SiC based Si/SiC heterojunction and its rectifying characteristics |
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| Authors: | Zhu Feng Chen Zhi-Ming Li Lian-Bi Zhao Shun-Feng and Lin Tao |
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| Affiliation: | Department of Electronic Engineering, Xi'an University of Technology, Xi'an 710048, China |
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| Abstract: | The Si on SiC heterojunction is still poorly understood,
although it has a number of potential applications in electronic and
optoelectronic devices, for example, light-activated SiC power
switches where Si may play the role of an light absorbing layer. This
paper reports on Si films heteroepitaxially grown on the Si face of
(0001) n-type 6H-SiC substrates and the use of B2H_6 as a
dopant for p-Si grown at temperatures in a range of
700--950~\du. X-ray diffraction (XRD) analysis and transmission
electron microscopy (TEM) tests have demonstrated that the samples
prepared at the temperatures ranged from 850~℃ to 900~℃ are
characterized as monocrystalline silicon. The rocking XRD curves
show a well symmetry with FWHM of 0.4339° Omega. Twin
crystals and stacking faults observed in the epitaxial layers might
be responsible for widening of the rocking curves. Dependence of the
crystal structure and surface topography on growth temperature is
discussed based on the experimental results. The energy band structure
and rectifying characteristics of the Si/SiC heterojunctions are
also preliminarily tested. |
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| Keywords: | Si/6H-SiC heterojunction heteroepitaxy SiC |
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