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Fully transparent nonvolatile resistive polymer memory
Authors:Hwan‐Chul Yu  Moon Young Kim  Jeong‐Sup Lee  Kwang‐Hun Lee  Kyoung Koo Baeck  Kyoung‐Kook Kim  Soohaeng Cho  Chan‐Moon Chung
Affiliation:1. Department of Chemistry, Yonsei University, Wonju, Gangwon‐Do, Republic of Korea;2. Department of Physics, Yonsei University, Wonju, Gangwon‐Do, Republic of Korea;3. Department of Chemistry, Gangneung‐Wonju National University, Gangneung, Gangwon‐Do, Republic of Korea;4. Department of Nano‐Optical Engineering, Korea Polytechnic University, Siheung, Gyeonggi‐Do, Republic of Korea
Abstract:We present a fully transparent nonvolatile resistive polymer memory device based on an anthracene‐containing partially aliphatic polyimide along with indium tin oxide (ITO) top and bottom electrodes. High transmittance of over 90% in the wavelength range of 400 to 800 nm is accomplished with an ITO/polyimide/ITO/glass device. The device shows unipolar write‐once‐read‐many times (WORM) memory behavior with an ON/OFF current ratio of ~2 × 103, and the ratio remained without any significant degradation for over 104 s. The memory behavior of the device is considered to be governed by trap‐controlled space‐charge limited conduction (SCLC) and local filament formation. Based on molecular simulation of the polyimide, the location of energy states is different from that in the conventional charge transfer (CT) mechanism. Despite the relatively low ON/OFF current ratio, our results can give insight into the development of fully transparent memory device. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2016 , 54, 918–925
Keywords:anthracene  filament formation  films  partially aliphatic polyimide  polyimides  SCLC  transparency  transparent memory device  WORM
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