Modeling of trap-assisted tunneling on performance of charge trapping memory with consideration of trap position and energy level |
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| Affiliation: | 1.Institute of Microelectronics, Peking University, Beijing 100871, China;2.School of Information and Communication, Beijing Information Science and Technology University, Beijing 100101, China |
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| Abstract: | In this work, the trap-assisted tunneling(TAT) mechanism is modeled as a two-step physical process for charge trapping memory(CTM). The influence of the TAT mechanism on CTM performance is investigated in consideration of various trap positions and energy levels. For the simulated CTM structure, simulation results indicate that the positions of oxide traps related to the maximum TAT current contribution shift towards the substrate interface and charge storage layer interface during time evolutions in programming and retention operations, respectively. Lower programming voltage and retention operations under higher temperature are found to be more sensitive to tunneling oxide degradation. |
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| Keywords: | trap assisted tunneling charge trapping memory tunneling oxide degradation |
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