Influence of thermal annealing on the microstructure,hardness and corrosion behavior of TiAlSiCuN nanocomposite films |
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| Authors: | J Shi M Q Wan H L Wang X Wang T ‐G Wang |
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| Affiliation: | 1. Institute of Materials Science and Engineering, Ocean University of China, Qingdao, China;2. Tianjin Key Laboratory of High Speed Cutting and Precision Processing, Tianjin University Technology and Education, Tianjin, China |
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| Abstract: | Nanocomposite TiAlSiCuN films were deposited on high speed steels by filtered magnetic arc ion plating. Detailed properties of the films annealed at various temperatures are studied. After thermal annealing at different temperatures ranging from 400 to 800 °C, changes in the film micro‐structure, chemical and phase composition, surface morphology, hardness and polarization curve properties were systematically characterized by X‐ray diffraction, X‐ray photoelectron spectroscopy, scanning electron microscopy, nano‐indenter and electrochemical workstation, respectively. It was found that the TiAlSiCuN films could be fully oxidized at 800 °C, Al and Ti atoms all diffused outwards and formed dense protective Al2O3 and TiO2 layer. Simultaneously, the TiAlN phase gradually disappeared. The films annealed at 400 °C obtained the highest hardness because of the certain grain growth and little generated oxides. Besides, the certain formation of dense protective Al2O3 layer made the TiAlSiCuN film annealed at 600 °C present the least corrosion current density and the corrosion voltage. Copyright © 2016 John Wiley & Sons, Ltd. |
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| Keywords: | TiAlSiCuN film thermal annealing hardness electrochemical |
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