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Measurement of Mg Content in Zn1-xMgxO Films by Electron Probe Microanalysis
引用本文:延凤平 简水生 王琳 尾形健一 小池一步 佐佐诚彦 井上正崇 矢野满明. Measurement of Mg Content in Zn1-xMgxO Films by Electron Probe Microanalysis[J]. 中国物理快报, 2006, 23(2): 313-315
作者姓名:延凤平 简水生 王琳 尾形健一 小池一步 佐佐诚彦 井上正崇 矢野满明
作者单位:[1]Institute of Lightwave Technology, Beijing Jiaotong University, Beijing 100044 [2]New Material Research Center, Osaka Institute of Technology, Asahi-ku, Ohmiya, 535-8585, Osaka, Japan [3]Bio Venture Center, Osaka Institute of Technology, Asahi-ku, Ohmiya, 535-8585, Osaka, Japan
摘    要:
Zn1-xMgxO films are grown on A-sapphire substrates by molecular beam epitaxy, and Mg content in the Zn1-xMgxO films is measured by electron probe microanalysis (EPMA) when the acceleration voltage, the emission current, and the magnification are set to be 1 k V, 30 μA and 1000, respectively. The dead time is controlled within 17%-20% during the measurement with the receive angle of characteristic x-ray of 45°. The Mg content of the ZnMgO film is calculated by the low energy calibration and the ZAF calibration. By comparing the measurement result with the theoretical analysis and the EPMA result with the inductively coupled plasma (ICP), one can obtain that the measured value of Mg content of the samples is in good agreement with the theoretical analysis no matter whether the phase separation exists or not, and the correctness of ICP and EPMA is valid when Mg content in the samples is less than 0.5.

关 键 词:Zn1-xMgxO薄膜 电子探头微量分析 A-蓝宝石衬底 分子束外延 加速电压 发射电流
收稿时间:2005-08-02
修稿时间:2005-08-02

Measurement of Mg Content in Zn1-xMgxO Films by Electron Probe Microanalysis
YAN Feng-Ping, JIAN Shui-Sheng, WANG Lin, Kenichi OGATA, Kazuto KOIK, Shigehiko SASA, Masatake INOUE, Mitsuaki YANO. Measurement of Mg Content in Zn1-xMgxO Films by Electron Probe Microanalysis[J]. Chinese Physics Letters, 2006, 23(2): 313-315
Authors:YAN Feng-Ping   JIAN Shui-Sheng   WANG Lin   Kenichi OGATA   Kazuto KOIK   Shigehiko SASA   Masatake INOUE   Mitsuaki YANO
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