷残液,具有腐蚀性强、产量大等特点.采用多晶硅副产物氯硅烷残液为原料进行水解反应生成二氧化硅.研究了以不同水解方式在不同水解体系中引入位阻剂及该位阻剂的时效性对二氧化硅团聚的影响以及机理研究.结果表明:气-液反应的水解方式产出的二氧化硅呈现颗粒状具有颗粒特性;水解体系中引入位阻剂后产物二氧化硅分散性好,颗粒均匀、粒径大小在2 μm左右;并且证实了位阻剂的位阻作用具有时效性.
|
| 关 键 词： | 氯硅烷残液 二氧化硅 位阻剂 团聚 机理 |
Mechanism Analysis of Silica Dioxide Agglomeration in the Process of Chlorosilane Residue Hydrolysis |
| |
| HUANG Bing,DONG Sen-lin,CHEN Liang,YANG Jie,ZHAO Yi,XU Bu-gang,CAI Ji-xiang.Mechanism Analysis of Silica Dioxide Agglomeration in the Process of Chlorosilane Residue Hydrolysis[J].Journal of Synthetic Crystals,2017,46(5):874-879. |
| |
| Authors: | HUANG Bing DONG Sen-lin CHEN Liang YANG Jie ZHAO Yi XU Bu-gang CAI Ji-xiang |
| |
| Abstract: | Chlorosilane residue is the by-product in the process of polysilicon production, which is highly productive and high corrosive.In the paper, chlorosilane residue was used as raw material to product silica dioxide via hydrolysis.Additionally, the mechanism of silica dioxide agglomeration and the effects of different methods of hydrolysis and surface active agent on the process of chlorosilane residue hydrolysis were investigated.The results show that the silicon dioxide is generated via gas-liquid reaction of hydrolysis and the product show granular particle characteristics,after adding the surface active agent, the silica dioxide presented good dispersion, in a uniform particle size of 2 μm, moreover, the steric effect of surface active agents has timeliness. |
| |
| Keywords: | chlorosilane residue silica dioxide surface active agent agglomeration mechanism |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
| 点击此处可从《人工晶体学报》浏览原始摘要信息 |
|
点击此处可从《人工晶体学报》下载全文 |
|
